• Proceedings of the Materials Research Society of Korea Conference
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• 2007.11a
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• pp.138.2-138.2
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• 2007

• Journal of the Korean Vacuum Society
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• v.13 no.1
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• pp.39-45
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• 2004

Ultraviolet-nanoimprint lithography (UV-NIL) is a promising method for cost-effectively defining nanoscale structures at room temperature and low pressure. A 5${\times}$5${\times}$0.09 in. quartz stamp is fabricated using the etch process in which a Cr film was employed as a hard mask for transferring nanostructures onto the quartz plate. FAS(Fluoroalkanesilane) is used as a material for anti-adhesion surface treatment on the stamp and a thin organic film to improve adhesion on a wafer is formed by spin-coating. The low viscosity resin droplets with a nanometer scale volume are dispensed on the whole area of the coated wafer. The UV-NIL experiments have been performed using the EVG620-NIL. 370 nm - 1 m features on the stamp have been transferred to the thin resin layer on the wafer using the multi-dispensing method and UV-NIL process. We have measured the imprinted patterns and residual layer using SEM and AFM to evaluate the potential of the process.

• Korean Journal of Materials Research
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• v.15 no.9
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• pp.589-593
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• 2005

Nanoimprinting lithography (NIL) is known as a suitable technique for fabricating nano and micro structures of high definition. Hot embossing is one of NIL techniques and can imprint on thin films and bulk polymers. Key issues of hot embossing are time and expense needed to produce a stamp withstanding a high temperature and pressure. Fabrication of a metal stamp such as an electroplated nickel is cost intensive and time consuming. A ceramic stamp made by silicon is easy to break when the pressure is applied. In this paper, a plastic stamp using a high temperature epoxy was fabricated and tested. The plastic stamp was relatively inexpensive, rapid to produce and durable enough to withstanding multiple hot embossing cycles. The merits of low viscosity epoxy solutions were a fast degassing and a rapid filling the microstructures. The hot embossing process with plastic stamp was performed on PMMA substrates. The hot embossing was conducted at 12.6 bar, $120^{\circ}C$ and 10 minutes. An imprinted PMMA wafer was almost same value of the plastic stamp after 10 times embossing. Entire fabrication process from silicon master to plastic stamp was completed within 12 hours.

• 한국신재생에너지학회:학술대회논문집
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• 2009.06a
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• pp.187-187
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• 2009

나노 임프링과 전기 도금의 저렴한 방식을 이용하여 CdTe 나노 패턴형태를 제작하고자 한다. CdTe 박막은 CdTe 태양전지에서 광흡수층으로 광전자형성에 큰 영향을 미치는 층이다. 나노 패턴을 이용할 경우 p-n 접합 면적이 늘어나 여기된 전자-정공쌍이 분리를 더 잘 일으킬 수 있기 때문에 나노 임프린팅 이라는 기술을 이용하여 이를 제작해 보고자 한다. 따라서 이렇게 제작된 CdTe 나노 패턴은 XRD와 라만 기술을 이용하여 구조를 분석하고, 흡광도와 반사도를 측정하여 광 특성을 조사하려고 한다.

• Journal of the Korean Society for Precision Engineering
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• v.26 no.6
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• pp.30-35
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• 2009

• Proceedings of the Korean Society of Precision Engineering Conference
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• 2004.05a
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• pp.148-148
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• 2004

전 세계적으로 컴퓨터 및 이동통신의 급속한 발전과 함께 전자, 통신부품을 비롯한 각종 부품들의 초소형화, 고기능화가 요구되고 있다. 이러한 추세에 따라 수 $\mu\textrm{m}$ 의 크기와 수 nm의 정밀도를 갖는 MEMS기술과 NANO 기술에 대한 연구가 활발히 전개되고 있다 MEMS 기술의 경우기존의 생산, 가공 공정과는 완전히 다른 반도체공정을 기반으로 한 리소그래피(lithography) 기술이나 전기도금(electroplating) 등의 기존 기계공학적 생산, 가공 방법을 넘어선 기술을 사용하게 되며 NANO 기술 역시 분자, 원자 단위를 기초로 한 AFM(atomic force microscope) 기술과 임프린팅(nanoimprinting) 기술 등의 새로운 기술을 접목시키는 생산 방법을 사용한다.(중략)

• Proceedings of the Korean Society for Technology of Plasticity Conference
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• 2009.05a
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• pp.290-293
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• 2009

This paper presents the development of a disposable label-free biosensor for bio molecular interaction analysis. Label-free biosensors have advantages of high performance in sensitivity and short detection time. Among various label-free systems, we introduced biosensor with nano grating structures based on white light source and spectrometer. And to develop high efficiency label-free biosensor, we suggest replicating processes satisfying required specification. We also report a system set-up to evaluate the characteristics of phenomenon shown in this biosensor system.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.35 no.6
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• pp.547-555
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• 2022

Color conversion layer refers to a layer that converts the blue light emitted from the backlight into the red and green light. Heavy metal-free quantum dots and perovskite nanocrystals have attracted great attention as base materials for color conversion layers due to their outstanding optical characteristics. Here, we review recent advances in the development of color conversion layers based on quantum dots. First, we overview the representative optical characteristics of quantum dots and perovskite nanocrystals, and then introduce printing techniques for color converting layers including photolithography, inkjet printing, and nanoimprinting. Finally, we conclude this review with a brief perspective.

• Journal of the Korean Society of Manufacturing Process Engineers
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• v.16 no.1
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• pp.96-101
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• 2017

We have developed a compact desktop-sized nanopatterning system driven by the Roll-to-Roll (R2R) nanoimprinting (NIL) principle. The system realizes the continuous and high-speed stamping of various nanoscale patterns on a large-area flexible substrate without resorting to ponderous and complicated instruments. We first lay out the process principle based on continuous NIL on a UV-curable resin layer using a flexible nanopatterned mold. We then create conceptual and specific designs for the system by focusing on two key processes, imprinting and UV curing, which are performed in a continuous R2R fashion. We build a system with essential components and optimized modules for imprinting, UV curing, and R2R conveying to enable simple but effective nanopatterning within the desktop volume. Finally, we demonstrate several nanopatterning results such as nanolines and nanodots, which are obtained by operating the built desktop R2R NIL system on transparent and flexible substrates. Our system may be further utilized in the scalable fabrication of diverse flexible nanopatterns for many functional applications in optics, photonics, sensors, and energy harvesters.

• Particle and aerosol research
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• v.6 no.3
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• pp.131-138
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• 2010

Flexible electronics are the electronics on flexible substrates such as a plastic, fabric or paper, so that they can be folded or attached on any curved surfaces. They are currently recognized as one of the most innovating future technologies especially in the area of portable electronics. The conventional vacuum deposition and photolithographic patterning methods are well developed for inorganic microelectronics. However, flexible polymer substrates are generally chemically incompatible with resists, etchants and developers and high temperature processes used in conventional integrated circuit processing. Additionally, conventional processes are time consuming, very expensive and not environmentally friendly. Therefore, there are strong needs for new materials and a novel processing scheme to realize flexible electronics. This paper introduces current research trends for flexible electronics based on (a) nanoparticles, and (b) novel processing schemes: nanomaterial based direct patterning methods to remove any conventional vacuum deposition and photolithography processes. Among the several unique nanomaterial characteristics, dramatic melting temperature depression (Tm, 3nm particle~$150^{\circ}C$) and strong light absorption can be exploited to reduce the processing temperature and to enhance the resolution. This opens a possibility of developing a cost effective, low temperature, high resolution and environmentally friendly approach in the high performance flexible electronics fabrication area.