• Title/Summary/Keyword: Moire fringes

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Applying Moire Interference Patterns to Clothing Design through Gratings (격자 무아레(Moire) 무늬를 활용한 의상 디자인)

  • 김병미;육근철;임우경
    • Journal of the Korea Fashion and Costume Design Association
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    • v.6 no.2
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    • pp.15-20
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    • 2004
  • These days are referred to as 'the times of textile fashion,' owing to the emphasis on textile design in the fashion industry. Accordingly, apparel companies have increased their interests in developing new types of textiles to overcome the limits of style and silhouette. Now the ultra-fashion of textile, a new way of process and design development, is given much more attention. A Moire interference pattern has a longer wavy circle of interference, an effect of intensity interference, than one made by piling more than one reflecting plate or transmitting plate. Till now, Moire interference patterns have been used to confirm scientific theory and to measure the structure of a body or a subject in areas such as physics and medical science. Work has also been done on the Moire interference effects on TV screens said to cause dizziness and eye strain. This study focuses on the new types of textiles by creating the appearance of the Moire phenomena. Contrary to the present usual stationary patterns of textiles, it is a varying pattern according to the different gratings, different angles, piling gratings, and the movements of the human bodies. In the preceding study, we observed Moire fringes formed by overlapping two different or same kinds of gratings such as parallel line gratings, square gratings, conic gratings and semicircular gratings and tried to find a promising possibility of new textiles through the method of clothes design simulation.

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Tow-dimensional Strain Analysis by Fourier Transform Moire Interferometry (Fourier 변환 모아레 간섭에 의한 이차원적 변형률 해석)

  • Park, T.W.;Shimada, T.;Morimoto, Y.;Han, E.K.
    • Journal of the Korean Society for Nondestructive Testing
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    • v.12 no.1
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    • pp.16-24
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    • 1992
  • Moire interferometry using a diffraction grating and a laser is a powerful technique for analizing small deformation of a specimen. In the method, the x and y-directional fringe patterns are obtained by using the x and y-directional sets of two beams. If the both sets of two beams are simultaneously incident to the specimen, the x and y-directional fringe patterns are super imposed. In this case, it is difficult to separate each directional fringe pattern. Therefore each fringe pattern has been separately recorded by selecting each set of two beams. In order to analyze a two-dimensional strain changing with time, Moire interferometry using the two-dimensional fourier transform method is proposed and the x and y-directional fringes are separated. By this method, the thermal deformation of a glass plate is analyzed.

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Signal Processing Algorithm for High Precision Encoder (초정밀 엔코더를 위한 신호처리기법 개발)

  • 정규원
    • Proceedings of the Korean Society of Machine Tool Engineers Conference
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    • 1999.10a
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    • pp.320-325
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    • 1999
  • An absolute type shaft encoder which utilized moire fringe will be presented in this paper. Linear moire fringe is commonly used to measure the displacement of the linear motion. However, an absolute encoder which measure the rotation angle of a shaft is operated usually with a code disk which the gray code pattern is printed on. Such encoder has inherently resolution limit because of the patterning mechanism and sensing mechanism. In order to measure the position of fringes which move as the code disk rotates, neural network was developed in this paper. Formerly fringe position is usually measured by a sophisticated software, which needs a little long calculation time. However, using neural network method can eliminate such calculation time, even though it needs learning job. The proposed method is verified through several experiments.

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모아레간섭을 이용한 3차원 형상측정

  • 박현구;김승우
    • Proceedings of the Korean Society of Precision Engineering Conference
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    • 1991.04a
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    • pp.195-201
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    • 1991
  • This paper presents appliation of optical moire topography to mesuring force profiles of dies and clay models for practical use in the field of production engineering. Moire topography has been studied intensively during last few decades in the area of optical physics and its mathmatical theory has now been established. In this study, two optical configurations are suggested in which resultant moire fringes can be readily analyzed, so that 3D proviles of the models are constructed through a series of image processing by suing ma chine vision techniques. Experimental results demonstreated by using a micro- computer and CCD camera show 0.05mm measuring spatial resulution, so that the optical method can effectively adopted in order to overcome many difficulties arising when using the existing contact-type digitizing methods.

HRTEM Observations on ZnSe/GaAs Interfaces Grown by MBE (MBE로 성장시킨 ZnSe/GaAs의 고분해능 TEM에 의한 계면관찰)

  • Lee, Hwack-Joo;Ryu, Hyun;Park, Hae-Sung;Kim, Tae-il
    • Applied Microscopy
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    • v.25 no.2
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    • pp.65-72
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    • 1995
  • The interfacial structures of ZnSe/GaAs which were grown by single chamber MBE at $300^{\circ}C$ were investigated by high resolution transmission electron microscope working at 300 kV with resolution of 0.18 nm. The interfaces of ZnSe/GaAs whose thickness is 2,700 nm are wavy and extensive stacking faults were formed in ZnSe epilayer but the interfaces maintained the coherency with the substrate GaAs. The stacking faults are formed in {111} planes and their sizes are $10{\sim}20nm$ in length and two or three atomic layer in width with the density of $10^9/cm^2$. Micortwins and moire fringes are also observed. However. in 10 nm ZnSe epilayer, the interfaces are pseudomorphic and only moire fringes are observed in local areas. The cylindrical defects which are perpendicular to the interface with $50{\sim}60nm$ in length, were observed with the interval of 50 nm at ZnSe/GaAs interfaces in 2,700nm epilayer. The origin and character of these defects are unknown, however, they played a role of producing the structural defects at the interfaces.

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Signal Processing Algorithm for High Precision Encoder (초정밀 엔코더를 위한 신호처리기법개발)

  • 정규원
    • Journal of the Korean Society of Manufacturing Technology Engineers
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    • v.9 no.3
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    • pp.103-110
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    • 2000
  • Shaft encoder which encodes the rotational angle of a shaft becomes more important recently due to factory automation and office automation. Although an absolute type encoder is more dsirable due to its convenience an incremental encoder is commonly used because of its cost and technical difficulties Fabricating a high resolution absolute encoder is very diff-cult because the physical size is limited by currently available technology. In order to overcome this difficulty Moire fringe can be used incorporated with gray code. In order to measure the position of fringes which move as the code disk rotates a neural network was developed in this paper. Formerly fringe position is usually measured by a sophisticated software which needs a little long calculation time. However using nerual network method can eliminate such calculation time even though it needs learning job The pro-posed method is verified through several experiments.

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Microstructure Characterization of Ternary ZnSSe/GaAs Epilayer Grown by MBE (MBE로 성장시킨 3원계 ZnSSe/GaAs 에피층의 미세구조 특성)

  • Lee, Hwack-Joo;Ryu, Hyun;Park, Hae-Sung;Kim, Tae-Il
    • Applied Microscopy
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    • v.25 no.3
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    • pp.75-81
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    • 1995
  • The microstructural characterization of ternary $ZnS_{x}Se_{1-x}$(x=0.085) on GaAs(001) substrate grown up to $2{\mu}m\;at\;300^{\circ}C$ by molecular beam epitaxy(MBE) which has a single growth chamber was investigated by high resolution transmission electron microscope (HRTEM) working at 300 kV with point resolution of 0.18nm. The interface in the ZnSSe/GaAs specimen maintains a pseudomorphism with the substrate, but the epilayer has high density of stacking faults and moire fringes. The pits which had formed along <111> direction were found at the interface of ZnSSe/GaAs. The pits were responsible for producing defects in both epilayer and substrate. The wavy interface which has the difference of 15nm in height was found to maintain the pseudomorphism with the substrate and no stacking faults were found around the interface. However there exists faint and fine moire fringes in the epilayer near interface.

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