• Journal of Ceramic Processing Research
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• 제19권6호
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• pp.479-482
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• 2018

Polystyrene superstructure films show faint rainbow color, and this low color saturation limits its wide application. In this paper, polystyrene superstructure films with single bright blue color were prepared by vertical deposition self-assembly method using polystyrene microspheres with average diameter of $310{\pm}10nm$ as raw material. Polystyrene superstructure films were modified by adding nano-carbon powder, and effect of the amount of nano-carbon powde on color performance was studied. The results showed that without addition of nano-carbon powder, the superstructure films showed a faint rainbow color, while with addition of nano-carbon power, the superstructure films exhibited a single bright blue under the same natural light source. Changing the amount of nano-carbon powder addition could adjust color saturation of the film. With increasing the amount of nano-carbon powder addition from 0.008 wt% to 0.01 wt%, color saturation of the superstructure film increased gradually. Further increasing the amount of nano-carbon powder addition to 0.011wt%, color saturation of the superstructure film didn't increase anymore and tended to get dark.

• 한국재료학회:학술대회논문집
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• 한국재료학회 2003년도 춘계학술발표강연 및 논문개요집
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• pp.88-88
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• 2003

Optical Emission Spectroscopy(OES) is a very important technology for real-time monitoring of plasma in a reactor during dry etching process. OES technology is non-invasive to the plasma process. It can be used to collect information on excitation and recombination between electrons and ions in the plasma. It also helps easily diagnose plasma intensity and monitor end-point during plasma etch processing. We studied high density planar inductively coupled BCl$_3$ and BCl$_3$/Ar plasma with an OES as a function of processing pressure, RIE chuck power, ICP source power and gas composition. The scan range of wavelength used was from 400 nm to 1000 nm. It was found that OES peak Intensity was a strong function of ICP source power and processing pressure, while it was almost independent on RIE chuck power in BCl$_3$-based planar ICP processes. It was also worthwhile to note that increase of processing pressure reduced negatively self-induced dc bias. The case was reverse for RIE chuck power. ICP power and gas composition hardly had influence on do bias. We will report OES results of high density planar inductively coupled BCl$_3$ and BCl$_3$/Ar Plasma in detail in this presentation.

• 한국자기학회:학술대회 개요집
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• 한국자기학회 2004년도 동계학술연구발표회 논문개요집
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• pp.31-32
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• 2004

• 한국자기학회:학술대회 개요집
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• 한국자기학회 2006년도 임시총회 및 하계학술연구발표회
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• pp.10-11
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• 2006

• 한국자기학회:학술대회 개요집
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• 한국자기학회 2006년도 동계학술연구발표회 및 자성 스핀트로닉스 국제학술대회
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• pp.80-81
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• 2006

• 한국자기학회:학술대회 개요집
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• 한국자기학회 2007년도 The 1st International Symposium on Advanced Magnetic Materials
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• pp.220.1-220.1
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• 2007

• 한국자기학회:학술대회 개요집
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• 한국자기학회 2007년도 The 1st International Symposium on Advanced Magnetic Materials
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• pp.125.2-125.2
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• 2007

• 한국진공학회:학술대회논문집
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• 한국진공학회 2007년도 제32회 학술대회 초록집
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• pp.149-149
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• 2007

• Bulletin of the Korean Chemical Society
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• 제32권4호
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• pp.1415-1418
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• 2011

• 한국진공학회:학술대회논문집
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• 한국진공학회 2009년도 제37회 하계학술대회 초록집
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• pp.101-101
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• 2009