• The Bulletin of The Korean Astronomical Society
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• v.45 no.1
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• pp.67.2-67.2
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• 2020

Not only the magnitude of the mirror surface error, the pattern matters as it produces certain aberrations. In particular, the surface error of the freeform mirrors, which are optimized to eliminate specific aberrations, might show much higher sensitivity in optical performance. Therefore, we analyze the mirror surface error with Zernike polynomials with the goal of generating a realistic error surface. We investigate the surface error of the freeform mirror fabricated by diamond turning machine to analyze the realistic tendency of the error. The surface error with 0.22 ㎛ root-mean-square value is fitted to the Zernike terms using the incremental fitting method, which increases the number of the fitting coefficients through steps. Furthermore, optical performance via surface error pattern based on Zernike terms is studied to see the influences of each term. With this study, realistic error surface generation may allow higher accuracy not only for the feasibility test but also for all tests and predictions using optical simulations.

• Transactions of Materials Processing
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• v.15 no.1 s.82
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• pp.3-8
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• 2006

The demand fer small and high-capacity optical data storage devices has rapidly increased. The areal density of optical disk is increased by using higher numerical aperture objective lens and shorter wavelength source. A wafer-scale stacked micro objective lens with a numerical aperture of 0.85 and a focal length of 0.467mm for the 405nm blue- violet laser was designed and fabricated. A diffractive optical element (DOE) was used to compensate the spherical aberration of the objective lens. Among the various fabrication methods for micro DOE, the UV-replication process is more suitable fur mass-production. In this study, an 8-stepped DOE pattern as a master was fabricated by photolithography and reactive ion etching process. A flexible mold was fabricated for improving the releasing properties and shape accuracy in UV-replication process. In the replication process, the effects of exposing time and applied pressure on the replication quality were analyzed. Finally, the surface profiles of master, mold and molded pattern were measured by optical scanning profiler. The geometrical deviation between the master and the molded DOE was less than $0.1{\mu}m$. The diffraction efficiency of the molded DOE was measured by DOE efficiency measurement system which consists of laser source, sample holder, aperture and optical power meter, and the measured value was $84.5\%$.

• Proceedings of the Korean Society for Technology of Plasticity Conference
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• 2005.09a
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• pp.35-40
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• 2005

The demand for small and high-capacity optical data storage devices has rapidly increased. The areal density of optical disk is increased using higher numerical aperture objective lens and shorter wavelength source. A wafer-scale stacked micro objective lens with a numerical aperture of 0.85 and a focal length of 0.467mm for the 405nm blue- violet laser was designed and fabricated. A diffractive optical element (DOE) was used to compensate the spherical aberration of the objective lens. Among the various fabrication methods for micro DOE, the UV-replication process is more suitable for mass-production. In this study, an 8-stepped DOE pattern as a master was fabricated by photolithography and reactive ion etching process. A flexible mold was fabricated for improving the releasing properties and shape accuracy in UV-molding process. In the replication process, the effects of exposing time and applied pressure on the replication quality were analyzed. Finally, the shapes of master, mold and molded pattern were measured by optical scanning profiler. The deviation between the master and the molded DOE was less than 0.1um. The efficiency of the molded DOE was measured by DOE efficiency measurement system which consists of laser source, sample holder, aperture and optical power meter, and the measured value was $84.5\%$.

• Journal of the Optical Society of Korea
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• v.14 no.2
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• pp.90-96
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• 2010

Joint transform correlator (JTC) has been the most suitable technique for real time pattern recognition. This paper proposes a new phase adjustment which adopts two steps of random phase adjustment in the spatial domain and additional phase adjustment in the Fourier domain. Simulated results are presented to show the optimum condition of the phase adjustment and the effect on the correlation peaks, the peak signal-to-noise ratio and the level of discrimination.

• 한국정보디스플레이학회:학술대회논문집
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• 2005.07a
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• pp.493-495
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• 2005

The director profiles of the Bloch walls are directly visualized using fluorescence confocal polarizing microscopy. Both pure twist Bloch walls and diffuse Bloch walls are analyzed. Polar anchoring energy was measured from optical simulation of the transmitted light interference pattern or the fluorescence intensity profile of a pure twist wall..

• Proceedings of the Optical Society of Korea Conference
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• 2003.02a
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• pp.242-243
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• 2003

A CGH is a hologram generated by computer. It is widely applied to wavefront manipulation, synthesis, optical information processing and interferometer. Some methods have been used to determine the optimum phase pattern to achieve high diffraction efficiency and uniform intensity such as DBS (Direct Binary Search), SA (Simulated Annealing), GA(Genetic Algorithm). These methods require long computation time to generate a hologram. (omitted)

• Proceedings of the Optical Society of Korea Conference
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• 1989.02a
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• pp.43-45
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• 1989

Single mode pulsed incidence dye laser which has TEMoo spatial beam pattern, near gaussian temporal shape and narrow band width(less than 500MHz) has been constructed The improved performance comes as a results of cavity length(~5cm) and definition of optical path by means of longitudinal pumping. Using 1.0X10-4M RH-6G dye, conversion efficiency was approximately 2.2% and tuning range was 548-564nm.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.23 no.6
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• pp.440-443
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• 2010

We report a top-down approach based on atomic force microscopy (AFM) local anodic oxidation for the fabrication of the nano-pattern field effect transistors (FETs). AFM anodic oxidation is relatively a simple process in atmosphere at room temperature but it still can result in patterns with a high spatial resolution, and compatibility with conventional silicon CMOS process. In this work, we study nano-pattern FETs for various cross-bar distance value D, from ${\sim}0.5\;{\mu}m$ to $1\;{\mu}m$. We compare the optical characteristics of the patterned FETs and of the reference FETs based on both 2-dimensional simulation and experimental results for the wavelength from 100 nm to 900 nm. The simulated the drain current of the nano-patterned FETs shows significantly higher value incident the reference FETs from ${\sim}1.7\;{\times}\;10^{-6}A$ to ${\sim}2.3\;{\times}\;10^{-6}A$ in the infrared range. The fabricated surface texturing of photo-transistors may be applied for high-efficiency photovoltaic devices.

• The Journal of Korean Institute of Communications and Information Sciences
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• v.27 no.8B
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• pp.826-833
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• 2002

Generally, it is announced that RZ pattern gives a better transmission performance than NRZ pattern in ultra-high speed transmission above 10Gbps. In this paper, we propose a wavelength converter for RZ data which can controls XPM in SOA by locating polarization controllers within optical fiber loop mirror and demonstrate its performance through simulation and 10Gbps data experiment. The proposed structure needs only one polarization dependent SOA for implementation compared to previous XPM ones to make the cost down. And it provides non-inverted pattern outputs at two output ports respectively.

• Journal of the Korean Society of Clothing and Textiles
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• v.26 no.7
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• pp.993-1004
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• 2002

This study was designed to examine the aesthetic characteristics of traditional wedding dress in Japan based on the internal$.$external aesthetics. They were extruded external and internal aesthetics based on pattern, color and fitting. The results of this study can be summarized as follows; Decorative characteristics in external aesthetics extracted into three factors; fantasticism, movement, amusement. The fantasticism was based on the omitted pattern, painting gold. The movement was presented through irregular composition, fitting method, and silhouette. The amusement was expressed through the composition focus on a near view and pattern reminded of bring up the image. Fitting characteristics in external aesthetics extracted into four factors; grace, cubic effect, optical illusion, and tradition. The pace was expressed through the weight, formativeness, and layered look The cubic effect was presented through spacing of belt and H-line silhouette. The optical illusion was based on the straight line of seam, V-pleats and straight silhouette of fitting, and high-waisted belt. The tradition expressed through the unchanged form since Heian-dynasty. Internal aesthetics were characterized by the naturalism and the moderation. The naturalism was presented through the natural pattern which based on subjective feeling, indignity and position of wearing man, and color based on taste. The necessaries, or pressed artificial moderation, were expressed through the clothing silhouette by simplicity.