• 청정기술
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• 제28권3호
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• pp.218-226
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• 2022

최근 선진국들은 수소경제 및 탄소중립 사회로의 전환을 위해 수소에너지의 수요가 급격히 증가하고 있으며, 이산화탄소(CO₂)를 배출이 없는 친환경적인 수소(H₂) 생산 기술에 대한 관심이 높아지고 있다. 본 연구에서는 암모니아(NH₃) 분해 수소 제조를 위해 루테늄 알루미나(Ru/Al₂O₃) 분말 촉매와 함께 알루미나 졸(alumina sol)의 무기바인더(inorganic binder)와 메틸 셀룰로오스(methyl cellulose)의 유기바인더(organic binder)를 사용하여 딥 코팅(dip coating) 방법으로 루테늄 알루미나 메탈 모노리스 코팅 촉매를 제조하였다. 딥 코팅을 위한 촉매 슬러리의 최적 비율로 촉매와 무기바인더의 중량 비율을 1:1로 고정하여 유기바인더 0.1일 때 1회 딥 코팅 시 촉매 코팅양은 61.6 g L^-1이다. 이때 메탈모노리스 표면에 코팅된 촉매 층의 균일한 두께 (약 42 ㎛)와 결정상을 주사전자현미경(Scanning Electron Microscope, SEM)과 X-ray 회절분석(X ray diffraction, XRD)을 통해 확인하였다. 또한, 암모니아 분해 수소 제조의 최적 공정조건을 찾고자 반응표면분석법(Response Surface Method, RSM)을 이용하여 반응온도와 공간속도의 독립변수에 따른 암모니아 전환율에 대한 수치 최적화 회귀식 모델을 계산하였다. 이러한 결과로부터 암모니아 분해 수소생산을 위한 상업적 규모의 공정운전 기본설계 자료로 활용이 가능하다.

• 한국신재생에너지학회:학술대회논문집
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• 한국신재생에너지학회 2010년도 추계학술대회 초록집
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• pp.42.2-42.2
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• 2010

Transparent conducting oxides (TCOs) are of significant importance for their applications in various devices, such as light-emitting diodes, thin-film solar cells, organic light-emitting diodes, liquid crystal displays, and so on. In order for TCOs to contribute to the performance improvement of these devices, TCOs should have high transmittance and good electrical properties simultaneously. Sn-doped $In_2O_3$ (ITO) is the most commonly used TCO. However, indium is toxic and scarce in nature. Thus, ZnO has attracted a lot of attention because of the possibility for replacing ITO. In particular, group III impurity-doped ZnO showed the optoelectronic properties comparable to those of ITO electrodes. Al-doped ZnO exhibited the best performance among various doped ZnO films because of the high substitutional doping efficiency. However, in order for the Al-doped ZnO to replace ITO in electronic devices, their electrical and optical properties should further significantly be improved. In this connection, different ways such as a variation of deposition conditions, different deposition techniques, and post-deposition annealing processes have been investigated so far. Among the deposition methods, RF magnetron sputtering has been extensively used because of the easiness in controlling deposition parameters and its fast deposition rate. In addition, when combined with post-deposition annealing in a reducing ambient, the optoelectronic properties of Al-doped ZnO films were found to be further improved. In this presentation, we deposited Al-doped ZnO (ZnO:$Al_2O_3$ = 98:2 wt%) thin films on the glass and sapphire substrates using RF magnetron sputtering as a function of substrate temperature. In addition, the ZnO samples were annealed in different conditions, e.g., rapid thermal annealing (RTA) at $900^{\circ}C$ in $N_2$ ambient for 1 min, tube-furnace annealing at $500^{\circ}C$ in $N_2:H_2$=9:1 gas flow for 1 hour, or RTA combined with tube-furnace annealing. It is found that the mobilities and carrier concentrations of the samples are dependent on growth temperature followed by one of three subsequent post-deposition annealing conditions.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2015년도 제49회 하계 정기학술대회 초록집
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• pp.65-65
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• 2015

In this talk, I will introduce two topics. The first topic is the polymer light emitting diodes (PLEDs) using graphene oxide quantum dots as emissive center. More specifically, the energy transfer mechanism as well as the origin of white electroluminescence in the PLED were investigated. The second topic is the facile synthesis of eco-friendly III-V colloidal quantum dots and their application to light emitting diodes. Polymer (organic) light emitting diodes (PLEDs) using quantum dots (QDs) as emissive materials have received much attention as promising components for next-generation displays. Despite their outstanding properties, toxic and hazardous nature of QDs is a serious impediment to their use in future eco-friendly opto-electronic device applications. Owing to the desires to develop new types of nanomaterial without health and environmental effects but with strong opto-electrical properties similar to QDs, graphene quantum dots (GQDs) have attracted great interest as promising luminophores. However, the origin of electroluminescence (EL) from GQDs incorporated PLEDs is unclear. Herein, we synthesized graphene oxide quantum dots (GOQDs) using a modified hydrothermal deoxidization method and characterized the PLED performance using GOQDs blended poly(N-vinyl carbazole) (PVK) as emissive layer. Simple device structure was used to reveal the origin of EL by excluding the contribution of and contamination from other layers. The energy transfer and interaction between the PVK host and GOQDs guest were investigated using steady-state PL, time-correlated single photon counting (TCSPC) and density functional theory (DFT) calculations. Experiments revealed that white EL emission from the PLED originated from the hybridized GOQD-PVK complex emission with the contributions from the individual GOQDs and PVK emissions. (Sci Rep., 5, 11032, 2015). New III-V colloidal quantum dots (CQDs) were synthesized using the hot-injection method and the QD-light emitting diodes (QLEDs) using these CQDs as emissive layer were demonstrated for the first time. The band gaps of the III-V CQDs were varied by varying the metal fraction and by particle size control. The X-ray absorption fine structure (XAFS) results show that the crystal states of the III-V CQDs consist of multi-phase states; multi-peak photoluminescence (PL) resulted from these multi-phase states. Inverted structured QLED shows green EL emission and a maximum luminance of ~45 cd/m2. This result shows that III-V CQDs can be a good substitute for conventional cadmium-containing CQDs in various opto-electronic applications, e.g., eco-friendly displays. (Un-published results).

• 한국재료학회지
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• 제4권6호
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• pp.681-686
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• 1994

$YBa_{2}Cu_{3}O_{7-x}$결정입계 접합을 이용한 마이크로파 감지소자 $YBa_{2}Cu_{3}O_{7-x}$초전도체 박막을 화학증착법을 이용하여 $LaAIO_{3}$단결정 위에 증착하여 임계온도 90K이상 임계전류밀도 $10^5/A \textrm{cm}^2$(77K) 이상의 우수한 박막을 제작하였다. 이를 포토작업과 이온밀링을 실시하여 수 마이크로미터 크기의 브릿지 형태로 만든 후 이들의 전류전압 특성을 조사하였다. 브릿지에 입사된 마이크로파의 크기에 따라 브릿지 간의 임계전류값의 저하가 관찰되었으며 동시에 샤피로스텝을 관찰할 수 있었다.

• 한국재료학회:학술대회논문집
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• 한국재료학회 2011년도 춘계학술발표대회
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• pp.8.1-8.1
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• 2011

Nanocrystalline titanium dioxide ($TiO_2$) materials have been widely used as an electron collector in DSSC. This is required to have an extremely high porosity and surface area such that the dye can be sufficiently adsorbed and be electronically interconnected, resulting in the generation of a high photocurrent within cells. In particular, their geometrical structures and crystalline phase have been extensively investigated as important issues in improving its photovoltaic efficiency. In this study, we present a new strategy to fabricate a photoelectrode having a periodic structured $TiO_2$ film templated from 1D or 3D polystyrene (PS) microspheres array. Monodisperse PS spheres of various radiuses were used for colloidal array on FTO glasses and two types of photoelectrode structures with different $TiO_2$ materials were investigated respectively. One is the igloo-shaped electrode prepared by $TiO_2$ deposition by RF-sputtering onto 2D microsphere-templated substrates. At the interface between the film and substrate, there are voids formed by the decomposition of PS microspheres during the calcination step. These holes might be expected to play the predominant roles as scattering spherical voids to promote a light harvesting effect, a spacious structure for electrolytes with higher viscosity and effective paths for electron transfer. Additionally the nanocrystalline $TiO_2$ phase prepared by the RF-sputtering method was previously reported to improve the electron drift mobility within $TiO_2$ electrodes. This yields solar cells with a cell efficiency of 2.45% or more at AM 1.5 illumination, which is a very remarkable result, considering its $TiO_2$ electrode thickness (<2 ${\mu}m$). This study can be expanded to obtain higher cell efficiency by higher dye loading through the increase of surface area or multi-layered stacking. The other is the inverse opal photonic crystal electrode prepared by titania particles infusion within 3D colloidal arrays. To obtain the enlargement of ordered area and high quality of crystallinity, the synthesis of titania particles coated with a organic thin layer were applied instead of sol-gel process using the $TiO_2$ precursors. They were dispersed so well in most solvents without aggregates and infused successfully within colloidal array structures. This ordered mesoporous structure provides the large surface area leading to the enough adsorption of dye molecules and have an light harvesting effect due to the photonic band gap properties (back-and-forth reflection effects within structures). A major advantage of this colloidal array template method is that the pore size and its distribution within $TiO_2$ photoelectrodes are determined by those of latex beads, which can be controlled easily. These materials may have promising potentials for future applications of membrane, sensor and so on as well as solar cells.

• 한국정보디스플레이학회:학술대회논문집
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• 한국정보디스플레이학회 2008년도 International Meeting on Information Display
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• pp.1261-1262
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• 2008

Laser-based crystallization techniques are ideally-suited for forming high-quality crystalline Si films on active-matrix display backplanes, because the highly-localized energy deposition allows for transformation of the as-deposited a-Si without damaging high-temperature-intolerant glass and plastic substrates. However, certain significant and non-trivial attributes must be satisfied for a particular method and implementation to be considered manufacturing-worthy. The crystallization process step must yield a Si microstructure that permits fabrication of thin-film transistors with sufficient uniformity and performance for the intended application and, the realization and implementation of the method must meet specific requirements of viability, robustness and economy in order to be accepted in mass production environments. In recent years, Low Temperature Polycrystalline Silicon (LTPS) has demonstrated its advantages through successful implementation in the application spaces that include highly-integrated active-matrix liquid-crystal displays (AMLCDs), cost competitive AMLCDs, and most recently, active-matrix organic light-emitting diode displays (AMOLEDs). In the mobile display market segment, LTPS continues to gain market share, as consumers demand mobile devices with higher display performance, longer battery life and reduced form factor. LTPS-based mobile displays have clearly demonstrated significant advantages in this regard. While the benefits of LTPS for mobile phones are well recognized, other mobile electronic applications such as portable multimedia players, tablet computers, ultra-mobile personal computers and notebook computers also stand to benefit from the performance and potential cost advantages offered by LTPS. Recently, significant efforts have been made to enable robust and cost-effective LTPS backplane manufacturing for AMOLED displays. The majority of the technical focus has been placed on ensuring the formation of extremely uniform poly-Si films. Although current commercially available AMOLED displays are aimed primarily at mobile applications, it is expected that continued development of the technology will soon lead to larger display sizes. Since LTPS backplanes are essentially required for AMOLED displays, LTPS manufacturing technology must be ready to scale the high degree of uniformity beyond the small and medium displays sizes. It is imperative for the manufacturers of LTPS crystallization equipment to ensure that the widespread adoption of the technology is not hindered by limitations of performance, uniformity or display size. In our presentation, we plan to present the state of the art in light sources and beam delivery systems used in high-volume manufacturing laser crystallization equipment. We will show that excimer-laser-based crystallization technologies are currently meeting the stringent requirements of AMOLED display fabrication, and are well positioned to meet the future demands for manufacturing these displays as well.

• Korean Chemical Engineering Research
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• 제54권6호
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• pp.854-862
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• 2016

최근 화석연료를 대체할 친환경 신재생에너지에 대한 요구가 증가하면서 수소에너지가 미래 대체에너지원으로서 주목받고 있다. 수소를 생산하는 방법 중 수전해 기술은 에너지효율과 안정성이 뛰어난 장점이 있지만, 산소발생반응시 발생하는 높은 과전압은 여전히 단점으로 지적되고 있다. 본 연구에서는 분무열분해 공정을 통하여 Co 전구체로부터 $Co_3O_4$를 제조하였다. 또한, urea, sucrose, citric acid의 유기물첨가제를 사용하여 다양한 입자 크기와 표면형상을 가지는 $Co_3O_4$를 제조하였고, 필요에 따라 추가로 열처리를 실시하였다. 합성한 $Co_3O_4$의 물리적 특성을 분석하기 위해 X-선 회절 분석(XRD)으로 결정성을 조사하였고, 주사전자현미경(SEM)과 투과전자현미경(TEM)으로 입자형상 및 표면을 분석하였다. 질소 흡 탈착 시험을 통해 촉매의 비표면적 및 기공부피를 측정하였고, 질소도핑을 확인하기 위해 X-선 광전자 분광법(XPS)을 사용하였다. 촉매의 산소발생반응 활성을 알아보기 위해 3전극 셀에서 선형주사전위법(LSV)으로 전기화학적 거동을 분석하였다. 첨가제를 사용하지 않은 $Co_3O_4$가 가장 우수한 활성을 보였고, 이는 분무열분해법을 통하여 상대적으로 작은 입자형성과 높은 비표면적의 영향인 것으로 판단된다.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2008년도 추계학술대회 논문집 Vol.21
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• pp.11-11
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• 2008

ZnO has a very large exciton binding energy (60 meV) as well as thermal and chemical stability, which are expected to allow efficient excitonic emission, even at room temperature. ZnO based electronic devices have attracted increasing interest as the backplanes for applications in the next-generation displays, such as active-matrix liquid crystal displays (AMLCDs) and active-matrix organic light emitting diodes (AMOLEDs), and in solid state lighting systems as a substitution for GaN based light emitting diodes (LEDs). Most of these electronic devices employ the electrical behavior of n-type semiconducting active oxides due to the difficulty in obtaining a p-type film with long-term stability and high performance. p-type ZnO films can be produced by substituting group V elements (N, P, and As) for the O sites or group I elements (Li, Na, and K) for Zn sites. However, the achievement of p-type ZnO is a difficult task due to self-compensation induced from intrinsic donor defects, such as O vacancies (Vo) and Zn interstitials ($Zn_i$), or an unintentional extrinsic donor such as H. Phosphorus (P) doped ZnO thin films were grown on c-sapphire substrates by radio frequency magnetron sputtering with various Ar/ $O_2$ gas ratios. Control of the electrical types in the P-doped ZnO films was achieved by varying the gas ratio with out post-annealing. The P-doped ZnO films grown at a Ar/ $O_2$ ratio of 3/1 showed p-type conductivity with a hole concentration and hole mobility of $10^{-17}cm^{-3}$ and $2.5cm^2/V{\cdot}s$, respectively. X-ray diffraction showed that the ZnO (0002) peak shifted to lower angle due to the positioning of $p^{3-}$ ions with a smaller ionic radius in the $O^{2-}$ sites. This indicates that a p-type mechanism was due to the substitutional Po. The low-temperature photoluminescence of the p-type ZnO films showed p-type related neutral acceptor-bound exciton emission. The p-ZnO/n-Si heterojunction LEO showed typical rectification behavior, which confirmed the p-type characteristics of the ZnO films in the as-deposited status, despite the deep-level related electroluminescence emission.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2014년도 제46회 동계 정기학술대회 초록집
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• pp.337-337
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• 2014

투명 전도성 산화물(transparent conductive oxide: TCO) 박막은 높은 투과율과 낮은 비저항 덕분에 LCD (liquid crystal display), PDP (plasma display panel), OLED (organic light emitting display) 등 평판 디스플레이에 널리 사용되고 있다. 현재 양산되고 있는 ITO (indium tin oxide)는 90% 이상의 높은 투과율과 우수한 전도성으로 인해 TCO 박막 가운데서 디스플레이 산업에서 가장 널리 쓰이고 있다. 그런데, ITO의 인듐산화물에 의한 간질성 폐렴(interstitial pneumonia)의 유발 위험이 있다든가, 인듐의 매장량이 적어 원자재 가격이 비싼 단점도 가지고 있다. 이에 최근 ITO를 대체할 수 있는 TCO물질로 많은 연구가 이루어지고 있는데, 특히 AZO (aluminum-doped zinc oxide)는 그 중 대표적인 대체물질로서 독성이 없고 가격도 저렴하여 많은 관심이 증폭되고 있다. 현재 AZO는 sol-gel 방법이나 CVD (chemical vapor deposition) 또는 스퍼터링 방법 등으로 증착되고 있다. 본 연구에서는 두 개의 이종타겟(hetero target)을 장착한 대향 타겟 스퍼터링(facing target sputtering: FTS) 장치를 사용하여 AZO 박막을 제작한다. 기존의 여러 증착법과 달리, FTS 장치는 두 타겟 사이에 형성되는 플라즈마 내의 ${\gamma}$-전자를 구속하게 되며, 낮은 가스 압력에서 고밀도 플라즈마가 생성되어 빠른 증착 속도와 안정적인 방전을 유지한 상태에서 박막을 증착할 수가 있다. 또한 기판과 플라즈마가 이격되어 있어 높은 에너지를 갖는 입자들의 기판 충돌을 억제할 수 있는 장점들을 갖는다. 이종 타겟인 ZnO와 Al2O3를 사용하고 각 타겟에 인가되는 파워 변화를 통해 AZO 박막 내 Al2O3의 성분비를 조절하였다. ZnO 타겟의 증착 파워를 100 W로 고정할 경우, Al2O3 타겟의 증착 파워가 (50~90) W으로 실험을 하였으며, Al2O3 타겟의 증착 파워가 70 W일 때 AZO 박막의 Al2O3 성분비는 2.02 wt.%이며 박막의 비저항 값은 $5{\times}10^{-4}{\Omega}{\cdot}cm$로 최소값을 보였다. 이러한 비저항의 변화는 파워에 따른 AZO 박막의 캐리어 이동도(Hall mobility)와 캐리어의 농도(Carrier Concentration)의 변화와 밀접한 관계가 있음을 보여주며, 특히 AZO 박막의 캐리어 농도와 캐리어 이동도는 AZO 박막을 형성하고 있는 결정립의 크기에 의존하는 것이 X-선 회절 패턴과 SEM으로부터 확인되었다. 특히, 본 연구에서는 두 개의 이종 타겟(hetero target) Al2O3와 ZnO를 장착하고 각각의 파워를 변화시켜 도핑 량을 조절할 수는 대향 타겟 스퍼터링(FTS: facing-target sputtering) 방법을 이용하여 제작된 AZO 박막에 대해 전기적, 광학적 및 구조적 특성을 분석하고 ITO의 대체물로서의 가능성을 검토하고자 한다.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2014년도 제46회 동계 정기학술대회 초록집
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• pp.363-363
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• 2014

Ruthenium (Ru) has attractive material properties due to its promising characteristics such as a low resistivity ($7.1{\mu}{\Omega}{\cdot}cm$ in the bulk), a high work function of 4.7 eV, and feasibility for the dry etch process. These properties make Ru films appropriate for various applications in the state-of-art semiconductor device technologies. Thus, it has been widely investigated as an electrode for capacitor in the dynamic random access memory (DRAM), a metal gate for metal-oxide semiconductor field effect transistor (MOSFET), and a seed layer for Cu metallization. Due to the continuous shrinkage of microelectronic devices, better deposition processes for Ru thin films are critically required with excellent step coverages in high aspect ratio (AR) structures. In these respects, atomic layer deposition (ALD) is a viable solution for preparing Ru thin films because it enables atomic-scale control of the film thickness with excellent conformality. A recent investigation reported that the nucleation of ALD-Ru film was enhanced considerably by using a zero-valent metallorganic precursor, compared to the utilization of precursors with higher metal valences. In this study, we will present our research results on the synthesis and characterization of novel ruthenium complexes. The ruthenium compounds were easy synthesized by the reaction of ruthenium halide with appropriate organic ligands in protic solvent, and characterized by NMR, elemental analysis and thermogravimetric analysis. The molecular structures of the complexes were studied by single crystal diffraction. ALD of Ru film was demonstrated using the new Ru metallorganic precursor and O2 as the Ru source and reactant, respectively, at the deposition temperatures of $300-350^{\circ}C$. Self-limited reaction behavior was observed as increasing Ru precursor and O2 pulse time, suggesting that newly developed Ru precursor is applicable for ALD process. Detailed discussions on the chemical and structural properties of Ru thin films as well as its growth behavior using new Ru precursor will be also presented.