• Title/Summary/Keyword: Organic Semiconductor Device

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Real-time Spectroscopic Methods for Analysis of Organic Compounds in Water

  • Kim, Chihoon;Ji, Taeksoo
    • Current Optics and Photonics
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    • v.3 no.4
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    • pp.336-341
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    • 2019
  • This paper proposes an optical system where the organic compound content in water is determined by using an ultraviolet (UV) LED (280 nm) and photodetector. The results obtained by the proposed prototype LED spectroscopy system, which includes a single photodetector and two parallel sample holders, are calculated by applying partial least square regression; the values are highly correlated with the actual concentrations of potassium hydrogen phthalate solutions, with an adjusted coefficient of determination about 0.996. Moreover, the total organic carbon values derived from the UV-Vis spectrometer of real samples (lake, river and sea water) differed little from those obtained by the LED spectroscopy. We confirm that the fast, sensitive, and compact LED sensor system can be readily configured for real-time monitoring of organic compounds in water.

Effect of the Plasma-assisted Patterning of the Organic Layers on the Performance of Organic Light-emitting Diodes

  • Hong, Yong-Taek;Yang, Ji-Hoon;Kwak, Jeong-Hun;Lee, Chang-Hee
    • Journal of Information Display
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    • v.10 no.3
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    • pp.111-116
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    • 2009
  • In this paper, a plasma-assisted patterning method for the organic layers of organic light-emitting diodes (OLEDs) and its effect on the OLED performances are reported. Oxygen plasma was used to etch the organic layers, using the top electrode consisting of lithium fluoride and aluminum as an etching mask. Although the current flow at low voltages increased for the etched OLEDs, there was no significant degradation of the OLED efficiency and lifetime in comparison with the conventional OLEDs. Therefore, this method can be used to reduce the ohmic voltage drop along the common top electrodes by connecting the top electrode with highly conductive bus lines after the common organic layers on the bus lines are etched by plasma. To further analyze the current increase at low voltages, the plasma patterning effect on the OLED performance was investigated by changing the device sizes, especially in one direction, and by changing the etching depth in the vertical direction of the device. It was found that the current flow increase at low voltages was not proportional to the device sizes, indicating that the current flow increase does not come from the leakage current along the etched sides. In the etching depth experiment, the current flow at low voltages did not increase when the etching process was stopped in the middle of the hole transport layer. This means that the current flow increase at low voltages is closely related to the modification of the hole injection layer, and thus, to the modification of the interface between the hole injection layer and the bottom electrode.

Effect of Hydroxyl Ethyl Cellulose Concentration in Colloidal Silica Slurry on Surface Roughness for Poly-Si Chemical Mechanical Polishing

  • Hwang, Hee-Sub;Cui, Hao;Park, Jin-Hyung;Paik, Ungyu;Park, Jea-Gun
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2008.06a
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    • pp.545-545
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    • 2008
  • Poly-Si is an essential material for floating gate in NAND Flash memory. To fabricate this material within region of floating gate, chemical mechanical polishing (CMP) is commonly used process for manufacturing NAND flash memory. We use colloidal silica abrasive with alkaline agent, polymeric additive and organic surfactant to obtain high Poly-Si to SiO2 film selectivity and reduce surface defect in Poly-Si CMP. We already studied about the effects of alkaline agent and polymeric additive. But the effect of organic surfactant in Poly-Si CMP is not clearly defined. So we will examine the function of organic surfactant in Poly-Si CMP with concentration separation test. We expect that surface roughness will be improved with the addition of organic surfactant as the case of wafering CMP. Poly-Si wafer are deposited by low pressure chemical vapor deposition (LPCVD) and oxide film are prepared by the method of plasma-enhanced tetra ethyl ortho silicate (PETEOS). The polishing test will be performed by a Strasbaugh 6EC polisher with an IC1000/Suba IV stacked pad and the pad will be conditioned by ex situ diamond disk. And the thickness difference of wafer between before and after polishing test will be measured by Ellipsometer and Nanospec. The roughness of Poly-Si film will be analyzed by atomic force microscope.

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Improvement of Out-coupling Efficiency of Organic Light Emitting Device by Ion-beam Plasma-treated Plastic Substrate (이온빔 플라즈마 처리된 플라스틱 기판에 의한 OLED의 광추출 효율 향상)

  • Kim, Hyeun Woo;Song, Tae Min;Lee, Hyeong Jun;Jeon, Yongmin;Kwon, Jeong Hyun
    • Journal of the Semiconductor & Display Technology
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    • v.21 no.2
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    • pp.7-10
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    • 2022
  • A functional polyethylene terephthalate substrate to increase light extraction efficiency of organic light-emitting diodes is studied. We formed nano-structured PET surfaces by controlling the power, gas, and exposure time of the linear ion-beam. The haze of the polyethylene terephthalate can be controlled from 0.2% to 76.0% by changing the peak-to-valley roughness of nano structure by adjusting the exposure cycle. The treated polyethylene terephthalate shows average haze of 76.0%, average total transmittance of 86.6%. The functional PET increases the current efficiency of organic light-emitting diodes by 47% compared to that of organic light-emitting diode on bare polyethylene terephthalate. In addition to polyethylene terephthalate with light extraction performance, by conducting additional research on the development of functional PET with anti-reflection and barrier performance, it will be possible to develop flexible substrates suitable for organic light-emitting diodes lighting and transparent flexible displays.

Hybrid polymer-quantum dot based single active layer structured multi-functional device (Organic Bistable Device, LED and Photovoltaic Cell)

  • Son, Dong-Ick;Kwon, Byoung-Wook;Park, Dong-Hee;Kim, Tae-Whan;Choi, Won-Kook
    • Proceedings of the Korean Vacuum Society Conference
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    • 2010.02a
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    • pp.97-97
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    • 2010
  • We demonstrate the hybrid polymer-quantum dot based multi-functional device (Organic bistable devices, Light-emitting diode, and Photovoltaic cell) with a single active-layer structure consisting of CdSe/ZnS semiconductor quantum-dots (QDs) dispersed in a poly N-vinylcarbazole (PVK) and 1,3,5-tirs- (N-phenylbenzimidazol-2-yl) benzene (TPBi) fabricated on indium-tin-oxide (ITO)/glass substrate by using a simple spin coating technique. The multi-functionality of the device as Organic bistable device (OBD), Light Emitting Diode (LED), and Photovoltaic cell can be successfully achieved by adding an electron transport layer (ETL) TPBi to OBD for attaining the functions of LED and Photovoltaic cell in which the lowest unoccupied molecular orbital (LUMO) level of TPBi is positioned at the energy level between the conduction band of CdSe/ZnS and LiF/Al electrode (band-gap engineering). Through transmission electron microscopy (TEM) study, the active layer of the device has a p-i-n structure of a consolidated core-shell structure in which semiconductor QDs are uniformly and isotropically adsorbed on the surface of a p-type polymer core and the n-type small molecular organic materials surround the semiconductor QDs.

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Bipolar Transport Model of Single Layer OLED for Embedded System

  • Lee, Jung-Ho;Han, Dae-Mun;Kim, Yeong-Real
    • Proceedings of the Korea Society of Information Technology Applications Conference
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    • 2005.11a
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    • pp.237-241
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    • 2005
  • We present a device model for organic light emitting diodes(OLEDs) which includes charge injection, transport, recombination, and space charge effects in the organic materials. The model can describe both injection limited and space charge limited current flow and the transition between them. Calculated device current, light output, and quantum and power efficiency are presented for different cases of material and device parameters and demonstrate the improvements in device performance in bilayer devices. These results are interpreted using the calculated spatial variation of the electric field, charge density and recombination rate density in the device. We find that efficient OLEDs are possible for a proper choice of organic materials and contact parameters.

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Preparation of Transparent conductive oxide cathode for Top-Emission Organic Light-Emitting Device by FTS system and RF system

  • Hong, Jeong-Soo;Park, Yong-Seo;Kim, Kyung-Hwan
    • Journal of the Semiconductor & Display Technology
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    • v.9 no.3
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    • pp.23-27
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    • 2010
  • We prepared Al doped ZnO thin film as a top electrode on a glass substrate with a deposited $Alq_3$ for the top emission organic Light emitting device (TEOLED) with facing target sputtering (FTS) method and radio-frequency (RF) sputtering method, respectively. Before the deposition of AZO thin film, we evaporated the $Alq_3$ on glass substrate by thermal evaporation. And we evaluated the damage of organic layer. As a result, PL intensity of $Alq_3$ on grown by FTS method showed higher than that of grown by RF sputtering method, so we found that the FTS showed the lower damage sputtering than RF sputtering. Therefore, we can expect the FTS method is promising the low-damage sputtering system that can be used as a direct sputtering on the organic layer.

Study of Plasma Process Induced Damages on Metal Oxides as Buffer Layer for Inverted Top Emission Organic Light Emitting Diodes

  • Kim, Joo-Hyung;Lee, You-Jong;Jang, Jin-Nyoung;Song, Byoung-Chul;Hong, Mun-Pyo
    • 한국정보디스플레이학회:학술대회논문집
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    • 2008.10a
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    • pp.543-544
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    • 2008
  • In the fabrication of inverted top emission organic light emitting diodes (ITOLEDs), the organic layers are damaged by high-energy plasma sputtering process for transparent top anode. In this study, the plasma process induced damages on metal oxide hole injection layers (HILs) including $WO_3$, $MoO_3$, and $V_2O_5$ as buffer layer are examined. With the result of IV characteristic of hole-only devices, we propose that $MoO_3$ and $V_2O_5$ are stable materials against plasma sputtering process.

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A Study on the Effects of Micro Cavity on the HTL Thicknesses on the Top Emission Organic Light Emitting Diode (유기발광 다이오드의 정공수송층 두께에 따른 미소 공진 효과의 영향에 관한 연구)

  • Lee, DongWoon;Cho, Eou Sik;Seong, Jin-Wook;Kwon, Sang Jik
    • Journal of the Semiconductor & Display Technology
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    • v.21 no.1
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    • pp.91-94
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    • 2022
  • Top emission organic light-emitting diode is commonly used because of high efficiency and good color purity than bottom - emission organic light-emitting device. Unlike BEOLED, TEOLED contain semi-transparent metal cathode. Because of semi-transparent cathode, micro cavity effect occurs in TEOLED. We optimized this effect by changing the thickness of hole injection layer. Device consists of is indium-tin-oxide / N,N'-Di-[(1-naphthyl)-N,N'-diphenyl]-1,1'-biphenyl-4,4'-diamine (x nm) / tris-(8-hydroxyquinoline) aluminum (50nm) / LiF(0.5nm) / Mg:Ag (1:9), and we changed NPB thickness which is used as HTL in our device in order to study how micro cavity effects are changed by optical path. As the results, NPB thickness at 35nm showed the current efficiency of 8.55Cd/A.

Plasma Treatment Effects on Tungsten Oxide Hole Injection Layer for Application to Inverted Top-Emitting Organic Light-Emitting Diodes

  • Kim, Joo-Hyung;Lee, You-Jong;Jang, Yun-Sung;Kim, Doo-Hyun;Hong, Mun-Pyo
    • 한국정보디스플레이학회:학술대회논문집
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    • 2009.10a
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    • pp.354-355
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    • 2009
  • In the fabrication of inverted top-emitting organic light emitting diodes (ITOLEDs), the sputtering process is needed for deposition of transparent conducting oxide (TCO) as top anode. Energetic particle bombardment, however, changes the physical properties of underlying layers. In this study, we examined plasma process effects on tungsten oxide ($WO_3$) hole injection layer (HIL). From our results, we suggest the theoretical mechanism to explain the correlation between the physical property changes caused by plasma process on $WO_3$ HIL and degradation of device performances.

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