Growth of super-grain pentacene by OVPD for AMLCD

  • Jung, Ji-Sim (Dept. of Physics and TFT-LCD National Lab., Kyung Hee University) ;
  • Cho, Kyu-Sik (Dept. of Physics and TFT-LCD National Lab., Kyung Hee University) ;
  • Jang, Jin (Dept. of Physics and TFT-LCD National Lab., Kyung Hee University)
  • Published : 2002.08.21

Abstract

We studied the growth of large-grain pentacene film by organic vapour phase deposition. The optimizations of the growth of pentacene are carried out by varying the gas pressure in the reactor and substrate temperature. We found that the grain size depends strongly on the gas pressure in the reactor. The grain size of $20{\mu}m$ has been obtained at the gas pressure of 200 Torr. The film was found to be strongly (001) oriented and its grain size decreases with decreasing the gas pressure.

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