• Journal of IKEEE
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• v.17 no.3
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• pp.260-266
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• 2013

The open bit line is vulnerable to noise compared to the folded bit line when read/write for the DRAM. According to the increasing DRAM densities, the core circuit operating conditions is exacerbated by the noise when it comes to the open bit line 6F2(F : Feature Size) structure. In this paper, the interference effects were analyzed by the data patterns between the bit line by experiments. It was beyond the scope of existing research. 68nm Tech. 1Gb DDR2, Advan Tester used in the experiments. The noise effects appears the degrade of internal operation margin of DRAM. This paper investigates sense amplifier power line splits by experiments. The noise can be improved by 0.2ns(1.3%)~1.9ns(12.7%), when the sense amplifier power lines split. It was simulated by 68nm Technology 1Gb DDR2 modeling.

• ETRI Journal
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• v.23 no.3
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• pp.97-105
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• 2001

$1.6\;{\mu}m$ emission originated from $Pr^{3+}:\;(^3F_3,\;^3F_4)\;{\longrightarrow}\;^3H_4$ transition in $Pr^{3+}-\;and\;Pr^{3+}/Er^{3+}$-doped selenide glasses was investigated under an optical pump of a conventional 1480 nm laser diode. The measured peak wavelength and fullwidth at half-maximum of the fluorescent emission are ~1650nm and 120nm, respectively. A moderate lifetime of the thermally coupled upper manifolds of ${\sim}212{\pm}10{\mu}s$ together with a high stimulated emission cross-section of ${\sim}(3{\pm}1){\times}10^{-20}\;cm^2$ promises to be useful for $1.6{\mu}m$ band fiber-optic amplifiers that can be pumped with an existing high-power 1480 nm laser diode. Codoping $Er^{3+}$ enhances the emission intensity by way of a nonradiative $Er^{3+}:\;^4I_{13/2}\;{\longrightarrow}\;Pr^{3+}:\;(^3F_3,\;^3F_4)$ energy transfer. The Dexter model based on the spectral overlap between donor emission and acceptor absorption describes well the energy transfer from $Er^{3+}$ to $Pr^{3+}$ in these glasses. Also discussed in this paper are major transmission loss mechanisms of a selenide glass optical fiber.

• The Korean Journal of Ceramics
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• v.5 no.4
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• pp.375-378
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• 1999

In tho XRD study of $56ZrF_4 \cdot34BaF_2 \cdot4AIF_3 \cdot(6-x)LaF_3 \cdotxLnF_3$ glassdLn=Ce, Nd, Gd, Th), halo pattern charactarktic fo an amorphous sample appeared. When the halo peak angle ($\theta_p$) was converted into a wavenumber with $Qp=4\pi sinG\pi/\lambda(\lambda$ is the wavolongth of the radialion used), it was found that the Qp values varied almost liuearly with the concentration 01 $LnF_3$. The emissiou spect1.a of $Ce^{3-}$-containing fluoride glasses nnder 273 nm excitation had a peak maximum at ea. 300 nm $(Ce^{3+}$ 5d-4f- transition). The maximal intensity of the fluorescence was observed when the $CeF_3$, content was extremely low (ca. 1 mol%j. DTA measurement revealed tbat these fluoride glasses had two crystallization temperatures. In $56ZrF_4. 34BaF_2. 4NF_3. (6-x)LaF_3 .xNdF_3$ glasses, the actmation energies of crystallization obtained from a Kssinger plot were 1.7 and 5.0 eV for the glass with x=2, and 1.9 and 5.6 eV for the glass with x=4.

• JSTS:Journal of Semiconductor Technology and Science
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• v.3 no.2
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• pp.76-82
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• 2003

The robust stack storage node and sufficient cell capacitance for high performance is indispensable for 90 nm DRAM capacitor. For the first time, we successfully demonstrated MIS capacitor process integration for 90 nm DRAM technology. Novel cell layout and integration technology of 90 nm DRAM capacitor is proposed and developed, and it can be extended to the next generation DRAM. Diamond-shaped OCS with 1.8 um stack height is newly developed for large capacitor area with better stability. Furthermore, the novel $Al_2O_3/HfO_2$ dielectric material with equivalent oxide thickness (EOT) of 25 ${\AA}$ is adopted for obtaining sufficient cell capacitance. The reliable cell capacitance and leakage current of MIS capacitor is obtained with ~26 fF/cell and < 1 fA/ceil by $Al_2O_3/HfO_2$ dielectric material, respectively.

• Proceedings of the Korean Vacuum Society Conference
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• 2013.08a
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• pp.172-172
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• 2013

최근에 디스프로슘 이온이 도핑된 형광체의 백색 발광 현상 때문에 백색 발광 소재의 제조에 관한 연구가 상당한 관심을 끌고 있다. 본 연구에서는 $Eu^{3+}$와 $Dy^{3+}$ 이온의 몰 비를 변화시키면서 $BaNb_2O_6:RE^{3+}$ (RE=Eu, Dy) 형광체 분말을 합성한 결과를 보고한다. 특히 활성제 이온인 $Eu^{3+}$와 $Dy^{3+}$ 이온의 몰 비에 따른 $BaNb_2O_6$ 형광체 분말의 결정 구조, 입자의 모양과 크기, 흡광과 발광 스펙트럼의 변화를 관측하였고, 최적의 합성 조건을 제시하고자 한다. 파장 393 nm로 여기 시킨 $Dy^{3+}$ 이온의 몰 비에 따른 $BaNb_2O_6$ 형광체 분말의 발광 스펙트럼은 580 nm에 주 피크를 갖는 황색 스펙트럼이 관측되었다. 이 발광 신호는 $^4F_{9/2}-^6H_{13/2}$ 전이 신호이다. $Dy^{3+}$ 이온의 몰 비가 0 mol인 경우에는 발광 신호가 검출되지 않았다. $Dy^{3+}$ 이온의 몰 비가 0.10 mol일 때 발광 피크의 세기는 최대이었으며, $Dy^{3+}$ 이온의 몰 비가 더욱 증가함에 따라 발광 스펙트럼의 세기는 계속 증가하지 않고 갑자기 감소하기 시작하였다. 이것은 $Dy^{3+}$ 이온의 몰 비가 임계값을 초과하여 더욱 증가하면 모체 격자들 사이에 치환 고용되어 있는 $Dy^{3+}$ 이온들 사이의 거리가 더욱 가까워져서 $Dy^{3+}$ 이온들이 서로 용이하게 결합함으로써 내부 산란에 의하여 발광의 세기가 감소함을 의미한다. 흡광 스펙트럼의 경우에, $Dy^{3+}$ 이온의 몰 비가 0.01 mol일때 형광체 분말은 두 종류의 흡광 스펙트럼을 나타내었다. 첫째는 $Dy^{3+}$ 양이온과 $O^{2-}$ 음이온들 사이에 발생한 전하 전달 밴드에 의해 발생하는 310 nm를 정점으로 하여 280~340 nm 영역에 걸쳐서 광범위하게 분포하는 흡광 신호가 관측되었으며, 둘째는 $Dy^{3+}$ 이온의 $4f^9$ 전자 배열 내에서 발생하는 4f-4f 전이 신호로서, 이것은 350~500 nm 영역에 걸쳐서 비교적 밴드폭이 좁은 다수의 흡광 신호가 나타났다. 본 실험에서는 다섯 개의 피크를 갖는 흡광 신호가 검출되었는데, 이중에서 제일 강한 주 피크인 393 nm의 흡수 파장은 모체 격자 내에 있는 $Dy^{3+}$ 이온의 바닥 상태인 $^6H_{15/2}$ 준위에서 여기 상태인 $^4F_{7/2}$ 인 에너지 준위로 전이하면서 발생한 신호이며, 이에 비하여 상대적으로 흡광 세기가 약한 370, 432, 458, 370 nm의 흡수 파장이 관측되었다.

• Progress in Superconductivity and Cryogenics
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• v.18 no.2
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• pp.5-7
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• 2016

We present an experimental investigation of the superconducting transition temperatures, $T_c$, of superconductor/ferromagnet bilayers with varying the thickness of ferromagnetic layer. FeN was used for the ferromagnetic (F) layer, and NbN and Nb were used for the superconducting (S) layer. The results were obtained using three different-thickness series of the S layer of the S/F bilayers: NbN/FeN with NbN thickness, $d_{NbN}{\approx}9.3nm$ and $d_{NbN}{\approx}10nm$, and Nb/FeN with Nb thickness $d_{Nb}{\approx}15nm$. $T_c$ drops sharply with increasing thickness of the ferromagnetic layer, $d_{FeN}$, before maximal suppression of superconductivity at $d_{FeN}{\approx}6.3nm$ for $d_{NbN}{\approx}10nm$ and at $d_{FeN}{\approx}2.5nm$ for $d_{Nb}{\approx}15nm$, respectively. After shallow minimum of $T_c$, a weak $T_c$ oscillation was observed in NbN/FeN bilayers, but it was hardly observable in Nb/FeN bilayers.

• Korean Journal of Materials Research
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• v.33 no.10
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• pp.400-405
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• 2023

Tb³⁺-doped CaNb₂O₆ (CaNb₂O₆:Tb³⁺) thin films were deposited on quartz substrates at a growth temperature of 300 ℃ using radio-frequency magnetron sputtering. The deposited thin films were annealed at several annealing temperatures for 20 min and characterized for their structural, morphological, and luminescent properties. The experimental results showed that the annealing temperature had a significant effect on the properties of the CaNb₂O₆:Tb³⁺ thin films. The crystalline structure of the as-grown CaNb₂O₆:Tb³⁺ thin films transformed from amorphous to crystalline after annealing at temperatures greater than or equal to 700 ℃. The emission spectra of the thin films under excitation at 251 nm exhibited a dominant emission band at 546 nm arising from the ⁵D₄→⁷F₅ magnetic dipole transition of Tb³⁺ and three weak emission bands at 489, 586, and 620 nm, respectively. The intensity of the ⁵D₄→⁷F₅ (546 nm) magnetic dipole transition was greater than that of the ⁵D₄→⁷F₆ (489 nm) electrical dipole transition, indicating that the Tb³⁺ ions in the host crystal were located at sites with inversion symmetry. The average transmittance at wavelengths of 370~1,100 nm decreased from 86.8 % at 700 ℃ to 80.5 % at an annealing temperature of 1,000 ℃, and a red shift was observed in the bandgap energy with increasing annealing temperature. These results suggest that the annealing temperature plays a crucial role in developing green light-emitting CaNb₂O₆:Tb³⁺ thin films for application in electroluminescent displays.

• Korean Journal of Optics and Photonics
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• v.5 no.2
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• pp.311-318
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• 1994

We fabricated fiber-optic polarizers utilizing polarization selective mode coupling between the guided mode of a fiber and the surface plasmon mode supported by a thin aluminium film deposited on the polished side of a fiber. AI thin films with various thicknesses were coated onto the 633 nm, 830 nm, 1.3 fJITI single mode fibers. The maximum extinction ratio was higher than 30 dB for most of the samples and the best result was 42 dB at 90 A film thickness, with 1.3 fJITI single mode fiber. The insertion loss ranged from 0.2 dB to 1.5 dB.1.5 dB.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2009.06a
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• pp.299-300
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• 2009

We have studied an organic layer and semitransparent Al cathode thickness dependent optical properties for top-emission organic light-emitting diodes. Device structure is ITO(170nm)/TPD(xnm)/$Alq_3$(ynm)/LiF(0.5nm)/Al(100nm) and Al(100nm)/TPD(xnm)/$Alq_3$(ynm)/LiF(0.5nm)/Al(25nm). While a thickness of total, organic layer was varied from 85nm to 165nm, a ratio of those two layers was kept to be about 2:3. Then it was compared with that of bottom devices. And a thickness of semitransparent Al cathode was varied from 20nm to 30nm for the device with an organic layer thickness of 140nm. We were able to control the emission spectra from the top-emission organic light-emitting diodes.

• Journal of the Korean Ceramic Society
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• v.39 no.4
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• pp.377-385
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• 2002

The possibility of $ZrO_2$ thin film as insulator for Metal-Ferroelectric-Insulator-Semiconductor(MFIS) structure was investgated. $SrBi_2Ta_2O_9$ and $SrBi_2Ta_2O_9$(SBT) thin films were deposited on P-type Si(111) wafer by R. F. magnetron sputtering method. The electrical properties of MFIS gate were relatively improved by inserting the $ZrO_2$ buffer layer. The window memory increased from 0.5 to 2.2V in the applied gate voltage range of 3-9V when the thickness of SBT film increased from 160 to 220nm with 20nm thick $ZrO_2$. The maximum value of window memory is 2.2V in Pt/SBT(160nm)/$ZrO_2$(20nm)/Si structure with the optimum thickness of $ZrO_2$. These memory windows are sufficient for practical application of NDRO-FRAM operating at low voltage.