• 제목/요약/키워드: OVPD

검색결과 7건 처리시간 0.024초

OLED display manufacturing by Organic Vapor Phase Deposition

  • Marheineke, B.
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2006년도 6th International Meeting on Information Display
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    • pp.1676-1681
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    • 2006
  • We report on Organic Vapor Phase Deposition $(OVPD^{(R)})$ an innovative deposition technology for organic light emitting device (OLED) and organic semiconductor manufacturing. The combination of $OVPD^{(R)}$ with Close Coupled Showerhead (CCS) technology results in manufacturing equipment with vast potential for cost effective manufacturing of OLED displays commercially competitive to LCD. The actual $OVPD^{(R)}$ equipment concept and design is discussed: Computational Fluid Dynamic (CFD) modeling is compared with experimental results proving the excellent controllability of the deposition process. Further other production relevant deposition properties are being reviewed e.g. high deposition rates and high organic material utilization efficiency of the $OVPD^{(R)}$ - Technology. Data from devices made by $OVPD^{(R)}$ show comparable/ superior performance to those fabricated with conventional vacuum thermal evaporation (VTE) techniques. An outlook on further potentials of $OVPD^{(R)}$ with respect to enabling advanced organic device structures is given.

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Enhanced Control of OLED Deposition Processes by OVPD(R)

  • Schwambera, M.;Meyer, N.;Keiper, D.;Heuken, M.;Hartmann, S.;Kowalsky, W.;Farahzadi, A.;Niyamakom, P.;Beigmohamadi, M.;Wuttig, M.
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2007년도 7th International Meeting on Information Display 제7권1호
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    • pp.336-339
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    • 2007
  • The enhanced control of OLED deposition processes by Organic Vapor Phase Deposition $(OVPD^{(R)})$ is discussed. $OVPD^{(R)}$ opens a wide space of process control parameters. It allows the accurate and individual control of deposition layer properties like morphology and precise mixing of multi component layers (co-deposition) in comparison to conventional deposition manufacturing processes like e. g. VTE (vacuum thermal evaporation).

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Organic Vapor Phase Deposition 방식을 이용한 펜타센 유기박막트랜지스터의 제작 (Fabrication of Pentacene Thin Film Transistors by using Organic Vapor Phase Deposition System)

  • 정보철;송정근
    • 한국전기전자재료학회논문지
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    • 제19권6호
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    • pp.512-518
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    • 2006
  • In this paper, we investigated the deposition of pentacene thin film on a large area substrate by Organic Vapor Phase Deposition(OVPD) and applied it to fabrication of Organic Thin Film Transistor(OTFT). We extracted the optimum deposition conditions such as evaporation temperature of $260^{\circ}C$, carrier gas flow rate of 10 sccm and chamber vacuum pressure of 0.1 torr. We fabricated 72 OTFTs on the 4 inch size Si Wafer, Which produced the average mobility of $0.1{\pm}0.021cm^2/V{\cdot}s$, average subthreshold slope of 1.04 dec/V, average threshold voltage of -6.55 V, and off-state current is $0.973pA/{\mu}m$. The overall performance of pentacene TFTs over 4 ' wafer exhibited the uniformity with the variation less than 20 %. This proves that OVPD is a suitable methode for the deposition of organic thin film over a large area substrate.

Improving current and luminous efficacy of red phosphorescent Organic Light Emitting Diodes (OLEDs) by introducing graded-layer device designs enabled by Organic Vapor Phase Deposition (OVPD)

  • Schwambera, Markus;Keiper, Dietmar;Meyer, Nico;Heuken, Michael;Lindla, Florian;Bosing, Manuel;Zimmermann, Christoph;Jessen, Frank;Kalisch, Holger;Jansen, Rolf H.;Gemmern, Philipp Van;Bertram, Dietrich
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2009년도 9th International Meeting on Information Display
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    • pp.1140-1143
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    • 2009
  • Organic Vapor Phase Deposition (OVPD) equipment enables the accurate and simultaneous control of deposition rates of multiple materials as well as their homogenous mixing in the gas phase. Graded or even cross-faded layers by varying carrier gas flow are options to improve OLED performances. As example, we will show how the efficacies of standard red phosphorescent OLEDs with sharp interfaces can be increased from 18.8 cd/A and 14.1 lm/W (1,000 cd/$m^2$) to 36.5 cd/A (+94 %, 18 % EQE) and 33.7 lm/W (+139 %) by the introduction of cross-fading, which is a controlled composition variation in the organic film.

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대면적 OLED증착용 서큘러소스의 성능개선 (Performance Improvement of Circular Source for Large Size OLED vapor deposition)

  • 엄태준;주영철;김국원;이상욱
    • 한국산학기술학회논문지
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    • 제7권5호
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    • pp.759-765
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    • 2006
  • 유기발광다이오드(OLED)증착을 위한 서큘러소스의 열전달 해석을 통하여 온도분포를 연구하였다. 대면적의 OLED용 평판의 유기물증착을 위해 서큘러소스가 사용되는데, 소스내의 유기물이 가열되고, 승화되어 증착된다. 유기물의 수율을 높이기 위해 히터설계를 개선하고, 이에 대한 열전달해석을 수행하였다. 그리고, 효율을 높이기 위한 새로운 제조공정인 OVPD공정의 개념과 유도 및 열전달특성에 관한 기본적인 연구결과를 제시하였다.

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Process Controllability and Stability in Organic Vapor Phase Deposition

  • Schwambera, M.;Gersdorff, M.;Reinhold, M.;Meyer, N.;Strauch, G.;Marheineke, B.;Heuken, M.;Zhou, T.X.;Ngo, T.;Brown, J.J.;Shtein, M.;Forrest, S.R.
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2004년도 Asia Display / IMID 04
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    • pp.824-827
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    • 2004
  • High performance green $Ir(ppy)_3$-based phosphorescent OLEDs (PHOLEDs) have been fabricated by organic vapor phase deposition ($OVPD^{TM}$). In addition to demonstrating both efficiency and operational device lifetime comparable to devices built by vacuum thermal evaporation, we report on the controllability and stability of the $OVPD^{TM}$ process. Specifically, run-to-run and day-to-day deposition rate reproducibility of better than 2 % for three consecutive days is demonstrated.

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Growth of super-grain pentacene by OVPD for AMLCD

  • Jung, Ji-Sim;Cho, Kyu-Sik;Jang, Jin
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2002년도 International Meeting on Information Display
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    • pp.163-166
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    • 2002
  • We studied the growth of large-grain pentacene film by organic vapour phase deposition. The optimizations of the growth of pentacene are carried out by varying the gas pressure in the reactor and substrate temperature. We found that the grain size depends strongly on the gas pressure in the reactor. The grain size of $20{\mu}m$ has been obtained at the gas pressure of 200 Torr. The film was found to be strongly (001) oriented and its grain size decreases with decreasing the gas pressure.

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