• 제목/요약/키워드: Optical Component

검색결과 573건 처리시간 0.033초

Optical Passive Component의 열응력 변화에 따른 문제 연구 (Research of the Thermal Stress effect for Optical Passive Component)

  • 박제영;차두열;여동훈;김종희;장성필
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2006년도 추계학술대회 논문집 Vol.19
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    • pp.118-119
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    • 2006
  • 현재의 소자간 연결을 위해 사용되는 금속배선의 한계로 인해 보다 고속/대용량의 광연결(Optical Interconnection)이 크게 각광받고 있다. 본 논문에서는 FEM 시뮬레이션(Finite Element Method Simulation)을 통해 온도변화에 따른 기판에서의 온도분포를 살펴보고, 열응력 분포와 열응력 집중에 의한 기판의 변형으로 인한 문제를 연구하였다. 이를 통해 향후 Optical Passive Component 설계시 Optical Passive Component 변형의 원인이 될 수 있는 열원들의 배치를 최적화 시키고 기판의 취약부운을 보강하여 우수한 성능의 Optical Passive Component 제작을 목표로 하고 있다.

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광 정보 저장 기기용 초소형 광픽업 설계 (Design of Slim Optical Pickup for Blu-ray Disk)

  • 이상혁;정미숙;손진승;송태선;박노철;박영필
    • 한국정밀공학회:학술대회논문집
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    • 한국정밀공학회 2003년도 춘계학술대회 논문집
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    • pp.386-389
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    • 2003
  • Recent issues in Optical Disk Drive (ODD) are focused on small size. Blu-ray Disk (BD), using blue laser (405nm wavelength) and high NA (0.85) objective lens. can store 25Gbyte on a conventional 12cm optical disk. Small Form Factor Optical (SFFO) drive uses 3cm disk which can store 1.5Gbyte on a disk. This kind of Small Form Factot Optical (SFFO) drive correspond to PCMCIA type memory (Compact Flash or Micro Drive). Preferably, Optical Disk has relatively low cost of the storage media per Byte rather than PCMCIA type memory. To make Small Form Factor Optical (SFFO) drive. optical pickup and its component must be miniaturized. Miniaturization of the component needs new concept of Optical Pickup. This paper is focused on two main subjects. One is Objective Lens design which can be manufactured on a wafer, and the other is optical path design of the pickup which has 2mm thickness.

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In-situ Endpoint Detection for Dielectric Films Plasma Etching Using Plasma Impedance Monitoring and Self-plasma Optical Emission Spectroscopy with Modified Principal Component Analysis

  • 장해규;채희엽
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2012년도 제43회 하계 정기 학술대회 초록집
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    • pp.153-153
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    • 2012
  • Endpoint detection with plasma impedance monitoring and self-plasma optical emission spectroscopy is demonstrated for dielectric layers etching processes. For in-situ detecting endpoint, optical-emission spectroscopy (OES) is used for in-situ endpoint detection for plasma etching. However, the sensitivity of OES is decreased if polymer is deposited on viewport or the proportion of exposed area on the wafer is too small. To overcome these problems, the endpoint was determined by impedance signal variation from I-V monitoring (VI probe) and self-plasma optical emission spectroscopy. In addition, modified principal component analysis was applied to enhance sensitivity for small area etching. As a result, the sensitivity of this method is increased about twice better than that of OES. From plasma impedance monitoring and self-plasma optical emission spectroscopy, properties of plasma and chamber are analyzed, and real-time endpoint detection is achieved.

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Optical Fiber Code-Division Multiple-Access Networks Using Concatenated Codes

  • Lam, Pham-Manh;Minh, Do-Quang
    • Journal of Communications and Networks
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    • 제4권3호
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    • pp.170-175
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    • 2002
  • An optical fiber code-division multiple-access (CDMA) network is proposed in which encoding is based on the use of concatenated sequences of relatively large weight. The first short component sequence in the concatenated sequence permits realistic electronic encoding of each data bit. The chips of this sequence are then all-optically encoded at substantially higher rate. In spite of the relatively large weight of the sequence the all-optical encoder is practical by virtue of the shortness of the component sequences. The use of Gold and Lempel sequences as component sequences for generating the concatenated sequences is studied and the bit-error rate (BER) performance of the proposed system is presented as a function of the received optical power with the number of simultaneous users as parameter.

지역별 에어로졸 화학성분 농도 및 광학특성 비교 (Comparison of the concentration characteristics and optical properties of aerosol chemical components in different regions)

  • 소윤영;송상근;최유나
    • 한국환경과학회지
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    • 제28권1호
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    • pp.107-123
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    • 2019
  • The aerosol chemical components in $PM_{2.5}$ in several regions (Seoul, Busan, Daejeon, and Jeju Island) were investigated with regard to their concentration characteristics and optical properties. The optical properties of the various aerosol components (e.g., water-soluble, insoluble, Black Carbon (BC), and sea-salt) were estimated using hourly and daily aerosol sampling data from the study area via a modeling approach. Overall, the water-soluble component was predominant over all other components in terms of concentration and impact on optical properties (except for the absorption coefficient of BC). The annual mean concentration and Aerosol Optical Ddepth (AOD) of the water-soluble component were highest in Seoul (at the Gwangjin site) ($26{\mu}g/m^3$ and 0.29 in 2013, respectively). Further, despite relatively moderate BC concentrations, the annual mean absorption coefficient of BC ($21.7Mm^{-1}$) was highest in Busan (at the Yeonsan site) in 2013, due to the strong light absorbing ability of BC. In addition, high AODs for the water-soluble component were observed most frequently in spring and/or winter at most of the study sites, while low values were noted in summer and/or early fall. The diurnal variation in the AOD of each component in Seoul (at the Gwangjin site) was slightly high in the morning and low in the afternoon during the study period; however, such distinctions were not apparent in Jeju Island (at the Aweol site), except for a slightly high AOD of the water-soluble component in the morning (08:00 LST). The monthly and diurnal differences in the AOD values for each component could be attributed to the differences in their mass concentrations and Relative Humidities (RH). In a sensitivity test, the AODs estimated under RH conditions of 80 and 90% were factors of 1.2 and 1.7 higher, respectively, than the values estimated using the observed RH.

필름형 마이크로 광필터 조립 평가 시스템 설계에 관한 연구 (A study on design of assembly and evaluation system for optical micro film filter)

  • 최두선;제태진;황경현;박한수
    • 한국정밀공학회:학술대회논문집
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    • 한국정밀공학회 2003년도 춘계학술대회 논문집
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    • pp.1191-1194
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    • 2003
  • At present, the fabrication of optical filter for optical communication mostly depends on handwork, and only a few companies are propelling semi-automatic systems compounded with automatic and hand-operated methods. The measurement evaluation of optical filters is not commonly useful, so it causes difficulties in the producing field. And the packaging process becomes a very unstable process because the filters are judged from the results that they are not measured and immediately packaged during that process. In this situation, the automatic assembly system of optical filter for communication is extremely important and has begun to make its appearance as the most necessary technology for developing optical communication component with high-functionality. In this paper, we constructed systems of assembly and performance evaluation for micro optical collimator. And by using that, we designed a system capable of performance evaluation and assembly of film filter of about 30 $\mu\textrm{m}$ thickness as well as optical filter for common communication.

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Chromatic Dispersion Monitoring of CSRZ Signal for Optimum Compensation Using Extracted Clock-Frequency Component

  • Kim, Sung-Man;Park, Jai-Young
    • ETRI Journal
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    • 제30권3호
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    • pp.461-468
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    • 2008
  • This paper presents a chromatic dispersion monitoring technique using a clock-frequency component for carrier-suppressed return-to-zero (CSRZ) signal. The clock-frequency component is extracted by a clock-extraction (CE) process. To discover which CE methods are most efficient for dispersion monitoring, we evaluate the monitoring performance of each extracted clock signal. We also evaluate the monitoring ability to detect the optimum amount of dispersion compensation when optical nonlinearity exists, since it is more important in nonlinear transmission systems. We demonstrate efficient CE methods of CSRZ signal to monitor chromatic dispersion for optimum compensation in high-speed optical communication systems.

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Disparity Refinement near the Object Boundaries for Virtual-View Quality Enhancement

  • Lee, Gyu-cheol;Yoo, Jisang
    • Journal of Electrical Engineering and Technology
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    • 제10권5호
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    • pp.2189-2196
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    • 2015
  • Stereo matching algorithm is usually used to obtain a disparity map from a pair of images. However, the disparity map obtained by using stereo matching contains lots of noise and error regions. In this paper, we propose a virtual-view synthesis algorithm using disparity refinement in order to improve the quality of the synthesized image. First, the error region is detected by examining the consistency of the disparity maps. Then, motion information is acquired by applying optical flow to texture component of the image in order to improve the performance. Then, the occlusion region is found using optical flow on the texture component of the image in order to improve the performance of the optical flow. The refined disparity map is finally used for the synthesis of the virtual view image. The experimental results show that the proposed algorithm improves the quality of the generated virtual-view.

Modified Principal Component Analysis for In-situ Endpoint Detection of Dielectric Layers Etching Using Plasma Impedance Monitoring and Self Plasma Optical Emission Spectroscopy

  • Jang, Hae-Gyu;Choi, Sang-Hyuk;Chae, Hee-Yeop
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2012년도 제42회 동계 정기 학술대회 초록집
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    • pp.182-182
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    • 2012
  • Plasma etching is used in various semiconductor processing steps. In plasma etcher, optical- emission spectroscopy (OES) is widely used for in-situ endpoint detection. However, the sensitivity of OES is decreased if polymer is deposited on viewport or the proportion of exposed area on the wafer is too small. Because of these problems, the object is to investigate the suitability of using plasma impedance monitoring (PIM) and self plasma optical emission spectrocopy (SPOES) with statistical approach for in-situ endpoint detection. The endpoint was determined by impedance signal variation from I-V monitor (VI probe) and optical emission signal from SPOES. However, the signal variation at the endpoint is too weak to determine endpoint when $SiO_2$ and SiNx layers are etched by fluorocarbon on inductive coupled plasma (ICP) etcher, if the proportion of $SiO_2$ and SiNx area on Si wafer are small. Therefore, modified principal component analysis (mPCA) is applied to them for increasing sensitivity. For verifying this method, detected endpoint from impedance monitoring is compared with optical emission spectroscopy.

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