• 한국정밀공학회지
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• 제19권1호
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• pp.25-32
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• 2002

• 한국자기학회:학술대회 개요집
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• 한국자기학회 2017년도 임시총회 및 하계학술연구발표회
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• pp.13-13
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• 2017

• 한국자기학회:학술대회 개요집
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• 한국자기학회 2015년도 자성 및 자성재료 국제학술대회
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• pp.186-186
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• 2015

• 한국정밀공학회지
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• 제14권1호
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• pp.29-51
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• 1997

The purpose of the survey is to identify possible new areas of research relating to nanotechnology and in particular areas in which the established facilities of the Centre for Metrology can be employed to good effect. This survey indicates that nanotechnology, a sub set of the more embracing Nano Science, is a rapidly developing discipline with good potential for Electronic and Mechanical Engineering. Nanotechnology includes three areas: Nanometrology, Nanometer positioning and Control, and Nanomanufacturing. In each of the areas, the current research situation and developing trends have been summarised. Possibilities for future work indicated.

• International Journal of Precision Engineering and Manufacturing
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• 제9권2호
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• pp.18-22
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• 2008

The pitch and orthogonality of two-dimensional (2-D) gratings were measured using a metrological atomic force microscope (MAFM), and the measurement uncertainty was analyzed. Gratings are typical standard devices for the calibration of precision microscopes, Since the magnification and orthogonality in two perpendicular axes of microscopes can be calibrated simultaneously using 2-D gratings, it is important to certify the pitch and orthogonality of such gratings accurately for nanometrology. In the measurement of 2-D gratings, the MAFM can be used effectively for its nanometric resolution and uncertainty, but a new measurement scheme is required to overcome limitations such as thermal drift and slow scan speed. Two types of 2-D gratings with nominal pitches of 300 and 1000 nm were measured using line scans to determine the pitch measurement in each direction. The expanded uncertainties (k = 2) of the measured pitch values were less than 0.2 and 0.4 nm for each specimen, and the measured orthogonality values were less than $0.09^{\circ}$ and $0.05^{\circ}$, respectively. The experimental results measured using the MAFM and optical diffractometer agreed closely within the expanded uncertainty of the MAFM. We also propose an additional scheme for measuring 2-D gratings to increase the accuracy of calculated peak positions, which will be the subject of future study.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2016년도 제50회 동계 정기학술대회 초록집
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• pp.344.1-344.1
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• 2016

Recently, graphene has shown great characteristic of electrical conductivity, strength, and elasticity. However, due to edge unstable and metallic properties, it is difficult to use as a semiconductor devices. The solution of such problems has been sought a way to use the boron nitride in a stacked layer structure. By graphene and boron nitride stacked layer structure on silicon substrate, the electron mobility is improved and deteriorated results in semiconductor properties. In this study, to make layered structure, we developed direct synthesis method for graphene on boron nitride. By using Raman technique, the directly stacked layer structure is in good agreement with measurements on each of the attributes.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2013년도 제44회 동계 정기학술대회 초록집
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• pp.660-660
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• 2013

나노 구조를 가지는 무기물은 입자의 형상, 크기, 분산도, 다공성, 표면적 등에 따라 광학, 전기 및 물리적인 특성에 큰 영향을 준다. 특히 희토류 금속 중 가장 풍부한 원소인 Cerium의 산화물은 착색제, 자동차배기가스 정화촉매, 화학 공업 촉매, 유리 연마재, 반도체 장치, 자외선 흡착제, 발광재료 등 다양한 분야에서 활용이 되는 중요한 소재이다. 본 연구에서는 공통 이온효과를 이용하여 시간을 조절하여 Cerium hydroxide의 성장 과정을 연구 하였고, Ammonium chloride의 농도를 조절하여 수백 나노 미터에서 수 마이크로 미터까지 막대와 같은 Cerium hydroxide를 합성하였다. 이들 입자의 형상 및 물리화학적 특성을 FE-SEM, XRD, EDS, FT-IR 분석장비를 사용하여 확인하였다.

• 대한기계학회:학술대회논문집
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• 대한기계학회 2008년도 추계학술대회A
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• pp.1778-1783
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• 2008

A compact and two-dimensional atomic force microscope (AFM) using an orthogonal sample scanner, a calibrated homodyne laser interferometer and a commercial AFM head was developed for use in the nanometrology field. The x and y position of the sample with respect to the tip are acquired by using the laser interferometer in the open-loop state, when each z data point of the AFM head is taken. The sample scanner which has a motion amplifying mechanism was designed to move a sample up to $100{\times}100{\mu}m^2$ in orthogonal way, which means less crosstalk between axes. Moreover, the rotational errors between axes are measured to ensure the accuracy of the calibrated AFM within the full scanning range. The conventional homodyne laser interferometer was used to measure the x and y displacements of the sample and compensated via an X-ray interferometer to reduce the nonlinearity of the optical interferometer. The repeatability of the calibrated AFM was measured to sub-nm within a few hundred nm scanning range.

• Current Applied Physics
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• 제18권11호
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• pp.1196-1200
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• 2018

We have experimentally demonstrated circular polarization generation from linear polarized soft X-ray at synchrotron by adopting a thin magnetic film polarizer. Polarizer is composed of Co/Pt multilayer with a perpendicular magnetic anisotropy, which allows us to easily accommodate without needing any tilting angle into the measurement setup since the circular polarization is generated for the X-ray with normal incidence and transmission. Generated circular polarization is examined by observing magnetic domain features based on the X-ray magnetic circular dichroism, where~11% of circular component is estimated compared to the case of full circular polarization.

• 한국정밀공학회지
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• 제24권9호
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• pp.68-75
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• 2007

The pitch and orthogonality of two-dimensional (2D) gratings have been measured by using a metrological atomic force microscope (MAFM) and measurement uncertainty has been analyzed. Gratings are typical standard artifacts for the calibration of precision microscopes. Since the magnification and orthogonality in two perpendicular axes of microscopes can be calibrated simultaneously using 2D gratings, it is important to certify the pitch and orthogonality of 2D gratings accurately for nano-metrology using precision microscopes. In the measurement of 2D gratings, the MAFM can be used effectively for its nanometric resolution and uncertainty, but a new measurement scheme was required to overcome some limitations of current MAFM such as nonnegligible thermal drift and slow scan speed. Two kinds of 2D gratings, each with the nominal pitch of 300 nm and 1000 nm, were measured using line scans for the pitch measurement of each direction. The expanded uncertainties (k = 2) of measured pitch values were less than 0.2 nm and 0.4 nm for each specimen, and those of measured orthogonality were less than 0.09 degree and 0.05 degree respectively. The experimental results measured using the MAFM and optical diffractometer were coincident with each other within the expanded uncertainty of the MAFM. As a future work, we also proposed another scheme for the measurements of 2D gratings to increase the accuracy of calculated peak positions.