• Title/Summary/Keyword: Oxide layers

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Vacuum thermal evaporated transparent cathodes for organic light-emitting devices (OLED를 위한 진공 열 증착 투명 음극 형성 기술)

  • Moon, Dae-Gyu
    • Vacuum Magazine
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    • v.1 no.2
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    • pp.19-23
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    • 2014
  • Transparent and top emission organic light-emitting device (OLEDs) are the important issues in realizing new display applications such as see-through electronic displays, and flexible displays. The cathode of the transparent and top emission OLEDs should be transparent in the visible light and should not give any damage to the underlying organic layers, in addition to its intrinsic role of injecting electrons into the organic layers. Several authors have investigated the transparent conducting oxide films prepared by sputtering methods. They have introduced the sophisticated sputtering process for reducing the damages. Other groups have developed thermally evaporated transparent cathodes which are believed to be damage free without causing any permanent defect to the organic layers. This review focuses on the vacuum evaporated damage free transparent cathodes.

Fabrication of $CeO_2$ Buffer Layer Using MOD Process

  • Kim, Young-Kuk;Yoo, Jai-Moo;Chung, Kook-Chae;Ko, Jae-Woong
    • Progress in Superconductivity and Cryogenics
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    • v.8 no.4
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    • pp.19-21
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    • 2006
  • Biaxially textured Ni was fabricated by electrodeposition process and delaminated from the biaxially textured cathode surface for further buffer layer deposition process. Those electrode posited Ni substrates showed well-developed biaxial texture and smooth surface. In order to improve the thermal stability of Ni substrates, Mn was alloyed by adding Mn precursor into the electrodeposition bath. Subsequently, $CeO_2$ buffer layers are deposited by MOD process to prevent interfacial reaction between superconductor and substrates. In particular, Bismuth oxide was added to $CeO_2$ to realize lower temperature processing of buffer layers. The microstructure and texture development of each layers have been investigated. Preliminary results shows that all electro/chemical process can be a candidate for cost effective route to YBCO coated conductor.

Dynamic/static stability characteristics of sandwich FG porous beams

  • Weijia Yu;Linyun Zhou
    • Steel and Composite Structures
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    • v.46 no.2
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    • pp.203-210
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    • 2023
  • In the present research, dynamic deflections of a sandwich beam having functionally graded (FG) porous core have been investigated assuming that the sandwich beam is exposed to a pulse load of blast type. The two layers of sandwich beam have been made of a polymeric matrix reinforced by graphene oxide powder (GOP). The micromechanical formulation of the layers has been done via Halpin-Tsai model. The solution method is chosen to be Ritz method which is an efficient method to solve the system of equations of beams modeled based on a higher-order theory. To derive the time history of sandwich beam under pulse load, Laplace method has been used. The porosity content of the core, the GOP content of the layers, thickness of the layer and also duration of the applied load have great influences of the responses of sandwich beam.

Rectifying and Nitrogen Monoxide Gas Sensing Properties of a Spin-Coated ZnO/CuO Heterojunction (스핀코팅법으로 제작한 산화아연/산화구리 이종접합의 정류 및 일산화질소 가스 감지 특성)

  • Hwang, Hyeonjeong;Kim, Hyojin
    • Korean Journal of Materials Research
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    • v.26 no.2
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    • pp.84-89
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    • 2016
  • We present the rectifying and nitrogen monoxide (NO) gas sensing properties of an oxide semiconductor heterostructure composed of n-type zinc oxide (ZnO) and p-type copper oxide thin layers. A CuO thin layer was first formed on an indium-tin-oxide-coated glass substrate by sol-gel spin coating method using copper acetate monohydrate and diethanolamine as precursors; then, to form a p-n oxide heterostructure, a ZnO thin layer was spin-coated on the CuO layer using copper zinc dihydrate and diethanolamine. The crystalline structures and microstructures of the heterojunction materials were examined using X-ray diffraction and scanning electron microscopy. The observed current-voltage characteristics of the p-n oxide heterostructure showed a non-linear diode-like rectifying behavior at various temperatures ranging from room temperature to $200^{\circ}C$. When the spin-coated ZnO/CuO heterojunction was exposed to the acceptor gas NO in dry air, a significant increase in the forward diode current of the p-n junction was observed. It was found that the NO gas response of the ZnO/CuO heterostructure exhibited a maximum value at an operating temperature as low as $100^{\circ}C$ and increased gradually with increasing of the NO gas concentration up to 30 ppm. The experimental results indicate that the spin-coated ZnO/CuO heterojunction structure has significant potential applications for gas sensors and other oxide electronics.

Structural and Electrical Features of Solution-Processed Li-doped ZnO Thin Film Transistor Post-Treated by Ambient Conditions

  • Kang, Tae-Sung;Koo, Jay-Hyun;Kim, Tae-Yoon;Hong, Jin-Pyo
    • Proceedings of the Korean Vacuum Society Conference
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    • 2012.08a
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    • pp.242-242
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    • 2012
  • Transparent oxide semiconductors are increasingly becoming one of good candidates for high efficient channel materials of thin film transistors (TFTs) in large-area display industries. Compare to the conventional hydrogenated amorphous silicon channel layers, solution processed ZnO-TFTs can be simply fabricated at low temperature by just using a spin coating method without vacuum deposition, thus providing low manufacturing cost. Furthermore, solution based oxide TFT exhibits excellent transparency and enables to apply flexible devices. For this reason, this process has been attracting much attention as one fabrication method for oxide channel layer in thin-film transistors (TFTs). But, poor electrical characteristic of these solution based oxide materials still remains one of issuable problems due to oxygen vacancy formed by breaking weak chemical bonds during fabrication. These electrical properties are expected due to the generation of a large number of conducting carriers, resulting in huge electron scattering effect. Therefore, we study a novel technique to effectively improve the electron mobility by applying environmental annealing treatments with various gases to the solution based Li-doped ZnO TFTs. This technique was systematically designed to vary a different lithium ratio in order to confirm the electrical tendency of Li-doped ZnO TFTs. The observations of Scanning Electron Microscopy, Atomic Force Microscopy, and X-ray Photoelectron Spectroscopy were performed to investigate structural properties and elemental composition of our samples. In addition, I-V characteristics were carried out by using Keithley 4,200-Semiconductor Characterization System (4,200-SCS) with 4-probe system.

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Hafnium Oxide Layer Based Metal-Oxide-Semiconductor (MOS) Capacitors with Annealing Temperature Variation

  • Lee, Na-Yeong;Choe, Byeong-Deok
    • Proceedings of the Korean Vacuum Society Conference
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    • 2016.02a
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    • pp.318.1-318.1
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    • 2016
  • Hafnium Oxide (HfOx) has been attracted as a promising gate dielectric for replacing SiO2 in gate stack applications. In this paper, Metal-Oxide-Semiconductor (MOS) capacitor with solution processed HfO2 high-k material as a dielectric were fabricated. The solvent using $HfOCl2{\cdot}8H2O$ dissolve in 2-Methoxy ethanol was prepared at 0.3M. The HfOx layers were deposited on p-type silicon substrate by spin-coating at $250^{\circ}C$ for 5 minutes on a hot plate and repeated the same cycle for 5 times, followed by annealing process at 350, 450 and $550^{\circ}C$ for 2 hours. When the annealing temperature was increased from 350 to $550^{\circ}C$, capacitance value was increased from 337 to 367 pF. That was resulted from the higher temperature of HfOx which have more crystallization phase, therefore dielectric constant (k) was increased from 11 to 12. It leads to the formation of dense HfOx film and improve the ability of the insulator layer. We confirm that HfOx layer have a good performance for dielectric layer in MOS capacitors.

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Study of ITO/ZnO/Ag/ZnO/ITO Multilayer Films for the Application of a very Low Resistance Transparent Electrode on Polymer Substrate

  • Han, Jin-Woo;Han, Jeong-Min;Kim, Byoung-Yong;Kim, Young-Hwan;Kim, Jong-Yeon;Ok, Chul-Ho;Seo, Dae-Shik
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.20 no.9
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    • pp.798-801
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    • 2007
  • Multilayer transparent electrodes, having a much lower electrical resistance than the widely used transparent conducting oxide electrodes, were prepared by using radio frequency magnetron sputtering. The multilayer structure consisted of five layers, indium tin oxided (ITO)/zinc oxide (ZnO)/Ag/zinc oxide (ZnO)/ITO. With about 50 nm thick ITO films, the multilayer showed a high optical transmittance in the visible range of the spectrum and had color neutrality. The electrical and optical properties of ITO/ZnO/Ag/ZnO/ITO multilayer were changed mainly by Ag film properties, which were affected by the deposition process of the upper layer. Especially ZnO layer was improved to adhesion of Ag and ITO. A high quality transparent electrode, having a resistance as low as and a high optical transmittance of 91% at 550 nm, was obtained. It could satisfy the requirement for the flexible OLED and LCD.

Indium-Zinc Oxide Thin Film Transistors Based N-MOS Inverter (Indium-Zinc 산화물 박막 트랜지스터 기반의 N-MOS 인버터)

  • Kim, Han-Sang;Kim, Sung-Jin
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.30 no.7
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    • pp.437-440
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    • 2017
  • We report on amorphous thin-film transistors (TFTs) with indium zinc oxide (IZO) channel layers that were fabricated via a solution process. We prepared the IZO semiconductor solution with 0.1 M indium nitrate hydrate and 0.1 M zinc acetate dehydrate as precursor solutions. The solution- processed IZO TFTs showed good performance: a field-effect mobility of $7.29cm^2/Vs$, a threshold voltage of 4.66 V, a subthreshold slope of 0.48 V/dec, and a current on-to-off ratio of $1.62{\times}10^5$. To investigate the static response of our solution-processed IZO TFTs, simple resistor load-type inverters were fabricated by connecting a $2-M{\Omega}$ resistor. Our IZOTFTbased N-MOS inverter performed well at operating voltage, and therefore, isa good candidate for advanced logic circuits and display backplane.

Reduced Graphene Oxide Field-Effect Transistor for Temperature and Infrared Sensing

  • Trung, Tran Quang;Tien, Nguyen Thanh;Kim, Do-Il;Lee, Nae-Eung
    • Proceedings of the Korean Vacuum Society Conference
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    • 2012.02a
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    • pp.552-552
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    • 2012
  • We fabricated reduced graphene oxide field-effect transistor (RGO-FET) on glass for highly sensitive temperature and IR detection. The device has the channels of RGO responsive to physical stimuli such as temperature and IR. The RGO sensing layers are fabricated from exfoliated graphene oxide sheets that are deposited to form a thin continuous network by electrostatic assembly. These graphene oxide networks are reduced toward reduce graphene oxide by exposure to a hydrazine hydrate vapor. To improve performance and eliminate interferences from oxygen and water vapor absorption to electrical properties of RGO-FET, the sensor devices were encapsulated by the tetratetracontane layer after annealing treatment. The device with encapsulation layer showed lower hysteresis, improved stability, and better repeatability. The temperature response of RGO-FET is examined by measuring changing the temperature, the device exhibited the high sensitivity and repeatability even with the temperature interval of 1 K. We also demonstrated that our devices have capability of IR sensing.

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