• 대한전자공학회논문지
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• 제22권6호
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• pp.7-12
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• 1985

Oxygen-active 금속, 천이금속 및 oxygen-noble 금속, 즉, Al, Ti, Mn, Ni 그리고 Cuㄹ박막의 광투과율을 조사하였다. Slide-glass 위에 $6{\times}10^{-5}$ ~ $2{\times}10^{-4}$ mbr 압력범위와 0.5 ~ $2{\AA}$/sec 의 증착속도 범위에서 두께를 $85{\AA}$내외로 하여 증착하였다. 증착속도와 진공도는 금속박막의 광학적 성질에 큰 영향을 미치며 이는 주로 산소개입에 의한 것임을 알 수 있었다. 특히 광투과율이 매우 낮다고 알려진 산소와의 친화력이 강한 금속, 즉, Al, Ti, Cr 그리고 Ni의 광투과율을 저 진공도나 느린 증착속도에 의한 증착공정으로 상당히 향상시킬 수 있었다.

• 한국자기학회지
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• 제12권3호
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• pp.94-98
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• 2002

20nm이하의 얇은 박막에서도 높은 보자력이 요구되는 Ti/CoCrPt 수직자기기록박막의 보자력 향상을 위해 Al, Cu, Ni, Cr, Ag, Mg, Fe, Co, Pd, Au, Pt, Mo, Hf등의 여러 하지층과 제조조건이 보자력에 미치는 영향을 조사하였다 이들 중 Ag과 Mg하지층은 Ti/CoCrPt박막의 보자력을 향상시켰으며 특히 2nm Ag 하지층을 사용할 경우 10nm CoCrPt 박막에서 2200 Oe의 높은 보자력을 보일뿐 아니라 $\alpha$값을 낮추는 효과가 있었다. 그러나 Ag를 하지층으로 사용하면 기대와는 달리 Ti(002)면의 우선배향 성장이 전혀 일어나지 않아 보자력 증대에 다른 기구가 작용하는 것으로 판단되었다. 그리고 표면의 거칠기가 큰 기판에서는 보자력뿐만 아니라 역자구생성자계도 감소하였다.

• 대한치과보철학회지
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• 제30권4호
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• pp.481-492
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• 1992

Author measured the bonding strength between Dental Porcelain and Nonprecious Dental Alloy and analyzed diffusion Phenomena at the interfaceby by Auger electron spectroscopy and also Electron spectroscopy for Chemical Analysis. The each specimen was sputtered with Al, Cr, In and Sn. 1. Ni whic is the main element of the matris of dental nonprecious alloy diffuse more than the other element and the Ni diffusion rate of each specimen was well coordinated with the bonding strength of each. 2. The Sn thin film suppress the diffusion rate of Ni of matrix into the Dental Porcelain than the In or Cr thin films. 3. The Al thin film suppress the diffusion rate of Ni than the Sn thin film. 4. The main coponent of dental porcelain : Al, Si, Mo diffused into the matrix of alloy. It means that the each element of dental alloy and dental porelain diffused into the each other part.

• 대한치과기공학회지
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• 제28권1호
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• pp.19-26
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• 2006

The effect of Nb on interfacial bonding characteristics of Ni-Cr alloy for porcelain fused to metal crown (PFM) has been studied in order to investigate oxide layer. A specimens of Ni-Cr alloy, which is 0.8mm in thickness, within the porcelain furnace of 1,000$^{\circ}C$ with four tests such as air, vacuum, air for 5 minutes and vacuum for 5 minutes in order to examine an oxide behavior of alloy surface generated by the adding of Nb to be controlled at a rate of 0, 1, 3 and 5. Oxide film was observed form of the fired specimens with scanning electron microscope (SEM), and at the same time it measured Electron Probe Micro Analyzer (EPMA). The result of this study were as follows: 1. Cr oxide film and Nb oxide film were observed from the surface of specimen to be controlled at a rate of Nb 1%. 2. Nb oxide film was observed from the interface of specimens to be controlled at a rate of Nb 1% and 3%. 3. The stability of oxide films that treated in air were more stable than treated under vacuum.

• 한국재료학회지
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• 제14권9호
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• pp.634-641
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• 2004

The photocatalytic performance of $TiO_2$ thin films coated on porous alumina balls using various aqueous $TiOCl_2$ solutions as starting precursors, to which 1.0 $mol\%$ transition metal ($Ni^{2+},\;Cr^{3+},\;Fe^{3+},\;Nb^{3+},\;and\;V^{5+}$) chlorides had been already added, has been investigated, together with characterizations for $TiO_2$ sols synthesized simultaneously in the same autoclave through hydrothermal method. The synthesized $TiO_2$ sols were all formed with an anatase phase, and their particle size was between several nm and 30 nm showing ${\zeta}-potential$ of $-25{\sim}-35$ mV, being maintained stable for over 6 months. However, the $TiO_2$ sol added with Cr had a much lower value of -potential and larger particle sizes. The coated $TiO_2$ thin films had almost the same shape and size as those of the sol. The pure $TiO_2$ sol showed the highest optical absorption in the ultraviolet light region, and other $TiO_2$ sols containing $Cr^{3+},\;Fe^{3+}\;and\;Ni^{2+}$ showed higher optical absorption than pure sol in the visible light region. According to the experiments for removal of a gas-phase benzene, the pure $TiO_2$ film showed the highest photo dissociation rate in the ultraviolet light region, but in artificial sunlight the photo dissociation rate of $TiO_2$ coated films containing $Cr^{3+},\;Fe^{3+}\;and\;Ni^{2+}$ was measured higher together with the increase of optical absorption by doping.

• 마이크로전자및패키징학회지
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• 제11권1호
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• pp.37-42
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• 2004

최근에 3 ㎓이상의 고주파용 전자부품과 소자의 제조에 낮은 저항온도계수(TCR)값과 높은 정밀도를 갖는 박막저항이 사용되고 있다. Ni-Cr 박막저항은 낮은 TCR 값과 저항에 대한 높은 안정성 때문에 저항 물질로 사용되는 가장 일반적인 물질이다. 본 연구에서는 $Ni_{72}Cr_Al_3Mn_4Si$(wt%)이 첨가된 우수한 저항특성을 갖는 S-type의 Evanohm 합금 타겟과 스퍼터링 장비를 이용하여 박막 저항을 제조하였다. 또한 열처리 조건을 $200^{\circ}C$, 300$300^{\circ}C$, $400^{\circ}C$, $500^{\circ}C$로 변화시키면서 고주파 박막 저항의 미세구조와 전기적 특성을 관찰하여 최상의 열처리 조건을 알아보았다.

• 한국마이크로전자및패키징학회:학술대회논문집
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• 한국마이크로전자및패키징학회 2003년도 기술심포지움 논문집
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• pp.145-150
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• 2003

최근에 3 GHz이상의 고주파용 전자부품과 소자의 제조에 낮은 TCR 값과 높은 정밀도를 갖는 박막저항이 사용되고 있다. Ni-Cr 박막저항은 낮은 TCR 값과 저항에 대한 높은 안정성 때문에 저항 물질로 사용되는 가장 일반적인 물질이다. 본 연구에서는 $Ni_{72}Cr_{20}Al_3Mn_4Si(wt\%)$ 첨가된 우수한 저항특성을 갖는 s-type의 Evanohm 합금 타겟과 스퍼터링 장비를 이용하여 박막 저항을 제조하였다. 또한 열처리 조건을 $200^{\circ}C,\;300^{\circ}C,\;400^{\circ}C,\;500^{\circ}C$로 변화시키면서 고주파 박막저항의 미세구조와 전기적 특성을 관찰하여 최상의 열처리 조건을 알아보았다.

• 한국재료학회:학술대회논문집
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• 한국재료학회 1999년도 추계학술발표강연 및 논문개요집
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• pp.58-58
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• 1999

• 한국표면공학회:학술대회논문집
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• 한국표면공학회 2000년도 추계학술발표회 초록집
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• pp.12-12
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• 2000

This paper investigated the effect of the film deposition rate for $CrN_x$ microstructure and mechanical properties. For these purpose, pure Cr an stoichiometric CrN films were deposited with various target power density on Si hardened M2 tool steel. The variation of ni trogen concentration in $CrN_x$ f analyzed by AES and deposition rate was calculated by measuring of thickness using ${\alpha}-step$ profilometer. The microstructure was analyzed by X-Ray Diffract and Scanning Electron Microscopy(SEM), and mechanical properties were evalua residual stress, microhardness and adhesion tests. Deposition rate of Cr and CrN increased as an almost linear function of target power density from $0.25\mu\textrm{m}/min$ and $0.15\mu\textrm{m}/min$ to $0.43\mu\textrm{m}/min$. Residual stresses of Cr and CrN films were from tensi Ie to compressive stress with an increase of deposi tion rate a compressive stresses were increased as more augmentation of deposition r maximum hardness value of $2300kg/\textrm{mm}^2$ and the best adhesion strength correspond HF 1 were obtained for CrN film synthesized at the highest target densitY($13.2W/\textrm{mm}^2$) owing to high residual compressive stress and increasing mobility.

• 대한치과보철학회지
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• 제25권1호
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• pp.317-325
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• 1987

A study on the shear bonding strength between dental alloy and porcelain according to various kidns of sputtered metallic thin films was established by Ingtron universal testing machine, and the change of the elemental weight % at the surface of dental alloy was studied by E.D.S. The kind of metallic thin films were Al, Ni, In, Cr. Ti and Sn with $0.3{\mu}m$ thickness. The dental alloys were Verabond made by Aalba Dent. Co. and Degudent H manufactured by Degussa Co. The control groups were Verabond and Degudent H. The obtained results were as follows; 1. The shear bonding strength of Al plated sample was the strongest of all. 2. The shear bonding strength of Ni plated sample was stronger than that of Degudent H, Sn plated samples. 3. The shear bonding strength of Verabond was weaker than that of Al, Ni, In, Cr, plated samples. 4. After degassing, it is more weight % of Ni at the alloy surface of the Ni sputtered specimen than the Sn sputtered sample.