• Title/Summary/Keyword: PLASMA

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A Study for plasma nonuniformity measurement by PDM Tool (PDM Tool을 이용한 plasma nonuniformity 측정에 관한 연구)

  • 김상용;서용진;이우선;정헌상;김창일;장의구
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2000.07a
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    • pp.75-78
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    • 2000
  • This paper is estimated to enhance yield improvement and device reliability using PDM(plasma damage monitoring) system capable of in-suit detection about plasma nonuniformity. PDM Tool is the non-contact method of wafer and surface potential electrode(kelvin probe). Its tool measures Vox(oxide barrier) with charge created by plasma. It's possible to inspect the wafer damage generated by plasma charge and analysis of in-situ monitoring data. we obtained the good data which is continuously prevented from plasma damage using its tool for 10weeks. This tool is contributed to preventive steps contemporaneously inspecting the difference of inter-chamber.

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Control of Contact Angle by Surface Treatment using Sanning Plasma Method (주사 플라즈마 법(SPM)을 이용한 소수성 표면처리)

  • Kim, Young-Gi;Choi, Byoung-Jung;Yang, Sung-Chae
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.23 no.1
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    • pp.10-13
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    • 2010
  • The plasma processing technologies of thin film deposition and surface treatment technique have been applied to many industrial fields. This study is purposed Large-area uniformity and surface treatment on the stainless substrate. We treat surface of stainless by $CF_4$ plasma. $CF_4$ plasma is generated by using SPM(Scanning plasma method)which is kind a of CVD. Generally, SPM has been used for uniform surface treatment using a crossed electromagnetic field. The optimum discharge condition has been studied for the gas pressure, the magnetic flux density and the distance between substrate and electrodes. In result, contact angle is increased by surface treatment using $CF_4$ Plasma. Therefore we expect that SPM to control contact angle is applied to many industries.

Measurement of plasma potential by a biased cut off probe

  • Kim, Dae-Ung;Kim, Jeong-Hyeong;Seong, Dae-Jin;Yu, Sin-Jae;Jang, Hong-Yeong
    • Proceedings of the Korean Vacuum Society Conference
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    • 2010.02a
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    • pp.465-465
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    • 2010
  • Cut off probe, the efficient method, can measure the plasma parameters like the plasma electron density and the electron temperature. Plasma potential is also one of the important parameters in plasma processing but cannot be measured by cut off probe yet. Thus we developed method to measure plasma potential by focusing on relation between bias on a tip and sheath around tip. The system consist of a ICP(Inductive Coupled Plasma) source, a Network analyzer and a bias tee that can be bridge apply DC voltage on the cut off probe tip. Plasma potential is identified by using this system. The results corresponded well with the measured results by single langmuir probe(SLP).

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Extreme Ultraviolet Plasma and its Emission Characteristics Generated from the Plasma Focus in Accordance with Gas Pressure for Biological Applications

  • Kim, Jin Han;Lee, Jin Young;Kim, Sung Hee;Choi, Eun Ha
    • Proceedings of the Korean Vacuum Society Conference
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    • 2013.08a
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    • pp.178.2-178.2
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    • 2013
  • Conventional ultraviolets A,B,C are known to be very important factor of killing, changing surface properties of biological cells and materials. It is of great importance to investigate the influence of extreme ultraviolet (EUV) exposure on the biological cell. Here we have studied high density EUV plasma and its emission characteristics, which have been generated by plasma focus device with hypercycloidal pinch (HCP) electrode under various Ar gas pressures ranged from 30~500 mTorr in this experiment. We have also measured the plasma characteristics generated from the HCP plasma focus device such as electron temperature by the Boltzman plot, plasma density by the Stark broading method, discharge images by open-shuttered pin hole camera, and EUV emission signals by using the photodiode AXUV-100 Zr/C.

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Dissolution Characteristics of Copper Oxide in Gas-liquid Hybrid Atmospheric Pressure Plasma Reactor Using Organic Acid Solution

  • Kwon, Heoung Su;Lee, Won Gyu
    • Applied Chemistry for Engineering
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    • v.33 no.2
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    • pp.229-233
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    • 2022
  • In this study, a gas-liquid hybrid atmospheric pressure plasma reactor of the dielectric barrier discharge method was fabricated and characterized. The solubility of copper oxide in the organic acid solution was increased when argon having a larger atomic weight than helium was used during plasma discharge. There was no significant effect of mixing organic acid solutions under plasma discharge treatment on the variation of copper oxide's solubility. As the applied voltage for plasma discharge and the concentration of the organic acid solution increased, the dissolution and removal power of the copper oxide layer increased. Solubility of copper oxide was more affected by the concentration in organic acid solution rather than the variation of plasma applied voltage. The usefulness of hybrid plasma reactor for the surface cleaning process was confirmed.

Inactivation of Zooplankton Artemia sp. Using Plasma Process (플라즈마 공정을 이용한 동물성 플랑크톤 Artemia sp. 불활성화)

  • Dong-Seog Kim;Young-Seek Park
    • Journal of Environmental Science International
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    • v.32 no.3
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    • pp.197-204
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    • 2023
  • This study aims to inactivate Artemia sp. (Zooplankton) in ballast water through the dielectric barrier discharge (DBD) plasma process. The DBD plasma process has the advantage of enabling direct electric discharge in water and utilizing chemically active species generated by the plasma reaction. The experimental conditions for plasma reaction are as follows; high voltage of 9-22 kV, plasma reaction time of 15-600 s, and air flow rate of 0.5-5.5 L/min. The results showed that the optimal experimental conditions for Artemia sp inactivation were 16 kV, 60 s, 2.5 L/min, respectively. The concentrations of total residual oxidants and ozone generated by plasma reaction increased with an increase of in voltage and reaction time, and the concentration of generated air did not increase above a certain amount.

Optical Diagnostics of Nanopowder Processed in Liquid Plasmas

  • Bratescu, M.A.;Saito, N.;Takai, O.
    • Proceedings of the Korean Vacuum Society Conference
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    • 2011.02a
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    • pp.17-18
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    • 2011
  • Plasma in liquid phase has attracted great attention in the last few years by the wide domain of applications in material processing, decomposition of organic and inorganic chemical compounds and sterilization of water. The plasma in liquid is characterized by three main regions which interact each - other during the plasma operation: the liquid phase, which supply the plasma gas phase with various chemical compounds and ions, the plasma in the gas phase at atmospheric pressure and the interface between these two regions. The most complex region, but extremely interesting from the fundamental, chemical and physical processes which occur here, is the boundary between the liquid phase and the plasma gas phase. In our laboratory, plasma in liquid which behaves as a glow discharge type, is generated by using a bipolar pulsed power supply, with variable pulse width, in the range of 0.5~10 ${\mu}s$ and 10 to 30 kHz repetition rate. Plasma in water and other different solutions was characterized by electrical and optical measurements. Strong emissions of OH and H radicals dominate the optical spectra. Generally water with 500 ${\mu}S/cm$ conductivity has a breakdown voltage around 2 kV, depending on the pulse width and the repetition rate of the power supply. The characteristics of the plasma initiated in ultrapure water between pairs of different materials used for electrodes (W and Ta) were investigated by the time-resolved optical emission and the broad-band absorption spectroscopy. The deexcitation processes of the reactive species formed in the water plasma depend on the electrode material, but have been independent on the polarity of the applied voltage pulses. Recently, Coherent anti-Stokes Raman Spectroscopy method was employed to investigate the chemistry in the liquid phase and at the interface between the gas and the liquid phases of the solution plasma system. The use of the solution plasma allows rapid fabrication of the metal nanoparticles without being necessary the addition of different reducing agents, because plasma in the liquid phase provides a reaction field with a highly excited energy radicals. We successfully synthesized gold nanoparticles using a glow discharge in aqueous solution. Nanoparticles with an average size of less than 10 nm were obtained using chlorauric acid solutions as the metal source. Carbon/Pt hybrid nanostructures have been obtained by treating carbon balls, synthesized in a CVD chamber, with hexachloro- platinum acid in a solution plasma system. The solution plasma was successfully used to remove the template remained after the mesoporous silica synthesis. Surface functionalization of the carbon structures and the silica surface with different chemical groups and nanoparticles, was also performed by processing these materials in the liquid plasma.

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우주통신에 있어서의 plasma의 응용

  • Schlesinger, S.P.
    • 전기의세계
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    • v.13 no.3
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    • pp.4-7
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    • 1964
  • 우주에 99%이상을 차지하고 있는 Plasma를 아주 기본적인 개념으로 설명하고, 현재 연구가 계속되고 있는 문제와 MHD, 유지(propulsion)등 광범한 영역에 걸친 Plasma응용문제를 소개하는 동시에 필자가 지금 Plasma의 온도와 전파특성을 연구하고 있음을 언급하고 있다.

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