• Journal of the Korean Society for Heat Treatment
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• v.24 no.3
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• pp.127-132
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• 2011

The silicon-containing Diamond-like Carbon (Si-DLC) film as an low friction coefficient coating has especially treated a different silicon content by plasma-enhanced chemical vapor deposition (PECVD) process at $500^{\circ}C$ on nitrided-STD 11 mold steel with (TMS) gas flow rate. The effects of variable silicon content on the Si-DLC films were tested with relative humidity of 5, 30 and 85% using a ball-on-disk tribometer. The wear-tested and original surface of Si-DLC films were analysed for an understanding of physical and chemical characterization, including a changing structure, via Raman spectra and nano hardness test. The results of Raman spectra have inferred a changing intra-structure from dangling bonds. And high silicon containing DLC films have shown increasing carbon peak ratio ($I_D/I_G$) values and G-peak values. In particular, the tribological tested surface of Si-DLC was shown the increasing hardness value in proportional to TMS gas flow rate. Therefore, at same time, the structure of the Si-DLC film was changed to a different intra-structure and increased hardness film with mechanical shear force and chemical reaction.

• Polymer(Korea)
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• v.30 no.5
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• pp.407-411
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• 2006

The SiC-based ceramic nanopatterns were prepared by placing polydimethylsiloxane (PDMS) mold from DVD master on the spincoated polyvinylsilaeane (PVS) or allylhydridopolycaybosilane (AHPCS) as ceramic precursors to fabricate line pattern via UV-nanoimprint lithography (UV-NIL), and subsequent pyrolysis at $800^{\circ}C$ in nitrogen atmosphere. As the dimensional change of polymeric and ceramic patterns was comparatively investigated by AFM and SEM, the shrinkage in height was 38.5% for PVS derived pattern and 24.1% for AHPCS derived pattern while the shrinkage in width was 18.8% for PVS and 16.7% for AHPCS. It indicates that higher ceramic yield of the ceramic precursor resulted in less shrinkage, and the strong adhesion between the substrate and the pattern caused anisotropic shrinkage. This preliminary work suggests that NIL is a promissing route for fabricating ceramic MEMS devices, with the development on the shrinkage control.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.31 no.4
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• pp.267-271
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• 2018

A high directivity TIR (total internal reflection) lens in the UV-A region was designed using a silicone resin, and a UV light source module with a maximum irradiation density of $150mW/cm^2$ was fabricated. The beam angle of the TIR lens was designed to be $8.04^{\circ}$ and the maximum diameter of the TIR lens was Ø13.5. A silicone resin having a UV transmittance of 93% and a refractive index of 1.4 at a wavelength of 365 nm was used, and the lens was manufactured using an aluminum mold, from which silicone could be easily released. The module was fabricated in a metal printed circuit board of COB (chip on board) type using a $0.75{\times}0.75mm^2$ UV chip. A jig was used to adjust the focal length between lens and chip and to fix the position of the lens. The optical characteristics such as illumination distributions of the lens and module were designed using 'LightTools' optical simulation software. The heat dissipation system was designed to use a forced-air cooling method using a heat-sink and fan.

• Journal of the Korean institute of surface engineering
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• v.38 no.3
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• pp.126-135
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• 2005

SKD 11 steel has been widely used for tools, metallic mold and die for press working because of its favorable mechanical properties such as high toughness and creep strength as well as excellent oxidation resistance. The ion nitrided tool steel containing Mo results in improvement of corrosion resistance, strength at high temperature and pitting resistance, especially in $Cl^-$ contained environment. But the Mo addition causes a disadvantage such as lower oxidation resistance at elevated temperature. In this study, several effects of ion-disadvantage on the oxidation characteristics for SKD 11 steel with various oxidation temperature were investigated. SKD 11 steels were manufactured by using vacuum furnace and solutionized for 1 hr at $1,050^{\circ}C$. Steel surface was ion nitrided at $500^{\circ}C$ for 1 hr and 5 hr by ion nitriding equipment. ion nitrided specimen were investigated by SEM, OM and hardness tester. Oxidation was carried out by using muffle furnace in air at $500^{\circ}C,\;700^{\circ}C\;and\;900^{\circ}C$ for 1hr, respectively. Oxidation behavior of the ion nitrided specimen was investigated by SEM, EDX and surface roughness tester. The conclusions of this study are as follows: It was found that plasma nitriding for 5 hr at $500^{\circ}C$, compared with ion nitriding for 1 hr at $500^{\circ}C$, had a thick nitrided layer and produced a layer with good wear, corrosion resistance and hardness as nitriding time increased. Nitrided SKD 11 alloy for 1hr showed that wear resistance and hardness decreased, whereas surface roughness increased, compared with nitrided SKD 11 alloy for 5 hr. The oxidation surface at $900^{\circ}C$ showed a good corrosion resistance.

• Korean Journal of Materials Research
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• v.15 no.9
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• pp.589-593
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• 2005

Nanoimprinting lithography (NIL) is known as a suitable technique for fabricating nano and micro structures of high definition. Hot embossing is one of NIL techniques and can imprint on thin films and bulk polymers. Key issues of hot embossing are time and expense needed to produce a stamp withstanding a high temperature and pressure. Fabrication of a metal stamp such as an electroplated nickel is cost intensive and time consuming. A ceramic stamp made by silicon is easy to break when the pressure is applied. In this paper, a plastic stamp using a high temperature epoxy was fabricated and tested. The plastic stamp was relatively inexpensive, rapid to produce and durable enough to withstanding multiple hot embossing cycles. The merits of low viscosity epoxy solutions were a fast degassing and a rapid filling the microstructures. The hot embossing process with plastic stamp was performed on PMMA substrates. The hot embossing was conducted at 12.6 bar, $120^{\circ}C$ and 10 minutes. An imprinted PMMA wafer was almost same value of the plastic stamp after 10 times embossing. Entire fabrication process from silicon master to plastic stamp was completed within 12 hours.

• Journal of Ocean Engineering and Technology
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• v.32 no.6
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• pp.502-510
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• 2018

In order to accumulate data to lower the friction coefficient of a press mold, tribological tests were performed before and after coating SM45C with a PVC/PO film and plasma coating (CrN, concept). The ultrasonic nanocrystal surface modification (UNSM)-treated material had a nano-size surface texture, high surface hardness, and large and deep compressive residual stress formation. Even when the load was doubled, the small amount of abrasion, small weight of the abrasion, and width and depth of the abrasion did not increase as much as those of untreated materials. A comparison of the weight change before and after the tribological test with the CrN and the concept coating material and that of the untreated material showed that the wear loss of the concept coating material and P-UNSM treated material (that is, the UNSM treated material treated with the concept coating) showed a tendency to decrease by approximately 55-75%. Concept 100N had a lower friction coefficient of about 0.6, and P-UNSM-30-100N showed almost the same curve as concept 100N and had a low coefficient of friction of about 0.6. The concept multilayer coating had a thickness of $5.32{\mu}m$. In the beginning, the coefficient of friction decreased because of the plasma coating, but it started to increase from about 250-300 s. After about 350 s, the coefficient of friction tended to approach the friction coefficient of the SM45C base metal. The SGV-280F film-attached test specimen was slightly pushed back and forth, but the SM45C base material was not exposed due to abrasion. The friction coefficient was 0.22, which was the lowest, and the tribological property was the best in this study.

• Progress in Superconductivity and Cryogenics
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• v.21 no.2
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• pp.40-44
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• 2019

In this study, the effects of the compaction method for (Mg+2B) powders on the apparent density and superconducting properties of $MgB_2$ bulk superconductor were investigated. The raw powders used in this study were nano-sized boron (B) and spherical magnesium (Mg). A batch of a powder mixture of (Mg+2B) was put in a steel mold and uniaxially pressed at 1 ton or 3 tons into pellets. Another batch of the powder mixture was uniaxially pressed at 1 ton and then pressed isostatically at $1800kg/cm^2$ in the water chamber. All pellets were heat-treated at $650^{\circ}C$ for 1 h in flowing argon gas for the formation of $MgB_2$. The apparent density of powder compacts pressed at 3 ton was higher than that at 1 ton. The cold isostatic pressing (CIP) in a water chamber allowed further increase of the apparent density of powder compacts, which influenced the pellet density of the final products ($MgB_2$). The compaction methods (uniaxial pressing and CIP) did not affect the formation of $MgB_2$ and superconducting critical temperature ($T_c$) of $MgB_2$, but affected the critical current density ($J_c$) of $MgB_2$ significantly. The sample with the high apparent density showed high $J_c$ at 5 K and 20 K at applied magnetic fields (0-5 T).

• Advances in nano research
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• v.13 no.2
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• pp.199-206
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• 2022

We present the high-brightness large-area 10.1" in-cell polarizer display panel integrated with a wire grid polarizer (WGP) and metal reflector, from the initial design to final system development in a commercially feasible level. We have modeled and developed the WGP architecture integrated with the metal reflector in a single in-cell layer, to achieve excellent polarization efficiency as well as brightness enhancement through the light recycling effect. After the optimization of key experimental parameters via Taguchi method, the roll nanoimprint lithography employing a flexible large-area tiled mold has been utilized to create the 90 nm-pitch polymer resist pattern with the 54.1 nm linewidth and 5.1 nm residual layer thickness. The 90 nm-pitch Al gratings with the 51.4 nm linewidth and 2150 Å height have been successfully fabricated after subsequent etch process, providing the in-cell WGPs with high optical performance in the entire visible light regime. Finally we have integrated the WGP in a commercial 10.1" display device and demonstrated its actual operation, exhibiting 1.24 times enhancement of brightness compared to a conventional film polarizer-based one, with the contrast ratio of 1,004:1. Polarization efficiency and transmittance of the developed WGPs in an in-cell polarizer panel achieve 99.995 % and 42.3 %, respectively.

• Journal of Adhesion and Interface
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• v.23 no.4
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• pp.116-121
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• 2022

OFET have require fine patterning technology for organic semiconductor solution process to be used in actual electronics. In this study, we compared and analyzed the soft lithography method which can form fine patterns more than the conventional spin coating method in order to confirm that it can have better electrical characteristics. The soft lithography method produced a flexible master mold using nano patterns on compact disc surfaces and obtained a 650 nm wide 2,7-Dioctyl [1] benzothieno [3,2-b] [1] benzo thiophene (C_8-BTBT) nanowires. As a result, the field-effect mobility of devices fabricated by the spin coating method was 0.0036 cm²/Vs and mobility of devices produced by soft lithography method was 0.086 cm²/Vs, which was about 20 times higher than spin-coated devices and has better electrical performance.