• 한국진공학회:학술대회논문집
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• 한국진공학회 2011년도 제40회 동계학술대회 초록집
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• pp.472-472
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• 2011

The capacitive coupled plasma (CCP) has been extensively used in the semiconductor industry because it has not only good uniformity, but also low electron temperature. But CCP source has some problems, such as difficulty in varying the ion bombardment energy separately, low plasma density, and high processing pressure, etc. In this reason, dual frequency CCP has been investigated with a separate substrate biasing to control the plasma parameters and to obtain high etch rate with high etch selectivity. Especially, in this study, we studied on the etching of $SiO_2$ by using the pulse-time modulation in the dual-frequency CCP source composed of 60 MHz/ 2 MHz rf power. By using the combination of high /low rf powers, the differences in the gas dissociation, plasma density, and etch characteristics were investigated. Also, as the size of the semiconductor device is decreased to nano-scale, the etching of contact hole which has nano-scale higher aspect ratio is required. For the nano-scale contact hole etching by using continuous plasma, several etch problems such as bowing, sidewall taper, twist, mask faceting, erosion, distortions etc. occurs. To resolve these problems, etching in low process pressure, more sidewall passivation by using fluorocarbon-based plasma with high carbon ratio, low temperature processing, charge effect breaking, power modulation are needed. Therefore, in this study, to resolve these problems, we used the pulse-time modulated dual-frequency CCP system. Pulse plasma is generated by periodical turning the RF power On and Off state. We measured the etch rate, etch selectivity and etch profile by using a step profilometer and SEM. Also the X-ray photoelectron spectroscopic analysis on the surfaces etched by different duty ratio conditions correlate with the results above.

• Elastomers and Composites
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• 제44권4호
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• pp.401-407
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• 2009

용액중합 스티렌-부타디엔 고무 컴파운드 가교체의 균열저항성 및 마모특성에 미치는 공정오일의 영향을 조사하기 위해 방향족 고리화합물(PCA) 성분을 다량 함유하고 있는 방향족 오일과 저 PCA 오일을 선택하였다. 인장강도 및 인열강도 결과에 의하면 방향족 오일함유 컴파운드가 저 PCA 오일함유 컴파운드에 비해 우수한 물성을 나타내었다. 또한 방향족 오일함유 컴파운드가 균열저항성이 월등히 우수하였고, 특히 인열에너지가 낮은 범위에서 더 우수한 결과를 나타내었다. 마모저항특성은 마찰에너지가 낮은 범위에서는 방향족 오일함유 컴파운드가 우수한 결과를 나타낸 반면, 높은 마찰에너지 범위에서는 저 PCA 오일 함유 컴파운드가 오히려 높은 저항성을 나타내었다.

• 한국분말재료학회지
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• 제11권3호
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• pp.202-209
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• 2004

In this study, nano-sized powder of Ni-ferrite was fabricated by spray pyrolysis process using the Fe-Ni complex waste acid solution generated during the shadow mask processing. The average particle size of the produced powder was below 100 nm. The effects of the reaction temperature, the inlet speed of solution and the air pressure on the properties of powder were studied. As the reaction temperature increased from 80$0^{\circ}C$ to 110$0^{\circ}C$, the average particle size of the powder increased from 40 nm to 100 nm, the fraction of the Ni-ferrite phase was also on the rise, and the surface area of the powder was greatly reduced. As the inlet speed of solution increased from 2 cc/min. to 10 cc/min., the average particle size of the powder greatly increased, and the fraction of the Ni-ferrite phase was on the rise. As the inlet speed of solution increased to 100 cc/min., the average particle size of the powder decreased slightly and the distribution of the particle size appeared more irregular. Along with the increase of the inlet speed of solution more than 10 cc/min., the fraction of the Ni-ferrite phase was decreased. As the air pressure increased up to 1 $kg/cm^2, the average particle size of the powder and the fraction of the Ni-ferrite phase was almost constant. In case of 3 $kg/cm^2 air pressure, the average particle size of the powder and the fraction of the Ni-ferrite phase remarkably decreased.

• Journal of Ceramic Processing Research
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• 제20권1호
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• pp.63-68
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• 2019

We investigated the effects of Al2O3 addition on (1-x)Li2B4O7-xAl2O3 (LBAO; x = 0, 0.005, 0.01, 0.05, 0.07, and 0.1) glasses. The glasses were synthesized by a conventional melt-quench method. Structural transformations of the LBAO glasses were assessed via X-ray diffraction analysis. Estimations of ΔT, KGS = (Tc-Tg)/(Tm-Tc), activation energy, and the Avrami parameter were performed using differential thermal analysis and differential scanning calorimetry. An interpretation of non-isothermal kinetics of the crystallization process is presented using the modified Ozawa equation. The activation energy E increased from 3.3 to 3.5 eV for the LBAO (x < 0.01) glasses whereas those of the LBAO (x > 0.05) glasses slightly increased from 3.75 to 4.05 eV. The exponent n was estimated to be 3.9 ± 0.1 for the LBAO (x < 0.01) glasses and 3.2 ± 0.02 for the LBAO (x > 0.05) glasses. Microstructural characterization of the glassy and crystalline phases using atomic force microscopy was investigated. The effects of Al2O3 on the LBAO glasses include a decreased nucleation rate in the crystallization process and a significantly reduced crystal size.

• 세라미스트
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• 제9권6호
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• pp.42-48
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• 2006

The structural ceramic, such as $A1_2O_3,\;ZrO_2\;and\;Si_3N_4$ have applied as several parts of precision machines, automotives and instruments for semiconductor. The mechanical properties depended on purity, morphology and microstructure of the ceramic and its fabrication process. High purity and fine starting powder for the structural ceramic was prepared mainly by wet process and powder processing such as milling, mixing, drying and granulating strongly influenced on the fabrication process. Powder processing included powder synthesis technology is essential for ceramic manufacture. Also, the advanced mechanical treat[neat in powder processing to create nano composite powder was developed to improve several properties of ceramic materials. Innovation of powder processing will lead to improve mechanical and functional properties of the ceramics.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2012년도 제43회 하계 정기 학술대회 초록집
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• pp.254-255
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• 2012

Interest in nano-crystalline silicon (nc-Si) thin films has been growing because of their favorable processing conditions for certain electronic devices. In particular, there has been an increase in the use of nc-Si thin films in photovoltaics for large solar cell panels and in thin film transistors for large flat panel displays. One of the most important material properties for these device applications is the macroscopic charge-carrier mobility. Hydrogenated amorphous silicon (a-Si:H) or nc-Si is a basic material in thin film transistors (TFTs). However, a-Si:H based devices have low carrier mobility and bias instability due to their metastable properties. The large number of trap sites and incomplete hydrogen passivation of a-Si:H film produce limited carrier transport. The basic electrical properties, including the carrier mobility and stability, of nc-Si TFTs might be superior to those of a-Si:H thin film. However, typical nc-Si thin films tend to have mobilities similar to a-Si films, although changes in the processing conditions can enhance the mobility. In polycrystalline silicon (poly-Si) thin films, the performance of the devices is strongly influenced by the boundaries between neighboring crystalline grains. These grain boundaries limit the conductance of macroscopic regions comprised of multiple grains. In much of the work on poly-Si thin films, it was shown that the performance of TFTs was largely determined by the number and location of the grain boundaries within the channel. Hence, efforts were made to reduce the total number of grain boundaries by increasing the average grain size. However, even a small number of grain boundaries can significantly reduce the macroscopic charge carrier mobility. The nano-crystalline or polymorphous-Si development for TFT and solar cells have been employed to compensate for disadvantage inherent to a-Si and micro-crystalline silicon (${\mu}$-Si). Recently, a novel process for deposition of nano-crystralline silicon (nc-Si) thin films at room temperature was developed using neutral beam assisted chemical vapor deposition (NBaCVD) with a neutral particle beam (NPB) source, which controls the energy of incident neutral particles in the range of 1~300 eV in order to enhance the atomic activation and crystalline of thin films at room temperature. In previous our experiments, we verified favorable properties of nc-Si thin films for certain electronic devices. During the formation of the nc-Si thin films by the NBaCVD with various process conditions, NPB energy directly controlled by the reflector bias and effectively increased crystal fraction (~80%) by uniformly distributed nc grains with 3~10 nm size. The more resent work on nc-Si thin film transistors (TFT) was done. We identified the performance of nc-Si TFT active channeal layers. The dependence of the performance of nc-Si TFT on the primary process parameters is explored. Raman, FT-IR and transmission electron microscope (TEM) were used to study the microstructures and the crystalline volume fraction of nc-Si films. The electric properties were investigated on Cr/SiO2/nc-Si metal-oxide-semiconductor (MOS) capacitors.

• 소성∙가공
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• 제14권8호통권80호
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• pp.696-703
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• 2005

In the modern days, a galvannealed sheet steel (GA) instead of a cold rolled steel sheet has been widely used as an alternative to extend the life of automotive body. Accordingly, the mechanical properties of GA for automobiles were taken into account and studied by examining their variation with annealing temperature. To clarify the effect of surface features on the mechanical and frictional properties of GA, the several tests such as nanoindentation, Vickers hardness and nano scratch test were executed. The frictional characteristics of coating layers of GA were examined through nano scratch test in this study. The friction coefficient of coating layers on the surface was obtained from the nano scratch. The variation of friction coefficient versus velocity and pressure was taken into consideration in this paper. Hardness and elastic modulus of coating layer were increased as increasing annealing temperature.

• Design & Manufacturing
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• 제14권1호
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• pp.36-41
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• 2020

Recently, due to the development of MEMS technology, researches for the production of effective micro structures and shapes have been actively conducted. However, the process technology based on chemical etching has a number of problems such as environmental pollution and time problems due to multi-process. Various processes to cope with this process are being studied, and one of the mechanical etching processes is the powder blasting process. This process is a method of spraying fine particles, which has the advantage of being an effective process in manufacturing hard brittle materials. However, it is also a process that adversely affects the material surface roughness and material properties due to the impact of the injection of fine particles. In this study, after fabricating micro-channels in fused silica glass with excellent optical properties among the hard brittle materials, we used the nano indentation system to analyze the micro parts using nano-particles as well as machinability and surface roughness analysis of the processed surface. The analysis was performed for the effective processing of powder blasting.

• 대한기계학회:학술대회논문집
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• 대한기계학회 2008년도 추계학술대회A
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• pp.1825-1828
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• 2008

A simple method for the fabrication of porous nano-master for antireflective surface is presented. In conventional fabrication methods for antireflective surface, coating method with low refractive index has usually been used. However, it is required to have high cost and long times for mass production. In this paper, we suggested the fabrication method of antireflective surface by the hot embossing process using the porous nano patterned master on silicon wafer fabricated by low-temperature anodic aluminum oxidation. Through multi-AAO and etching processes, nano patterned master with high aspect ratio was fabricated at the large area. Pore diameter and inter-pore distance are about 150nm and from 150 to 200nm. In order to replicate anti-reflective structure, hot embossing process was performed by varying the processing parameters such as temperature, pressure and embossing time etc. Finally, antireflective surface can be successfully obtained after etching process to remove selectively silicon layer of AAO master.

• 한국재료학회지
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• 제27권5호
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• pp.289-293
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• 2017

$Y_2Ti_2O_7$ nanoparticles (0.3 mol%) have been successfully synthesized by the co-precipitation process. The samples, adjusted to pH7 with ammonia solution as catalyst and calcined at $700{\sim}900^{\circ}C$, exhibit very fine particles with close to spherical shape and average size of 10-30 nm. It was possible to control the size of the synthesized $Y_2Ti_2O_7$ particles by manipulating the conditions. The $Y_2Ti_2O_7$ nanoparticles were coated on a glass substrate by a dipping coating process with inorganic binder. The $Y_2Ti_2O_7$ solution coated on the glass substrate had excellent adhesion of 5B; pencil hardness test results indicated an excellent hardness of 6H. The thickness of the thick film was about $30{\mu}m$. Decomposition of MB on the $Y_2Ti_2O_7$ thin film shows that the photocatalytic properties were excellent.