• 제목/요약/키워드: Nano-molding process

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나노 광 프로브 어레이 구현을 위한 광학 헤드 유닛 개발 (Development of Optical Head Unit for Nano Optical Probe Array)

  • 김홍민;임지석;김석민;한정원;강신일
    • 한국소성가공학회:학술대회논문집
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    • 한국소성가공학회 2005년도 금형가공,미세가공,플라스틱가공 공동 심포지엄
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    • pp.29-34
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    • 2005
  • A optical head unit for nano optical probe away was developed. The optical probe array is generated by Talbot effect. The shape and thickness of microlens array(MLA) were designed to minimize the spot size at the foci of MLA. To increase the optical efficiency of the system and obtain the large tolerance for fabrication, aperture size was theoretically optimized. Then microlens illuminated aperture array(MLIAA) as an optical head unit was fabricated using a ultra violet(UV) molding process on aluminum aperture array. In this process, Al aperture array was fabricated separately using the photolithography and reactive ion etching(RIE) process. Optical properties of the generated optical probes were measured and compared at Talbot distance from the aperture array having a diameter of $1{\mu}m$ and MLIAA.

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나노 복화(複畵)공정을 이용한 PDMS 스탬프 제작 (Fabrication of a PDMS (Poly-Dimethylsiloxane) Stamp Using Nano-Replication Printing Process)

  • 박상후;임태우;양동열;공홍진
    • 대한기계학회논문집A
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    • 제28권7호
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    • pp.999-1005
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    • 2004
  • A new stamp fabrication technique for the soft lithography has been developed in the range of several microns by means of a nano-replication printing (nRP) process. In the nRP process, a figure or a pattern can be replicated directly from a two-tone bitmap figure with nano-scale details. A photopolymerizable resin was polymerized by the two-photon absorption which was induced by a femtosecond laser. After the polymerization of master patterns, a gold metal layer (about 30 ㎚ thickness) was deposited on the fabricated master patterns for the purpose of preventing a join between the patterns and the PDMS, then the master patterns were transferred in order to fabricate a stamp by using the PDMS (poly-dimethylsiloxane). In the transferring process, a few of gold particles, which were isolated from the master patterns, remained on the PDMS stamp. A gold selective etchant, the potassium iodine (KI) was employed to remove the needless gold particles without any damage to the PDMS stamp. Through this work, the effectiveness of the nRP process with the PDMS molding was evaluated to make the PDMS stamp with the resolution of around 200 ㎚.

급속 금형가열 시스템 개발을 위한 고주파 유도가열 과정의 유한요소해석 (Finite Element Analysis of Induction Heating Process for Development of Rapid Mold Heating System)

  • 황재진;권오경;윤재호;박근
    • 소성∙가공
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    • 제16권2호
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    • pp.113-119
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    • 2007
  • Rapid mold heating has been recent issue to enable the injection molding of thin-walled parts or micro/nano structures. Induction heating is an efficient way to heat material by means of an electric current that is caused to flow through the material or its container by electromagnetic induction. It has various applications such as heat treatment, brazing, welding, melting, and mold heating. The present study covers a finite element analysis of the induction heating process which can rapidly raise mold temperature. To simulate the induction heating process, the electromagnetic field analysis and transient heat transfer analysis are required collectively. In this study, a coupled analysis connecting electromagnetic analysis with heat transfer simulation is carried out. The estimated temperature changes are compared with experimental measurements for various heating conditions.

자성연마슬러리를 이용한 초미립 초경합금(WC-Co 18%)의 나노급 경면가공 특성 (Machining Properties to Nano-Level Mirror Surface Finishing for Fine Grained WC-Co 18% Alloy using Magnetic Polishing Slurry)

  • 곽태수
    • 한국세라믹학회지
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    • 제46권1호
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    • pp.102-107
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    • 2009
  • This study has been focused on an effective surface finishing method combining ELID (ELectrolytic In-process Dressing) and MAP (Magnetic Assisted Polishing) for the nano-precision mirror grinding of glass-lens molding mould. ELID grinding is an excellent technique for mirror grinding of various advanced metallic or nonmetallic materials. A polishing process is also required for elimination of scratches present on ELID grinded surfaces. MAP has been used as polishing method due to its high polishing efficiency and superior surface quality. It also presents some techniques for achieving the nanometer roughness of the hard material such as WC-Co, which are extensively used in precision tooling material.

나노임프린트 리소그래피 적용을 위한 CHF3 플라즈마를 이용한 실리콘 몰드 표면 처리 특성 (A Study of the Silicon Mold Surface Treatment Using CHF3 Plasma for Nano Imprint Lithography)

  • 김용근;김재현;유반석;장지수;권광호
    • 한국전기전자재료학회논문지
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    • 제24권10호
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    • pp.790-793
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    • 2011
  • In this study, the surface modification for a silicon(Si) mold using $CHF_3$ inductively coupled plasma(ICP). The conditions under that plasma was treated a input ICP power 600 W, an operating gas pressure of 10 mTorr and plasma exposure time of 30 sec. The Si mold surface became hydrophobic after plasma treatment in order to $CF_x$(X= 1,2,3) polymer. However, as the de-molding process repeated, it was investigated that the contact angle of Si surface was decreased. So, we attempted to investigate the degradation mechanism of the accurate pattern transfer with increasing the count of the de-molding process using scanning electron microscope (SEM), contact angle, and x-ray photoelectron spectroscopy (XPS) analysis of Si mold surface.

Application of ta-C Coating on WC Mold to Molded Glass Lens

  • Lee, Woo-Young;Choi, Ju-hyun
    • Tribology and Lubricants
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    • 제35권2호
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    • pp.106-113
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    • 2019
  • We investigated the application of tetrahedral amorphous carbon (ta-C) coatings to fabricate a glass lens manufactured using a glass molding process (GMP). In this work, ta-C coatings with different thickness (50, 100, 150 and 200 nm) were deposited on a tungsten carbide (WC-Co) mold using the X-bend filter of a filtered cathode vacuum arc. The effects of thickness on mechanical and tribological properties of the coating were studied. These ta-C coatings were characterized by atomic force microscopy, scanning electron microscopy, nano-indentation measurements, Raman spectrometry, Rockwell-C tests, scratch tests and ball on disc tribometer tests. The nano-indentation measurements showed that hardness increased with an increase in coating thickness. In addition, the G-peak position in the Raman spectra analysis was right shifted from 1520 to $1586cm^{-1}$, indicating that the $sp^3$ content increased with increasing thickness of ta-C coatings. The scratch test showed that, compared to other coatings, the 100-nm-thick ta-C coating displayed excellent adhesion strength without delamination. The friction test was carried out in a nitrogen environment using a ball-on-disk tribometer. The 100-nm-thick ta-C coating showed a low friction coefficient of 0.078. When this coating was applied to a GMP, the life time, i.e., shot counts, dramatically increased up to 2,500 counts, in comparison with Ir-Re coating.

순차이송형 유리렌즈 성형공정에서 비구면 유리렌즈의 최적 성형조건 연구 (A Study on the Optimal Molding Conditions for Aspheric Glass Lenses in Progressive GMP)

  • 정태성;박규섭;윤길상
    • 한국산학기술학회논문지
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    • 제12권3호
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    • pp.1051-1057
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    • 2011
  • 최근 개발된 GMP공정의 활용으로 디지털 카메라, 광저장기기, 각종 전자기기 등의 광응용 기기에서 비구면 유리렌즈가 폭넓게 활용되고 있다. GMP공정은 복잡한 형상의 유리렌즈를 정밀하면서도 경제적으로 생산할 수 있다. 본 연구에서는 다구치 실험계획법을 이용하여 순차이송형 GMP공정에서 비구면 유리렌즈의 성형 조건을 최적화 하였다. 냉각 1단계에서의 압력과 온도, 시간을 3가지 주요 공정변수로 정하였으며, 3캐비티 금형을 이용하여 실험한 결과 순차이송형 유리렌즈 성형공정에서 냉각시간이 비구면 유리렌즈의 형상정밀도(PV)에 가장 큰 영향을 미치는 것을 알 수 있었다.

광학 마이크로 피라미드 패턴의 제조 및 광특성 해석 (Fabrication and analysis of optical micro-pyramid array-patterns)

  • 이재령;전은채;제태진;우상원;최두선;유영은;김휘
    • 한국기계가공학회지
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    • 제13권4호
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    • pp.7-12
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    • 2014
  • A transparent poly methyl methacrylate (PMMA) optical micro-pyramid array-pattern is designed and fabricated using an injection modeling technique. The device's optical characteristics are tested and analyzed theoretically. In the optical pattern generated using the fabricated PMMA pattern, the components, due to not only refraction but also diffraction, are observed simultaneously. Wave optic modeling and analysis reveals that the energy ratio between the diffraction and refraction in the optical pattern are dependent on the critical dimension of the optical pattern such that the refraction and diffraction tend to be directly and inversely proportional to the pattern dimension, respectively.

Monomer based thermally curable resin을 이용한 150nm 급 Soft-Lithography (Sub 150nm Soft-Lithography using the monomer based thermally curable resin)

  • 양기연;홍성훈;이헌
    • 한국정밀공학회:학술대회논문집
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    • 한국정밀공학회 2005년도 춘계학술대회 논문집
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    • pp.676-679
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    • 2005
  • Nano imprint Lithography (NIL) is regarded as one of the next-generation lithography technologies with EUV lithography, immersion lithography, Laser interference lithography. Because a Si wafer stamp and a quartz stamp, used to imprinting usually are very expensive and easily broken, it is suggested that master stamp is duplicated by PDMS and the PDMS stamp uses to imprint .For using the PDMS stamp, a thermally curable monomer resin was used for the imprinting process to lower pressure and temperature. As a result, NIL patterns were successfully fabricated.

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