• Title/Summary/Keyword: Optical film

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a-Si:H Photosensor Using Cr silicide Schottky Contact

  • Hur, Chang-Wu
    • Journal of information and communication convergence engineering
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    • v.4 no.3
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    • pp.105-107
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    • 2006
  • Amorphous silicon is a kind of optical to electric conversion material with current or voltage type after generating a numerous free electron and hole when it is injected by light. It is very effective technology to make schottky diode by bonding thin film to use optical diode. In this paper, we have fabricated optical diode device by forming chrome silicide film through thermal processing with thin film($100{\AA}$) having optimal amorphous silicon. The optimal condition is that we make a thin film by using PECVD(Plasma Enhanced Chemical Vapor Deposition) to improve reliability and characteristics of optical diode. We have obtained high quality diode by using chrome silicide optical diode from dark current and optical current measurement compared to previous method. It makes a simple process and improves a good reliability.

Qualitative Analysis of Film Thickness in Elastohydrodynamic Lubrication (탄성 유체 윤활에서의 유막 두께 측정에 관한 정성적 분석)

  • 최언진;박경근;장시열
    • Tribology and Lubricants
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    • v.16 no.5
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    • pp.317-323
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    • 2000
  • The film thickness and shape of elastohydrodynamic lubrication is measured by optical interferometer, which is the most precise method for EHL film measurement. However, the interpretation of the image pattern from optical viscometer is not simple for two-dimensional shape. A newly developed method of image processing makes it possible to evaluate the film thickness and shape in every point of contact region with two dimensional aspects. In this study, we captured the film shape of EHL film by the monochromatic incident light and analyzed the film thickness with the image processing method, which uses phase shift method. From the values of intensity in fringes, the qualitative feature of film thickness in the contact area are obtained by using Zernike polynomial

Optical Transmittance of PdHx Thin Film (PdHx 박막의 광투과도)

  • Cho, Young sin
    • Transactions of the Korean hydrogen and new energy society
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    • v.12 no.3
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    • pp.201-209
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    • 2001
  • The change of optical transmittance of $PdH_x$ thin film due to hydrogen concentration change was measured at room temperature. Pd film($312{\AA}$ thick) was made by thermal evaporation on glass substrate. Hydrogen absorption and desorption cycling effect on optical transmittance was measured 4 times in the pressure range between 0 and 640 torr. Ratio of optical transmittance to the change of ln pressure(torr) increases with increasing number of hydrogen A-D cyclings in the ${\beta}$ phase.

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Qualitative Analysis of Film Thickness in Elastohydrodynamic Lubrication (탄성 유체 윤활에서의 유막 두께 측정에 관한 정성적 분석)

  • 최언진;장시열
    • Proceedings of the Korean Society of Tribologists and Lubrication Engineers Conference
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    • 1999.06a
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    • pp.147-155
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    • 1999
  • The film thickness and shape of elastohydrodynamic lubrication is measured by optical interferometer, which is the most precise method for EHL film measurement. However the interpretation of the image pattern from optical viscometer is not easy for two-dimensional shape. A newly developed method of image processing makes it possible to evaluate the film thickness and shape in every point of contact region with two dimensional aspects. In this study, we captured film shape of EHL film from the monochromatic incident light with the Image processing method, which uses phase shift method, and obtained the image analysis method for gray level image in order to qualitatively evaluate film shapes.

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Circular Polarizers for Reflective LCDs

  • Yoshimi, Hiroyuki;Yano, Shuji;Fujimura, Yasuo
    • 한국정보디스플레이학회:학술대회논문집
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    • 2002.08a
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    • pp.905-909
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    • 2002
  • Characteristics of reflective LCDs, which have gained a lot of notice in recent years, rely largely on optical design of circular polarizers and the quarter-wave plates, as a component. Important design includes wavelength dispersion, viewing angle, uniformity of display and matching of refractive index. Our work has contributed to improving performance of reflective LCDs by enhancing the characteristics of polymer film using stretching and optical lamination technologies. To design that offers higher contrast and wider viewing angle, we have discovered that it is necessary to control viewing angle variation of the polarizing axis in order to compensate for the viewing angle of the polarizing film as well as the optical anisotropic properties of liquid crystal. Applying this technology to circular polarizers used for reflective LCDs enables design of wide viewing angle circular polarizers. In order to realize higher contrast for reflective LCDs, it is also necessary to design other optical materials including polarizing films. For design of hybrid optical film, it is particularly necessary to reduce surface reflection and interface reflection. This paper also reports our findings concerning this topic.

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The variation of optical pass length between incident and reflective beam in multilayer thin film (다층박막에서의 입사광과 반사광의 광로정변화)

  • 김문환;최영규
    • Korean Journal of Optics and Photonics
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    • v.13 no.6
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    • pp.515-520
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    • 2002
  • The variation of the optical pass length between incident and reflective beam in a multilayer thin film reflection mirror is investigated. This variation is caused mainly by environmental parameters around the optical system, such as the air pressure, temperature, humidity and $CO_2$concentration. In this paper, a new method for measuring optical pass length variation is proposed. This optical pass length is measured against the above parameters by experiment. From the experimental results, it is clarified that the optical pass length is mostly effected by humidity changes.

The study of SiON thin film for optical properties. (SiON 박막의 광학적 특성에 대한 연구)

  • Kim, D.H.;Im, K.J.;Kim, K.H.;Kim, H.S.;Sung, M.Y.
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2001.11b
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    • pp.247-250
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    • 2001
  • We studied optical properties of SiON thin-film in the applications of optical waveguide. SiON thin-film was grown in $300^{\circ}C$ by PECVD(plasma enhanced chemical vapor deposition) system. The change of SiON thin-film composition and refractive Index was studied as a function of varying $NH_3$ gas flow rate. As $NH_3$ gas flow rate was increased, Quantity of N and refractive index were increased at the same time. By the results, we could form the SiON thin-film to use of a waveguide with refractive index of 1.6. We analyzed the conditions of the thin-film with FTIR(fourier transform infrared) and OES (optical emission spectroscopy). N-H bonding($3390cm^{-1}$ ) can be removed by thermal annealing. And we could observe the SiH bonding state and quantity by OES analysis in $SiH_4$

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The study of SiON thin film for optical properlies (SiON 박막의 광학적 특성에 대한 연구)

  • 김도형;임기주;김기현;김현석;김상식;성만영
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2001.11a
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    • pp.247-250
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    • 2001
  • We studied optical properties of SiON thin-film in the applications of optical waveguide. SiON thin-film was grown in 300$^{\circ}C$ by PECVD(plasma enhanced chemical vapor deposition) system. The change of SiON thin-film composition and refractive Index was studied as a function of varying NH$_3$ gas flow rate. As NH$_3$ gas flow rate was increased, Quantity of N and refractive index were increased at the same time. By the results, we could form the SiON thin-film to use of a waveguide with refractive index of 1.6. We analyzed the conditions of the thin-film with FTIR(fourier transform infrared) and OES(optical emission spectroscopy). N-H bonding(3390cm$\^$-1/) can be removed by thermal annealing. And we could observe the SiH bonding state and quantity by OES analysis in SiH$_4$

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Study on the Optical Properties of Light Diffusion Film with Plate Type Hollow Silica

  • Lee, Ji-Seon;Moon, Seong-Cheol;Noh, Kyeong-Jae;Lee, Seong-Eui
    • Journal of the Korean Ceramic Society
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    • v.54 no.5
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    • pp.429-437
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    • 2017
  • Micro hollow plate type silica with low refraction properties was synthesized and its hollow structure was applied as an optical structure to develop a light diffusion material that simultaneously satisfies the requirements of good light diffusibility, high transmissibility, and high luminance. The developed light diffusion material was applied to a light diffusion film and the film's optical properties were assessed. Hollow silica was synthesized by precipitation method using $Mg(OH)_2$ core particles, sodium silicate, and ammonium sulfate as the silica precursors. The concentration of the silica precursor was adjusted to control hollow silica shell thickness. The total light transmittance of the light diffusion film composed of the hollow silica was 94.55%, which was 4.57% higher than that of the PC film; new film's haze was 71.20%, which was 70.9% higher. Furthermore, the luminance increased by 5.34% compared to that of the light source. The reason for the results is not only that the micro plate type hollow silica, which has a low refractive property, played a role in reducing the difference in refractive index between the medium boundaries, but also that there was a light-concentrating effect due to the changing of light paths to the front direction inside the hollow structure. Optical simulation verified the enhanced optical properties when hollow silica was applied to the light diffusion film.

Pretilt control of nematic liquid crystal by deposition of $SiO_x$ film (비정질 $SiO_x$ 박막을 이용한 nematic 액정의 선경사각 제어)

  • Park, Jeong-Hun;Son, Pil-Guk;Cha, Seong-Su;Kim, Jae-Chang;Yun, Tae-Hun
    • Proceedings of the Optical Society of Korea Conference
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    • 2006.07a
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    • pp.91-92
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    • 2006
  • Liquid crystal (LC) alignment on $a-SiO_x$ thin film was investigated by means of X-ray photoemission spectroscopy and optical transmittance as we varied the deposition temperature and the target-to-substrate distance. LC molecules can be aligned vertically on $a-SiO_x$ film when the stoichiometric parameter x of $a-SiO_x$ is smaller than 1.56, but they can be aligned homogeneously when x is larger than 1.56. We also found that whether liquid crystals can be aligned vertically or homogeneously on $a-SiO_x$ film can be predicted simply by measuring the change in optical transmittance by deposition of $a-SiO_x$ thin film layers.

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