• Analytical Science and Technology
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• v.6 no.2
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• pp.217-223
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• 1993

Thin films of the Au/Cr, Au/Ni/Cr and Au/Pd/Cr systems were deposited on alumina substrates at ambient temperature and $250^{\circ}C$ in a high-vacuum resistance heating evaporator and annealed at $300^{\circ}C$, $450^{\circ}C$ and $600^{\circ}C$ for 1 hour in air, respectively. The film thicknesses of Au, Ni(or pd), and Cr were $1000{\AA}$, $300{\AA}$, and $50{\AA}$, respectively. The substrate temperature during deposition and the post-deposition annealing temperature affected the sheet resistance of thin-films due to the inter-diffusion of each layer. As a result of Auger depth profile analysis, in the Au/Cr system Cr already diffused out to Au surface during deposition at the substrate temperature of $250^{\circ}C$ and Au distribution changed after heat treatment. In the Au/Ni/Cr and Au/Pd/Cr systems, diffusion phenomena of Ni and Pd were found and especially Ni (approximately 45 at.%) diffused out to Au surface and oxidized.

• Journal of the Microelectronics and Packaging Society
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• v.23 no.3
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• pp.69-75
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• 2016

This study investigated the effect of heat treatment conditions not only on the Cr surface crack propagation behaviors but also on the Ni/Cr interfacial reaction characteristics in electroless Ni/electroplated Cr double coating layers on Cu substrate. Clear band layer of Ni-Cr solid solutions were developed at Ni/Cr interface after heat treatment at $750^{\circ}C$ for 6 h. Channeling cracks formed in Cr layer after 1 step heat treatment, that is, heat treatment after Ni/Cr plating, while little channeling cracks formed after 2 step heat treatment, that is, same heat treatments after Ni and Cr plating, respectively, due to residual stress relaxation due to crystallization of Ni layer before Cr plating.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.18 no.8
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• pp.714-719
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• 2005

NiCr thin film was deposited by DC magnetron sputtering on $A;_2O_3$/Si substrate with NiCr (80:20) alloy target. NiCr thin films were annealed at $300^{\circ}C,\;400^{\circ}C,\;500^{\circ}C,\;600^{\circ}C,\;and\;700^{\circ}C$ for 6 hr in $H_2$ after annealing at $500^{\circ}C$ for 6hr in air atmosphere, respectively. To analyze NiCr thin film properties, the changes of its micro structure were Investigated through field emission scanning electron microscope (FESEM). X-ray photoelectron spectroscopy (XPS) was used to analyze a surface of NiCr thin film. Resistance of NiCr thin film was measured by 4-point probe technique. The generated heats were measured by infrared thermometer through the application of DC voltage (5 V/l2 V). NiCr thin film treated by gradational double annealing process had uniform and small grains. Maximum temperature generated heat by NiCr micro heater was $173^{\circ}C$. We expect that our results will be a useful reference in the realization of NiCr micro heater.

• Journal of the Korean Ceramic Society
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• v.37 no.9
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• pp.839-846
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• 2000

통전활성 소결법을 이용하여 단상의 세라믹스(PSZ) 및 금속(NiCrAlY)과 PSZ/NiCrAlY 복합체를 각 소결온도에서 제조하였으며, 이에 대한 특성평가는 개량형 소형펀치 시험법을 이용하여 수행하였다. 복합체의 밀도 및 경도에 미치는 소결온도의 영향은 NiCrAlY의 부피분율 증가에 따라 감소되었으며, 중간조성에서의 밀도 및 경도는 연속적인 변화를 나타내었다. 파괴인성의 변화에서는 60vol%-NiCrAlY 이상의 조성에서 급격한 증가를 나타내었으며, 짧은 소결시간 및 빠른 승온속도 등 통전활성 소결법의 장점에 의해 단상의 PSZ에서도 10 MPa.m$^{1}$2/ 의 높은 파괴인성 값을 얻을 수 있었다. PSZ/NiCrAlY 복합체에서의 특성은 소결온도와 NiCrAlY의 부피분율에 의해 지배적으로 영향을 받았으며, 단상의 PSZ은 전형적인 취성거동을 나타내었고 80vol%-NiCrAlY 까지의 복합체에서는 부분적인 취성 및 소성거동을 함께 나타내었다. 각 소결체에서 최고의 특성을 나타내고 소결온도는 단상의 PSZ 경우인 140$0^{\circ}C$에서부터 단상의 NiCrAlY 경우인 120$0^{\circ}C$까지 최대 20$0^{\circ}C$의 차이를 나타내었으며, PSZ과 NiCrAlY의 조성비에 따라서 연속적인 변화를 보였다.

• Journal of the Korean Ceramic Society
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• v.41 no.6
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• pp.450-455
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• 2004

NiCr thin films were fabricated by thermal evaporation method using NiCr alloy as evaporating source. NiCr thin films were annealed at various temperatures in air atmosphere in order to investigate effects of annealing conditions on phase change, composition, and microstructures of NiCr films. Typical multilayer was formed after annealing in air atmosphere. This results from the diffusion and oxidation of Cr toward surface during annealing. In the case of annealing at 700$^{\circ}C$, large columnar grains of NiO were formed on Cr-oxide layer through the diffusion and oxidation of Ni over Cr-oxide layer. Especially, NiO layer was formed additionally on surface, sustaining the underlayer structure with the formation of porous Ni layer.

• Advances in nano research
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• v.13 no.4
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• pp.313-323
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• 2022

The microstructure and mechanical properties of Cr-Ni steel and Cr-Ni steel-matrix nanocomposites reinforced with nano-ZrO₂ particles were investigated in this study. Cr-Ni steel and Cr-Ni/ZrO₂ nanocomposites were produced using a combination of high-energy ball milling, pressing, and sintering processes. The microstructures of the specimens were analyzed using EDX and XRD. Compression and hardness tests were performed to determine the mechanical properties of the specimens. Nano-ZrO₂ particles were effective in preventing chrome carbide precipitate at the grain boundaries. While t-ZrO₂ was detected in Cr-Ni/ZrO₂ nanocomposites, m-ZrO₂ could not be found. Few α'-martensite and deformation bands were formed in the microstructures of Cr-Ni/ZrO₂ nanocomposites. Although nano-ZrO₂ particles had a negligible impact on the strength improvement provided by deformation-induced plasticity mechanisms in Cr-Ni/ZrO₂ nanocomposites, the mechanical properties of Cr-Ni steel were significantly improved by using nano-ZrO₂ particles. The hardness and compressive strength of Cr-Ni/ZrO₂ nanocomposite were higher than those of Cr-Ni steel and enhanced as the weight fraction of nano-ZrO₂ particles increased. Cr-Ni/ZrO₂ nanocomposite with 5wt.% nano-ZrO₂ particles had almost twofold the hardness and compressive strength of Cr-Ni steel. The nano-ZrO₂ particles were considerably more effective on particle-strengthening mechanisms than deformation-induced strengthening mechanisms in Cr-Ni/ZrO₂ nanocomposites.

• Korean Journal of Materials Research
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• v.13 no.10
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• pp.640-644
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• 2003

NiCr thin films were fabricated by rf magnetron sputtering for applying to both the top electrode and absorption layer on Pb(Zr, Ti)O$_3$(PZT) thin films for infrared sensors. The rms roughness and resistivity of NiCr films prepared with Ni power of 80 W and Cr power of 50 W showed the most stable oxidation resistance after annealing at $600^{\circ}C$ for 5 min in oxygen ambient. The rms roughness and resistivity of NiCr films annealed at $V^{\circ}C$ in oxygen ambient were about 2$0\AA$ and $70 \mu$Ω-cm, respectively. As-deposited Ni/PZT/Pt and NiCr (Ni 80 W, Cr 50 W)/PZT/Pt structures showed well saturated hysteresis loops. However, in case of the samples annealed at $500^{\circ}C$ in oxygen ambient, only NiCr/PZT/Pt showed saturated loops having a remanent polarization of 20$\mu$C/$\textrm{cm}^2$. Ultra-thin NiCr films showed a possibility as a top electrode for infrared sensors.

• Korean Journal of Materials Research
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• v.8 no.8
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• pp.757-765
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• 1998

This study was performed to investigate the influence of fuel/oxygen ratio (F/O= 3.2, 3.0, 2.8) on the oxidation behavior of two kinds of (20wt%NiCr claded $\textrm{Cr}_{3}\textrm{C}_{2}$, and 7wt%NiCr mixed $\textrm{Cr}_{3}\textrm{C}_{2}$) composite powder with different manufacturing method. The results show that the oxidation behavior between the 20wt% NiCr claded $\textrm{Cr}_{3}\textrm{C}_{2}$ and 7wt% NiCr mixed $\textrm{Cr}_{3}\textrm{C}_{2}$ coating was widely different. The surface morphology of the coating composed of 7wt% NiCr mixed $\textrm{Cr}_{3}\textrm{C}_{2}$ was changed to porous with F/O ratio by the aggressive evolution of gas phases($\textrm{CO}_2$, CO and $\textrm{CrO}_3$) and the oxide cluster composed of Ni and Cr were grown after oxidation at $1000^{\circ}C$ for 50 hours. But the surface morphology of the coating composed of 20wt% NiCr claded $\textrm{Cr}_{3}\textrm{C}_{2}$ was not changed to porous after oxidation at $1000^{\circ}C$ for 50 hours. Therefore, the reason for high oxidation rate is due to activation of $\textrm{Cr}_{3}\textrm{C}_{2}$ to oxidation by entrapped oxygen gases within coating layer, and to closely relate with the decomposition of $\textrm{Cr}_{3}\textrm{C}_{2}$ to $\textrm{Cr}_{7}\textrm{C}_{3}$ phase. Accordingly, On the evidence of these results, the study about the oxidation behavoir of the HVOF sprayed $\textrm{Cr}_{3}\textrm{C}_{2}$ coating depending on hydrogen flow rate must be done.

• Proceedings of the KIEE Conference
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• 2001.07c
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• pp.1399-1401
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• 2001

We studied on structure and resistivity, temperature coefficient of resistance (TCR) of NiCr and NiCr-N thin resistor films prepared by do reactive magnetron sputtering of NiCr target. It is found that while pure NiCr films are polycrystalline, an addition of nitrogen (N2/(Ar+N2) ratios are between 10% and 70%) into the film is changed into amorphous structure and sheet resistance of films is increased. Measurement temperatures of TCR are ratios of $5^{\circ}C$ per 15min from $25^{\circ}C$ to $130^{\circ}C$. TCR for an as-deposited NiCr-N thin film is varied from positive to negative.

• Applied Microscopy
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• v.45 no.1
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• pp.9-15
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• 2015

In the present study, microstructural evolution in CuCrFeNi, CuCrFeNiMn, and CuCrFeNiMnAl alloys has been investigated. The as-cast CuCrFeNi alloy consists of a single fcc phase with the lattice parameter of 0.358 nm, while the as-cast CuCrFeNiMn alloy consists of (bcc+fcc1+fcc2) phases with lattice parameters of 0.287 nm, 0.366 nm, and 0.361 nm. The heat treatment of the cast CuCrFeNiMn alloy results in the different type of microstructure depending on the heat treatment temperature. At $900^{\circ}C$ a new thermodynamically stable phase appears instead of the bcc solid solution phase, while at $1,000^{\circ}C$, the heat treated microstructure is almost same as that in the as-cast state. The addition of Al in CuCrFeNiMn alloy changes the constituent phases from (fcc1+fcc2+bcc) to (bcc1+bcc2).