Temperature Dependence on Dry Etching of $ZrO_2$ Thin Films in $Cl_2/BCl_3$ /Ar Inductively Coupled Plasma
($Cl_2/BCl_3$ /Ar 유도 결합 플라즈마에서 온도에 따른 $ZrO_2$ 박막의 식각)
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- Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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- 2008.11a
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- pp.145-145
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- 2008