• 제목/요약/키워드: Optoelectronic Device

검색결과 127건 처리시간 0.027초

Nonlinear Microwave Performance of an Optoelectronic CPW-to-Slotline Ring Resonator on GaAs Substrate

  • Lee, Jong-Chul
    • Journal of Electrical Engineering and information Science
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    • 제2권3호
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    • pp.95-98
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    • 1997
  • A nonlinear optical-microwave interaction is carried out in an uniplanar CPW-to-Slotline ring resonator on the semi-insulating GaAs substrate, in which a Schottky photodetector is monolithically integrated as a coupling gap. When the capacitive reactance of the detetor is modulated, the parametric amplification effect of the mixer occurs. In this device structure, the parametric amplification gain of 20 dB without the applied bias in RF signal is obtained. This microwave optoelectronic mixer can be used in the fiber-optic communication link.

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Fabrication of Gallium Phosphide Tapered Nanostructures on Selective Surfaces

  • Song, Young Min;Park, Hyun Gi
    • Applied Science and Convergence Technology
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    • 제23권5호
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    • pp.284-288
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    • 2014
  • We present tapered nanostructures fabricated on a selective area of gallium phosphide substrates for advanced optoelectronic device applications. A lithography-free fabrication process was accomplished by dry etching of metal nanoparticles. Thermal dewetting of micro-patterned metal thin films provides etch masks for tapered nanostructures. This simple process also allows the formation of plasmonic surfaces with corrugated shapes. Rigorous coupled-wave analysis calculations provide design guidelines for tapered nanostructures on gallium phosphide substrates.

Optically Controlled Silicon MESFET Fabrication and Characterizations for Optical Modulator/Demodulator

  • Chattopadhyay, S.N.;Overton, C.B.;Vetter, S.;Azadeh, M.;Olson, B.H.;Naga, N. El
    • JSTS:Journal of Semiconductor Technology and Science
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    • 제10권3호
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    • pp.213-224
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    • 2010
  • An optically controlled silicon MESFET (OPFET) was fabricated by diffusion process to enhance the quantum efficiency, which is the most important optoelectronic device performance usually affected by ion implantation process due to large number of process induced defects. The desired impurity distribution profile and the junction depth were obtained solely with diffusion, and etching processes monitored by atomic force microscope, spreading resistance profiling and C-V measurements. With this approach fabrication induced defects are reduced, leading to significantly improved performance. The fabricated OPFET devices showed proper I-V characteristics with desired pinch-off voltage and threshold voltage for normally-on devices. The peak photoresponsivity was obtained at 620 nm wavelength and the extracted external quantum efficiency from the photoresponse plot was found to be approximately 87.9%. This result is evidence of enhancement of device quantum efficiency fabricated by the diffusion process. It also supports the fact that the diffusion process is an extremely suitable process for fabrication of high performance optoelectronic devices. The maximum gain of OPFET at optical modulated signal was obtained at the frequency of 1 MHz with rise time and fall time approximately of 480 nS. The extracted transconductance shows the possible potential of device speed performance improvements for shorter gate length. The results support the use of a diffusion process for fabrication of high performance optoelectronic devices.

Optoelectronic Characteristics of Hydrogen and Oxygen Annealed Si-O Superlattice Diode

  • Seo, Yong-Jin
    • Transactions on Electrical and Electronic Materials
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    • 제2권2호
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    • pp.16-20
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    • 2001
  • Optoelectronic characteristics of the superlattice diode as a function of deposition temperature and annealing conditions have been studied. The multilayer nanocrystalline silicon/adsorbed oxygen (nc/Si/O) superlattice formed by molecular beam epitaxy (MBE) system. Experimental results showed that deposition temperature of 550$^{\circ}C$, followed by hydrogen annealing leads to best results, in terms of optical photoluminescence (PL) and electrical current-voltage (I-V) characteristics. Consequently, the experimental results of multilayer Si/O superlattic device showed the stable photoluminescence and good insulating behavior with high breakdown voltage. This is very useful promise for Si-based optoelectronic devices, and can be readily integrated with conventional silicon ULSI processing.

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광 시냅스 및 뉴로모픽 소자 기술 (Recent Progress of Light-Stimulated Synapse and Neuromorphic Devices)

  • 송승호;김지훈;김영훈
    • 한국전기전자재료학회논문지
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    • 제35권3호
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    • pp.215-222
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    • 2022
  • Artificial neuromorphic devices are considered the key component in realizing energy-efficient and brain-inspired computing systems. For the artificial neuromorphic devices, various material candidates and device architectures have been reported, including two-dimensional materials, metal-oxide semiconductors, organic semiconductors, and halide perovskite materials. In addition to conventional electrical neuromorphic devices, optoelectronic neuromorphic devices, which operate under a light stimulus, have received significant interest due to their potential advantages such as low power consumption, parallel processing, and high bandwidth. This article reviews the recent progress in optoelectronic neuromorphic devices using various active materials such as two-dimensional materials, metal-oxide semiconductors, organic semiconductors, and halide perovskites

Self-Pulsation in Multisection Distributed Feedback Laser Diode with a Novel Dual Grating Structure

  • Park, Kyung-Hyun;Leem, Young-Ahn;Yee, Dae-Su;Baek, Yong-Soon;Kim, Dong-Churl;Kim, Sung-Bock;Sim, Eun-Deok
    • ETRI Journal
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    • 제25권3호
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    • pp.149-155
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    • 2003
  • A self-pulsating multisection distributed-feedback laser diode (DFB LD) can potentially realize all-optical clock extraction. This device generally consists of three sections, two DFB sections and one waveguide section. The most important variable in this device is detuning, which is the relative spectral position between the stop bands of two DFB sections. We fabricated a novel structure in which two gratings were located one over and one under the active layers. Each grating structure was independently defined in processing so that detuning, which is the prerequisite for self-pulsation, could be easily controlled. Observing various self-pulsating phenomena in these devices under several detuning conditions, we characterized the phenomena as dispersive Q-switching, mode beating, and self-mode-locking.

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유기 광전자 재료의 기술동향 (Technical Trend in Organo-Optoelectronic Materials and Their Applications)

  • 김명룡
    • E2M - 전기 전자와 첨단 소재
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    • 제10권3호
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    • pp.295-301
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    • 1997
  • 다양하고 방대한 양의 정보를 효과적으로 처리, 분배하는 멀티미디어 정보통신 시스템이 광신호에 의한 처리를 통해 구현되어갈 전망이다. 이를 위해 빛을 발생시키는 발광소자, 빛을 검출하는 소광소자, 광신호를 처리하는 광신호 처리소자 그리고 광신호를 전달해주는 광섬유 및 화상정보의 표시를 위한 표시소자 등이 중요한 요소기술이다. 이같은 소자의 제작에 있어 기존 물질로는 요구에 대한 대응이 어려워 보다 우수한 성능의 소재개발이 요구된다. 이에 대한 대체물질로 최근 유기물 또는 고분자가 각광을 받고 있으며, 이를 사용한 소자개발이 활발히 진행되고 있다. 이제까지 무기물로 달성하기 힘들었던 많은 기술들이 유기물로 쉽게 구현이 가능하게 되면 고성능의 소재 및 소자기술은 다가오느 정보화 시대를 더축 풍요롭게 하는데 크게 기여할 것이다.

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직접천이 띠간격을 갖는 $Ge_{1-x}$$Sn_x$/$Ge_{1-y}$$Sn_y$(001)의 전기적 특성 연구 (Study of the electrical propety for $Ge_{1-x}$$Sn_x$/$Ge_{1-y}$$Sn_y$((001) with a direct gap)

  • 박일수;전상국
    • 한국전기전자재료학회논문지
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    • 제13권12호
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    • pp.989-995
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    • 2000
  • G $e_{1-x}$ S $n_{x}$G $e_{1-y}$S $n_{y}$ is a very promising material for the high-speed device due to the fact that electron and hole mobilities for the strained G $e_{1-x}$ S $n_{x}$G $e_{1-y}$S $n_{y}$ are greatly enhanced. Because G $e_{1-x}$ S $n_{x}$G $e_{1-y}$S $n_{y}$ has a direct band gap for the proper combination of x and y, it can be applied to the optoelectronic device. Therefore, the study of the electrical property for G $e_{1-x}$ S $n_{x}$G $e_{1-y}$S $n_{y}$(001) with a direct energy gap is needed. G $e_{1-x}$ S $n_{x}$ layer can not be grown thickly due to the large difference of lattice constants. This fact prefers the structure of the device where electrons and holes move in the plane direction. The transverse mobilities of electron and hole for G $e_{0.8}$S $n_{0.2}$Ge(001) are 2~3 times larger than those for Ge/Ge/ sub0.8/S $n_{0.2}$(001). Therefore, G $e_{0.8}$S $n_{0.2}$Ge(001) is expected to be better than Ge/G $e_{0.8}$S $n_{0.2}$(001) for the development of the high-speed device.h-speed device.device.h-speed device. device.

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저온에서 Hydropolymer를 이용한 ZnO 나노입자 염료 감응형 태양전지 (ZnO Nanoparticle Based Dye-Sensitized Solar Cells Devices Fabricated Utilizing Hydropolymer at Low Temperature)

  • 권병욱;손동익;박동희;양정도;최원국
    • 한국재료학회지
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    • 제20권9호
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    • pp.483-487
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    • 2010
  • To fabricate $TiO_2$ nanoparticle-based dye sensitized solar cells (DSSCs) at a low-temperature, DSSCs were fabricated using hydropolymer and ZnO nanoparticles composites for the electron transport layer around a low-temperature ($200^{\circ}C$). ZnO nanoparticle with 20 nm and 60 nm diameter were used and Pt was deposited as a counter electrode on ITO/glass using an RF magnetron sputtering. We investigate the effect of ZnO nanoparticle concentration in hydropolymer and ZnO nanoparticle solution on the photoconversion performance of the low temperature fabricated ($200^{\circ}C$) DSSCs. Using cis-bis(isothiocyanato)bis(2,20 bipyridy1-4,40 dicarboxylato) ruthenium (II) bis-tetrabutylammonium (N719) dye as a sensitizer, the corresponding device performance and photo-physical characteristics are investigated through conventional physical characterization techniques. The effect of thickness of the ZnO photoelectrode and the morphology of the ZnO nanoparticles with the variations of hydropolymer to ZnO ratio on the photoconversion performance are also investigated. The morphology of the ZnO layer after sintering was examined using a field emission scanning electron microscope (FE-SEM). 60 nm ZnO nanoparticle DSSCs showed an incident photon-to-current conversion efficiency (IPCE) value of about 7% higher than that of 20 nm ZnO nanoparticle DSSCs. The maximum parameters of the short circuit current density ($J_{sc}$), the open circuit potential ($V_{oc}$), fill factor (ff), and efficiency ($\eta$) in the 60 nm ZnO nanoparticle-based DSSC devices were 4.93 mA/$cm^2$, 0.56V, 0.40, and 1.12%, respectively.

광대역 교환을 위한 InP JFET소자 (InP JFET Devices for High Speed Switching Application)

  • 지윤규;김성준;정종민
    • 전자공학회논문지A
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    • 제28A권5호
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    • pp.370-374
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    • 1991
  • A high performance fully ion-implanted InP JFET was characterized for high speed switching elements. The switch has an insertion loss of 5.5dB with 31.6dB isolation at 1GHz. This device can effectively swithc a byte-multiplexed 2Gb/s signal and an eye-diagram taken at 2Gb/s shows an error-free eye pattern. Therefore, this device can be used as a switching element for high transmission data rate for monolithic integration of optoelectronic circuit in the long-wavelength region.

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