• Title/Summary/Keyword: Oxide Semiconductors

Search Result 191, Processing Time 0.036 seconds

Amorphous Oxide Semiconductor: Factors Determining TFT Performance and Stability

  • Kamiya, Toshio;Nomura, Kenji;Hosono, Hideo
    • 한국정보디스플레이학회:학술대회논문집
    • /
    • 2009.10a
    • /
    • pp.322-325
    • /
    • 2009
  • Amorphous oxide semiconductors (AOSs) are expected as new channel materials in TFTs for largearea and/or flexible FPDs, and several prototype displays have been demonstrated in these five years since the first report of AOS TFT. In this paper, we review fundamental materials science of AOSs that have been clarified to date in connection with operation characteristics of AOS TFTs.

  • PDF

High performance organic gate dielectrics for solution processible organic and inorganic thin-film transitors

  • Ga, Jae-Won;Jang, Gwang-Seok;Lee, Mi-Hye
    • Proceedings of the Materials Research Society of Korea Conference
    • /
    • 2012.05a
    • /
    • pp.64.1-64.1
    • /
    • 2012
  • Next generation displays such as high performance LCD, AMOLED, flexible display and transparent display require specific TFT back-planes. For high performance TFT back-planes, low temperature poly silicon (LTPS), and metal-oxide semiconductors are studied. Flexible TFT backplanes require low temperature processible organic semiconductors. Not only development of active semiconducting materials but also design and synthesis of semiconductor corresponding gate dielectric materials are important issues in those display back-planes. In this study, we investigate the high heat resistant polymeric gate dielectric materials for organic TFT and inorganic TFT with good insulating properties and processing chemical resistance. We also controlled and optimized surface energy and morphology of gate dielectric layers for direct printing process with solution processible organic and inorganic semiconductors.

  • PDF

Photoelectrochemical cells based on oxide semiconductors

  • Yun, Yeong-Dae;Baek, Seung-Gi;Kim, Ju-Seong;Kim, Yeong-Bin;Jo, Hyeong-Gyun
    • Proceedings of the Korean Institute of Surface Engineering Conference
    • /
    • 2018.06a
    • /
    • pp.50.2-50.2
    • /
    • 2018
  • The demand for steady and dependable power sources is very high in the field of sustainable energy because of the limited amount of fossil fuels reserves. Among several sustainable alternatives, solar energy may be the most efficient solution because it constitutes the largest renewable energy source. So far, the only practical way to store such large amounts of energy has been to use a chemical energy carrier likewise a fuel. In various solar energy to power conversion systems, the photoelectrochemical (PEC) splitting of water into hydrogen and oxygen by the direct use of solar energy is an ideal process. It is a renewable method of hydrogen production integrated with solar energy absorption and water electrolysis using a single photoelectrode. Previous studies on photoelectrode films for PEC water splitting cells have been mainly focused on synthesizing oxide semiconductors with wide band gaps, such as TiO2(3.2eV), WO3(2.8eV), and Fe2O3(2.3eV). Unfortunately, these pristine oxide photoanodes without any catalysts have relatively low photocurrent densities because of the inherent limitation of insufficient visible light absorption due to the wide bandgap. Specifically, there is a tradeoff between high photocurrent and photoelectrochemical corrosion behavior, which is representative of figures of meritf or PEC materials.

  • PDF

Anchoring Cadmium Chalcogenide Quantum Dots (QDs) onto Stable Oxide Semiconductors for QD Sensitized Solar Cells

  • Lee, Hyo-Joong;Kim, Dae-Young;Yoo, Jung-Suk;Bang, Ji-Won;Kim, Sung-Jee;Park, Su-Moon
    • Bulletin of the Korean Chemical Society
    • /
    • v.28 no.6
    • /
    • pp.953-958
    • /
    • 2007
  • Anchoring quantum dots (QDs) onto thermodynamically stable, large band gap oxide semiconductors is a very important strategy to enhance their quantum yields for solar energy conversion in both visible and near-IR regions. We describe a general procedure for anchoring a few chalcogenide QDs onto the titanium oxide layer. To anchor the colloidal QDs onto a mesoporous TiO2 layer, linker molecules containing both carboxylate and thiol functional groups were initially attached to TiO2 layers and subsequently used to capture dispersed QDs with the thiol group. Employing the procedure, we exploited cadmium selenide (CdSe) and cadmium telluride (CdTe) quantum dots (QDs) as inorganic sensitizers for a large band gap TiO2 layer of dye-sensitized solar cells (DSSCs). Their attachment was confirmed by naked eyes, absorption spectra, and photovoltaic effects. A few QD-TiO2 systems thus obtained have been characterized for photoelectrochemical solar energy conversion.

Manufacture and characteristic evaluation of Amorphous Indium-Gallium-Zinc-Oxide (IGZO) Thin Film Transistors

  • Seong, Sang-Yun;Han, Eon-Bin;Kim, Se-Yun;Jo, Gwang-Min;Kim, Jeong-Ju;Lee, Jun-Hyeong;Heo, Yeong-U
    • Proceedings of the Korean Vacuum Society Conference
    • /
    • 2010.08a
    • /
    • pp.166-166
    • /
    • 2010
  • Recently, TFTs based on amorphous oxide semiconductors (AOSs) such as ZnO, InZnO, ZnSnO, GaZnO, TiOx, InGaZnO(IGZO), SnGaZnO, etc. have been attracting a grate deal of attention as potential alternatives to existing TFT technology to meet emerging technological demands where Si-based or organic electronics cannot provide a solution. Since, in 2003, Masuda et al. and Nomura et al. have reported on transparent TFTs using ZnO and IGZO as active layers, respectively, much efforts have been devoted to develop oxide TFTs using aforementioned amorphous oxide semiconductors as their active layers. In this thesis, I report on the performance of thin-film transistors using amorphous indium gallium zinc oxides for an active channel layer at room temperature. $SiO_2$ was employed as the gate dielectric oxide. The amorphous indium gallium zinc oxides were deposited by RF magnetron sputtering. The carrier concentration of amorphous indium gallium zinc oxide was controlled by oxygen pressure in the sputtering ambient. Devices are realized that display a threshold voltage of 1.5V and an on/off ration of > $10^9$ operated as an n-type enhancement mode with saturation mobility with $9.06\;cm^2/V{\cdot}s$. The devices show optical transmittance above 80% in the visible range. In conclusion, the fabrication and characterization of thin-film transistors using amorphous indium gallium zinc oxides for an active channel layer were reported. The operation of the devices was an n-type enhancement mode with good saturation characteristics.

  • PDF

Investigation of Effective Contact Resistance of ZTO-Based Thin Film Transistors

  • Gang, Yu-Jin;Han, Dong-Seok;Park, Jae-Hyeong;Mun, Dae-Yong;Sin, So-Ra;Park, Jong-Wan
    • Proceedings of the Korean Vacuum Society Conference
    • /
    • 2013.02a
    • /
    • pp.543-543
    • /
    • 2013
  • Thin-film transistors (TFTs) based on oxide semiconductors have been regarded as promising alternatives for conventional amorphous and polycrystalline silicon TFTs. Oxide TFTs have several advantages, such as low temperature processing, transparency and high field-effect mobility. Lots of oxide semiconductors for example ZnO, SnO2, In2O3, InZnO, ZnSnO, and InGaZnO etc. have been researched. Particularly, zinc-tin oxide (ZTO) is suitable for channel layer of oxide TFTs having a high mobility that Sn in ZTO can improve the carrier transport by overlapping orbital. However, some issues related to the ZTO TFT electrical performance still remain to be resolved, such as obtaining good electrical contact between source/drain (S/D) electrodes and active channel layer. In this study, the bottom-gate type ZTO TFTs with staggered structure were prepared. Thin films of ZTO (40 nm thick) were deposited by DC magnetron sputtering and performed at room temperature in an Ar atmosphere with an oxygen partial pressure of 10%. After annealing the thin films of ZTO at $400^{\circ}C$ or an hour, Cu, Mo, ITO and Ti electrodes were used for the S/D electrodes. Cu, Mo, ITO and Ti (200 nm thick) were also deposited by DC magnetron sputtering at room temperature. The channel layer and S/D electrodes were defined using a lift-off process which resulted in a fixed width W of 100 ${\mu}m$ and channel length L varied from 10 to 50 ${\mu}m$. The TFT source/drain series resistance, the intrinsic mobility (${\mu}i$), and intrinsic threshold voltage (Vi) were extracted by transmission line method (TLM) using a series of TFTs with different channel lengths. And the performances of ZTO TFTs were measured by using HP 4145B semiconductor analyzer. The results showed that the Cu S/D electrodes had a high intrinsic field effect mobility and a low effective contact resistance compared to other electrodes such as Mo, ITO and Ti.

  • PDF

Investigation of Oxygen Functional Group Movement in Graphene Oxide Devices (그래핀 산화물 소자에서의 산소 작용기 이동 연구)

  • Eun Hee Kee;Mohd Musaib Haidari;Ji Hoon Jeon;Jin Sik Choi;Bae Ho Park
    • Journal of Sensor Science and Technology
    • /
    • v.32 no.2
    • /
    • pp.100-104
    • /
    • 2023
  • In this study, a device was fabricated to check the possibility of a memory device by controlling the oxygen functional groups in graphene oxide formed with a 45-second exposure time. We discovered that graphene oxide can be formed using the ultraviolet (UV) light treatment method with different exposure times. Moreover, Raman spectroscopy measurement revealed that the oxygen functional groups can be moved by controlling the voltage. We further studied the change in the local graphene oxide region, which was found to be related to the modulation of the electrical properties of the device. Therefore, the fabricated graphene oxide device can be used as a wettability switching membrane and graphene-based ion transport device.

Transparent Amorphous Oxide Semiconductor as Excellent Thermoelectric Materials (비정질 산화물 반도체의 열전특성)

  • Kim, Seo-Han;Park, Cheol-Hong;Song, Pung-Geun
    • Proceedings of the Korean Institute of Surface Engineering Conference
    • /
    • 2018.06a
    • /
    • pp.52-52
    • /
    • 2018
  • Only approximately 30% of fossil fuel energy is used; therefore, it is desirable to utilize the huge amounts of waste energy. Thermoelectric (TE) materials that convert heat into electrical power are a promising energy technology. The TE materials can be formed either as thin films or as bulk semiconductors. Generally, thin-film TE materials have low energy conversion rates due to their thinness compared to that in bulk. However, an advantage of a thin-film TE material is that the efficiency can be smartly engineered by controlling the nanostructure and composition. Especially nanostructured TE thin films are useful for mitigating heating problems in highly integrated microelectronic devices by accurately controlling the temperature. Hence, there is a rising interest in thin-film TE devices. These devices have been extensively investigated. It is demonstrated that transparent amorphous oxide semiconductors (TAOS) can be excellent thermoelectric (TE) materials, since their thermal conductivity (${\kappa}$) through a randomly disordered structure is quite low, while their electrical conductivity and carrier mobility (${\mu}$) are high, compared to crystalline semiconductors through the first-principles calculations and the various measurements for the amorphous In-Zn-O (a-IZO) thin film. The calculated phonon dispersion in a-IZO shows non-linear phonon instability, which can prevent the transport of phonon. The a-IZO was measured to have poor ${\kappa}$ and high electrical conductivity compared to crystalline $In_2O_3:Sn$ (c-ITO). These properties show that the TAOS can be an excellent thin-film transparent TE material. It is suggested that the TAOS can be employed to mitigate the heating problem in the transparent display devices.

  • PDF