• 한국대기환경학회지
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• 제11권1호
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• pp.37-44
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• 1995

Concentration of particulate nitrate classified by formation mechanism and particle diameter in ambient air was determined from Feb. to Oct. 1993. Sampling was carried out using a two-stage Andersen air sampler at the top of a five-story building located at Kon-Kuk University in seoul. Concentration of N $H_{4}$N $O_{3}$ in TSP was measured by pyrolysis of sample filters at 160.deg.C for 1hr. concentration of N $H_{4}$N $O_{3}$ was higher in winter time compared with that in summmer time. Also, concentration of N $H_{4}$N $O_{3}$ was higher in fine particles compared with that in coarse particle. The range of N $H_{4}$N $O_{3}$ concentration was between 2.9 and 9.9.mu.g/ $m^{3}$. Weight fraction of N $H_{4}$N $O_{3}$ in total particulate nitrate was 31.1 .sim. 59.5%, and weight fraction of N $H_{4}$N $O_{3}$ in TSP was 2.1 .sim. 11.2%. Concentration of NaN $O_{3}$, which originated from sea salt, was highest in spring time and lowest in summer time,and the concentration range was between 0.1 and 0.7.mu.g/ $m^{3}$. NaN $O_{3}$/TSP ratio was very low (0.1 .sim. 0.4%) indicating that the portion of NaN $O_{3}$in TSP was negligible. Concentration of particulate nitrate originated from soil was 2.4 .sim. 2.9.mu.g/ $m^{3}$. Weight fraction of that in total particulate nitrate was 14.0 .sim. 37.1%.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2008년도 하계학술대회 논문집 Vol.9
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• pp.367-367
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• 2008

Aluminum nitride (AlN) thin films have been deposited on Si substrate by using reactive RF magnetron sputtering method in a gas mixture of Ar and $N_2$ at different $N_2$ concentration. It was found that $N_2$ concentration was varied in the range up to 20-100%, highly c-axis oriented film can be obtained at 50% $N_2$ with full width at half maximum (FWHM) $4.5^{\circ}$. Decrease in surface roughness from 7.5 nm to 4.6 nm found to be associated with decrease in grain size, with $N_2$ concentration; however, the AlN film fabricated at 20% $N_2$ exhibited a granular type of structure with non-uniform grains. The absorption peak was observed around 675 $cm^{-1}$ in fourier transform infrared spectroscopy (FTIR). It is concluded that the AlN film deposited at $N_2$ concentration of 50% exhibited the most desirable properties for the application of high-frequency surface acoustic devices.

• 반도체디스플레이기술학회지
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• 제3권2호
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• pp.17-21
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• 2004

Aluminum nitride(AlN) thin films were deposited on silicon substrate by reactive RF magnetron sputtering without substrate heating. We investigated the dependence of some properties for AlN thin film on sputtering conditions such as working pressure, $N_2$ concentration and RF power. XRD, Ellipsometer and AES has been measured to find out structural properties and preferred orientation of AlN thin films. Deposition rate of AlN thin film was increased with an increase of RF power and decreased with an increase of $N_2$ concentration. AES in-depth measurements showed that stoichiometry of Aluminium and Nitrogen elements were not affected by $N_2$ concentration. It has shown that low working pressure, low $N_2$ concentration and high RF power should be maintained to deposit AlN thin film with a high degree of (0002) preferred orientation.

• 한국정보디스플레이학회:학술대회논문집
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• 한국정보디스플레이학회 2002년도 International Meeting on Information Display
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• pp.586-589
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• 2002

The Ultra Violet(UV) emission characteristics of Neon + Nitrogen gas-mixture discharge was investigated in AC plasma display panel. The firing voltage of Ne+$N_2$ gas-mixture discharge increased with increasing nitrogen concentration. The UV intensity emitted from the gas discharge also increased with increasing nitrogen concentration. The UV efficiency increase with increasing $N_2$ partial pressure at low $N_2$ concentration, and then UV efficiency is saturated at high $N_2$ concentration.

• 한국물환경학회지
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• 제30권1호
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• pp.1-7
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• 2014

The purpose of this study was to investigate the nitrification characteristics of biological aerated filter (BAF) packed with ceramic media, especially focusing on nitrite build-up during nitrification. When increasing the nitrogen load above $1.63kgNH_4{^+}-N/m^3{\cdot}d$, ammonium removal efficiency decreased to less than 60% and the nitrite ratio ($NO_2{^-}-N/NO_x-N$) of higher than 75% was achieved due to the inhibitory free ammonia (FA, $NH_3-N$) concentration and oxygen limitation. FA inhibition, however, is not recommended strategy to promote nitrite build-up since FA concentration in the reactor is coupled with decreased ammonium removal efficiency. Nitrite ratio in the effluent was also affected by aeration rate and influent ammonium concentration. Ammonium oxidation was enhanced at a higher aeration rate regardless of influent ammonium concentration but, the nitrite ratio was dependent on both aeration rate and influent ammonium concentration. While a higher nitrite ratio was obtained when BAFs were fed with $50mgNH_4{^+}-N/L$ of influent, the nitrite ratio significantly decreased for a greater influent concentration of $200-300mgNH_4{^+}-N/L$. Taken together, aeration rate, influent ammonium concentration and FA concentrations kept in the BAF were found to be critical variables for nitrite accumulation in the BAF system.

• 상하수도학회지
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• 제27권1호
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• pp.77-82
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• 2013

The growth and removal capacity of nitrogen and phosphorus of Chlorella vulgaris were evaluated in artificial wastewater with different nitrogen and phosphorus concentrations as element growing components for microalgae growth. The nitrogen concentration was varied in 9, 15, 30 and 60 mg-N/L with fixed phosphorus concentration of 3 mg-P/L. The growth and phosphorus removal capacity of C. vulgaris were high at initial nitrogen concentration of 15 and 30 mg-N/L, and the corresponding N/P ratios calculated were 5 and 10. In the case of varying in 1.5, 3, 6 and 10 mg-P/L of phosphorus concentration with fixed nitrogen concentration of 30 mg-N/L, the growth and removal capacity of nitrogen and phosphorus were excellent with phosphorus concentration of 3 and 6 mg-P/L. The corresponding N/P ratios were shown as 10 and 5. Therefore, the appropriate N/P ratio was concluded between 5 and 10 for wastewater treatment using C. vulgaris.

• 한국농공학회지
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• 제41권4호
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• pp.47-56
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• 1999

The concentration and load of T-N and T-P in paddy field areas in Chongwon, Chungbuk , Korea , were investigated during the irrigation period. The concentration of T-N and T-P in ponded water in paddies is higher than that in the irrigation, drainage and percolation waters. For T-N, the average concentration indrainage water was higher than that in irrigation water until end of Jung, But lower thereafter. The average T-N concentration in irrigation water was 2.3 ∼3.2mg/l and therefore the agricultural water quality standard at on-farm level for T-N should be established realistically . The expontial L(load)-Q(discharge) equations have higher coefficients of determination than the linear L-Q equations . Especially, the exponential L-Q equation of T_N showed a coefficient of determinatino of over 0.9 for irrigation water.

• 한국환경과학회지
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• 제8권1호
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• pp.107-113
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• 1999

A new biological nutrient removal system combining $A^2/O$ process with fixed film was developed in this work and the characteristics of denitrification were especially investigated in the combined fixed film reactor(CFFR). Media was added in the anaerobic, anoxic and aerobic reactors, respectively. Tests were made to establish the effluent level of $NO_x-N$, COD, DO and nitrite effects on $NO_x-N$ removal in the CFFR by decreasing hydraulic retention time (HRT) from 10.0 to 3.5 hours and by increasing internal recycle ratio form 0% to 200%. The influent was synthesized to levels similar to the average influent of municipal wastewater treatment plants in Korea. SARAN media with a porosity of 96.3% was packed 40% / 130% / 25% based on its reactor volume, respectively. It was found that COD rarely limited dentrification in the anoxic reactor because of high $C/NO_x/-N$ ratio in the anoxic reactor, while DO concentration in the anoxic reactor and $NO_2-N/NO_x/-N$ from the aerobic effluent inhibited denitrification in the anoxic reactor. It was proved that the critical points of DO concentration in the anoxic reactor and $NO_2-N/NO_x/-N$ from the aerobic effluent were 0.15mg/L and 10%, respectively. As the internal recycle ratio increased, DO concentration in the anoxic reactor and $NO_2-N/NO_x/-N$ from the aerobic effluent increased. Especially, at the condition of internal recycle ratio, 200%, DO concentration in the anoxic reactor and $NO_2-N/NO_x/-N$ from the aerobic effluent exceeded the critical points of 0.15mg/L and 10%, respectively. Then, denitrification efficiency considerably decreased. Consequently, it was represented that the control of DO concentration in the anoxic reactor and $NO_2-N/NO_x/-N$ from the aerobic effluent can assure effective denitrification.

• 청정기술
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• 제25권1호
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• pp.40-45
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• 2019

본 연구에서는 도시고형폐기물 소각시설을 대상으로 2018년 8월 27일부터 2018년 10월 22일 동안 총 3회에 걸쳐 도시고형폐기물의 소각에 의해 발생되는 $N_2O$ 농도를 24시간 동안 연속적으로 측정하여 발생량과 배출특성을 조사하였으며, 배출가스 중 $N_2O$ 농도측정은 비분산 적외선 분석기(NDIR)를 이용하였다. $N_2O$ 배출특성을 조사한 결과 도시고형폐기물 소각시설의 $N_2O$ 발생량 및 발생농도는 폐기물의 성상 보다는 소각시설의 소각로 온도와 산소농도 같은 운전조건에 따라 상이하게 발생하는 것으로 판단된다. 도시고형폐기물 소각시설의 $N_2O$ 일일평균 발생농도는 53.6 ~ 59.5 ppm이며, 전체 평균농도는 55.6 ppm으로 측정되었다. 또한 $N_2O$ 농도를 이용하여 계산된 $N_2O$ 발생량은 $90.41{\sim}108.44kg\;day^{-1}$이며, 평균 발생량은 $98.05kg\;day^{-1}$로 조사되었다. 이러한 결과를 바탕으로 도시고형폐기물 소각시설의 $N_2O$ 배출계수를 산출한 결과 $1,066.13g_{N_2O}\;ton_{waste^{-1}}$로 생활폐기물의 Tier 2 방법으로 산출된 $N_2O$ 배출계수에 비해 약 20배 정도 높은 결과를 얻었다. 따라서, 폐기물 종류와 소각량을 이용한 폐기물 소각시설의 $N_2O$ 발생량 산출방식은 정확성에 대한 보완이 필요할 것으로 판단된다.

• 한국환경과학회지
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• 제23권6호
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• pp.1151-1156
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• 2014

The photocatalytic decomposition characteristics of single n-pentane, n-pentane mixed with methyl ethyl ketone (MEK), and n-pentane mixed with ethyl acetate (EA) by cylindrical UV reactor installed with $TiO_2$-coated perforated plane were studied. The effects of the residence time, the inlet gas concentration, and the oxygen concentration were investigated. The removal efficiency of n-pentane was increased with increasing the residence time and the oxygen concentration, but decreased with increasing the inlet concentration of n-pentane. The photocatalytic decomposition rates of single n-pentane, n-pentane mixed with MEK, and n-pentane mixed with EA fitted well on Langmuir-Hinshelwood kinetics equation. The maximum elimination capacities of single n-pentane, n-pentane mixed with MEK, and n-pentane mixed with EA were obtained to be $465g/m^3{\cdot}day$, $217g/m^3{\cdot}day$, and $320g/m^3{\cdot}day$, respectively. The presence of coexisting MEK and EA vapor had a negative effect on the photocatalytic decomposition of n-pentane and the negative effect of MEK was higher than that of EA.