• Journal of the Korean Chemical Society
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• v.45 no.4
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• pp.351-356
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• 2001

Planarization of the free-standing diamond film surface as smooth as possible could be obtained by using the hydrogen plasma etching with the diffusion of the carbon species into the metal alloy (Fe, Cr, Ni). For this process, we placed the free-standing diamond film between the metal alloy and the Mo substrate like a metal-diamond-molybdenum (MDM) sandwich. We set the sandwich-type MDM in a microwave-plasma-enhanced chemical vapor deposition (MPECVD) system. The sandwich-type MDM was heated over ca. 1000 $^{\circ}C$ by using the hydrogen plasma. We call this process as the hydrogen plasma etching with carbon diffusion process. After etching the free-standing diamond film surface, we investigated surface roughness, morphologies, and the incorporated impurities on the etched diamond film surface. Finally, we suggest that the hydrogen plasma etching with carbon diffusion process is an adequate etching technique for the fabrication of the diamond film surface applicable to electronic devices.

• Korean Journal of Optics and Photonics
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• v.26 no.4
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• pp.195-202
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• 2015

We developed a reflection ellipsometer so that one can measure the extremely small optical anisotropy of a rubbed polyimide alignment layer, without being disturbed by the residual anisotropy of the substrate. The optical anisotropy of the alignment layer was measured as rubbing strength was increased, and the measured anisotropy was compared to the retardation obtained by using a transmission-type ellipsometer, to confirm the reliability of our reflection ellipsometer. With this measured anisotropy we could verify the formation of an alignment layer by rubbing, and could quantitatively evaluate the formation of the alignment layer.

• Journal of Sensor Science and Technology
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• v.29 no.1
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• pp.27-32
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• 2020

This study proposes a pixel-patterning method for organic light-emitting diodes (OLEDs) based on thermal transfer. An infrared lamp was introduced as a heat source, and glass type donor element, which absorbs infrared and generates heat and then transfers the organic layer to the substrate, was designed to selectively sublimate the organic material. A 200 nm-thick layer of molybdenum (Mo) was used as the lightto-heat conversion (LTHC) layer, and a 300 nm-thick layer of patterned silicon dioxide (SiO₂), featuring a low heat-transfer coefficient, was formed on top of the LTHC layer to selectively block heat transfer. To prevent the thermal oxidation and diffusion of the LTHC material, a 100 nm-thick layer of silicon nitride (SiN_x) was coated on the material. The fabricated donor glass exhibited appropriate temperature-increment property until 249 ℃, which is enough to evaporate the organic materials. The alpha-step thickness profiler and X-ray reflection (XRR) analysis revealed that the thickness of the transferred film decreased with increase in film density. In the patterning test, we achieved a 100 ㎛-long line and dot pattern with a high transfer accuracy and a mean deviation of ± 4.49 ㎛. By using the thermal-transfer process, we also fabricated a red phosphorescent device to confirm that the emissive layer was transferred well without the separation of the host and the dopant owing to a difference in their evaporation temperatures. Consequently, its efficiency suffered a minor decline owing to the oxidation of the material caused by the poor vacuum pressure of the process chamber; however, it exhibited an identical color property.

• The Journal of Korean Institute of Electromagnetic Engineering and Science
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• v.19 no.5
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• pp.562-571
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• 2008

In this paper, we propose a novel structure of a spiral antenna with a CP characteristic for RFID reader in UHF band. Since the proposed antenna can be built by printing on a FR-4 substrate, it is appropriate for low-cost mass-production. The antenna is designed to operate in UHF band of $860{\sim}960$ MHz. The CP bandwidth is Increased enough to cover an overall UHF RFID band by using a spiral structure for the antenna arm. The matching bandwidth is broadened by using a quarter-wave transformer between the fred and the antenna body. The proposed antenna has advantages of its easy gain and pattern control with a small antenna size. The measured antenna performance shows the matching bandwidth of 13%, the CP bandwidth of 23%, and the gain of 6.5 dBi. This verifies that the proposed antenna is appropriate for RFID antennas in UHF band.

• The Journal of Korean Institute of Electromagnetic Engineering and Science
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• v.20 no.11
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• pp.1145-1160
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• 2009

In this paper, a dual band microstrip antenna with soft surface for gapfiller applications is proposed. The proposed antenna with similar radiation pattern and gain is fabricated on RO4003 substrate with a dielectric constant of 3.38 and a thickness of 0.508 mm, and operates in IEEE 802.11a/b bands. The size of the antenna is $50{\times}56.5{\times}5.5\;mm^3$ and the ground plane size including soft surface structure is $175.0{\times}154.4\;mm^2$. The antenna is fed by coaxial cable. The simulated bandwidths of the antenna are 2.388~2.493 GHz and 5.561~6.051 GHz for VSWR<2. The gains are 10.63 dBi and 10.33 dBi, respectively, for the lower and upper bands.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.26 no.5
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• pp.367-372
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• 2013

In this paper, micro dried bio-potential electrodes are demonstrated for sEMG (surface ElectroMyoGraphic) signal measurement using conductive epoxy on the textile fabric. Micro dried bio-potential electrodes on the textile fabric substrate have several advantages over the conventional wet/dry electrodes such as good feeling of wearing, possibility of extended-wearing due to the good ventilation. Also these electrodes on the textile fabric can easily apply to the curved skin surface. These electrodes are fabricated by the screen-printing process with the size of $1mm{\times}10mm$ and the resultant resistance of these electrodes have the average value of $0.4{\Omega}$. The conventional silver chloride electrode shows the average value of $0.3{\Omega}$. However, the electrode on the textile fabric are able to measure the sEMG signal without feeling of difference and this electrode shows the lower resistance of $1.03{\Omega}$ than conventional silver chloride electrode with $2.8{\Omega}$ in the condition of the very sharp curve surface (the radius of curvature is 40 mm).

• Journal of the Korean Magnetic Resonance Society
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• v.20 no.2
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• pp.56-60
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• 2016

Adenylate kinase (AK) enzyme which acts as the catalyst of reversible high energy phosphorylation reaction between ATP and AMP which associate with energetic metabolism and nucleic acid synthesis and signal transmission. This enzyme has three distinct domains: Core, AMP binding domain (AMPbd) and Lid domain (LID). The primary role of AMPbd and LID is associated with conformational changes due to flexibility of two domains. Three dimensional structure of human AK1 has not been confirmed and various mutation experiments have been done to determine the active sites. In this study, AK1R138A which is changed arginine[138] of LID domain with alanine[138] was made and conducted with NMR experiments, backbone dynamics analysis and mo-lecular docking dynamic simulation to find the cause of structural change and substrate binding site. Synthetic human muscle type adenylate kinase 1 (hAK1) and its mutant (AK1R138A) were re-combinded with E. coli and expressed in M9 cell. Expressed proteins were purified and finally gained at 0.520 mM hAK1 and 0.252 mM AK1R138A. Multinuclear multidimensional NMR experiments including HNCA, HN(CO)CA, were conducted for amino acid sequence analysis and signal assignments of $^1H-^{15}N$ HSQC spectrum. Our chemical shift perturbation data is shown LID domain residues and around alanine[138] and per-turbation value(0.22ppm) of valine[179] is consid-ered as inter-communication effect with LID domain and the structural change between hAK1 and AK1R138A.

• Proceedings of the KIEE Conference
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• 2002.07c
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• pp.1536-1538
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• 2002

Effects at thermal treatment on the structural and electrical properties at DLC films have been studied. The DLC films were deposited by using a modified FCVA system as a function at negative substrate bias voltage, deposition time, and nitrogen flow rate. The thermal treatment on DLC films could be achieved by performing the RTA process at $600^{\circ}C$, 2min. Structural investigation on the thermal treatment effect was evaluated by inspecting the Raman spectroscopy, XPS, AFM, and internal compressive stress. In addition, the electrical properties of DLC films were evaluated by using the high current source and Lab-View data acquisition system. As the result at RTA treatment, $sp^3/sp^2$ ratio and internal compressive stress of the DLC films were decreased tram 5% to 22% and from 1GPa to 3GPa, and the $I_D/I_G$ intensity ratios was increased from 0.19 to 0.35. It was also found that the variation of internal stress of DLC films strongly agree with the variation of $sp^3/sp^2$ fraction and $I_D/I_G$ intensity ratio.

• 한국신재생에너지학회:학술대회논문집
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• 2009.11a
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• pp.382-382
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• 2009

염료감응형 태양전지의 구성체 중 전극으로 연구 되어 지고 있는 $TiO_2$는 기존에 대량 생산이 가능한 spin coating법, screen printing법, spray법의 연구가 이루어져 왔으나 고 효율 태양전지에 쓰이는 전극 시스템에 비해 고 분산성을 지닌 $TiO_2$페이스트를 제조 하는데 어려움이 있다. 그리고 플렉시블 디스플레이 소자의 응용을 위해서는 소자 공정 온도인 $250^{\circ}C$ 이하의 공정 온도가 요구 되어 지므로 고온공정인 CVD법은 이에 적합하지 않다. 이에 본 연구는 진공 증착 방법인 광원자층증착법을 이용하여 $150^{\circ}C$이하의 저온공정온도에서도 적용이 가능한 $TiO_2$ 박막을 185nm의 UV light를 조사하여 glass 기판위에 제조 하고 그에 따른 박막의 물성 분석을 하였다. Mo source로는 titanium tetraisopropoxide(TTIP)와 reactant gas 로는 $H_2O$를 사용하였으며 불활성 기체인 Ar 가스는 purge 가스로 각각 사용하였다. $100^{\circ}C{\sim}250^{\circ}C$ 공정온도를 변수로 $TiO_2$ 박막을 제조 하였으며 제조된 $TiO_2$ 박막의 물성 분석을 위해 FESEM, TEM을 이용하여 표면 및 두께를 분석하였다. 또한 $100^{\circ}C$ 400 cycles에서 약 12nm 막 두께를 관찰 할 수 있었으며 그 결과 박막의 성장률이 $0.3{\AA}$/cycle 임을 확인 할 수 있었다. 그리고 UV-VIS을 이용하여 박막의 좌외선에 대한 흡수도 및 투과도 분석을 하였다. 또한 XPS 성분 분석을 통하여 $100^{\circ}C$의 저온 공정에서 형성된 박막이 $TiO_2$임을 확인 하였다. 이러한 결과에서 185nm의 UV light에 의한 광원자층 증착법으로 $100^{\circ}C$의 저온에서도 $TiO_2$ 박막이 증착 되는 것을 확인 할 수 있었다.

• Proceedings of the Korean Vacuum Society Conference
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• 2011.08a
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• pp.127-127
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• 2011

We investigate the transparent TFTs using a transparent ZnSnO3 (ZTO)/Ag/ZTO multilayer electrode as S/D electrodes with low resistivity of $3.24{\times}10^{-5}$ ohm-cm, and high transparency of 86.29% in ZTO based TFTs. The Transparent TFTs (TTFTs) are prepared on glass substrate coated 100 nm of ITO thin film. On atomic layer deposited $Al_2\;O_3$, 50 nm ZTO layer is deposited by RF magnetron sputtering through a shadow mask for channel layer using ZTO target with 1 : 1 molar ratio of ZnO : $SnO_2$. The power of 100W, the working pressure of 2mTorr, and the gas flow of Ar 20 sccm during the ZTO deposition. After channel layer deposition, a ZTO (35 nm)/Ag (12 nm)/ZTO(35 nm) multilayer is deposited by DC/RF magnetron sputtering to form transparent S/D electrodes which are patterned through the shadow mask. Devices are annealed in air at 300$^{\circ}C$ for 30 min following ZTO deposition. Using UV/Visible spectrometer, the optical transmittances of the TTFT using ZTO/Ag/ ZTO multilayer electrodes are compared with TFT using Mo electrode. The structural properties of ZTO based TTFT with ZTO/Ag/ZTO multilayer electrodes are analyzed by high resolution transmission electron microscopy (HREM) and X-ray photoelectron spectroscopy (XPS). The transfer and output characterization of ZTO TTFTs are examined by a customized probe station with HP4145B system in are.