• Title/Summary/Keyword: Nanoscale fabrication

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CuO-Al2O3/camphene 슬러리의 동결건조 공정에 의한 Al2O3 입자분산 Cu 다공체 제조 (Fabrication of Al2O3 Dispersed Porous Cu by Freeze Drying of CuO-Al2O3/Camphene Slurry)

  • 강현지;류도형;오승탁
    • 한국분말재료학회지
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    • 제25권1호
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    • pp.25-29
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    • 2018
  • Porous Cu with a dispersion of nanoscale $Al_2O_3$ particles is fabricated by freeze-drying $CuO-Al_2O_3$/camphene slurry and sintering. Camphene slurries with $CuO-Al_2O_3$ contents of 5 and 10 vol% are unidirectionally frozen at $-30^{\circ}C$, and pores are generated in the frozen specimens by camphene sublimation during air drying. The green bodies are sintered for 1 h at $700^{\circ}C$ and $800^{\circ}C$ in $H_2$ atmosphere. The sintered samples show large pores of $100{\mu}m$ in average size aligned parallel to the camphene growth direction. The internal walls of the large pores feature relatively small pores of ${\sim}10{\mu}m$ in size. The size of the large pores decreases with increasing $CuO-Al_2O_3$ content by the changing degree of powder rearrangement in the slurry. The size of the small pores decreases with increasing sintering temperature. Microstructural analysis reveals that 100-nm $Al_2O_3$ particles are homogeneously dispersed in the Cu matrix. These results suggest that a porous composite body with aligned large pores could be fabricated by a freeze-drying and $H_2$ reducing process.

나노임프린트를 이용한 바이오칩용 나노 패턴 제작 (Fabrication of Nanopatterns for Biochip by Nanoimprint Lithography)

  • 최호길;김순중;오병근;최정우
    • KSBB Journal
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    • 제22권6호
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    • pp.433-437
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    • 2007
  • 본 연구에서는 나노임프린트 리소그래피를 이용하여 500 nm line, 600 nm pore, $1{\mu}m$ pore, $2.5{\mu}m$ pore의 마이크로 수준에서 나노 수준에 이르는 다양한 크기와 모양의 nanopore 형태 패턴을 제작하였다. Thermal imprint 방식과 달리 상온, 저압에서 임프린팅이 가능하며 사용되는 스탬프의 수명을 늘리고 보다 미세하고 복잡한 형태의 패턴을 제작할 수 있는 UV-assisted imprint 방식을 사용하였다. E-beam lithography로 패턴을 각인한 quartz소재의 스탬프를 사용하였으며 스탬프의 재질이 투명하여 UV 조사시 UV curable resin이 경화될 수 있도록 하였다. 또한 스탬프의 표면을 (heptadecafluoro-1,1,2,2-tetrahydrodecyl) trichlorosilane의 monolayer 층으로 미리 코팅하여 임프린트 후 스탬프와 기판과의 releasing을 쉽게함과 동시에 패턴의 일부가 스탬프에 묻어 나와 전사된 패턴에 defect가 없도록 하였다. 또한, gold를 미리 증착하여 임프린팅함으로써 lift-off 시에 필요한 hi-layer 층이 필요 없게 되어 산소 플라즈마를 이용한 에칭이 더욱 쉽고 lift-off 공정이 생략될 수 있도록 하였다. 나노임프린트 공정에 있어 가장 큰 문제점은 잔여층의 생성이며 이러한 잔여층을 제거하고자 산소 플라즈마 에칭을 하였다. 에칭공정을 통해 gold의 표면이 완전히 드러났으며 산소 플라즈마를 통해 gold의 표면이 친수성으로 바뀌어 추후 단백질 고정화를 더욱 쉽게 하였다. 그리하여 나노임프린트 기술을 이용해 나노크기의 바이오소자 제작을 가능하게 하였다.

Fabrication of a robust, transparent, and superhydrophobic soda-lime glass

  • Rahmawan, Yudi;Kwak, Moon-Kyu;Moon, Myoung-Woon;Lee, Kwang-Ryeol;Suh, Kahp-Yang
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2009년도 제38회 동계학술대회 초록집
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    • pp.86-86
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    • 2010
  • Micro- and nanoscale texturing and control of surface energy have been considered for superhydrophobicity on polymer and silicon. However these surfaces have been reported to be difficult to meet the robustness and transparency requirements for further applications, from self cleaning windows to biochip technology. Here we provided a novel method to fabricate a nearly superhydrophobic soda-lime glass using two-step method. The first step involved wet etching process to fabricate micro-sale patterns on soda-lime glass. The second step involved application of $SiO_x$-incorporated DLC to generate high intrinsic contact angle on the surface using chemical vapor deposition (CVD) process. To investigate the effect of surface roughness, we used both positive and negative micro-scale patterns on soda-limeglass, which is relatively hard for surface texturing in comparison to quartz or Pyrex glasses due to the presence of impurities, but cheaper. For all samples we tested the static wetting angle and transparency before and after 100 cycles of wear test using woolen steel. The surface morphology is observed using optical and scanning electron microscope (SEM). The results shows that negative patterns had a greater wear resistance while the hydrophobicity was best achieved using positive patterns having static contact angle up to 140 deg. with about 80% transparency. The overall experiment shows that positive patterns at etching time of 1 min shows the optimum transparency and hydrophobicity. The optimization of micro-scale pattern to achieve a robust, transparent, superhydrophobic soda-lime glass will be further investigated in the future works.

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Active Materials for Energy Conversion and Storage Applications of ALD

  • 신현정
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2013년도 제45회 하계 정기학술대회 초록집
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    • pp.75.2-75.2
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    • 2013
  • Atomic layer deposition (ALD), utilizing self-limiting surface reactions, could offer promising perspectives for future efficient energy conversion devices. The capabilities of ALD for surface/interface modification and construction of novel architectures with sub-nanometer precision and exceptional conformality over high aspect ratio make it more valuable than any other deposition methods in nanoscale science and technology. In the context, a variety of researches on fabrication of active materials for energy conversion applications by ALD are emerging. Among those materials, one-dimensional nanotubular titanium dioxide, providing not only high specific surface area but also efficient carrier transport pathway, is a class of the most intensively explored materials for energy conversion systems, such as photovoltaic cells and photo/electrochemical devices. The monodisperse, stoichiometric, anatase, TiO2 nanotubes with smooth surface morphology and controlled wall thickness were fabricated via low-temperature template-directed ALD followed by subsequent annealing. The ALD-grown, anatase, TiO2 nanotubes in alumina template show unusual crystal growth behavior which allows to form remarkably large grains along axial direction over certain wall thickness. We also fabricated dye-sensitized solar cells (DSCs) introducing our anatase TiO2 nanotubes as photoanodes, and studied the effect of blocking layer, TiO2 thin films formed by ALD, on overall device efficiency. The photon convertsion efficiency ~7% were measured for our TiO2 nanotubebased DSCs with blocking layers, which is ~1% higher than ones without blocking layer. We also performed open circuit voltage decay measurement to estimate recombination rate in our cells, which is 3 times longer than conventional nanoparticulate photoanodes. The high efficiency of our ALD-grown, anatase, TiO2 nanotube-based DSCs may be attributed to both enhanced charge transport property of our TiO2 nanotubes photoanode and the suppression of recombination at the interface between transparent conducting electrode and iodine electrolytes by blocking layer.

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Advanced radiation shielding materials: PbO2-doped zirconia ceramics synthesized through innovative sol-gel method

  • Islam G. Alhindawy;Mohammad. W. Marashdeh;Mamduh. J. Aljaafreh;Mohannad Al-Hmoud;Sitah Alanazi;K. Mahmoud
    • Nuclear Engineering and Technology
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    • 제56권7호
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    • pp.2444-2451
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    • 2024
  • This work demonstrates a new sol-gel approach for synthesizing PbO2-doped zirconia using zircon mineral precursors. The streamlined methodology enables straightforward fabrication of the doped zirconia composites. Comprehensive materials characterization was performed using XRD, SEM, and TEM techniques to analyze the crystal structure, microstructure, and morphology. Quantitative analysis of the XRD data provided insights into the nanoscale crystallite sizes achieved, along with their relationship to lattice imperfections. Furthermore, the gamma-ray shielding capacity for the PbO2-doped zirconia samples was estimated by the Monte Carlo simulation, which proves an increase in the gamma ray shielding properties by raising the Pb concentration. The linear attenuation coefficient increased between 0.467 and 0.499 cm-1 (at 0.662 MeV) by increasing the Pb content between 11 and 21 wt%. By increasing the Pb content to 21 wt%, the synthesized composites' lead equivalent thickness reaches 2.49 cm. The radiation shielding properties for the synthesized composites revealed a remarkable performance against low and intermediate γ-ray photons, with radiation shielding capacity of 37.3 % and 21.4 % at 0.662 MeV and 2.506 MeV, respectively. As a result, the developed composites can be employed as an alternative shielding material in hospitals and radioactive zones.

Contact Transfer Printing Using Bi-layer Functionalized Nanobio Interface for Flexible Plasmonic Sensing

  • Lee, Jihye;Park, Jiyun;Lee, Junyoung;Yeo, Jong-Souk
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2014년도 제46회 동계 정기학술대회 초록집
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    • pp.413-413
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    • 2014
  • In this paper, we present a fabrication method of functionalized gold nanostructures on flexible substrate that can be implemented for plasmonic sensing application. For biomolecular sensing, many researchers exploit unconventional lithography method like nanoimprint lithography (NIP), contact transfer lithography, soft lithography, colloidal transfer printing due to its usability and easy to functionalization. In particular, nanoimprint and contact transfer lithography need to have anti-adhesion layer for distinctive metallic properties on the flexible substrates. However, when metallic thin film was deposited on the anti-adhesion layer coated substrates, we discover much aggravation of the mold by repetitive use. Thus it would be impossible to get a high quality of metal nanostructure on the transferred substrate for developing flexible electronics based transfer printing. Here we demonstrate a method for nano-pillar mold and transfer the controllable nanoparticle array on the flexible substrates without an anti-adhesion layer. Also functionalization of gold was investigated by the different length of thiol applied for effectively localized surface plasmonic resonance sensing. First, a focused ion beam (FIB) and ICP-RIE are used to fabricate the nanoscale pillar array. Then gold metal layer is deposited onto the patterned nanostructure. The metallic 130 nm and 250 nm nanodisk pattern are transferred onto flexible polymer substrate by bi-layer functionalized contact imprinting which can be tunable surface energy interfaces. Different thiol reagents such as Thioglycolic acid (98%), 3-Mercaptopropionic acid (99%), 11-Mercaptoundecanoic acid (95%) and 16-Mercaptohexadecanoic acid (90%) are used. Overcoming the repeatedly usage of the anti-adhesion layer mold which has less uniformity and not washable interface, contact printing method using bi-layer gold array are not only expedient access to fabrication but also have distinctive properties including anti-adhesion layer free, functionalized bottom of the gold nano disk, repeatedly replicate the pattern on the flexible substrate. As a result we demonstrate the feasibility of flexible plasmonic sensing interface and anticipate that the method can be extended to variable application including the portable bio sensor via mass production of stable nanostructure array and other nanophotonic application.

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전자빔 증착을 위한 소결체 지르코니아의 열충격 저항성 연구 (A Study on the Thermal Shock Resistance of Sintered Zirconia for Electron Beam Deposition)

  • 오윤석;한윤수;채정민;김성원;이성민;김형태;안종기;김태형;김동훈
    • 한국추진공학회지
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    • 제19권3호
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    • pp.83-88
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    • 2015
  • 열차폐 코팅(Thermal Barrier Coating) 기술의 하나로 연구되는 전자빔(EB, Electron Beam) 증착에 사용되는 코팅재료는 증착 공정 중에 고출력의 전자빔이 조사되기 때문에, 균일코팅을 위해서는 증착 중 코팅재료의 형상유지 및 안정한 융탕 형성이 필요하며, 이를 위해 적절한 밀도와 미세구조를 갖춘 잉곳(Ingot) 형태의 코팅소스가 요구된다. 본 연구에서는 8 wt%의 이트리아($Y_2O_3$)가 안정화제로 첨가된 지르코니아(8YSZ) 조성을 활용하여, 고출력 전자빔 조사환경에 사용가능한 잉곳제조를 위해 최적의 원료분말 조건을 확보하고자 하였다. 제조된 잉곳시료들에 대한 전자빔 조사 시, 수십 마이크론과 수십 나노 크기의 입자들로 구성된 혼합형 분말로 제조된 잉곳의 경우, 나노크기의 분말만으로 제조된 경우보다 향상된 열충격 저항성을 보였다.

나노임프린트 공정에서 실란커플링제 기상증착을 이용한 표면처리 효과 (The Surface Treatment Effect for Nanoimprint Lithography using Vapor Deposition of Silane Coupling Agent)

  • 이동일;김기돈;정준호;이응숙;최대근
    • Korean Chemical Engineering Research
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    • 제45권2호
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    • pp.149-154
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    • 2007
  • 나노임프린트 공정기술은 나노구조물이 패턴된 스템프(혹은 몰드)를 이용하여 적절한 기판 위에 나노구조물을 복제하여 패턴을 전사하는 기술이다. 효과적인 나노임프린트 공정을 위해서는 몰드의 이형처리뿐 아니라 반대쪽의 기질과 레지스트 사이에 접착력 증가(adhesion promoter) 처리가 매우 중요한 역할을 한다. 본 연구에서는 자기조립 실란커플링제의 기상증착을 이용하여 나노임프린트 공정에서 사용되는 접착 증가막 및 표면처리 방법을 비교 분석 하였다. 이를 위해서 평탄화층(DUV-30J), 산소 플라즈마 처리, 실란커플링제 자기조립막이 비교되었다. 실란커플링제 자기조립막이 형성된 실리콘 표면은 전체적으로 나노 두께의 균일한 막이 형성되며 임프린트시 구조물들을 정밀하게 전사하였으며 3-acryloxypropyl methyl dichlorosilane(APMDS)을 이용한 자기조립막(SAMs) 처리가 평탄화층과 산소 플라즈마 처리보다 강한 접착력을 가지고 있어 나노임프린트 공정에 적합함을 알 수 있었다.

Morphology Control of Nanostructured Graphene on Dielectric Nanowires

  • 김병성;이종운;손기석;최민수;이동진;허근;남인철;황성우;황동목
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2012년도 제43회 하계 정기 학술대회 초록집
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    • pp.375-375
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    • 2012
  • Graphene is a sp2-hybridized carbon sheet with an atomic-level thickness and a wide range of graphene applications has been intensely investigated due to its unique electrical, optical, and mechanical properties. In particular, hybrid graphene structures combined with various nanomaterials have been studied in energy- and sensor-based applications due to the high conductivity, large surface area and enhanced reactivity of the nanostructures. Conventional metal-catalytic growth method, however, makes useful applications difficult since a transfer process, used to separate graphene from the metal substrate, should be required. Recently several papers have been published on direct graphene growth on the two dimensional planar substrates, but it is necessary to explore a direct growth of hierarchical nanostructures for the future graphene applications. In this study, uniform graphene layers were successfully synthesized on highly dense dielectric nanowires (NWs) without any external catalysts. We also demonstrated that the graphene morphology on NWs can be controlled by the growth parameters, such as temperature or partial pressure in chemical vapor deposition (CVD) system. This direct growth method can be readily applied to the fabrication of nanoscale graphene electrode with designed structures because a wide range of nanostructured template is available. In addition, we believe that the direct growth growth approach and morphological control of graphene are promising for the advanced graphene applications such as super capacitors or bio-sensors.

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데스크탑 규모의 간결한 롤투롤 나노임프린팅 기반 나노패턴 연속가공 시스템 개발 (Development of a Compact Desktop-sized Roll-to-roll Nanoimprinting System for Continuous Nanopatterning)

  • 이정수;이지훈;남승범;조성일;조용수;고민석;이승조;오동교;김정대;이재혁;옥종걸
    • 한국기계가공학회지
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    • 제16권1호
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    • pp.96-101
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    • 2017
  • We have developed a compact desktop-sized nanopatterning system driven by the Roll-to-Roll (R2R) nanoimprinting (NIL) principle. The system realizes the continuous and high-speed stamping of various nanoscale patterns on a large-area flexible substrate without resorting to ponderous and complicated instruments. We first lay out the process principle based on continuous NIL on a UV-curable resin layer using a flexible nanopatterned mold. We then create conceptual and specific designs for the system by focusing on two key processes, imprinting and UV curing, which are performed in a continuous R2R fashion. We build a system with essential components and optimized modules for imprinting, UV curing, and R2R conveying to enable simple but effective nanopatterning within the desktop volume. Finally, we demonstrate several nanopatterning results such as nanolines and nanodots, which are obtained by operating the built desktop R2R NIL system on transparent and flexible substrates. Our system may be further utilized in the scalable fabrication of diverse flexible nanopatterns for many functional applications in optics, photonics, sensors, and energy harvesters.