• Title/Summary/Keyword: Nano-Plasma

Search Result 641, Processing Time 0.028 seconds

Recent Study of Thermal Spray for Green Automotive Industry (친환경 자동차산업의 용사(Thermal spray)에 대한 최신 연구동향)

  • Yoo, Ho-Cheon
    • Journal of Welding and Joining
    • /
    • v.32 no.3
    • /
    • pp.43-52
    • /
    • 2014
  • Recent developing tendency of thermal spray for green automotive industry are studied by searching of NDSL, KIPRIS, ScienceDirect and so on. Spraying techniques such as plasma spray, microwave treatment, dry-ice blasting, HVOF thermal spray, cold spraying, aerosol deposition are introduced, further more spraying materials such as nano particles, intermetallic compound, TiAlN, TiC, Si-Al alloys are investigated.

Growth of nickel-catalyzed carbon nanofibers using MPCVD method and their electrical properties

  • Kim, Sung-Hoon
    • Journal of the Korean Crystal Growth and Crystal Technology
    • /
    • v.14 no.1
    • /
    • pp.1-5
    • /
    • 2004
  • Carbon nanofilaments were formed on silicon substrate via microwave plasma-enhanced chemical vapor deposition method. The structure of carbon nanofilaments was identified as the carbon nanofibers. The extent of carbon nanofibers growth and the diameters of carbon nanofibers increased with increasing the total pressure. The growth direction of carbon nanofibers was horizontal to the substrate. Laterally grown carbon nanofibers showed the semiconductor electrical characteristics.

Competitive Growth of Carbon Nanotubes versus Carbon Nanofibers

  • Kim, Sung-Hoon
    • Journal of the Korean Ceramic Society
    • /
    • v.40 no.12
    • /
    • pp.1150-1153
    • /
    • 2003
  • Carbon nanofilaments were formed on silicon substrate using microwave plasma-enhanced chemical vapor deposition method. The structures of carbon nanofilaments were identified as carbon nanotubes or carbon nanofibers. The formation of bamboo-like carbon nanotubes was initiated by the application of the bias voltage during the plasma reaction. The growth kinetics of bamboo-like carbon nanotubes increased with increasing the bias voltage. The growth direction of bamboo-like carbon nanotubes was vertical to the substrate.

High-temperature oxidation of Ti3(Al,Si)C2 nano-laminated compounds in air

  • Lee, Hwa-Shin;Lee, Dong-Bok
    • Proceedings of the Korean Institute of Surface Engineering Conference
    • /
    • 2007.11a
    • /
    • pp.147-148
    • /
    • 2007
  • The compound, Ti3(Al,Si)C2, was synthesized by hot pressing a powder mixture of TiCX, Al and Si. Its oxidation at 900 and 1000 oC in air for up to 50 h resulted in the formation of rutile-TiO2, -Al2O3 and amorphous SiO2. During oxidation, Ti diffused outwards to form the outer TiO2 layer, and oxygen was transported inwards to form the inner mixed layer.

  • PDF

Selective etching of SiO2 using embedded RF pulsing in a dual-frequency capacitively coupled plasma system

  • Yeom, Won-Gyun;Jeon, Min-Hwan;Kim, Gyeong-Nam;Yeom, Geun-Yeong
    • Proceedings of the Korean Vacuum Society Conference
    • /
    • 2015.08a
    • /
    • pp.136.2-136.2
    • /
    • 2015
  • 반도체 제조는 chip의 성능 향상 및 단가 하락을 위해 지속적으로 pattern size가 nano size로 감소해 왔고, capacitor 용량은 증가해 왔다. 이러한 현상은 contact hole의 aspect ratio를 지속적으로 증가시킨바, 그에 따라 최적의 HARC (high aspect ratio contact)을 확보하는 적합한 dry etch process가 필수적이다. 그러나 HARC dry etch process는 많은 critical plasma properties 에 의존하는 매우 복잡한 공정이다. 따라서, critical plasma properties를 적절히 조절하여 higher aspect ratio, higher etch selectivity, tighter critical dimension control, lower P2ID과 같은 plasma characteristics을 확보하는 것이 요구된다. 현재 critical plasma properties를 제어하기 위해 다양한 plasma etching 방법이 연구 되어왔다. 이 중 plasma를 낮은 kHz의 frequency에서 on/off 하는 pulsed plasma etching technique은 nanoscale semiconductor material의 etch 특성을 효과적으로 향상 시킬 수 있다. 따라서 본 실험에서는 dual-frequency capacitive coupled plasma (DF-CCP)을 사용하여 plasma operation 동안 duty ratio와 pulse frequency와 같은 pulse parameters를 적용하여 plasma의 특성을 각각 제어함으로써 etch selectivity와 uniformity를 향상 시키고자 하였다. Selective SiO2 contact etching을 위해 top electrode에는 60 MHz pulsed RF source power를, bottom electrode에는 2MHz pulse plasma를 인가하여 synchronously pulsed dual-frequency capacitive coupled plasma (DF-CCP)에서의 plasma 특성과 dual pulsed plasma의 sync. pulsing duty ratio의 영향에 따른 etching 특성 등을 연구 진행하였다. 또한 emissive probe를 통해 전자온도, OES를 통한 radical 분석으로 critical Plasma properties를 분석하였고 SEM을 통한 etch 특성분석과 XPS를 통한 표면분석도 함께 진행하였다. 그 결과 60%의 source duty percentage와 50%의 bias duty percentage에서 가장 향상된 etch 특성을 얻을 수 있었다.

  • PDF

Investigation on nanoadhesive bonding of plasma modified titanium for aerospace application

  • Ahmed, Sabbir;Chakrabarty, Debabrata;Mukherjee, Subroto;Joseph, Alphonsa;Jhala, Ghanshyam;Bhowmik, Shantanu
    • Advances in aircraft and spacecraft science
    • /
    • v.1 no.1
    • /
    • pp.1-14
    • /
    • 2014
  • Physico-chemical changes of the plasma modified titanium alloy [Ti-6Al-4V] surface were studied with respect to their crystallographic changes by X-Ray Diffraction (XRD) and Scanning Electron Microscope (SEM).The plasma-treatment of surface was carried out to enhance adhesion of high performance nano reinforced epoxy adhesive, a phenomenon that was manifested in subsequent experimental results. The enhancement of adhesion as a consequence of improved spreading and wetting on metal surface was studied by contact angle (sessile drop method) and surface energy determination, which shows a distinct increase in polar component of surface energy. The synergism in bond strength was established by analyzing the lap-shear strength of titanium laminate. The extent of enhancement in thermal stability of the dispersed nanosilica particles reinforced epoxy adhesive was studied by Thermo Gravimetric Analysis (TGA), which shows an increase in onset of degradation and high amount of residuals at the high temperature range under study. The fractured surfaces of the joint were examined by Scanning electron microscope (SEM).

Dentinal Tubules Occluding Effect Using Nonthermal Atmospheric Plasma

  • Lee, Chang Han;Kim, Young Min;Kim, Gyoo Cheon;Kim, Shin
    • International Journal of Oral Biology
    • /
    • v.43 no.2
    • /
    • pp.83-91
    • /
    • 2018
  • Nonthermal atmospheric plasma has been studied for its many biomedical effects, such as tooth bleaching, wound healing, and coagulation. In this study, the effects of dentinal tubules occlusion were investigated using fluoride-carboxymethyl cellulose (F-CMC) gel, nano-sized hydroxyapatite (n-HA), and nonthermal atmospheric plasma. Human dentin specimens were divided to 5 groups (group C, HA, HAF, HAP, and HAFP). Group HA was treated with n-HA, group HAF was treated with n-HA after a F-CMC gel application, group HAP was treated with n-HA after a plasma treatment and group HAFP was treated with n-HA after a plasma and F-CMC gel treatment. The occlusion of dentinal tubules was investigated using scanning electron microscopy (SEM) and energy dispersive x-ray spectroscopy (EDS), which shows Ca/P ratio. In the EDS results, a higher Ca/P ratio was shown in the groups including n-HA than in the control group. The specimens of group HAP and HAFP had a higher Ca/P ratio in retentivity. In the SEM results, there was not a significant difference in the amount of times applied. Therefore, this study suggests F-CMC gel and n-HA treatment using nonthermal atmospheric plasma will be a new treatment method for decreasing hypersensitivity.

High quality fast growth nano-crystalline Si film synthesized by UHF assisted HF-PECVD

  • Kim, Youn-J.;Choi, Yoon-S.;Choi, In-S.;Han, Jeon-G.
    • Proceedings of the Korean Vacuum Society Conference
    • /
    • 2010.08a
    • /
    • pp.306-306
    • /
    • 2010
  • A high density (> $10^{11}\;cm^{-3}$) and low electron temperature (< 2 eV) plasma is produced by using a conventional HF (13.56 MHz) plasma enhanced chemical vapor deposition (PECVD) with an additional ultra high frequency (UHF, 314 MHz) plasma source utilizing two parallel antenna assembly. It is applied for the high rate synthesis of high quality nanocrystalline silicon (nc-Si) films. A high deposition rate of 1.8 nm/s is achieved with a high crystallinity (< 70%), a low spin density (< $3{\times}10^{16}\;cm^{-3}$) and a high light soaking stability (< 1.5). Optical emission spectroscopy measurements reveal emission intensity of $Si^*$ and $SiH^*$, intensity ratio of $H{\alpha}/Si^*$ and $H{\alpha}/SiH^*$ which are closely related to film deposition rate and film crystallinity, respectively. A high flux of precursor and atomic hydrogen which are produced by an additional high excitation frequency is effective for the fast deposition of highly crystallized nc-Si films without additional defects.

  • PDF

Superb Mechanical Stability of n-Octadecyltriethoxysilane Monolayer Due to Direct Chemical Bonds between Silane Headgroups and Mica Surface: Part II

  • Kim, Sungsoo
    • Journal of Integrative Natural Science
    • /
    • v.3 no.2
    • /
    • pp.96-102
    • /
    • 2010
  • It is still controversial where the improved stability of n-octadecyltriethoxysilane self-assembled monolayer (OTE SAM) on plasma-pretreated mica surface exactly originates from. To date, it has been well known that the extensive cross-polymerization between silane headgroups is a crucial factor for the outstanding mechanical strength of the monolayer. However, this study directly observed that the stability comes not only from the cross-links but also, far more importantly, from the direct chemical bonds between silane headgroups and mica surface. To observe this phenomenon, n-octadecyltrichlorosilane monolayers were self-assembled on both untreated and plasma treated mica surfaces, and their adhesion properties at various stress conditions and force profiles in pure water were investigated and compared through the use of the surface forces apparatus technique. It revealed that, in pure water, there is a substantial difference of stability between untreated and plasma treated cases and the plasma treated surface is mechanically much more stable. In particular, the protrusion behavior of the monolayer during contact repetition experiment was always observed in the untreated case, but never in the plasma treated case. It directly demonstrates that the extensive chemical bonds indeed exist between silane head-groups and plasma treated mica surface and dramatically improve the mechanical stability of the OTE monolayer-coated mica substrate.