Resolution Limit Analysis of Isolated Patterns Using Optical Proximity Correction Method with Attenuated Phase Shift Mask (Attenuated Phase Shift Mask에 광 근접 효과 보정을 적용한 고립 패턴의 해상 한계 분석)
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- Journal of the Korean Institute of Electrical and Electronic Material Engineers
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- v.13 no.11
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- pp.901-907
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- 2000