• 제목/요약/키워드: PLZT 박막

검색결과 53건 처리시간 0.028초

졸-겔법에 의한 PLZT 합성과 강유전성 박막 제조 (Ferroelectric PLZT Thin Films Prepared by Sol-Gel Route)

  • 오영제;김정기;주기태;현상훈;정형진
    • 한국세라믹학회지
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    • 제29권11호
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    • pp.870-876
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    • 1992
  • Lead lanthanum zirconate titanate (PLZT, 6/65/35) powders, crack-free and dense thin films have been prepared by polymeric sol-gel process. Pyrolysis of the gel, crystallization and optical transmittance behavior of the PLZT thin film onto sapphire substrate have been studied. Esterification occurs during synthesis of PLZT complexation. Crystalline Pb phase was transiently formed near 450$^{\circ}C$. Content of perovskite phase in the films were increased with increasing thickness of film, but the kinetics of formation of perovskite phase in films was slower than that of powders. Transmittance of the films was decreased with increasing the temperature of heat treatment. Ferroelectric hysteresis loop measurements indicated increments of remanent polarization and coercive field for plenty more of perovskite phase.

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Sol-Gel법으로 제작된 PLZT박막의 Raman 연구 (Raman spectroscopy of PLZT thin films prepared by Sol-Gel processing)

  • 방선웅;장낙원;박정흠;마석범;박창엽;최형욱
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 1997년도 추계학술대회 논문집
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    • pp.52-55
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    • 1997
  • In this study, PLZT stock solutions were prepared by sol-gel processing to fabricate PLZT thin films. The stock solutions were spin-coated on ITO-glass and the film were annealed by rapid thermal annealing(RTA). The variation of tile crystallographic structure of the thin films and the phase transition with respect to it were observed using Raman spectra. Raman result showed that the band of spectra are broad as the amount of Zr substitution increased and specially, abrupt change occurs in the raman spectra upon crossing the tetragonal-rhombohedral phase boundry at 2/55/45 PLZT thin film. So, the fact that the crystallographic structure was transitted from tetragonal to rhombohedral structure was certified.

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비휘발성 메모리 소자를 위한 PLZT(x/30/70) 박막에 대한 La 농도변화의 효과 (The Effect of La Concentration on The PLZT(x/30/70) Thin Films for NVRAM Memory Device)

  • 김성진;윤영섭
    • 대한전자공학회:학술대회논문집
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    • 대한전자공학회 2000년도 하계종합학술대회 논문집(2)
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    • pp.28-31
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    • 2000
  • In this paper, the effects of La addition of PLZT(x/30/70) thin films Prepared by sol-gel method are investigated for NVFRAM application. The tetragonality (c/a), the grain size, and the surface roughness of PLZT thin films decrease with an increase of La concentration. As the La concentration increases, the dielectric constants at 10 kHz increase from 450 to 600, while the loss tangent decrease from 0.075 to 0.025. Also, the leakage current density at 100kV/cm decrease from 5.83$\times$10$^{-7}$ to 1.38$\times$10$^{-7}$ 4/$\textrm{cm}^2$. In the results of hysteresis loops measured at $\pm$170kV/cm, the remanent polarization and the coercive field of PLZT thin films with La concentration from 0 to 10㏖% decrease from 20.8 to 10.5 $\mu$C/cm and from 54.48 to 32.12kV/cm, respectively. After a fatigue measurement by applying 10$^{9}$ square pulses with $\pm$5V, the remanent polarizations of PLZT thin films with 0 and 10㏖% La concentration decrease about 64 and 42 % from initial state. In the results of retention measurement after 10$^{5}$ s, PLZT thin films with 0 to 10mo1% La concentration show that the remanent polarization is decreased about 43% and 9% from initial state, respectively.

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기판온도에 따른 PLZT 박막의 결정성과 전기적 특성 (Effects of Substrate Temperatures on the Crystallinity and Electrical Properties of PLZT Thin Films)

  • 이인석;윤지언;김상지;손영국
    • 한국전기전자재료학회논문지
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    • 제22권1호
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    • pp.29-34
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    • 2009
  • PLZT thin films were deposited on platinized silicon (Pt/$TiSiO_2$/Si) substrate by RF magnetron sputtering. A $TiO_2$ buffer layer was fabricated, prior to deposition of PLZT films. the layer was strongly affected the crystallographic orientation of the PLZT films. X-ray diffraction was performed on the films to study the crystallization of the films as various substrate temperatures (Ts). According to increasing Ts, preferred orientation of films was changed (110) plane to (111) plane. The ferroelectric, dielectric and electrical properties of the films were also investigated in detail as increased substrate temperatures. The PLZT films deposited at $400^{\circ}C$ showed good ferroelectric properties with the remnant polarization of $15.8{\mu}C/cm^2$ and leakage current of $5.4{\times}10^{-9}\;A/cm^2$.

Pt 또는 Ir 계열의 상부전극을 갖는 (Pb, La) (Zr, Ti)$O_3$ (PLZT) 박막의 누설전류특성에 미치는 수소 열처리의 효과 (Effect of Hydrogen on leakage current characteristics of (Pb, La) (Zr, Ti )$O_3$(PLZT) thin film capacitors with Pt or Ir-based top electrodes)

  • 윤순길
    • 한국재료학회지
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    • 제11권2호
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    • pp.151-154
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    • 2001
  • 상부전극, Pt, Ir, 그리고 $IrO_2$, 에 따라 수소 열처리전과 후, 그리고 회복열처리시 누설전류특성을 고찰하였다. Pt/PLZT/Pt 케페시터는 수소열처리 후에 다시 회복열처리를 수행하면 완전히 이력곡선의 회복을 보이며 또한 피로특성도 거의 회복 된다. Pt과 IrO$_2$ 상부전극의 경우의 진 누설전류 특성은 열처리조건에 관계없이 강한 시간 의존성을 갖는 space-charge influenced injection모델에 적합하다. 반면에 Ir 상부전극의 경우는 Ir과 PLZT 사이의 계면에 헝성된 전도성 상인 $IrO_2$로 인해 높은 누설전류 밀도를 보이면서 relaxation current 영역이 없이 steady state 영역을 보이는, 주로 Schottky barrier 모델에 의해 설명된다.

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누설전류를 고려한 Quasi-MFISFET 소자의 특성 (Characteristics of Quasi-MFISFET Device Considering Leakage Current)

  • 정윤근;정양희;강성준
    • 한국정보통신학회논문지
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    • 제11권9호
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    • pp.1717-1723
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    • 2007
  • 본 연구에서는 PLZT(10/30/70), PLT(10), PZT(30/70) 강유전체 박막을 이용한 quasi-MFISFET (Metal-Ferroelectric-Insulator-Semiconductor FET) 소자를 제작하여 드레인 전류 특성을 조사하였다. 이로부터, quasi-MHSFET 소자의 드레인 전류 크기가 강유전체 박막의 분극 크기에 따라 직접적인 영향을 받으며 결정된다는 사실을 알 수 있었다. 또, ${\pm}5V$${\pm}10V$의 게이트 전압변화를 주었을 때 메모리 윈도우는 각각 0.5V 와 1.3V 이었고, 강유전체 박막에 인가되는 전압에 의해 만들어지는 항전압의 변동에 따라 메모리 윈도우가 변화된다는 사실을 확인할 수 있었다. MFISFET 소자의 retention 특성을 알아보기 위 해 PLZT(10/30/70) 박막의 전기장과 시간지연에 따른 누설전류 특성을 측정하여 전류밀도 상수 $J_{ETO}$, 전기장 의존 요소 K, 시간 의존 요소 m을 구하고, 이들 파라미터를 이용하여 시간에 따른 전하밀도의 변화를 정량적으로 분석하였다.

PLZT박막의 제조 및 유전 특성에 관한 연구 (A Study on the Preparation and Dielectric Properties of the PLZT Thin Films.)

  • 박준열;박인길;이성갑;이영희
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 1995년도 춘계학술대회 논문집
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    • pp.187-191
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    • 1995
  • Thin film of the (Pb$\_$1-x/La.sub x/)(Zr$\_$0.25/Ti/Sub 0.48/) O$_3$(x=0~13[at%]) were prepared by Sol - Gel method. Multi-layer PLZT thin films were fabricated by spin-coating on Pt/Ti/SiO$_2$/Si substrate. The crystallinity and microstructure of the films were investigated with the sintering condition. At the sintering temperature of of 600[$^{\circ}C$], the perovskite phase was dominat. PLZT(11/52/48)thin films sintered at 600[$^{\circ}C$], 1[hr] had good dielectric constant (1236), dielectric loss (2.2[%]), remanent polarization (1.38[${\mu}$C/$\textrm{cm}^2$] and coercive field(16.86[ kV/cm]) respectively.

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Sol-Gel 법에 의한 X/40/60 PLZT 박막의 전기 및 광학 특성 (Electrical and Optical Characteristics of X/40/60 PLZT Thin Films by Sol-Gel Processing)

  • 이진욱;마석범;강종윤;장낙원;박정흠
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 1996년도 추계학술대회 논문집
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    • pp.139-142
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    • 1996
  • X/40/60 PLZT thin films were prepared by sol-gel processing and annealed by rapid thermal annealing(RTA). X/40/60 PLZT thin films were crystallized at 75$0^{\circ}C$ for 5min by RTA. Hysteresis curves were narrowed and coercive field was decreased from 50kV/cm to 31.2 kV/cm and remnant polarization was also decreased from 14.3$\mu$C/$\textrm{cm}^2$ to 6.72$\mu$C/$\textrm{cm}^2$ as La mol% increased. Dielectric constanat and optical transmittance were increased with increasing La mol%.

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