• JSTS:Journal of Semiconductor Technology and Science
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• v.15 no.1
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• pp.77-84
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• 2015

This paper presents the design of a low-power, low area 256-radix 16-bit crossbar switch employing a 2D Hyper-X network topology. The Hyper-X crossbar switch realizes the high radix of 256 by hierarchically combining a set of 4-radix sub-switches and applies three modifications to the basic Hyper-X topology in order to mitigate the adverse scaling of power consumption and propagation delay with the increasing radix. For instance, by restricting the directions in which signals can be routed, by restricting the ports to which signals can be connected, and by replacing the column-wise routes with diagonal routes, the fanout of each circuit node can be substantially reduced from 256 to 4~8. The proposed 256-radix, 16-bit crossbar switch is designed in a 65 nm CMOS and occupies the total area of $0.93{\times}1.25mm^2$. The simulated worst-case delay and power dissipation are 641 ps and 13.01 W when operating at a 1.2 V supply and 1 GHz frequency. In comparison with the state-of-the-art designs, the proposed crossbar switch design achieves the best energy-delay efficiency of $2.203cycle/ns{\cdot}fJ{\cdot}{\lambda}2$.

• Journal of the Korean Magnetics Society
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• v.3 no.3
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• pp.190-195
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• 1993

새로운 Fe기 초미세 결정립합금의 제조 가능성 및 자기특성에 관하여 조사하였다. 고포화자화 (Fe.$_{85}$Co.$_{15}$ )$_{80}$B$_{20}$ 비정질합금에서 천이금속을 약 10 at.% Al으로 치환한 (Fe.$_{85}$ Co.$_{15}$ )$_{70}$B$_{20}$Al$_{10}$ 합금은 급속응고에 의하여 비정질 기지내에 직접 .alpha. -Fe(Co)의 석출이 가능하다. 또한 (Fe.$_{85}$Co.$_{15}$ )$_{70}$B$_{20}$Al$_{10}$합금에 2~6 at.% Nb의 첨가는 급속 응고시 결정립성장을 억제하고 포화자왜를 약 6ppm이하로 감소시켜 자기 특성을 개선시킨다. 열처리에 의한 자기 특성은 Nb의 치환량이 증가할 수록 감소한다. 400 .deg. C에서 1시간 열처리한 (Fe.$_{85}$Co.$_{15}$ )$_{70}$ B$_{18}$ Al$_{10}$Nb$_{2}$합금은 평균 약 8nm이하의 .alpha. -Fe(Co) 결정립으로 구성된 초미세 결정립합금 으로 제조가 가능하며, 포화자속밀도, 철손 및 투자율 (f=50 kHz, B$_{m}$ =0.2 T)이 각각 1.2 T, 12W/kg 및 2.5 *$10^{4}$으로 가장 우수하다. 이는 Fe-Si-B-Nb-Cu 초미세결정립합금 및 영자왜 Co기 비정질합금과 거의 같은 자기특성을 나타낸다.다..다.다..낸다.다..

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.27 no.2
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• pp.132-135
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• 2014

The Sr based ceramic thin films were deposited on Si substrate by RF magnetron sputtering method. And Sr based thin films were annealed at $500{\sim}700^{\circ}C$ using RTA. The surface roughness showed about 2.4 nm in annealed thin film at $600^{\circ}C$. The capacitance density of Sr based thin films were increased with the increase of annealing temperature. The maximum capacitance density of $0.6{\mu}F/cm^2$ was obtained by annealing temperature at $700^{\circ}C$. The voltage dependence of dielectric loss showed about 0.02 in voltage ranges of -10~+10 V. The leakage current density of annealing temperature of $600^{\circ}C$ was the $4.0{\times}10^{-6}\;A/cm^2$ at applied voltage of -5~+5 V.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.20 no.4
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• pp.342-347
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• 2007

$Bi_6Mg_2Nb_4O_{21}(BMN)$ thin films were deposited at various substrates by sputtering system for embedded capacitor applications. BMN thin films deposited at room temperature are manufactured as MIM(Metal/Insulator/Metal) structures. Dielectric properties and leakage current density were investigated as a function of various substrates and thickness of BMN thin films. Leakage current density of BMN thin films deposited on CCL(Copper Clad Laminates) showed relatively high value ($1{\times}10^{-3}A/cm^2$) at an applied field of 300 kV/cm on substrates, possibly due to relatively high value of roughness(rms $50{\AA}$) of CCL substrates. 100 nm-thick BMN thin films deposited on Cu/Ti/Si substrates showed the capacitance density of $300 nF/cm^2$, a dielectric constant of 32, a dielectric loss of 2 % at 100 kHz and the leakage current density of $1{\times}10^{-6}A/cm^2$ at an applied field of 300 kV/cm. BMN capacitors are expected to be promising candidates as embedded capacitors for printed circuit board(PCB).

• Korean Journal of Materials Research
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• v.16 no.4
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• pp.253-256
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• 2006

The blue emitting OLEDs using GDI host-dopant phosphors have been fabricated and characterized. In the device fabrication, 2-TNATA [4,4',4'-tris(2-naphthylphenyl-phenylamino)- triphenylamine] as a hole injection material and NPB [N,N'-bis(1-naphthyl)-N,N'-diphenyl-1,1'-biphenyl-4,4'-diamine] as a hole transport material were deposited on the ITO(indium thin oxide)/glass substrate by vacuum evaporation. And then, blue color emission layer was deposited using GDI602 as a host material and GDI691 as a dopant. Finally, small molecule OLEDs with structure of ITO/2-TNATA/NPB/GDI602:GDI691/Alq3/LiF/Al were obtained by in-situ deposition of Alq3, LiF and Al as the electron transport material, electron injection material and cathode, respectively. Blue OLEDs fabricated in our experiments showed the color coordinate of CIE(0.14, 0.16) and the maximum power efficiency of 1.1 lm/W at 11 V with the peak emission wavelength of 464 nm.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.16 no.4
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• pp.298-303
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• 2003

Bi$_4$-$_{x}$EU$_{x}$Ti$_3$O$_{12}$ (BET) thin films were etched by inductively coupled CF$_4$/Ar plasma. We obtained the maximum etch rate of 78 nm/min at the gas mixing ratio of CF$_4$(10%)/Ar(90%). The variation of volume density for F and Ar atoms are measured by the optical emission spectroscopy. As CF$_4$increased in CF$_4$/Ar plasma, the emission intensities of F increase, but Ar atoms decrease, which confirms our suggestion that emission intensity is proportional to the volume density of atoms. From X-ray photoelectron spectroscopy, the intensities of the Bi-O, the Eu-O and the Ti-O peaks are changed. By pure Ar plasma, intensity peak of the oxygen-metal (O-M : TiO$_2$, Bi$_2$O$_3$, Eu$_2$O$_3$) bond was seemed to disappear while the intensity of pure oxygen peak showed an opposite tendency. After the BET thin films was etched by CF$_4$/Ar plasma, the peak intensity of O-M bond increase slowly, but more quickly than that of peak belonged to pure oxygen atoms due to the decrease of Ar ion bombardment. Scanning electron microscopy was used to investigate etching Profile. The Profile of etched BET thin film was over 85$^{\circ}$./TEX>.

• Korean Journal of Materials Research
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• v.29 no.10
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• pp.623-630
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• 2019

Because of their excellent stability and highly specific surface area, carbon based materials have received attention as electrode materials of electrical double-layer capacitors(EDLCs). Biomass based carbon materials have been studied for electrode materials of EDLCs; these materials have low capacitance and high-rate performance. We fabricated tofu based porous activated carbon by polymer dissolution reaction and KOH activation. The activated porous carbon(APC-15), which has an optimum condition of 15 wt%, has a high specific surface area($1,296.1m^2\;g^{-1}$), an increased average pore diameter(2.3194 nm), and a high mesopore distribution(32.4 %), as well as increased surface functional groups. In addition, APC has a high specific capacitance($195F\;g^{-1}$) at low current density of $0.1A\;g^{-1}$ and excellent specific capacitance($164F\;g^{-1}$) at high current density of $2.0A\;g^{-1}$. Due to the increased specific surface area, volume ratio of mesopores, and surface functional groups, the specific capacitance and high-rate performance increased. Consequently, the tofu based activated porous carbon can be proposed as an electrode material for high-performance EDLCs.

• The Bulletin of The Korean Astronomical Society
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• v.40 no.2
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• pp.56.2-56.2
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• 2015

본 연구에서는 미국 맥도날드 천문대 (Mcdonald Observatory)에 있는 82인치 Otto Struve 망원경의 가이드 망원경으로 사용하기 위해 2개의 반사경을 이용해 구경이 100 mm이고 유효초점거리가 800 mm인 비축 반사망원경을 설계하였다. 비축 반사경은 일반적인 축 대칭인 반사경보다 가공이 매우 어렵기 때문에 형상 정밀도의 요구량을 알 수 있다면 비축 반사경을 가공하는 과정에서 시간과 비용을 절약할 수 있다. 광학계가 수차가 잘 보정된 회절한계의 성능이기 때문에 엔서클드 에너지 직경(Encircled Energy Diameter) 분석을 통해 민감도 분석을 하였다. 광학설계 소프트웨어인 CodeV를 사용하여 80 % 에너지가 $20{\mu}m$ 내에 들도록 공차한계로 설정하였으며, 기준 파장은 $587.56{\mu}m$이다. 또한 부경과 초점 면 사이의 거리를 보상자로 설정하여 공차가 광학계의 성능에 미치는 영향을 최소화하였다. 민감도 분석은 반사경의 위치, 회전, 그리고 반사경의 형상 정밀도에 대해 수행하였다. 분석 결과, 반사경의 위치와 각도는 일반적인 제작 및 조립 공차보다 매우 작은 것을 확인하였다. 그리고 형상정밀도는 주경이 부경보다 민감하였으며 자승 제곱 평균제곱근 (root-mean-square) 32 nm로 가장 민감한 결과가 나왔다.

• Korean Journal of Materials Research
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• v.15 no.5
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• pp.293-300
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• 2005

ZnO:Li epilayers were synthesized on sapphire substrates by the pulesd laser deposition (PLD) after the surface of the ZnO:Li sintered pellet was irradiated by the ArF (193 nm) excimer laser. The growth temperature was fixed at $400^{\circ}C$. The crystalline structure of epilayers was investigated by the photoluminescence (PL) and double crystal X-ray diffraction (DCXD). The carrier density and mobility of epilayers measured by van der Pauw-Hall method are $2.69\times10cm^{-3}$ and $52.137cm^2/V{\cdot}s$ at 293 K, respectively. The temperature dependence of the energy band gap of epilayers obtained from the absorption spectra is well described by the Varshni's relation, $E_g(T)=3.5128eV{\cdot}(9.51\times10^{-4}eV/K)T^2/(T+280K)$. After the as-grown ZnO:Li epilayer was annealed in Zn atmospheres, oxygen and vaccum the origin of point defects of ZnO:Li has been investigated by PL at 10 K. The Peaks of native defects of $V_{zn},\;V_o,\;Zn_{int},\;and\;O_{int}$ showned on PL spectrum are classified as a donors or accepters type. We confirm that $ZnO:Li/Al_2O_3$ in vacuum do not form the native defects because ZnO:Li epilayers in vacuum existe in the form of stable bonds.

• 한국정보디스플레이학회:학술대회논문집
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• 2003.07a
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• pp.984-987
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• 2003

The electrophosphorescent emission properties were investigated in polymer light-emitting diodes (PLEDs) based on a poly(9-vinylcarbazole) (PVK) doped with a green phosphorescent dye of fac-tris(2-phenylpyridine) iridium (III) [$Ir(ppy)_3$]. A green light peaked at 516 nm was emitted from devices with a configuration of ITO/PEDOT:PSS/PVK:$Ir(ppy)_{3}$/BCP/$Alq_{3}$/LiF/Al. The optimal doping concentration of $Ir(ppy)_{3}$ in PVK was found at 2% by weight, under which maximum current efficiency of 24.3 cd/A and peak external quantum efficiency of 6.8% were achieved at the high luminance of 4240 $cd/m^{2}$. The external quantum efficiency of 5% and current efficiency of 18 cd/A can be sustained even at the very high luminance of 35000 $cd/m^{2}$.