• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2004.04b
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• pp.137-140
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• 2004

We treated $O_2$ plasma on ITO thin film using RIE (Reactive Ion Etching) system, and analyzed the ingredient of ITO thin film according to change of processing conditions. The ingredient analysis of ITO thin film was used by EDS (Energy Dispersive Spectroscopy) and XPS (X-ray Photoelectron Spectroscopy) to compare and analyze the ingredient of bulk and surface. We measured electrical resistivity using Four-Point-Probe and calculated sheet resistance, and ITO surface roughness was measured by using AFM (Atomic Force Microscope). Finally, we fabricated OLEDs (Organic Light-Emitting Diodes) device using substrate that was treated optimum ITO surface. The result of the study for electrical and optical properties using I V L System (Flat Panel Display Analysis System), we confirmed that electrical properties (I-V) and optical properties (L-V) were improved.

• The Transactions of The Korean Institute of Electrical Engineers
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• v.64 no.9
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• pp.1323-1329
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• 2015

The WO₃/Ag/WO₃ transparent thin films are fabricated by the RF magnetron sputtering. This has a transmittance of front and rear about 90% in the visible light range and surface resistance of 6.41Ω/□. In this paper, we analyzed the surface characteristics caused by the working pressure and O₂ plasma surface treatment to apply a transparent electrode that was prepared to the laminated structure with other materials. The working pressure was changed in the WO₃ film to 10mTorr, 7mTorr, and 5mTorr, it showed a lower than roughness of conventional ITO. In addition, by 55.5774 J/m² at 5mTorr, it shows the hydrophobic property with lower process pressure. O₂ plasma surface treatment was changed at the condisions of the RF power to 150W, 100W, and 50W and the process time to 240s, 180s, 120s, and 60s. The surface roughness are the maximum roughness(Rmax) 6.437nm and the average roughness(Rq) 0.827nm at RF power 150W, and the maximum roughness (Rmax) 6.880nm and the average roughness (Rq) 0.839nm at process time 240sec. It showed a lower value than the surface treatment. also about working pressure and process time is increased, it showed the hydrophobic.

• Korean Chemical Engineering Research
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• v.47 no.1
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• pp.59-64
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• 2009

This study investigated the surface characteristics of polylactic acid (PLA) film after one atmospheric pressure plasma treatment. We used de-ionized water and diiodomethane as polar and non-polar solvents, respectively, for measuring contact angles, and subsequently calculated the surface free energy of PLA film. The contact angle and free energy of PLA surface were optimized at the treatment time of 30 sec, RF-power of 70 W, Ar gas flow rate of 6 lpm and air exposure time of 5 min. We analyzed the change of chemical functional groups on the surface of PLA film through XPS and were able to observe the change of polar functional groups such as -C=O, -CO, -COO on the surface of PLA film after one atmospheric pressure plasma treatment.

• Proceedings of the Korean Vacuum Society Conference
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• 2011.02a
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• pp.509-509
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• 2011

Superhydrophobic surfaces on alloyed steels were fabricated with a non-conventional method of plasma etching and subsequent water immersion procedure. High aspect ratio nanopatterns of nanoflake or nano-needle were created on the steels with various Cr content in its composition. With CF4 plasma treatment in radio-frequence chemical vapor deposition (r.-f. CVD) method, steel surfaces were etched and fluorinated by CF4 plasma, which induced the nanopattern evolution through the water immersion process. It was found that fluorine ion played a role as a catalyst to form nanopatterns in water elucidated with XPS and TEM analysis. The hierarchical patterns in micro- and nano scale leads to superhydrophobic properties on the surfaces by deposition of a hydrophobic coating with a-C:H:Si:O film deposited with a gas precursor of hexamethlydisiloxane (HMDSO) with its lower surface energy of 24.2 mN/m, similar to that of curticular wax covering lotus surfaces. Since this method is based on plasma dry etching & coating, precise patterning of surface texturing would be potential on steel or metal surfaces. Patterned hydrophobic steel surfaces were demonstrated by mimicking the Robinia pseudoacacia or acacia leaf, on which water was collected from the humid air using a patterned hydrophobicity on the steels. It is expected that this facile, non-toxic and fast technique would accelerate the large-scale production of superhydrophobic engineering materials with industrial applications.

• Proceedings of the Korean Vacuum Society Conference
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• 2011.08a
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• pp.342-342
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• 2011

산화막은 반도체 공정 중 가장 핵심적이며 기본적인 물질이다. 반도체 소자에서 내부의 캐리어들의 이동을 막고 전기를 절연시켜주는 절연체로서 역할을 하게 된다. 실제로 제작된 산화막에서는 dangling bond 혹은 내부에 축적되는 charge들의 의해 leakage가 생기게 되고 그에 따라 산화막의 특성은 저하되게 된다. 내부에서 특성을 저하시키는 defect을 감소시키기 위해 Plasma Treatment에 따른 특성변화를 관찰하였다. 본 연구에서는 최적화 시킨 Flexible TFT제작을 위해 저온에서 Silicon Oxide로 형성한 Gate Insulator에 각각 N2O, H2, NH3가스를 주입 후 Plasma처리를 하였다. 특성화 시킨 Gate Insulator를 이용하여 MIS(Metal-Insulator-Semiconductor)구조를 제작 후 C-V curve특성변화, Dit의 감소, Stress bias에 따른 stability를 확인 하였다.

• Proceedings of the Korean Vacuum Society Conference
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• 2013.02a
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• pp.97-97
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• 2013

The exterior structures of natural organisms have continuously evolved by controlling wettability, such as the Namib Desert beetle, whose back has hydrophilic/hydrophobic contrast for water harvesting by mist condensation in dry desert environments, and some plant leaves that have hierarchical micro/nanostructures to collect or repel liquid water. In this work, we have provided a method for wettability contrast on metals by both nano-flake or needle patterns and tuning of the surface energy. Metals including steel alloys and aluminum were provided with hierarchical micro/nanostructures of metaloxides induced by fluorination and a subsequent catalytic reaction of fluorine ions on metal surfaces in water with various ranges from room to boiling temperature of water. Then, a hydrophobic material was deposited on the structured surfaces, rendering superhydrophobicity. Plasma oxidization induces the formation of superhydrophilic surfaces on selective regions surrounded by superhydrophobic surfaces. We show that wettability contrast surfaces align liquid water within patterned hydrophilic regions during the condensation process. Furthermore, this method could have a greater potential to align other liquids or living cells.

• 한국정보디스플레이학회:학술대회논문집
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• 2009.10a
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• pp.1189-1192
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• 2009

Short channel a-Si:H TFT devices with Cu electrodes have been investigated. Short channel TFTs are defined by new plasma etch process. When the channel length becomes shorter, the TFT characteristics (threshold voltage, off current, sub threshold voltage, etc.,) are degraded. These degraded characteristics can be improved through the hydrogen plasma treatment and new gate insulator structure. Using these processes, 15.0 inch XGA LCD panel was fabricated successfully where the channel length of the TFT devices was about 2.5 micrometers.

• Journal of the Korean Ceramic Society
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• v.48 no.1
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• pp.1-5
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• 2011

Silicon carbide (SiC) has recently drawn an enormous industrial interest because of its useful mechanical properties such as thermal resistance, abrasion resistance and thermal conductivity at high temperature. RF Thermal plasma (PL-35 Induction Plasma, Tekna CO., Canada) has been utilized for synthesis of high purity SiC powder from cheap inorganic solution (Tetraethyl Orthosilicate, TEOS). It is found that the powders by thermal plasma consist of SiC with free carbon and amorphous silica ($SiO_2$) and, by thermal treatment and HF treatment, the impurities are driven off resulting high purity SiC nano-powder. The synthesized SiC powder lies below 30 nm and its properties such microstructure, phase composition, specific surface area and free carbon content have been characterized by X-ay diffraction (XRD), field emission scanning electron microscopy (FE-SEM), thermogravimetric (TG) and Brunauer-Emmett-Teller (BET).

• The Journal of Korean Medicine
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• v.16 no.2 s.30
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• pp.312-319
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• 1995

The purpose of this study was to know the difference of the effect between the E- A and the S-A. The 19 patients complaining the pain on the neck, shoulder and upper limb were chosen, divided and controled by two groups; One was the E-A group treated at upper limb meridian point, the other was the therapy group treated by S-A at the scalp and E-A at upper limb meridian point together. In 20 minutes after treatment, the change of plasma cortisol concentration was observed. The results were as follows: 1. In E-A group, there was no significant change of plasma cortisol concentration. 2. In S-A and E-A group, there was significant increase to plasma cortisol concentration. In conclusion, it seems that the increased stimulation by the treatment of S-A and E-A together has close relation with the plasma cortisol concentration. And the further study about the intensity of acupuncture stimulation and S-A is expected.

• Journal of Powder Materials
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• v.12 no.6 s.53
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• pp.422-427
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• 2005

The $Al_2O_3$ with various phases were prepared by simple ex-situ hydrolysis and spark plasma sintering (SPS) process of Al powder. The nano bayerite $(\beta-Al(OH)_3)$ phase was derived by hydrolysis of commercial powder of Al with micrometer size, whereas the bohemite (AlO(OH)) phase was obtained by hydrolysis of nano Al powder synthesized by pulsed wire evaporation (PWE) method. Compaction as well as dehydration of both nano bayerite and bohemite was carried out simultaneously by SPS method, which is used to fabricate dense powder compacts with a rapid heating rate of $100^{\circ}C$ per min. under the pressure of 50MPa. After compaction treatment in the temperature ranges from $100^{\circ}C\;to\; 1100^{\circ}C$, the bayerite and bohemite phases change into various alumina phases depending on the compaction temperatures. The bayerite shows phase transition of $Al(OH)_3{\to}{\eta}-Al_2O_3{\to}{\theta}-Al_2O_3{\to}\alpha-Al_2O_3$ sequences. On the other hand, the bohemite experiences the phase transition from AlO(OH) to ${\gamma}-Al_2O_3\;at\;350^{\circ}C.$ It shows AlO(OH) ${\gamma}-Al_2O_3{\to}{\delta}-Al_2O_3{\to}{\alpha}-Al_2O_3$ sequences. The ${\gamma}-Al_2O_3$ compacted at $550^{\circ}C$ shows a high surface area $(138m^2/g)$.