• Title/Summary/Keyword: Nanolithography

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Nanoscale Fabrication in Aqueous Solution using Tribo-Nanolithography (Tribo-Nanolithography 를 이용한 액중 나노가공기술 개발)

  • 박정우;이득우
    • Proceedings of the Korean Society of Precision Engineering Conference
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    • 2004.10a
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    • pp.1315-1318
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    • 2004
  • Nano-scale fabrication of silicon substrate in an aqueous solution based on the use of atomic force microscopy was demonstrated. A specially designed cantilever with diamond tip, allowing the formation of damaged layer on silicon substrate easily by a simple scratching process (Tribo-Nanolithography, TNL), has been applied instead of conventional silicon cantilever for scanning. A slant nanostructure can be fabricated by a process in which a thin damaged layer rapidly forms in the substrate at the diamond tip-sample junction along scanning path of the tip and simultaneously the area uncovered with the damaged layer is being etched. This study demonstrates how the TNL parameters can affect the formation of damaged layer and the shape of 3-D structure, hence introducing a new process of proximal nanolithography in aqueous solution.

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Nanoscale Fabrication in Aqueous Solution using Tribo-Nanolithography (Tribo-Nanolithography를 이용한 액중 나노가공기술 개발)

  • Park Jeong Woo;Lee Deug Woo;Kawasegi Noritaka;Morita Noboru
    • Journal of the Korean Society for Precision Engineering
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    • v.22 no.2
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    • pp.194-201
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    • 2005
  • Nanoscale fabrication of silicon substrate in an aqueous solution based on the use of atomic force microscopy was demonstrated. A specially designed cantilever with diamond tip, allowing the formation of damaged layer on silicon substrate easily by a simple scratching process (Tribo-Nanolithography, TNL), has been applied instead of conventional silicon cantilever for scanning. A slant nanostructure can be fabricated by a process in which a thin damaged layer rapidly forms in the substrate at the diamond tip-sample junction along scanning path of the tip and simultaneously the area uncovered with the damaged layer is being etched. This study demonstrates how the TNL parameters can affect the formation of damaged layer and the shape of 3-D structure, hence introducing a new process of AFM-based nanolithography in aqueous solution.

Nanoscale Fabrication in Aqueous Solution using Tribo-Nanolithography

  • Park, Jeong-Woo;Lee, Deug-Woo;Kawasegi, Noritaka;Morita, Noboru
    • International Journal of Precision Engineering and Manufacturing
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    • v.7 no.4
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    • pp.8-13
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    • 2006
  • Nanoscale fabrication of silicon substrate in an aqueous solution based on the use of atomic force microscopy was demonstrated. A specially designed cantilever with a diamond tip, allowing the formation of a mask layer on the silicon substrate by a simple scratching process (Tribo-Nanolithography, TNL), has been applied instead of the conventional silicon cantilever for scanning. A slant nanostructure can be fabricated by a process in which a thin mask layer rapidly forms on the substrate at the diamond tip-sample junction along scanning path of the tip, and simultaneously, the area uncovered with the mask layer is etched. This study demonstrates how the TNL parameters can affect the formation of the mask layer and the shape of 3-D structure, hence introducing a new process of AFM-based nanolithography in aqueous solution.

Etch Resistance of Mask Layer modified by AFM-based Tribo-Nanolithography in Aqueous Solution (AFM 기반 액중 Tribo nanolithography 에서의 마스크 층 내식각성에 관한 연구)

  • Park Jeong-Woo;Lee Deug-Woo;Kawasegi Noritaka;Morita Noboru
    • Proceedings of the Korean Society of Precision Engineering Conference
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    • 2005.10a
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    • pp.268-271
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    • 2005
  • Etch resistance of mask layer on silicon substrate modified by AFM-based Tribo-Nanolithography (TNL) in Aqueous Solution in an aqueous solution was demonstrated. n consists or sequential processes, nano-scratching and wet chemical etching. The simple scratching can form a mask layer on the silicon substrate, which acting as an etching mask. For TNL, a specially designed cantilever with diamond tip, allowing the formation of mask layer on silicon substrate easily by a simple scratching process, has been applied instead of conventional silicon cantilever fur scanning. This study demonstrates how the TNL parameters can affect the etch resistance of mask layer, hence introducing a new process of AFM-based maskless nanolithography in aqueous solution.

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Nano Mechanics Analysis of Dislocation Nucleation and Interaction (전위의 생성 및 상호작용에 관한 나노 역학 해석)

  • Lee, Young-Min;Kim, Sung-Youb;Jun, Suk-Ky;Im, Se-Young
    • Proceedings of the KSME Conference
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    • 2004.04a
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    • pp.537-541
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    • 2004
  • Molecular dynamics simulation of nanolithography by AFM is conducted to study nucleation of various defects, and their subsequent development and interactions as well. During nanolithography via AFM, dislocation loops are emitted along the top surface, and resourceful defect interactions such as, formation of voids chain via the motion of a jog, and creations of extended nodes and Lomer-Cottrell Lock are observed.

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Random Walk Simulation for the Growth of Monolayer in Dip Pen Nanolithography

  • Kim, Hyojeong;Ha, Soojung;Jang, Joonkyung
    • Bulletin of the Korean Chemical Society
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    • v.34 no.1
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    • pp.164-166
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    • 2013
  • Using a simple random walk model, this study simulated the growth of a self-assembled monolayer (SAM) pattern generated by dip-pen nanolithography (DPN). In this model, the SAM pattern grew mainly via the serial pushing of molecules deposited from the tip. This study examined various SAM patterns, such as lines, crosses and letters, by changing the tip scan speed.

A Study on Dip-Pen Nanolithography Process to fabricate Two-dimensional Photonic Crystal for Planar-type Optical Biosensor (평판형 광-바이오센서용 2차원 광자결정 제작을 위한 Dip-Pen Nanolithography 공정 연구)

  • Kim Jun-Hyong;Lee Jong-Il;Lee Hyun-Yong
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.19 no.3
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    • pp.267-272
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    • 2006
  • Optical waveguide based on symmetric and asymmetric Mach-Zehnder interferometer(MZI) type was designed, fabricated and measured the optical characteristics for the application of biosensor. The wavelength of the input optical signal for the device was 1550 nm. And the difference of refractive index was $0.45\;{\Delta}\%$ between core and cladding of the device. The TM(Transverse Magnetic) mode optical properties of the biosensor were analyzed with the refractive index variation of gold thin film deposited for overclad. Nowadays, nano-photonic crystal structures have been paied much attention for its high optical sensitivity. There is a technique to realize the structure, which is called Dip-Pen Nanolithography(DPN) process. The process requires a nano-scale process patterning resolution and high reliability. In this paper, two dimensional nano-photonic crystal array on the surface was proposed for improving the sensitivity of optical biosensor. And the Dip-Pen Nanolithogrphy process was investigated to realize it.

Fabrication of Micro Diamond Tip Cantilever for AFM-based Tribo-Nanolithography (AFM 기반 Tribo-Nanolithography 를 위한 초미세 다이아몬드 팁 켄틸레버의 제작)

  • Park Jeong-Woo;Lee Deug-Woo
    • Journal of the Korean Society for Precision Engineering
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    • v.23 no.8 s.185
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    • pp.39-46
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    • 2006
  • Nano-scale fabrication of silicon substrate based on the use of atomic force microscopy (AFM) was demonstrated. A specially designed cantilever with diamond tip, allowing the formation of damaged layer on silicon substrate by a simple scratching process, has been applied instead of conventional silicon cantilever for scanning. A thin mask layer forms in the substrate at the diamond tip-sample junction along scanning path of the tip. The mask layer withstands against wet chemical etching in aqueous KOH solution. Diamond tip acts as a patterning tool like mask film for lithography process. Hence these sequential processes, called tribo-nanolithography, TNL, can fabricate 2D or 3D micro structures in nanometer range. This study demonstrates the novel fabrication processes of the micro cantilever and diamond tip as a tool for TNL using micro-patterning, wet chemical etching and CVD. The developed TNL tools show outstanding machinability against single crystal silicon wafer. Hence, they are expected to have a possibility for industrial applications as a micro-to-nano machining tool.

Study on the Deformation Characteristics of Grain Boundary in Nanolithography Process (분자동력학을 이용한 나노 리소그래피 공정의 결정립계의 변형 거동 연구)

  • Kim, Chan-Il;Hyun, Sang-Il;Kim, Young-Suk
    • Proceedings of the KSME Conference
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    • 2007.05a
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    • pp.326-331
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    • 2007
  • Large-scale molecular dynamics simulations are performed to verify the deformation characteristics of grain boundaries in nanolithography process. The copper substrate made of 200,000 atoms is constructed by two grains in different crystal orientations using dynamic relaxation method. The grain boundary is located in the middle of the substrate with $45\sim135$ degree angles. The plowing tip is made of diamond-like-carbon atoms in a variety of shapes. In the simulations, the generation, propagation, and accumulation of dislocations are observed inside the substrate. From the numerical results, we address the dynamic behavior of the grain boundaries as well as the frictional characteristics in terms of the morphology of initial grain boundaries.

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