Investigation of Initial Formation of Aluminum Nitride Films by Single Precursor Organometallic Chemical Vapor Deposition of$[Me_{2}Al(\mu-NHR)]_{2}\;(R=^{i}Pr,\;^{t}Bu)$
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- Bulletin of the Korean Chemical Society
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- v.15 no.1
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- pp.79-83
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- 1994