• 제목/요약/키워드: Oxalic etching

검색결과 16건 처리시간 0.023초

법랑질(琺瑯質)의 산탈회(酸脱灰)에 관(關)한 실험적(實驗的) 연구(硏究) (A STUDY ON THE MICROSCOPIC CHANGE OF THE ENAMEL SURFACE AFTER ACID ETCHING)

  • 민병덕
    • Restorative Dentistry and Endodontics
    • /
    • 제6권1호
    • /
    • pp.37-50
    • /
    • 1980
  • Scanning Electron Microscopic (SEM) examination on the labial surface of 91 permanent upper incisors were made after etching procedure with phosphoric acid, sulfuric acid, nitric acid, hydro chloric acid, oxalic acid, formic acid, citric acid and zinc phosphate liquid for 2 minutes. Following results were obtained. 1. In the surfaces etched by 10%. 50% phosphoric acid, 50% sulfuric acid, 10%. 30% nitric acid, 10%. 50% oxalic acid, 10%. 30%. 50% formic acid, 30%. 50% citric acid and zinc phosphate liquid, there appeared to be a preferential removal of prism cores, but in the surfaces etched by 10% phosphoric acid, 50% nitric acid, 10%. 30% hydrochloric acid and 30% oxalic acid, the prism peripheries were removed preferentially. 2. According to Silverstone classification on enamel etching pattern the surface treated by zinc phosphate liquid, 30. 50% citric acid, 10%. 30%. 50% formic acid, 10%. 50% oxalic acid, 10%. 30% nitric acid, 50% sulfuric acid and 10%. 50%. phosphoric acid showed Type 1, and etched by 30% oxalic acid, 10%. 30% hydrochloric acid, 50% nitric acid and 10% phosphoric acid showed Type II. Etching of prism cores was by far the most common occurence. The changes produced could be related to intrinsic differences in histology and / or solubility of enamel.

  • PDF

Effect of oxalic acid solution to optimize texturing of the front layer of thin film sloar cells

  • 박형식;장경수;조재현;안시현;장주연;송규완;이준신
    • 한국진공학회:학술대회논문집
    • /
    • 한국진공학회 2011년도 제40회 동계학술대회 초록집
    • /
    • pp.401-401
    • /
    • 2011
  • In this work, we deposited Al2O3doped ZnO (AZO) thin films by direct current (DC) magnetron sputtering method with a $40^{\circ}$ tilted target, for application in the front layer of thin film solar cell. Wet chemical etching behavior of AZO films was also investigated. In order to optimize textured AZO films, oxalic acid ($C_2H_2O_4$)has been used as wet etchant of AZO film. In this experiment we used 0.001% concentration of oxalic acid various etching time, that showed an anisotropy in etching texture of AZO films. Electrical resistivity, Hall mobility and carrier concentration measurements are performed by using the Hall measurement, that are $6{\times}10^{-4}{\Omega}cm$, $20{\sim}25cm^2/V-s$ and $4{\sim}6{\times}10^{20}$, respectively.

  • PDF

Wet Etching Behaviors of Transparent Conducting Ga-Doped Zinc Oxide Thin Film by Organic Acid Solutions

  • Lee, Dong-Kyoon;Lee, Seung-Jung;Bang, Jung-Sik;Yang, Hee-Sun
    • 한국정보디스플레이학회:학술대회논문집
    • /
    • 한국정보디스플레이학회 2008년도 International Meeting on Information Display
    • /
    • pp.831-833
    • /
    • 2008
  • 150 nm thick Ga-doped ZnO thin film, which was deposited by a sputtering process, was wet-chemically etched by using various organic acids such as oxalic, citric and formic acid. Wet etch parameters including etchant concentration and temperature are investigated for each etchant, and their effects on the etch rate and the feature of edge line are compared.

  • PDF

Plasma Corrosion in Oxalic Acid Anodized Coatings Depending on Tartaric Acid Content

  • Shin, Jae-Soo;Song, Je-Boem;Choi, Sin-Ho;Kim, Jin-Tae;Oh, Seong-Geun;Yun, Ju-Young
    • Applied Science and Convergence Technology
    • /
    • 제25권1호
    • /
    • pp.15-18
    • /
    • 2016
  • Study investigated the optimal anodizing conditions for fabricating an oxide film that produces less contamination in a corrosive plasma environment, using oxalic acid and tartaric acid. Oxide films were produced using sulfuric acid, oxalic acid, and tartaric acid electrolyte mixtures with various mole ratios. The oxide film made by adding 0.05M tartaric acid to 0.3M oxalic acid showed higher breakdown voltage and lower leakage current. Additionally, contamination particles were reduced during plasma etching, thus demonstrates that this mixture presented optimal conditions. However, higher tartaric acid content (0.1 M, 0.15 M) led to lower breakdown voltages and higher leakage currents. Also, it resulted in more cracking during thermal shock tests as well as the generation of more contamination particles during plasma processing.

공정 디자인에 따른 클래드강 맞대기 용접부의 기계적 특성에 관한 연구 (A Study on the Mechanical Properties of Butt Welding Zone of Clad Steel According to the Process Design)

  • 이정현;박재원
    • 한국생산제조학회지
    • /
    • 제21권4호
    • /
    • pp.532-540
    • /
    • 2012
  • In this study, some considerations have been suggested in developing on-site techniques to evaluate the sensitization of stainless steels. Electrochemical potentiokinetic reactivation (EPR) technique is known to be a candidate tool for field applications since it enables quantitative assessment in reasonable test time, compared to oxalic etching (ditch) technique. The on-site application of the test method imposes additional restrictions on the selection of the test method (for example, minimum surface preparation requirement, insensitivity to testing temperature, etc.). The EPR and etching techniques have been compared in order to sensitization of stainless steel structures. It has been widely reported that the maximum sensitivity in the welded structure of stainless steel is shown at heat-affected zone (HAZ) than weldments with cast structure. In this work, sectioned weldments and external surfaces were investigated to reveal the degree of sensitization by the etching and the results were compared with those of EPR test. The EPR test showed little sensitivity to surface roughness and test temperature.

마그네슘 금속으로부터의 산화마그네슘 나노와이어 제조 (Preparation of Magnesium Oxide Nanowires from a Magnesium Foil)

  • 이병건;최진섭
    • 공업화학
    • /
    • 제22권5호
    • /
    • pp.514-517
    • /
    • 2011
  • 본 실험에서는 옥살산과 알코올계 용매를 사용하여 마그네슘 호일의 화학적 식각에 의해서 마그네슘 옥살레이트(Magnesium oxalate) 나노구조를 제조하였다. 알코올계 용매 중 에탄올 용매에서 마그네슘 옥살레이트 나노와이어를 얻을 수 있었다. 시간에 따른 나노와이어의 형성 과정을 살펴보았고, FE-SEM을 통하여 형상을 살펴보았다. TGA 분석을 통하여 열처리 조건을 결정하였다. 열처리를 통하여 마그네슘 옥살레이트 나노와이어에서 산화마그네슘(MgO) 나노와이어로 전환시켰고, 이를 FE-SEM과 FT-IR을 통하여 확인하였다.

In-situ Characterization of Electrochemical and Frictional Behaviors During Copper CMP

  • 엄대홍;강영재;박진구
    • 한국전기전자재료학회:학술대회논문집
    • /
    • 한국전기전자재료학회 2004년도 하계학술대회 논문집 Vol.5 No.1
    • /
    • pp.227-230
    • /
    • 2004
  • As the organic acids were added in the slurry, zeta potential of alumina was changed to negative value and IEP value was shifted from alkaline to acidic pH. In citric acid based slurry, Cu surface continuously dissolved and etching depth linearly increased. On the contrary, passivation layer was grown on Cu surface in oxalic acid based slurry. As the platen rotation speed increased, Preston coefficient decreased in both slurries. With oxalic acid based slurry, at low velocity, removal rate is high value because of high friction force compared to citric acid based slurry. As platen velocity increased, removal of Cu in citric acid based slurry became higher value than oxalic acid based slurry. Typical lubrication behaviors were observed in both slurries. As Sommerfeld number increased, COF values gradually decreased and then re-increased. It indicated that lubrication was changed to direct contact or semi-direct contact mode to hydro-lubrication mode.

  • PDF

Cu-Cr합금 박막의 구리 전기도금을 위한 전처리 및 에칭 특성에 관한 연구 (Pretreatment for Cu electroplating and Etching Property of Cu-Cr Film)

  • 김남석;강탁;윤일표;박용수
    • 한국표면공학회지
    • /
    • 제26권3호
    • /
    • pp.149-157
    • /
    • 1993
  • In the study of TAB(Tape Automated Bonding)technologies, Cu-Cr sputtered seed layer has been used to improve the adhesion between Polyimide and Cu film and electrical properties. But the Cu electrodeposit on Cu-Cr film had poor adhesion or powder-like form due to the surface Cr oxides on the Cu-Cr film. By means of activating the Cu-Cr film with the oxalic acid and phosphoric acid, the Cu film with the improved adhesion could be coated on the Cu-Cr sputtered film in CuSO4 solution. The etching rate was compared with increasing the Cr content of the sputtered Cu-Cr film, and anodic polarization curve in FeCl3 solution was investigated. With increasing the Cr content, the etching rate was reduced. The clean etching cross section could be obtained with increasing the concentration of FeCl3 solution. But above the 13 w/o Cr content, Cu-Cr sputtered film could not bed etched cleanly only with FeCl3 solution and additives were needed.

  • PDF

산화구리 잔유물 제거를 위한 카르복시산 함유 반수계 용액의 세정특성 (Characteristics of Semi-Aqueous Cleaning Solution with Carboxylic Acid for the Removal of Copper Oxides Residues)

  • 고천광;이원규
    • Korean Chemical Engineering Research
    • /
    • 제54권4호
    • /
    • pp.548-554
    • /
    • 2016
  • Damascene 구조를 갖는 반도체소자의 구리금속배선 식각공정에서 배선재료에 의해서 발생되는 구리 식각잔류물을 제거하기 위해 oxalic acid (OA), lactic acid (LA) 및 citric acid (CA)의 카르복시산 함유된 반수계 혼합세정액을 제조하고 특성을 분석하였다. 카르복시산은 pH에 따라 카르복실기와 구리이온들과의 다양한 복합체를 형성하며 세정특성의 변화를 준다. 카르복시산들이 함유된 각각의 세정액의 세정특성평가결과 10 wt% CA를 함유한 반수계 세정액의 식각잔류물 세정특성은 pH 2에서 7까지의 영역에서 가장 낮은 구리 식각률을 보였으며 pH 2에서 4까지 구리에 대한 구리산화물의 가장 높은 식각 선택도를 나타내었으나 pH 5에서 7 범위에서는 10 wt% LA가 함유된 세정액이 더 높은 선택도를 보였다. 따라서 표면세정효과는 pH에 따라 변화하며 적절한 카르복시산을 사용함이 요구된다. CA가 함유된 세정액의 경우에 CA 농도와 구리에 대한 구리산화물의 식각 선택도의 증가특성을 보이며 CA가 5 wt%이상 함유된 경우에는 세정 후 구리배선의 표면이 88 %이상의 금속구리로 분석되어 구리산화물로 구성된 식각 잔류물의 제거에 효과적임을 알 수 있었다.

열간압연 클래드강의 맞대기용접부 내식성 및 용접성 평가 (Evaluation of Corrosion Resistance and Weldability for the Butt Welding Zone of Hot Rolled Clad Steel Plates)

  • 박재원;이철구
    • Journal of Welding and Joining
    • /
    • 제31권5호
    • /
    • pp.47-53
    • /
    • 2013
  • We have investigated the traits of clad metals in hot-rolled clad steel plates, including the sensitization and mechanical properties of STS 316 steel plate and carbon steel (A516), under various specific circumstances regarding post heat treatment, multilayered welds, and thick or repeated welds for repair. For evaluations, sectioned weldments and external surfaces were investigated to reveal the degree of sensitization by micro vickers hardness, tensile, and etching tests the results were compared with those of EPR tests. The clad steel plates were butt-welded using FCAW and SAW with the time of heat treatment as the variable, a that was conducted at $625^{\circ}C$, for 80, 160, 320, 640, and 1280 min. Then, the change in corrosion resistance was evaluated in these specimens. With carbon steel (A516), as the heat treatment time increased, the annealing effect caused the tensile strength to decrease. The micro-hardness gradually increased and decreased after 640 min. The elongation and contraction of the area also increased gradually. The oxalic acid etch test and EPR test on STS316 and the clad metal showed STEP structure and no sensitization. From the test results on multi-layered and repair welds, it could be concluded that there is no effect on the corrosion resistance of clad metals. The purpose of this study was to suggest some considerations for developing on-site techniques to evaluate the sensitization of stainless steels.