• 한국표면공학회지
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• 제39권2호
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• pp.64-69
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• 2006

Nanoscale task such as nanolithography and nanoindenting is a challenging work that is beyond the capabilities of human sensing and precision. Since surface forces and intermolecular forces dominate over gravitational and other more intuitive forces of the macro world at the nanoscale, a user is not familiar with these novel nanoforce effects. In order to overcome this scaling barrier, haptic interfaces that consist of visual and force feedback at the macro world have been used with an Atomic Force Microscope (AFM) as a manipulator at the nanoscale. In this paper, a nanoscale virtual coupling (NSVC) concept is introduced and the relationship between performance and impedance scaling factors of velocity (or position) and force are explicitly represented. Experiments have been performed for nanoindenting and nanolithography with different materials in the nanoscale virtual surface. The interaction forces (non contact and contact nanoforces) between the AFM tip and the nano sample are transmitted to the operator through the haptic interface.

• 대한전자공학회:학술대회논문집
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• 대한전자공학회 2006년도 하계종합학술대회
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• pp.641-642
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• 2006

Two-dimensional (2D) photonic quasicrystals (PQCs) were fabricated by a holographic nanolithography techniques. Using two laser beams with different angles incident on the sample, micro-cavities with 2D internal nanostructures are patterned with a few micrometer periods.

• Macromolecular Research
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• 제15권3호
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• pp.263-266
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• 2007

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2005년도 하계학술대회 논문집 Vol.6
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• pp.381-383
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• 2005

바이오센서 응용을 위한 대칭 및 비대칭 마하젠더 간섭계 광도파로 소자의 설계, 제작 및 광학적 응답특성을 평가하였다. 설계 제작된 광도파로 소자의 압력광원은 각각 1550nm와 632.8nm이고, 코어와 클래딩의 굴절률차는 0.45 $\Delta$%로 설계 제작하였다. 센서부(상위 클래드)의 금 박막의 미소 굴절률 변화에 따른 TE, TM모드의 특성을 분석하였다. 센서의 보다 높은 감도 개선을 위한 나노-광자결정 구조가 주목받고 있는데, 광자결정 구조의 구현를 위한 리소그래피 공정은 높은 분해능과 신뢰성 있는 나노스케일의 공정이 요구된다. 광-바이오센서의 감도 개선을 위해 센서부 표면에 2차원 나노-광자결정 배열을 제안하고 이를 구현하기 위한 Dip-Pen Nanolithography 공정에 대해 고찰하였다.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2001년도 창립10주년 제20회 학술발표회
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• pp.29-30
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• 2001

• 한국유체기계학회 논문집
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• 제9권2호
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• pp.19-24
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• 2006

Nano fountain-pen is a novel device to make the constant patterning in micro process using new designed probe. Fountain-pen nanolithography (FPN) is applied for constant supply of liquid in conjunction of patterns and surface variation in the micro process. In this study, nuo fountain-pen is composed with reservoir, micro channels, tip and scondary chamber. Instead of traditional method only using capillary force, liquid can be definitely and exactly injected with membrane pumping by the repulse force of tip. It is dfficult to perform experiments in the micro range so that we carried out a numerical analysis for internal flow, using a commercial code, FlUENT, The velocity, pressure and flow rate are obtained under laminar, unsteady, three-dimensional incompressible flow with no-slip condition, and results are graphically described.

• Bulletin of the Korean Chemical Society
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• 제34권12호
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• pp.3790-3794
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• 2013

Molecular dynamics simulations were performed to study the structure and stability of a nanoscale self-assembled monolayer (SAM) of alkanethiol on a gold (111) surface. The tilt angle and orientational order of the alkyl chains in the SAM island were examined by systematically varying the size of the island. The chain length dependence of the SAM island was examined by considering alkanethiols containing 12, 16, 20, and 24 carbon atoms. The minimum diameter of SAM islands made from 1-tetracosanethiol, 1-ecosanethiol, 1-hexadecanethiol and 1-dodecanethiol were 2.29, 1.9, 4.7 and 4.76 nm, respectively. These set the ultimate resolution that can be patterned by soft nanolithography. As the length of alkanethiol increases, the SAM islands became more ordered in both orientation and conformation of the alkyl chains.

• 반도체디스플레이기술학회지
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• 제6권3호
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• pp.25-33
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• 2007

A computationally efficient and accurate Monte Carlo (MC) simulator of electron beam lithography process, which is named SCNU-EBL, has been developed for semiconductor nanometer pattern design and fabrication. The simulator is composed of a MC simulation model of electron trajectory into solid targets, an Gaussian-beam exposure simulation model, and a development simulation model of photoresist using a string model. Especially for the trajectories of incident electrons into the solid targets, the inner-shell electron scattering of an target atom and its discrete energy loss with an incident electron is efficiently modeled for multi-layer resists and heterogeneous multi-layer targets. The simulator was newly applied to the development profile simulation of ZEP520 positive photoresist for NGL(Next-Generation Lithography). The simulation of ZEP520 for electron-beam nanolithography gave a reasonable agreement with the SEM experiments of ZEP520 photoresist.

• 한국표면공학회지
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• 제47권6호
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• pp.362-367
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• 2014

We report the design, fabrication of a $Si_3N_4$ probe and calculation of its mechanical properties for DPN(dip pen nanolithography), which consists of dual tips. Concept of dual tip probe is to employ individual tips on probe as either an AFM tip for imaging or a writing tip for nano patterning. For this, the dual tip probe is fabricated using low residual stress $Si_3N_4$ material with LPCVD deposition and MEMS fabrication process. On the basis of FEM analysis we show that the functionality of dual tip probe for imaging is dependent on the dimensions of dual tip probe, and high ratio of widths of beam areas is preferred to minimize curvature variation on probe.

• 한국정밀공학회:학술대회논문집
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• 한국정밀공학회 2003년도 추계학술대회 논문요약집
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• pp.251-251
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• 2003