• Title/Summary/Keyword: Molecular beam

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CdTe/ZnTe 이중 양자점의 결합에 따른 광학적 특성

  • Kim, Su-Hwan;Jin, Seong-Hwan;Choe, Jin-Cheol;Lee, Hong-Seok
    • Proceedings of the Korean Vacuum Society Conference
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    • 2015.08a
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    • pp.197.1-197.1
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    • 2015
  • 현재 화합물 반도체 나노구조는 적외선 검출기, 레이저, 발광 다이오드, 단전자 트랜지스터, 태양전지 등과 같은 고효율 광전자 소자에서의 응용을 위해 활발한 연구가 진행 되고 있다. 특히 양자점은 3차원으로 구속되어 있는 상태 밀도를 갖고 있어 레이저 응용 시 낮은 문턱 전류 밀도, 높은 이득, 높은 열적 안정성을 기대되고 있다. 하지만 양자점의 크기가 불규칙적이고 운반자 수집의 한계로 인하여 기대 이하의 온도 안정성을 갖고 있어 이를 극복하기 위해 양자점의 크기와 운반자 수집을 제어하기 위해 다양한 방법이 연구되고 있다. 본 연구에서는 분자 선속 에피 성장법(Molecular Beam Epitaxy; MBE)과 원자 층 교대 성장법(Atomic Layer Epitaxy; ALE)으로 크기가 다른 CdTe/ZnTe 이중 양자점을 ZnTe 장벽층의 두께에 변화하면서 성장 후 광학적 특성을 연구하였다. 저온 광루미네센스 측정(Photoluminescence; PL) 측정 결과 장벽층 두께가 작아질수록 작은 양자점의 광 루미네센스의 세기가 감소하면서 큰 양자점의 세기가 증가하는 것을 관찰할 수 있었는데, 이는 장벽층 두께가 작아질수록 작은 양자점의 운반자들이 큰 양자점으로 이동되는 양이 많아지기 때문이다. 또한 장벽층 두께가 작아질수록 큰 양자점의 반치폭(Full Width at Half Maximum; FWHM)이 단층 양자점의 반치폭 보다 감소하는 것을 관찰 할 수 있었는데 이는 작은 양자점과 결합된 큰 양자점이 작은 양자점의 strain을 받아 크기의 균일함이 증가했기 때문이다. 이와 같은 결과 두 양자점이 결합된 이중 양자점 구조가 단층 양자점의 한계인 운반자 수집과 크기의 균일함을 향상할 수 있는 좋은 구조임을 제시하고 있다.

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Abnormal behavior in photoluminescence of InAs quantum dots subjected to annealing treatment (열처리 온도에 따른 InAs 양자점의 특성변화)

  • 최현광;이선연;이제원;조관식;전민현
    • Journal of the Korean Vacuum Society
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    • v.10 no.3
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    • pp.374-379
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    • 2001
  • We have investigated the annealing effects on the optical properties of InAs quantum dots(QDs) capped with InGaAs(sample QDl), where InGaAs layer was deposited by opening Gallium, Arsenic, Indium and Arsenic shutters alternately with 3 periods, grown by molecular beam epitaxy. The emission wavelength of the sample of InAs QDs capped by GaAs barriers was observed to be blue-shifted as the annealing temperature was increased. On the other hand, the photoluminescence(PL) peak position of sample QD1 was observed to be red-shifted at the annealing temperature of up to $600^{\circ}C$ and, then, it was found to be blue-shifted at temperatures ranging from 700 to $800^{\circ}C$. The full width at half maximum values of sample QD1 subjected to annealing treatments show different behavior compared to typical InAs quantum dot structures.

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GaAs-Carbon Nanotubes Nanocomposite: Synthesis and Field-Emission Property (갈륨비소-탄소나노튜브 복합체 제작과 전계방출특성)

  • Lim, Hyun-Chul;Chandrasekar, P.V.;Chang, Dong-Mi;Ahn, Se-Yong;Jung, Hyuk;Kim, Do-Jin
    • Korean Journal of Materials Research
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    • v.20 no.4
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    • pp.199-203
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    • 2010
  • Hybridization of semiconductor materials with carbon nanotubes (CNTs) is a recent field of interest in which new nanodevice fabrication and applications are expected. In this work, nanowire type GaAs structures are synthesized on porous single-wall carbon nanotubes (SWCNTs) as templates using the molecular beam epitaxy (MBE) technique. The field emission properties of the as-synthesized products were investigated to suggest their potential applications as cold electron sources, as well. The SWCNT template was synthesized by the arc-discharge method. SWCNT samples were heat-treated at $400^{\circ}C$ under an $N_2/O_2$ atmosphere to remove amorphous carbon. After heat treatment, GaAs was grown on the SWCNT template. The growth conditions of the GaAs in the MBE system were set by changing the growth temperatures from $400^{\circ}C$ to $600^{\circ}C$. The morphology of the GaAs synthesized on the SWCNTs strongly depends on the substrate temperature. Namely, nano-crystalline beads of GaAs are formed on the CNTs under $500^{\circ}C$, while nanowire structures begin to form on the beads above $600^{\circ}C$. The crystal qualities of GaAs and SWCNT were examined by X-ray diffraction and Raman spectra. The field emission properties of the synthesized GaAs nanowires were also investigated and a low turn-on field of $2.0\;V/{\mu}m$ was achieved. But, the turn-on field was increased in the second and third measurements. It is thought that arsenic atoms were evaporated during the measurement of the field emission.

PDMS-based pixel-wall bonding technique for a flexible liquid crystal display (플렉서블 액정 디스플레이를 위한 PDMS 기반 pixel-wall bonding 기술)

  • Kim, Young-Hwan;Park, Hong-Gyu;Oh, Byeong-Yun;Kim, Byoung-Yong;Paek, Kyeong-Kap;Seo, Dae-Shik
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2008.04a
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    • pp.42-42
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    • 2008
  • Considerable attention has been focused on the applications of flexible liquid crystal (LC)-based displays because of their many potential advantages, such as portability, durability, light weight, thin packaging, flexibility, and low power consumption. To develop flexible LCDs that are capable of delivering high-quality moving images, like conventional glass-substrate LCDs, the LC device structure must have a stable alignment layer of LC molecules, concurrently support uniform cell gaps, and tightly bind two flexible substrates under external tension. However, stable LC molecular alignment has not been achieved because of the layerless LC alignment, and consequently high-quality images cannot be guaranteed. To solve these critical problems, we have proposed a PDMS pixel-wall based bonding method via the IB irradiation was developed for fasten the two substrates together strongly and maintain uniform cell gaps. The effect of the IB irradiation on PDMS with PI surface was also evaluated by side structure configuration and a result of x-ray photoelectron spectroscopic analysis of PDMS interlayer as a function of binder with substrates. large number of PDMS pixel-walls are tightly fastened to the surface of each flexible substrate and could maintain a constant cell gap between the LC molecules without using any other epoxy or polymer. To enhance the electro-optical performance of the LC device, we applied an alignment method that creates pretilt angle on the PI surface via ion beam irradiation. Using this approach, our flexible LCDs have a contrast ratio of 132:1 and a response time of about 15 ms, resulting in highly reliable electro-optical performance in the bent state, comparable to that of glass-substrate LCDs.

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Evaluation of Applicability of Heavy Oil Upgrading By-Product (Pitch) as A Pavement Paving Material (중질유 고도정제 부산물의 도로포장용 역청재료로서의 적용성 평가)

  • Yang, Sung Lin
    • International Journal of Highway Engineering
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    • v.16 no.5
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    • pp.9-18
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    • 2014
  • PURPOSES : The objective of this study is to evaluate the applicability of the pitch, which is produced during SDA petroleum upgrading process, as a pavement paving material. In order for the purpose, the physical and chemical properties of the pitch are analyzed, and then the various plasticizers are applied in the pitch. METHODS : Two types of pitch are selected from oil refinery companies, which are owned the SDA petroleum upgrading process. Also, two types of asphalt binders, PG 64-22 and PG 58-22, are employed to compare with the pitch because these two types of asphalt binders are currently used as paving materials. For the chemical property of the pitch, the composition of SARA (Saturate, Aromatic, Resin, Asphaltene), the elementary composition, and the functional group are analyzed. For the physical property of the pitch, the basic material property tests, such as penetration test, softening point test, flash point test, ductility test, and rotational viscometer test, are performed. Also, the DSR (Dynamic Shear Rheometer) test and the BBR (Bending Beam Rheometer) test are conducted using asphalt binder specimens obtained by both short term aging (Rolling Thin Film Oven, RTFO) and long term aging (Pressure Aging Vessel, PAV) processes. The rheological property of each pitch type is evaluated as a function of temperatures and loading cycles. PG 64-22 asphalt binder is used as a control material. RESULTS AND CONCLUSIONS : The Pitch may not be suitable for the pavement paving material without modifications, but the pitch can be used as alternatives of modified addictive or asphalt. If low molecular component, such as saturate and aromatic components, are added in the pitch based on the development of various plasticizers, it has a strong possibility for the pitch to be used as a alternative. However, in order to verify the performance property of the pitch, further research is needed.

Si 기판 위에 성장한 CdTe/ZnTe 양자점의 크기에 따른 열적 활성화 에너지와 운반자 동역학

  • Lee, Ju-Hyeong;Choe, Jin-Cheol;Lee, Hong-Seok
    • Proceedings of the Korean Vacuum Society Conference
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    • 2013.02a
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    • pp.340-341
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    • 2013
  • 양자점(Quantum dots; QDs)은 단전자 트랜지스터, 레이저, 발광다이오드, 적외선 검출기와 같은 고효율 광전소자 응용을 위해 활발한 연구가 진행되고 있다. II-VI 족 화합물 반도체는 III-V 족 화합물 반도체와 비교했을 때 더 큰 엑시톤 결합에너지(exciton binding energy)를 가지는 우수한 특성을 보이고 있으며 이러한 성질을 가지는 II-VI 족 화합물 반도체 중에서도 넓은 에너지 갭을 가지는 CdTe 양자점은 녹색 영역대의 광전자 소자로서 활용되고 있다. 기존의 CdTe/ZnTe 양자점을 성장하기 위해 ZnTe와 격자부정합이 적은 GaAs 기판을 이용한 연구가 주를 이룬 반면 Si기판을 이용한 연구는 미흡하다. 하지만 Si 기판은 GaAs 기판에 비해 값이 싸고, 여러 분야에 응용이 가능하며 대량생산이 가능하다는 이점을 가지고 있어 초고속, 초고효율 반도체 광전소자의 제작을 가능케 할 것으로 기대된다. 또한 양자점의 고효율 광전소자에 응용을 위해서는 Si 기판 위에 양자점의 크기를 효율적으로 조절하는 연구 뿐 아니라 양자점의 크기에 따른 운반자 동역학에 대한 연구도 중요하다. 본 연구에선 분자선 에피 성장법(Molecular Beam Epitaxy; MBE)과 원자층 교대 성장법(Atomic Layer Epitaxy; ALE)을 이용하여 Si 기판 위에 성장한 CdTe/ZnTe 양자점의 크기에 따른 광학적 특성을 연구하였다. 저온 광 루미네센스(PhotoLuminescence; PL) 측정 결과 양자점의 크기가 증가함에 따라 더 낮은 에너지영역으로 피크가 이동하는 것을 확인하였다. 그리고 온도 의존 광루미네센스 측정 결과 양자점의 크기가 증가함에 따라 열적 활성화 에너지가 증가하는 것을 관찰하였는데, 이는 양자점의 운반자 구속효과가 증가하였기 때문이다. 또한 시분해 광루미네센스 측정 결과 CdTe/ZnTe 양자점의 크기가 증가함에 따라 소멸 시간이 긴 값을 갖는 것을 관찰하였는데, 이는 양자점의 크기가 증가함에 따라 엑시톤 진동 세기가 감소하였기 때문이다. 이와 같은 결과 Si 기판 위에 성장한 CdTe/ZnTe 양자점의 크기에 따른 열적 활성화 에너지와 운반자 동역학에 대해 이해 할 수 있었다.

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열처리 온도에 의한 디지털 합금 InGaAlAs 다중양자우물의 발광특성 변화

  • Jo, Il-Uk;Byeon, Hye-Ryeong;Ryu, Mi-Lee;Song, Jin-Dong
    • Proceedings of the Korean Vacuum Society Conference
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    • 2013.02a
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    • pp.414-414
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    • 2013
  • InGaAlAs/InP은 $1.3{\sim}1.55{\mu}m$ 레이저 다이오드 응용을 위한 InGaAsP/InP를 대체하기 위한 물질로 많은 관심을 받아왔다. 디지털 합금 InGaAlAs 다중양자우물(multiple quantum wells: MQWs) 시료는 MBE (molecular beam epitaxy) 장비를 이용하여 n-InP 기판 위에 성장하였다. 양자우물과 장벽은 각각 (InGaAs)0.8(InAlAs)0.2와 (InGaAs)0.4(InAlAs)0.6 SPSs (short-period superlattices)로 $510^{\circ}C$에서 성장하였다. 발광특성을 향상시키기 위하여 질소분위기에서 $700^{\circ}C$ $750^{\circ}C$ 또는 $800^{\circ}C$에서 30초간 열처리(rapid thermal annealing: RTA)하였다. RTA 온도에 따른 디지털 합금 InGaAlAs MQWs의 발광특성을 분석하기 위해 PL (photoluminescence)과 TRPL(time-resolved PL)을 이용하였다. RTA 온도에 따른 InGaAlAs MQWs 시료의 발광 메카니즘 및 운반자 동력학을 연구하기 위하여 발광파장 및 온도에 따른 TRPL을 측정하였다. 저온(10 K)에서 PL 피크는 RTA 온도를 $700^{\circ}C$에서 $750^{\circ}C$로 증가하였을 때 1,242 nm에서 1,245 nm로 장파장 영역으로 이동하였다가 $800^{\circ}C$에서 열처리하였을 때 단파장 영역으로 이동하여 1,239 nm에서 나타났다. 또한 PL 세기는 RTA 온도를 증가함에 따라 증가함을 보이다가 RTA 온도를 $800^{\circ}C$로 증가하였을 때 PL 세기는 감소하였다. 발광소자 개발을 위한 InAlGaAs MQWs 시료의 최적의 열처리 조건을 이러한 PL과 TRPL 결과로부터 결정할 수 있다.

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A Study on Monte Carlo Simulation by Beam Scattering in Resin of New Austria Tunnel Method for Safety of Industrial Disaster (산업재해 안전을 위한 New Austria Tunnel Method 수지에서 빔산란에 관한 Monte Carlo 시뮬레이션에 관한 연구)

  • Kim, Ki-Jun;Lee, Joo-Youb
    • Journal of the Korean Applied Science and Technology
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    • v.29 no.3
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    • pp.473-479
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    • 2012
  • The influences of scatterer and absorber in turbid material by light scattering were interpreted for the scattered intensity and wavelength. The molecular properties have been studied by Monte Carlo simulation in resin of New Austria Tunnel Method. It has been found that the effects of optical properties in scattering media could be investigated by the optical parameters(${\mu}_s$, ${\mu}_a$, ${\mu}_t$). Monte Carlo Simulation method for modelling of light transport in the civil engineering and construction field was applied. The results using a phantom were discussed that the distance from source to detector is closer, and scattering intensity is stronger with those obtained through Monte Carlo Simulation. It may also aid in designing the best model for coatings and corrosion for the durability of metal constructions.

Formation of a thin nitrided GaAs layer

  • Park, Y.J.;Kim, S.I.;Kim, E.K.;Han, I.K.;Min, S.K.;O'Keeffe, P.;Mutoh, H.;Hirose, S.;Hara, K.;Munekata, H.;Kukimoto, H.
    • Proceedings of the Korean Vacuum Society Conference
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    • 1996.06a
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    • pp.40-41
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    • 1996
  • Nitridation technique has been receiving much attention for the formation of a thin nitrided buffer layer on which high quality nitride films can be formedl. Particularly, gallium nitride (GaN) has been considered as a promising material for blue-and ultraviolet-emitting devices. It can also be used for in situ formed and stable passivation layers for selective growth of $GaAs_2$. In this work, formation of a thin nitrided layer is investigated. Nitrogen electron cyclotron resonance(ECR)-plasma is employed for the formation of thin nitrided layer. The plasma source used in this work is a compact ECR plasma gun3 which is specifically designed to enhance control, and to provide in-situ monitoring of plasma parameters during plasma-assisted processing. Microwave power of 100-200 W was used to excite the plasma which was emitted from an orifice of 25 rnm in diameter. The substrate were positioned 15 em away from the orifice of plasma source. Prior to nitridation is performed, the surface of n-type (001)GaAs was exposed to hydrogen plasma for 20 min at $300{\;}^{\circ}C$ in order to eliminate a native oxide formed on GaAs surface. Change from ring to streak in RHEED pattern can be obtained through the irradiation of hydrogen plasma, indicating a clean surface. Nitridation was carried out for 5-40 min at $RT-600{\;}^{\circ}C$ in a ECR plasma-assisted molecular beam epitaxy system. Typical chamber pressure was $7.5{\times}lO^{-4}$ Torr during the nitridations at $N_2$ flow rate of 10 seem.(omitted)mitted)

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The optical characteristics of $Al_{0.25}Ga_{0.75}As/In_{0.15}Ga_{0.85}As$/GaAspseudomorphic high electron mobility transistor structure grown by molecular beam epitaxy (분자선 에피탁시법으로 성장된 $Al_{0.25}Ga_{0.75}As/In_{0.15}Ga_{0.85}As$/GaAs 슈우도형 고 전자 이동도 트랜지스터 구조의 광학적 특성)

  • 이동율;이철욱;김기홍;김종수;김동렬;배인호;전헌무;김인수
    • Journal of the Korean Vacuum Society
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    • v.9 no.2
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    • pp.130-135
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    • 2000
  • We have analyzed characteristics for the structure of $Al_{0.25}/Ga_{0.75}/As/In_{0.15}/Ga_{0.85}$/AS/GaAS pseudomorphic high electron mobility transistor (PHEMT) by photoluminescence (PL) and photoreflectance (PR) measurements. By the PL measurement at 10 K, we observed el-hl transition peak at 1.322 eV and e2-hl transition peak at 1.397 eV in the InGaAs quantum well. We calculated value of 23 meV, the difference between the first energy level and the second energy level of a valence band by dependence of temperatures. Also, (e2-h2) transition signal was observed at 300 K by PR measurement. From the PR measurement, we recognized that the transition was dominated the second energy level of conduction band than the first energy level of conduction band due to band filling. The other hand, PL signal of the first energy level of conduction band was dominated because of the electron screening effect.

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