• 한국정보디스플레이학회:학술대회논문집
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• 2006.08a
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• pp.1676-1681
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• 2006

We report on Organic Vapor Phase Deposition $(OVPD^{(R)})$ an innovative deposition technology for organic light emitting device (OLED) and organic semiconductor manufacturing. The combination of $OVPD^{(R)}$ with Close Coupled Showerhead (CCS) technology results in manufacturing equipment with vast potential for cost effective manufacturing of OLED displays commercially competitive to LCD. The actual $OVPD^{(R)}$ equipment concept and design is discussed: Computational Fluid Dynamic (CFD) modeling is compared with experimental results proving the excellent controllability of the deposition process. Further other production relevant deposition properties are being reviewed e.g. high deposition rates and high organic material utilization efficiency of the $OVPD^{(R)}$ - Technology. Data from devices made by $OVPD^{(R)}$ show comparable/ superior performance to those fabricated with conventional vacuum thermal evaporation (VTE) techniques. An outlook on further potentials of $OVPD^{(R)}$ with respect to enabling advanced organic device structures is given.

• 한국정보디스플레이학회:학술대회논문집
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• 2007.08a
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• pp.336-339
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• 2007

The enhanced control of OLED deposition processes by Organic Vapor Phase Deposition $(OVPD^{(R)})$ is discussed. $OVPD^{(R)}$ opens a wide space of process control parameters. It allows the accurate and individual control of deposition layer properties like morphology and precise mixing of multi component layers (co-deposition) in comparison to conventional deposition manufacturing processes like e. g. VTE (vacuum thermal evaporation).

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.19 no.6
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• pp.512-518
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• 2006

In this paper, we investigated the deposition of pentacene thin film on a large area substrate by Organic Vapor Phase Deposition(OVPD) and applied it to fabrication of Organic Thin Film Transistor(OTFT). We extracted the optimum deposition conditions such as evaporation temperature of $260^{\circ}C$, carrier gas flow rate of 10 sccm and chamber vacuum pressure of 0.1 torr. We fabricated 72 OTFTs on the 4 inch size Si Wafer, Which produced the average mobility of $0.1{\pm}0.021cm^2/V{\cdot}s$, average subthreshold slope of 1.04 dec/V, average threshold voltage of -6.55 V, and off-state current is $0.973pA/{\mu}m$. The overall performance of pentacene TFTs over 4 ' wafer exhibited the uniformity with the variation less than 20 %. This proves that OVPD is a suitable methode for the deposition of organic thin film over a large area substrate.

• 한국정보디스플레이학회:학술대회논문집
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• 2009.10a
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• pp.1140-1143
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• 2009

Organic Vapor Phase Deposition (OVPD) equipment enables the accurate and simultaneous control of deposition rates of multiple materials as well as their homogenous mixing in the gas phase. Graded or even cross-faded layers by varying carrier gas flow are options to improve OLED performances. As example, we will show how the efficacies of standard red phosphorescent OLEDs with sharp interfaces can be increased from 18.8 cd/A and 14.1 lm/W (1,000 cd/$m^2$) to 36.5 cd/A (+94 %, 18 % EQE) and 33.7 lm/W (+139 %) by the introduction of cross-fading, which is a controlled composition variation in the organic film.

• Journal of the Korea Academia-Industrial cooperation Society
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• v.7 no.5
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• pp.759-765
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• 2006

Temperature distribution of the circular heat source was studied by analyzing the heat transfer of the environment of the circular source for OLED. Circular nozzle source was used to fabricate thin organic layer as the organic material in it was heated, vaporized and deposited to the large size flat panel. Circular source for large size fat panel for OLED has been modified to obtain higher productivity and heat transfer characteristics was predicted using computer simulation. Fundamentals for OVPD process also was presented to estimate flow and heat transfer characteristics of the process which can increase the material efficiency.

• 한국정보디스플레이학회:학술대회논문집
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• 2004.08a
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• pp.824-827
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• 2004

High performance green $Ir(ppy)_3$-based phosphorescent OLEDs (PHOLEDs) have been fabricated by organic vapor phase deposition ($OVPD^{TM}$). In addition to demonstrating both efficiency and operational device lifetime comparable to devices built by vacuum thermal evaporation, we report on the controllability and stability of the $OVPD^{TM}$ process. Specifically, run-to-run and day-to-day deposition rate reproducibility of better than 2 % for three consecutive days is demonstrated.

• 한국정보디스플레이학회:학술대회논문집
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• 2002.08a
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• pp.163-166
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• 2002

We studied the growth of large-grain pentacene film by organic vapour phase deposition. The optimizations of the growth of pentacene are carried out by varying the gas pressure in the reactor and substrate temperature. We found that the grain size depends strongly on the gas pressure in the reactor. The grain size of $20{\mu}m$ has been obtained at the gas pressure of 200 Torr. The film was found to be strongly (001) oriented and its grain size decreases with decreasing the gas pressure.