• Title/Summary/Keyword: NH3 plasma treatment

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Fabrication of soluble organic thin film transistor with ammonia ($NH_3$) plasma treatment

  • Kim, Dong-Woo;Kim, Doo-Hyun;Kim, Keon-Soo;Kim, Hyoung-Jin;Choi, Hong;Lee, Dong-Hyeok;Hong, Mun-Pyo
    • 한국정보디스플레이학회:학술대회논문집
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    • 2009.10a
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    • pp.566-567
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    • 2009
  • We have examined the silicon nitride ($SiN_x$) as gate insulator with the ammonia ($NH_3$) plamsa treatment for the soluble derivatives of polythiophene as p-type channel materials of organic thin film transistors (OTFTs). Fabrications of the jetting-processed OTFTs with $SiN_x$ as gate insulator by $NH_3$ plasma treatment can be similar to performance of OTFTs with silicon dioxide ($SiO_2$) insulator.

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Electrochemical Behaviors of Platinum Catalysts Deposited on the Plasma Treated Carbon Blacks Supports (플라즈마 처리된 카본블랙 담지체에 담지된 백금 촉매의 전기화학적 거동)

  • Kim, Seok;Cho, Mi-Hwa;Lee, Jae-Rock;Ryu, Ho-Jin;Park, Soo-Jin
    • Korean Chemical Engineering Research
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    • v.43 no.6
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    • pp.756-760
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    • 2005
  • In this study, the effect of $N_2$-plasma treatment on carbon blacks (CBs) was investigated by analyzing acid-base surface values and surface functional groups of CBs. The surface characteristics of the CBs were determined by fourier transformed-infrared (FT-IR) spectrometer, X-ray photoelectron spectroscopy (XPS), and Boehm's titration method. Electrochemical properties of the plasma-treated CBs-supported Pt (Pt/CBs) catalysts were analyzed by cyclic voltammetry (CV) experiments. From the results of FT-IR and acid-base values, $N_2$-plasma treatment at 300 W intensity on the CBs led to the formation of the free radical. The peak intensity was increased with increasing the treatment time due to the formation of new basic functional groups(such as C-N, C=N, $-NH_3{^+}$, -NH, and =NH) by the free radical. Accordingly, the basic values were increased by the basic functional groups. However, after a specific reaction time, $N_2$-plasma treatment could hardly influence change of surface functional groups of CBs, due to the disappearance of free radical. Consequently, it was found that optimal treatment time was 30 second for electro activity of Pt/CBs catalysts.

Carbon Nano-Powder Functionalization and Disperisibility with Plasma Discharge

  • Gang, Yu-Seok;Jeong, Man-Gi;Lee, Deok-Yeon;Song, Seok-Gyun;Kim, Seong-In
    • Proceedings of the Korean Vacuum Society Conference
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    • 2013.02a
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    • pp.491-491
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    • 2013
  • A novel plasma system has been developed for 3-dimensional modification of the carbon nano-powders. Improvement of dispersion of these nano materials are studied by plasma discharge, not using chemical modification. The plasma process is considered to great advantages over wet chemical process due to environmental, economic viewpoint, and uniformity over the treated volume. The uniform dispersion is a critical factor for these material's nano composite applications. Using this plasma system, graphene, carbon black, and CNT was treated and functionalized. Several key discharge conditions such as Ar/H2/O2 or Ar/H2/NH3 gas ratio, treatment time, power, feeder's vibration frequency are investigated. Hydrophobic of graphene has turned some more into hydrophilic by reaction test with water, electrophoresis, surface contact angle test, and turbidity analysis. The oxygen content ratio in the plasma treated CNT has increased about 3.7 times than the untreatedone. In the case of graphene and carbon black, the oxygen- and nitrogen- content has been enhanced average 10%. O-H (N-H) peak, C-O (C-N) peak, and C=O (C=N) peak data have been detected by FTIR measurement and intensified compared to before-plasma treatment due to O2 or NH3 content.

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Effect of Plasma Etching and $PdCl_2/SnCl_2$ Catalyzation on the Performance of Electroless Plated Copper Layer (플라즈마 에칭 및 $PdCl_2/SnCl_2$ 촉매조건이 무전해 동도금 피막의 성능에 미치는 영향)

  • 오경화;김동준;김성훈
    • Journal of the Korean Society of Clothing and Textiles
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    • v.27 no.7
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    • pp.843-850
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    • 2003
  • Cu/PET film composites were prepared by electroless copper plating method. In order to improve adhesion between electroless plated Cu layer and polyester (PET) film, the effect of pretreatment conditions such as etching method, mixed catalyst composition were investigated. Chemical etching and plasma treatment increased surface roughness in decreasing order of Ar>HCl>O$_2$>NH$_3$. However, adhesion of Cu layer on PET film increased in the following order: $O_2$<Ar<HCl<NH$_3$. It indicated that appropriate surface roughness and introduction of affinitive functional group with Pd were key factors of improving adhesion of Cu layer. PET film was more finely etched by HCI tolution, resulting in an improvement in adhesion between Cu layer and PET film. Plasma treatment with NH$_3$produced nitrogen atoms on PET film, which enhances chemisorption of Pd$^{2+}$ on PET film, resulting in improved adhesion and shielding effectiveness of Cu layer deposited on the Pd catalyzed surface. Surface morphology of Cu plated PET film revealed that Pd/Sn colloidal particles became more evenly distributed in the smaller size by increasing the molar ratio of PdCl$_2$; SnCl$_2$from 1 : 4 to 1 : 16. With increasing the molar ratio of mixed catalyst, adhesion and shielding effectiveness of Cu plated PET film were increased.d.

Effects of Intermittent Operation of Plasma and Electrolysis Processes on Lettuce Growth and Nutrient Solution Components (플라즈마 공정과 전기분해 공정의 간헐 운전이 상추성장과 양액 성분에 미치는 영향)

  • Kim, Dong-Seog;Park, Young-Seek
    • Journal of Environmental Science International
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    • v.26 no.1
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    • pp.109-118
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    • 2017
  • This study was conducted to investigate the effects of intermittent plasma and electrolysis treatments on lettuce (Lactuca sativa var. oak-leaf.), nutrient solution components ($NO_3{^-}-N$, $NH_4{^+}-N$, $PO{_4}^{3-}-P$, $K^+$, $Ca^{2+}$ and $Mg^{2+}$) and environmental parameters (electrical conductivity, total dissolved solids and pH). The recirculating hydroponic cultivation system consisted of planting port, LED lamp, water reservoir and circulating pump. Nutrient solution was circulated in the following order: reservoir ${\rightarrow}$ filtration-plasma or filtration-electrolysis ${\rightarrow}$ planting port ${\rightarrow}$ reservoir. The results showed that nutrient solution components and environmental parameters were changed by plasma or electrolysis treatment. Lettuce growth was not affected by the intermittent plasma or electrolysis treatment with 30 minutes or 90 minutes, respectively. The roots of the lettuce was damaged by excessive plasma and electrolysis treatment. Electrolysis treatment had greater effect on than plasma treatment because of the accumulation of high levels of TRO (Total Residual Oxidants).

Change of Hydroponic Components by Plasma Treatment (플라즈마 처리에 의한 양액 성분 변화)

  • Kim, Dong-Seog;Park, Young-Seek
    • Journal of Environmental Science International
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    • v.21 no.3
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    • pp.363-368
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    • 2012
  • The influence of plasma discharge on the nutrient components ($NO_3$-N, $NH_4$-N, $PO_4$-P, K, Ca, and Mg) and water quality [pH, ORP (oxidation-reduction potential) and electric conductivity] of hydroponic water were investigated. It was observed that the $NH_4$-N, $PO_4$-P, K, Ca, and Mg were kept at the constant concentrations for plasma discharging of 90 min. On the other hand, $NO_3$-N concentration was increased with proceeding of the plasma discharge. The increase of $NO_3$-N concentration was considered with the fact that nitric acid was created from nitrogen among supplying air for the insulation of inside of dielectric barrier. ORP and electric conductivity was increased with plasma discharging time. However, pH was decrease with what because of the generation of the nitric acid. When adjusting the hydroponic ingredients, pH and conductivity must to be considered because of the change of pH and conductivitiy with the discharging.

Hydroquenation Effects on the Poly-Si TFT (다결정 실리콘 TFT에 대한 수소처리 영향)

  • 하형찬;이상규;고철기
    • Journal of the Korean Institute of Telematics and Electronics A
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    • v.30A no.1
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    • pp.23-30
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    • 1993
  • Hydrogenation on the top gate and bottom gate Poly-Si TET's was performed by using Nh$_{3}$ plasma and annealing SiN film deposited by PECVD and then the electric characteristics on Poly-Si TET were investigated. As the time of NA$_{3}$ plasma treatment increaes, on/off current ratio gradually increases and the swing value decreases. The trap densities of graim boundaries in Poly-Si decrease very much during the inital 20min of hydrogenation time, and the decreasing scale becomes smaller after 20 min. The electric characteristics of the top gate TFT are better than those of the bottom gate TFT, it is considered due to the defects at the interface between the Poly-Si and the underlayer, SiO$_{2}$. After NH$_{3}$ plasma was treated for 2 hours for the top gate TFT, as the aging time atroon temperature increases on current was not scacely changed and off current decreases more than 1 order. Gate current density recovers to original value after the aging treatment for 8 days and then the electric characteristics are finally improved. It is suggested that the degraded characteristics of gate oxide are improved, from the variations of C-V characteristics with aging time. For the hydrogenation of isothermal and isochronal annealing SiN film deposited by PECVD, the characteristics of Poly-Si TFT are improved with increasing annealing temperature and are not largely changed with increasing annealing time. This results is good in agreement with the hydrogen reduction in Sin film as variations of annealing temperature and time.

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Effect of Plasma Treatment on Permeability and Selectivity Characteristics of Mixture Gas through Polyimide Membrane (플라즈마 처리된 폴리이미드 막의 기체투과특성)

  • 배성렬;노상호;류대선;박희진
    • Membrane Journal
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    • v.11 no.1
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    • pp.38-49
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    • 2001
  • The surface of polyimide membrane was modified by plasma treatment using Ar and NH~. and the permeability and selectivity for the mixture gas $(CO_2/N_2=20/80 vol%)$ were measured. The per¬meation experiments were performed by a variable volume method at $30^{\circ}$C and total pressure of 5 atm, The effect of the plasma conditions such as treatment time, power input, gas flow rate and pressure in the reactor on the transport Dwperties of modified membranes was investigated. The surface of the plasma treated membrane was analyzed by means of FTlR - ATH, ESCA and AFM. The dependences of the wettability and the etching on plasma treatment time were investigated by use of the contact angle and the weight loss measurement. Measurements of gas pcnneability characteristic were performed using both dry and wet membranes. The effects of experimental conditions such as temperature on the membrane performance were studied.

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Effect of Low Temperature Plasma Pretreatment on the Color Depth of Wool Fabrics (양모직물의 염착농도에 미치는 저온플라즈마 처리의 영향)

  • 배소영;이문철
    • Textile Coloration and Finishing
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    • v.4 no.2
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    • pp.76-83
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    • 1992
  • Wool tropical and nylon taffeta were treated with low temperature plasma of $O_2$, $N_2$, NH$_3$, CF$_4$ and CH$_4$ for the intervals of 10 to 300 sec, and then dyed with leveling and milling type acid dyes in presence or absence of buffer solution. From the color depth of dyed fabrics, effect of plasma gases, treated time, dyeing time and temperature on dyeing property was studied. The results of the experiment can be summarized as follows: 1) The plasma treatments except methane gas increased the color depth of dyed wool fabrics, but not that of dyed nylon fabrics regardless of the plasma gases used. 2) The color depth of wool fabrics dyed in the dye bath without buffer solution was increased by the low temperature plasma, especially increased much more by CF$_4$ plasma treatment. It is found that with the identification of F- ion in the residual dye bath the hydrogen fluoride gas was adsorbed on wool fabrics in the plasma treatment. 3) The color depth of wool fabrics was increased with the time of $O_2$ and CF$_4$ plasma treatments. 4) In both cases of the leveling and milling type acid dyes, the rate of dyeing was increased in the low temperature plasma treatments, and it is found that the leveling type acid dye increased the color depth at relatively low temperature below 4$0^{\circ}C$, compared with the milling type acid dye.

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Effect of pre-treatment in 0.5 M oxalic acid containing various NH4F concentrations on PEO Film Formation of AZ91 Mg Alloy (NH4F가 첨가된 0.5 M 옥살산 전처리가 AZ91 마그네슘 합금의 PEO 피막 형성에 미치는 영향)

  • Kwon, Duyoung;Song, Pung-Keun;Moon, Sungmo
    • Journal of Surface Science and Engineering
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    • v.55 no.1
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    • pp.24-31
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    • 2022
  • This study investigated the effect of pre-treatment on the PEO film formation of AZ91 Mg alloy. The pre-treatment was conducted for 10 min at room temperature in 0.5 M oxalic acid (C2H2O4) solution containing various ammonium fluoride (NH4F) concentrations. The pre-treated AZ91 Mg specimens were anodized at 100 mA/cm2 of 300 Hz AC for 2 min in 0.1 M NaOH + 0.4 M Na2SiO3 solution. When AZ91 Mg alloy was pretreated in 0.5 M oxalic acid with NH4F concentration less than 0.3 M, continuous dissolution of the AZ91 Mg alloy occurred together with the formation of black smuts and arc initiation time for PEO film formation was very late. It was noticed that corrosion rate of the AZ91 Mg alloy became faster if small amount of NH4F concentration, 0.1 M, is added. The fast corrosion is attributable to fast formation of porous fluoride together with porous oxides in the reaction products. On the other hand, when AZ91 Mg alloy was pretreated in 0.5 M oxalic acid with sufficient NH4F more than 0.3 M, a thin and dense protective film was formed on the AZ91 Mg alloy surface which resulted in faster initiation of arcs and formation of PEO film.