• Title/Summary/Keyword: P-P bonding

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Wafer-Level Three-Dimensional Monolithic Integration for Intelligent Wireless Terminals

  • Gutmann, R.J.;Zeng, A.Y.;Devarajan, S.;Lu, J.Q.;Rose, K.
    • JSTS:Journal of Semiconductor Technology and Science
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    • v.4 no.3
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    • pp.196-203
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    • 2004
  • A three-dimensional (3D) IC technology platform is presented for high-performance, low-cost heterogeneous integration of silicon ICs. The platform uses dielectric adhesive bonding of fully-processed wafer-to-wafer aligned ICs, followed by a three-step thinning process and copper damascene patterning to form inter-wafer interconnects. Daisy-chain inter-wafer via test structures and compatibility of the process steps with 130 nm CMOS sal devices and circuits indicate the viability of the process flow. Such 3D integration with through-die vias enables high functionality in intelligent wireless terminals, as vertical integration of processor, large memory, image sensors and RF/microwave transceivers can be achieved with silicon-based ICs (Si CMOS and/or SiGe BiCMOS). Two examples of such capability are highlighted: memory-intensive Si CMOS digital processors with large L2 caches and SiGe BiCMOS pipelined A/D converters. A comparison of wafer-level 3D integration 'lith system-on-a-chip (SoC) and system-in-a-package (SiP) implementations is presented.

SHEAR BOND STRENGTH OF METAL BRACKETS BONDED WITH LIGHT-CURED ADHESIVE: AN IN VITRO COMPARATIVE STUDY (광중합 접착제로 접착된 금속 브라켓의 전단접착강도에 관한 연구)

  • Chang, Young-Il;Lee, Suhng-Jin
    • The korean journal of orthodontics
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    • v.22 no.2 s.37
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    • pp.289-296
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    • 1992
  • The purpose of this study was to evaluate and compare the shear bond strengths and failure sites of metal brackets bonded with chemically cured adhesive and light-cured adhesive. 10 brackets were bonded on prepared enamel surfaces with $Transbond^{circledR}$ (Unitek/3M; U.S.A.) light-cured orthodontic adhesive and another 10 brackets were bonded with $Ortho-one^{\circledR}$ (Bisco:U.S.A.) chemically cured orthodontic adhesive. 24 hours after bonding, the Instron universal testing machine was used to measure the shear bond strengths. The failure sites were examined under streoscopic microscope. The results were as follows: 1 . The mean shear bond strength of metal brackets bonded with light-cured adhesive was lower than that of metal brackets bonded with chemically cured adhesive, but the difference was not statistically significant (p < 0.05). 2. Regardless of the type of adhesives, the brackets were failed primarily at the bracket base-adhesive interface. 3. Bonding of metal brackets with light-cured adhesive is considered to be clinically acceptable.

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A Study on Mechanical Characteristics of Interface of Ceramic/Metal Composites (세라믹/금속 이종재료 계면의 기계적 특성에 관한 연구)

  • Seo, Do-Won;Kim, Hak-Kun;Song, Jun-Hee;Lim, Jae-Kyoo;Park, Chan-Gyung
    • Proceedings of the KSME Conference
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    • 2000.04a
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    • pp.121-126
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    • 2000
  • Metal/Ceramic structures have many attractive properties, with great potential for applications that demand high stiffness, as well as chemical and biological stability, thermal and electrical insulation. They are currently in use for mechanical and thermal protection in cutting tool and engine parts. With all their great advantage, ceramics suffer from one major problem they are brittle, and are especially susceptible to cracking from surface contacts. Delamination at the interfaces with adjacent layers is a particularly disturbing problem, and can cause premature failure of a composite system. so determination of adhesive properties of coating is one of the most important problems for the extension of the use of coated materials. In this work, mechanical characteristics of Interface of ceramic/Metal composites are evaluated by means of hardness test, indentation test apparent interfacial toughness and bonding strength test. The interface indentation test provides a relation between the applied load(P) and the length of the crack(a) created at the interface between the coating and the substrate.

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Analysis of Au-DNA Nanowires by Adding HCl to Change Charges of Au Nanoparticles

  • Jeong, Yun-Ho;Kim, Dae-Cheol;Park, Hyeon-Gyu;No, Yong-Han
    • Proceedings of the Korean Vacuum Society Conference
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    • 2014.02a
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    • pp.421.1-421.1
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    • 2014
  • Top-down processes based on photolithography technology have been developed by using light sources with short wavelength, however, the processes are expected to meet their limits in higher integration of semiconductor integrated circuits. To overcome the limits, researches on bottom-up processes have been proceeded. One of those, fabrication of nanodevices by using nanoparticles has been on research. But it is difficult to align nanoparticles at appropriate positions. To resolve this, studies has been proceeded to form nanowires by bonding DNA molecules which have self-assembly property and positive-charged functionalized gold nanoparticles. There are negative-charged phosphates in backbones of DNA molecules. By using the attractive force between the negative charge of the phosphates and the positive charge of gold nanoparticles, the Au-DNA nanowires are made. However, bonding Au nanoparticles only on DNA molecules, not other nanoparticles, is to be solved. So we studied to resolve this problem. In the formation of Au nanoparticles, we changed the charge of Au nanoparticles by adding HCl to control pH of the functionalized nanoparticles, measured zeta potential. Then we bonded the nanoparticles and DNA molecules and made observation by using FE-SEM and AFM.

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Formation of porous 3C-SiC thin film by anodization with UV-LED (양극산화법과 UV-LED를 이용한 다공성 3C-SiC 박막 형성)

  • Kim, Kang-San;Chung, Gwiy-Sang
    • Journal of Sensor Science and Technology
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    • v.18 no.4
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    • pp.307-310
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    • 2009
  • This paper describes the formation of porous 3C-SiC by anodization. 3C-SiC thin films were deposited on p-type Si(100) substrates by APCVD using HMDS(Hexamethyildisilane: $Si_2(CH_3)_6$). UV-LED(380 nm) was used as a light source. The surface morphology was observed by SEM and the pore size was increased with increase of current density. Pore diameter of 70 $\sim$ 90 nm was achieved at 7.1 mA/cm$^2$ current density and 90 sec anodization time. FT-IR was conducted for chemical bonding of thin film and porous 3C-SiC. The Si-H bonding was observed in porous 3C-SiC around wavenumber 2100 cm$^{-1}$. PL shows the band gap enegry of thin film(2.5 eV) and porous 3C-SiC(2.7 eV).

Saccharide Effect on the Lower Critical Solution Temperature of Poly(organophosphazenes) with Methoxy-poly(ethylene glycol) and Amino Acid Esters as Side Groups

  • Lee, Sang-Beom;Sohn, Youn-Soo;Song, Soo-Chang
    • Bulletin of the Korean Chemical Society
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    • v.24 no.7
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    • pp.901-905
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    • 2003
  • The lower critical solution temperature (LCST) of thermosensitive poly(organophosphazenes) with methoxypoly(ethylene glycol) (MPEG) and amino acid esters as side groups was studied as a function of saccharide concentration in aqueous solutions of mono-, di-, and polysaccharides. Most of the saccharides decreased the LCST of the polymers, and the LCST decrease was more prominently observed by saccharides containing a galactose ring, such as D-galactose, D-galactosamine and D-lactose, and also the polysacccharide, 1-6-linked D-dextran effectively decreased the LCST of the polymers. Such an effect was discussed in terms of intramolecular hydrogen bonding of saccharides in polymer aqueous solution. The saccharide effect was found to be almost independent on the kinds of the amino acid esters and MPEG length of the polymers. Such a result implies that the polymer-saccharide interaction in aqueous solution is clearly influenced by the structure of sacchardes rather than by that of the polymers. The acid saccharides such as D-glucuronic and D-lactobionic acid increased the LCST, which seems to be due to their pH effect.

Properties of SiOCH Thin Film Lour Dielectric by BTMSM/O2 Flow Rates (BTMSM/O2 유량변화에 따른 SiOCH 박막의 저유전 특성)

  • Park, In-Cheol;Kim, Hong-Bae
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.22 no.2
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    • pp.132-136
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    • 2009
  • SiOC thin film of hybrid-type that is the limelight as low dielectric material of next generation were deposited by plasma enhanced chemical vapor deposition (PECVD) method with bistrimethylsilylmethane (BTMSM) precursor increased by 2 sccms from 24 sccms to 32 sccm. Manufactured samples are analyzed components by measuring FT/IR absorption lines. It is a tendency that seems to be growing of Si-O-Si(C) bonding group and narrowing of Si-O-$CH_3$ bonding group relative to the increasing flow-rate BTMSM. The chemical shift in the XPS analysis was shown in the specimens between the BTMSM=26 sccm and BTMSM = 28 sccm. The binding energy of Si 2p, C 1s and O 1s electron orbit spectra was the low-est at the specimen of the BTMSM=26 sccm. From the results of electrical Properties using the 1 MHz C - V measurements, the dielectric constant was 2.32 at the specimen with the BTMSM = 26 sccm.

Complex Formation of Syndiotactic Poly(methacrylic acid) with Complementary Polymers through Hydrogen Bonding

  • Kim, Bum-Sung;Jeon, Seung-Ho;Ree, Tai-Kyue
    • Bulletin of the Korean Chemical Society
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    • v.7 no.3
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    • pp.238-240
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    • 1986
  • Complex formations between syndiotactic poly(methacrylic acid) (st-PMAA) and poly(N-vinyl pyrrolidone) (PVP), and that between st-PMAA and polyethyleneoxide (PEO) through hydrogen bonding were studied by viscometry and potentiometry. Reduced viscosity (${\eta}_{red}$) was measured at various mole fraction of PVP or PEO with respect to a constant amount of st-PMAA. Observation shows a sharp minimum at the 1:1 mole ratio of st-PMAA:PVP or st-PMAA:PEO, which shows that the complexation becomes optimal and the complex has a compact structure in this ratio. Variation of pH also supports this conclusion. This is the case of the system of st-PMAA and PVP in water as well as in DMF. Also the complexation is much enhanced when the molecular weight of PVP is high. Meanwhile, the system of st-PMAA and PEO shows a little different behavior, i.e., this system does not form the complex in DMF and does only in water. It is because the interaction st-PMAA with PEO is weaker than that with PVP.

EFFECT OF CUTTING INSTRUMENTS ON THE DENTIN BOND STRENGTH OF A SELF-ETCH ADHESIVE (상아질 삭제기구가 자가부식 접착제의 결합강도에 미치는 효과)

  • Lee, Young-Gon;Moon, So-Ra;Cho, Young-Gon
    • Restorative Dentistry and Endodontics
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    • v.35 no.1
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    • pp.13-19
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    • 2010
  • The purpose of this study was to compare the microshear bond strength of a self-etching primer adhesive to dentin prepared with different diamond points, carbide burs and SiC papers, and also to determine which SiC paper yield similar strength to that of dentinal surface prepared with points or burs. Fifty-six human molar were sectioned to expose the occlusal dentinal surfaces of crowns and slabs of 1.2 mm thick were made. Dentinal surfaces were removed with three diamond points, two carbide burs, and three SiC papers. They were divided into one of eight equal groups (n = 7); Group 1: standard diamond point(TF-12), Group 2: fine diamond point (TF-12F), Group 3: extrafine diamond point (TF-12EF), Group 4: plain-cut carbide bur (no. 245), Group 5: cross-cut carbide bur (no. 557), Group 6 : P 120-grade SiC paper, Group 7: P 220-grade SiC paper, Group 8: P 800-grade SiC paper. Clearfil SE Bond was applied on dentinal surface and Clearfil AP-X was placed on dentinal surface using Tygon tubes. After the bonded specimens were subjected to uSBS testing, the mean uSBS (n = 20 for each group) was statistically compared using one-way ANOV A and Tukey HSD test. In conclusion, the use of extrafine diamond point is recommended for improved bonding of Clearfil SE Bond to dentin. Also the use of P 220-grade SiC paper in vitro will be yield the results closer to dentinal surface prepared with fine diamond point or carbide burs in vivo.

A Study on the Mixed Organic Solvent Dose and Subjective Symptoms of Direct and Indirect Bonding workers in Shoes Manufacturing Industrial (신발제조업체의 접착제 사용에 따른 직접·간접폭로 근로자들의 복합유기용제 폭로량과 자각증상 비교)

  • Byun, Jeong-Sik;Kim, Jeong-Yun;Cho, Young-Chae;Kim, Dong-Hyun
    • Journal of Korean Society of Occupational and Environmental Hygiene
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    • v.5 no.1
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    • pp.48-58
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    • 1995
  • This study was performed to find out the exposure level of mixed organic solvents, excretion of urinary hippuricacid and subjective symptoms according to the exposure of organic solvents of female workers who works on 5 shoes manufacturing industries in Taejon City from 24, september to 20, october 1993. The studied groups were divided into 3 groups that were consist of direct exposure group(48 workers), indirect exposure group(49 workers) and non-exposure group(68 workers) to the organic solvents. The exposure levels of toluene of direct exposure group which $89.86{\pm}56.20ppm$ had higher than that of indirect exposure group which had $40.23{\pm}47.21ppm$. In the exposure level of mixed organic solvent(R-value), direct exposure group was $2.84{\pm}1.53$ and exceeded approximatly 3 times the R-value. Whereas, indirect exposure group was not exceeded the R-value as $0.80{\pm}0.61$. In the excretion level of urinary hippuric acid, direct exposure group was $1.78{\pm}1.25g/l$, indirect exposure group was $1.22{\pm}0.93g/l$ and non-exposure group was $0.51{\pm}0.18g/l$ respectively. Therefore both direct exposure group and indirect exposure group were significantly higher than non-exposure group(P<0.01). In the correlation between toluene levels and urinary hippuric acid level, the direct exposure group had positive correlation(R=0.8309, P<0.01), also indirect exposure group had positive correlation(R=0.5859, P<0.05) and also in the correlation between the R value of mixed organic solvents and the urinary hippuric acid levels, the direct exposure group had positive correlation(R=0.4492, P<0.05), and indirect exposure group had ositive correlation(R=0.7911, P<0.01). In the complain rates of the worker's subjective symptoms at work, both direct exposure group and indirect exposure group were higher than non-exposure group(P<0.05, P<0.01). But the sujective symptoms of "floating sensation" of direct exposure group had significantly higher than indirect exposure group. In the percent of subjective symptoms complaints during the worker's daily life, both direct exposure group and indirect exposure group had generally more statistical significance than nonexposure group(P<0.01), direct exposure group had not statistical significant difference from indirect exposure group. As the results mentioned above, it has been analysed that the indirect at the adjacent manufaturing process are exposed to the considerable amount of solvent. Therefore, I think that there should be the betterment of surrounding through the complete working environment management to the occurrence source of the organic solvent, the changes of health management system to the indirect-exposed workers, and the systematic management of the special medical examination and the like.

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