• 제목/요약/키워드: NIL

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유한요소 해석을 이용한 나노임프린트 가압 공정에서 발생하는 결함 원인에 대한 연구 (A Study on Cause of Defects in NIL Molding Process using FEM)

  • 송남호;손지원;김동언;오수익
    • 한국소성가공학회:학술대회논문집
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    • 한국소성가공학회 2007년도 추계학술대회 논문집
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    • pp.364-367
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    • 2007
  • In nano-imprint lithography (NIL) process, which has shown to be a good method to fabricate polymeric patterns, several kinds of pattern defects due to thermal effects during polymer flow and mold release operation have been reported. A typical defect in NIL process with high aspect ratio and low resist thickness pattern is a resist fracture during the mold release operation. It seems due to interfacial adhesion between polymer and mold. However, in the present investigation, FEM simulation of NIL molding process was carried out to predict the defects of the polymer pattern and to optimize the process by FEA. The embossing operation in NIL process was investigated in detail by FEM. From the analytical results, it was found that the lateral flow of polymer resin and the applied pressure in the embossing operation induce the weld line and the drastic lateral strain at the edge of pattern. It was also shown that the low polymer-thickness result in the delamination of polymer from the substrate. It seems that the above phenomena cause the defects of the final polymer pattern. To reduce the defect, it is important to check the initial resin thickness.

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A Study on the Uniformity Improvement of Residual Layer of a Large Area Nanoimprint Lithography

  • Kim, Kug-Weon;Noorani, Rafigul I.;Kim, Nam-Woong
    • 반도체디스플레이기술학회지
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    • 제9권4호
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    • pp.19-23
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    • 2010
  • Nanoimprint lithography (NIL) is one of the most versatile and promising technology for micro/nano-patterning due to its simplicity, high throughput and low cost. Recently, one of the major trends of NIL is large-area patterning. Especially, the research of the application of NIL to TFT-LCD field has been increasing. Technical difficulties to keep the uniformity of the residual layer, however, become severer as the imprinting area increases. In this paper we performed a numerical study for a large area NIL (the $2^nd$ generation TFT-LCD glass substrate ($370{\times}470$ mm)) by using finite element method. First, a simple model considering the surrounding wall was established in order to simulate effectively and reduce the computing time. Then, the volume of fluid (VOF) and grid deformation method were utilized to calculate the free surfaces of the resist flow based on an Eulerian grid system. From the simulation, the velocity fields and the imprinting pressure during the filling process in the NIL were analyzed, and the effect of the surrounding wall and the uniformity of residual layer were investigated.

k-NIL RADICAL IN BCI-ALGEBRAS II

  • Jun, Y.B;Hong, S.M
    • 대한수학회논문집
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    • 제12권3호
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    • pp.499-505
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    • 1997
  • This paper is a continuation of [3]. We prove that if A is quasi-associative (resp. an implicative) ideal of a BCI-algebra X then the k-nil radical of A is a quasi-associative (resp. an implicative) ideal of X. We also construct the quotient algebra $X/[Z;k]$ of a BCI-algebra X by the k-nhil radical [A;k], and show that if A and B are closed ideals of BCI-algebras X and Y respectively, then

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Pharbitis nil 개화 요도시 엽단백질 변화에 대한 면역학적 분석 (Immunological Analysis of Proteins in the Leaf of Pharbitis nil during Photoinduction of Flowring)

  • 맹주선
    • Journal of Plant Biology
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    • 제25권4호
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    • pp.169-174
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    • 1982
  • Using double immunodiffusion and immunoelectrophoretic techniques, attempts were made to detect any protein changes in leaf tissues of a short-day plant, Pharbitis nil Chois. variety Violet during floral induction under 8 hr light, 16 hr dark cycles. Immunoprecipitin systems shwoed at least four proteins newly appeared in the induced leaf tissues. Accumulation of the proteins were observed as the induction proceeded.

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ON NIL-EXTENSIONS OF LEFT STRONGLY SIMPLE po-SEMIGROUPS

  • Zhu, Qing Shun
    • 대한수학회논문집
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    • 제26권3호
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    • pp.405-416
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    • 2011
  • In this paper, we first introduce the concept of left strongly simple po-semigroups, then we discuss properties and characterizations nil-extensions of left strongly simple po-semigroups and semilattices of leftstrongly simple po-semigroups. Finally, we give some characterizations of the chain of left strongly simple po-semigroups.

MC2 Rings

  • Wei, Jun-Chao
    • Kyungpook Mathematical Journal
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    • 제48권4호
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    • pp.651-663
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    • 2008
  • In this paper, we first study some characterizations of left MC2 rings. Next, by introducing left nil-injective modules, we discuss and generalize some well known results for a ring whose simple singular left modules are Y J-injective. Finally, as a byproduct of these results we are able to show that if R is a left MC2 left Goldie ring whose every simple singular left R-module is nil-injective and GJcp-injective, then R is a finite product of simple left Goldie rings.

NILRADICALS OF POWER SERIES RINGS AND NIL POWER SERIES RINGS

  • HUH, CHAN;KIM, CHOL ON;KIM, EUN JEONG;KIM, HONG KEE;LEE, YANG
    • 대한수학회지
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    • 제42권5호
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    • pp.1003-1015
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    • 2005
  • Klein proved that polynomial rings over nil rings of bounded index are also nil of bounded index; while Puczylowski and Smoktunowicz described the nilradical of a power series ring with an indeterminate. We extend these results to those with any set of commuting indeterminates. We also study prime radicals of power series rings over some class of rings containing the case of bounded index, finding some examples which elaborate our arguments; and we prove that R is a PI ring of bounded index then the power series ring R[[X]], with X any set of indeterminates over R, is also a PI ring of bounded index, obtaining the Klein's result for polynomial rings as a corollary.

다중양각스탬프를 사용하는 UV 나노임프린트 리소그래피공정에서 웨이퍼 미소변형의 영향 (The effect of micro/nano-scale wafer deformation on UV-nanoimprint lithography using an elementwise patterned stamp)

  • 정준호;심영석;최대근;김기돈;신영재;이응숙;손현기;방영매;이상찬
    • 한국정밀공학회:학술대회논문집
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    • 한국정밀공학회 2004년도 추계학술대회 논문집
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    • pp.1119-1122
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    • 2004
  • In the UV-NIL process using an elementwise patterned stamp (EPS), which includes channels formed to separate each element with patterns, low-viscosity resin droplets with a nano-liter volume are dispensed on all elements of the EPS. Following pressing of the EPS, the EPS is illuminated with UV light to cure the resin; and then the EPS is separated from several thin patterned elements on a wafer. Experiments on UV-NIL were performed on an EVG620-NIL. 50 - 70 nm features of the EPS were successfully transferred to 4 in. wafers. Especially, the wafer deformation during imprint was analyzed using the finite element method (FEM) in order to study the effect of the wafer deformation on the UV-NIL using EPS.

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INSERTION-OF-FACTORS-PROPERTY ON NILPOTENT ELEMENTS

  • Baek, Jin-Eon;Chin, Woo-Young;Choi, Ji-Woong;Eom, Tae-Hyun;Jeon, Young-Cheol;Lee, Yang
    • 대한수학회보
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    • 제49권2호
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    • pp.381-394
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    • 2012
  • We generalize the insertion-of-factors-property by setting nilpotent products of elements. In the process we introduce the concept of a nil-IFP ring that is also a generalization of an NI ring. It is shown that if K$\ddot{o}$the's conjecture holds, then every nil-IFP ring is NI. The class of minimal noncommutative nil-IFP rings is completely determined, up to isomorphism, where the minimal means having smallest cardinality.