• Transactions of the Society of Information Storage Systems
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• v.1 no.2
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• pp.182-187
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• 2005

A large area micro mirror is an optical element that functions as changing an optical path by reflection in integrated optical system. We fabricated the large area silicon mirror by anisotropic etching using MEMS for implementation of integrated optical pickup. In this work, we report the optimum conditions to better fabricate and design, greatly improve mirror surface quality. To obtain mirror surface of $45^{\circ},\;9.74^{\circ}$ off-axis silicon wafer from (100) plane was used in etching condition of $80^{\circ}C$ with 40wt.% KOH solution. After wet etching, polishing process by MR fluid was applied to mirror surface for reduction of roughness. In the next step, after polymer coating on the polished Si wafer, the Si mirror was fabricated by UV curing using a trapezoid bar-type way structure. Finally, we obtained peak to valley roughness about 50 nm in large area of $mm^2$ and it is applicable to optical pickup using blu-ray wavelength as well as infrared wavelength.

• Journal of the Optical Society of Korea
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• v.16 no.4
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• pp.343-348
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• 2012

This paper described an off-axis five-mirror-anastigmatic telescope. It is composed of three aspheric surfaces and one spherical surface while the third mirror and fifth mirror have the same parameters at the same place. This configuration is useful for having wide field of view. The strip full field of view for the near infrared telescope is $20^{\circ}{\times}0.2^{\circ}$. The entrance pupil is located in front of the first mirror. There is an intermediate image between the second mirror and the third mirror. The entrance pupil diameter is 100 mm and the effective focal length is 250 mm. The spectral range is $0.85-1.75{\mu}m$. The pixel pitch is $15{\mu}m$. The image quality is near the diffraction limit. Some methods were used to restrain the stray light such as a field stop near the intermediate image, the baffle, the narrow-band pass filter and a stop in front of the focal plane.

• Journal of the Korea Institute of Military Science and Technology
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• v.25 no.6
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• pp.561-571
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• 2022

An optical mirror assembly is an opto-mechanically coupled system as the optical and mechanical behaviors interact. In the assembly, a flexure mount attached to an optical mirror should be flexible in the radial direction, but rigid for the remaining degrees of freedom for supporting the mirror rigidly and suppressing the wavefront error of the optical mirror. This work presents an optimal design of the flexure mount using topology optimization with thermal stress constraint. By simplifying the optical mirror assembly into finite shell elements, topology optimization model was built for efficient design and good machinability. The stress at the boundary between the optical mirror and the mount together with the first natural frequency were applied as constraints for the optimization problem, while the objective function was set to minimize the strain energy. As a result, we obtained the optimal design of the flexure mount yielding the improved wavefront error, proper rigidity, and machinability.

• Journal of the Optical Society of Korea
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• v.20 no.4
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• pp.481-487
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• 2016

This study presents a new optical system for a combiner-type head-up display (HUD) with a cylindrical lens as an asymmetrical aberration corrector, instead of a freeform mirror. In the initial design process based on off-axial aberration analysis, we obtain an off-axis two-mirror system corrected for linear astigmatism and spherical aberration by adding a conic secondary mirror to an off-axis paraboloidal mirror. Thus, since the starting optical system for an HUD is corrected for dominant aberrations, it enables us to balance the residual asymmetrical aberrations with a simple optical surface such as a cylinder, not a complex freeform surface. From this design process, an optical system for an HUD having good performance is finally obtained. The size of the virtual image is 10 inches at 2 meters away from a combiner, and the area of the eye box is 130×50 mm².

• Journal of the Optical Society of Korea
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• v.13 no.2
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• pp.223-226
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• 2009

A Magneto-Optical Trap (MOT) for $^{87}Rb$ atoms near the surface of a dielectric coated mirror at the top of a small $20{\times}25{\times}40\;mm^3$ cell has been observed. Two beams of $3.3\;mW/cm^2$ were used for optical cooling and an anti-Helmholtz magnetic field with a spatial gradient of 9.1 G/cm was used for magnetic trapping. The thickness of the mirror coated on a cover glass was less than $100{\mu}m$. The mirror covered the top of a cell and the atom-chip was located outside the vacuum in order to exploit the long life time of the mirror and easy operation of the chip. The trapping position was found 5 mm beneath the mirror surface. The number of trapped atoms was roughly $3{\times}10^7$ atoms and the temperature was approximately a few tens mK. In this paper, we describe the construction of the mirror-MOT in detail.

• Current Optics and Photonics
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• v.1 no.4
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• pp.344-350
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• 2017

We present a new design approach and an example design for an image-space telecentric two-mirror system that has a fast f-number and a wide-field line image. The initial design of the telecentric mirror system is a conventional axially symmetric system, consisting of a flat primary mirror with fourth-order aspheric deformation and an oblate ellipsoidal secondary mirror to correct spherical aberration, coma, and field curvature. Even though in the optimized design the primary mirror is tilted, to avoid ray obstruction by the secondary mirror, the image-space telecentric two-mirror system shows quite good imaging performance, for a line imager.

• Proceedings of the IEEK Conference
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• 2007.07a
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• pp.337-338
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• 2007

The present paper proposes the method which improves a record and remaking efficiency of the optical pickup as applying the mirror where Phase Shift(PS) principle is applied to optical pickup. Plan to get a circularly polarized light quality above quality which is embodied through Existing Quater Wave Plate(QWP) and a function of total reflection mirror as applying PS mirror which integrates QWP with the function of the total reflection to optical pickup. In the present paper, embody circularly polarized light quality through applying PS mirror to optical pickup, and it through, plan to propose to come true the optimization of recording and remaking CD/DVD disc.

• Transactions of Materials Processing
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• v.14 no.5 s.77
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• pp.477-481
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• 2005

Wafer scale micro mirror array with high surface quality for small form factor (SFF) optical pick-up was fabricated by micro UV-molding. To replicate micro mirror array for SFF optical pick-up, a high- precision mold was fabricated using micro-machining technology. Wafer scale micro mirror array was UV-molded using the mold and then the process was optimized experimentally. The surface flatness and roughness of UV-molded micro mirror array were measured by white light scanning interferomety system and analyzed the transcribing characteristics. Finally, the measured flatness of UV-molded micro mirror away for SFF optical pick-up, which was fabricated in the optimum processing condition, was less than 70nm.

• Journal of the Korean Society for Precision Engineering
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• v.23 no.1 s.178
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• pp.89-96
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• 2006

In this study, fabrication of the large area silicon mirror is accomplished by anisotropic wet etching using micromachining technology for implementation of integrated slim optical pickup and the process condition is also established for improving the mirror surface roughness. Until now, few results have been reported about the production of highly stepped $9.74^{\circ}$ off-axis-cut silicon wafers using wet etching. In addition rough surface of the mirror is achieved in case of tong etching time. Hence a novel method called magnetorheolocal finishing is applied to enhance the surface quality of the mirror plane. Finally, areal peak to valley surface roughness of mirror plane is reduced about 100nm in large area of $mm^2$ and it is applicable to optical pickup using infrared wavelength.

• Journal of the Optical Society of Korea
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• v.16 no.1
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• pp.80-84
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• 2012

A high reflectance mirror, which has very low absorption and scattering loss, was coated onto a crystalline substrate by ion beam sputtering and then annealed at $450^{\circ}C$. We carefully selected the mirror coating material, and designed the high reflectance mirror, in order to avoid UV degradation which comes from the He-Ne plasma. We measured the surface roughness of the Zerodur substrate using phase shift interferometry and atomic force microscopy, and compared it with the TIS scattering of the mirror. The cavity ring-down method was used to measure the absorption of the mirror, and the thin film structure was correlated to its results. We also compared the optical properties of coated mirrors before and after annealing.