Journal of the Korean Institute of Electrical and Electronic Material Engineers (한국전기전자재료학회논문지)

The Korean Institute of Electrical and Electronic Material Engineers (한국전기전자재료학회)
권호 표지
DOI QR코드

DOI QR Code

Gradational Double Annealing Process for Improvement of Thermal Characteristics of NiCr Thin Films

NiCr 박막의 발열 특성 개선을 위한 순차적 이중 열처리 방법 연구

  • 권용 (조선대학교 신소재공학과) ;
  • 노효섭 (조선대학교 신소재공학과) ;
  • 김남훈 (조선대학교 에너지자원신기술연구소) ;
  • 최동유 (조선대학교 에너지자원신기술연구소) ;
  • 박진성 (조선대학교 신소재공학과)
  • Published : 2005.08.01
Download PDF
⟨ Previous Next ⟩

Abstract

NiCr thin film was deposited by DC magnetron sputtering on $A;_2O_3$/Si substrate with NiCr (80:20) alloy target. NiCr thin films were annealed at $300^{\circ}C,\;400^{\circ}C,\;500^{\circ}C,\;600^{\circ}C,\;and\;700^{\circ}C$ for 6 hr in $H_2$ after annealing at $500^{\circ}C$ for 6hr in air atmosphere, respectively. To analyze NiCr thin film properties, the changes of its micro structure were Investigated through field emission scanning electron microscope (FESEM). X-ray photoelectron spectroscopy (XPS) was used to analyze a surface of NiCr thin film. Resistance of NiCr thin film was measured by 4-point probe technique. The generated heats were measured by infrared thermometer through the application of DC voltage (5 V/l2 V). NiCr thin film treated by gradational double annealing process had uniform and small grains. Maximum temperature generated heat by NiCr micro heater was $173^{\circ}C$. We expect that our results will be a useful reference in the realization of NiCr micro heater.

Keywords

References

  1. U. Dibbern, 'A substrate for thin-film gas sensors in microelectronic technology', Sensors and Actuators B, Vol. 2, Iss. 1, p. 63, 1990
  2. E. Yoon, 'An integrated mass flow sensor with on-chip CMOS interface ciruitry', IEEE Transactions on Electron Devices, Vol. 39, No. 6, p. 1376, 1992
  3. J. W. Gardner, A. Pike, N. F. De Rooij, M. Koudelka-Hep, P. A. Clerc, A. Hierlemann, and W. Gopel, 'Integrated array sensor for detection organic solvents', Sensors and Actuators B, Vol. 26, Iss. 1-3, p. 135, 1995 https://doi.org/10.1016/0925-4005(94)01546-T
  4. V. V. Luchinin, 'Microtechonlogy and equipment for manugactruing SiC-based sensors of physical values for extreme operation condition', Proceeding of 7th Conference on Sensor Technology, p. 30, 1996
  5. M. A. Gajda and H. Ahmed, 'Applications of thermal silicon sensors on membranes', Sensors and Actuators A, Vol. 49, Iss. 1-2, p. 1, 1995 https://doi.org/10.1016/0924-4247(96)80025-2
  6. W. Y. Chung, C. H. Shim, D. D. Lee, and S. D. Choi, 'Tin oxide microsensor for LPG monitoring', Sensors and Actuators B, Vol. 20, Iss. 2-3, p. 139, 1994
  7. A. Banovec and A. Zalar, 'Investigation of sliding contact resistance of Ni-Cr/Au and Ni-Cr/$Au-SiO_2$ thin resistive films', Thin Solid Films, Vol. 164, p. 129, 1988
  8. A. Peled, J. Farhadyan, Y. Zloof, and V. Baranauskas, 'The midrange and high temperature dependence of vacuum deposited NiCr thin film resistors', Vacuum, Vol. 45, Iss. 1, p. 5, 1994
  9. N. G. Dhere and D. G. Vaoide, 'Composition and temperature coefficient of resistance of Ni-Cr thin films', Thin Solid Films, Vol. 59, Iss. 1, p. 33, 1979
  10. M. I. Birjega, C. A. Constantin, I. TH. Florescu, and C. Sarbu, 'Crystallization of amorphous sputtered 55 %Cr-45 %Ni thin films', Thin Solid Films, Vol. 92, Iss. 4, p. 315, 1982 https://doi.org/10.1016/0040-6090(82)90154-7
  11. S. Hofmann and A. Zalar, 'Correlation between electrical properties and AES concentration-depth profiles of NiCr thin films', Thin Solid Films, Vol. 39, p. 219, 1976
  12. 권용, 김남훈, 최동유, 이우선, 서용진, 박진성, 'DC 마그네트론 스퍼터링 NiCr 박막의 열처리 조건에 따른 미세구조 및 표면특성', 전기전자재료학회논문지, 18권,6호, p. 554, 2005
  13. 김병희, '성문 이화학사전', 한국사전연구사, p. 573, 1995
  14. J. H. Ryu, N. H. Kim, H. S. Kim, G. Y. Yeom, E. G. Chang, and C. I. Kim, 'Roles of $N_2$ Gas in Etching of Platinum by Inductively Coupled Ar/$CI_2$$N_2$ Plasmas', Journal of Vacuum Science & Technology A, Vol. 18, No. 4, p. 1377, 2000