Proceedings of the KSME Conference (대한기계학회:학술대회논문집)
- 2004.04a
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- Pages.537-541
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- 2004
Nano Mechanics Analysis of Dislocation Nucleation and Interaction
전위의 생성 및 상호작용에 관한 나노 역학 해석
- Published : 2004.04.28
Abstract
Molecular dynamics simulation of nanolithography by AFM is conducted to study nucleation of various defects, and their subsequent development and interactions as well. During nanolithography via AFM, dislocation loops are emitted along the top surface, and resourceful defect interactions such as, formation of voids chain via the motion of a jog, and creations of extended nodes and Lomer-Cottrell Lock are observed.
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