• 마이크로전자및패키징학회지
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• 제8권2호
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• pp.15-18
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• 2001

Magnetron sputtering 장비를 이용하여 극자외선 노광 공정용 Mo/Si 다층 박막을 증착하였다. 증착 파워로는 Mo의 경우 DC파워를, Si의 경우 RF파워를 이용하였다. 각각의 target에 인가되는 DC 또는 RF 파워의 시간 및 파워 조절을 통해서 원하는 구조인자를 가진 다층박막을 증착하였다. 증착된 다층박막을 단면 TEM, low/high angle XRD 등을 이용하여 박막의 미세구조와 interfacial layer의 거동을 살펴 보았으며, low angle XRD로부터 다층박막을 간접적으로 평가할 수 있었으며, 단면 TEM으로부터 Si위에 형성되는 Mo의 interfacial layer가 Mo위에 형성되는 경우보다 두꺼운 것을 알 수 있었다.

• 한국전기전자재료학회논문지
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• 제30권1호
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• pp.23-26
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• 2017

Mo doped carbon (C:Mo) thin films were fabricated with various Mo target power densities by unbalanced magnetron sputtering (UBM). The effects of target power density on the surface, structural, and electrical properties of C:Mo films were investigated. UBM sputtered C:Mo thin films exhibited smooth and uniform surfaces. However, the rms surface roughness of C:Mo films were increased with the increase of target power density. Also, the resistivity value of C:Mo film as electrical properties was decreased with the increase of target power density. From the performance of organic thin filml transistor using conductive C:Mo gate electrode, the carrier mobility, threshold voltage, and on/off ratio of drain current (Ion/Ioff) showed $0.16cm^2/V{\cdot}s$, -6.0 V, and $7.7{\times}10^4$, respectively.

• 한국표면공학회지
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• 제53권6호
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• pp.343-350
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• 2020

The degradation of mechanical properties of nitride coatings to steel substrates is one of the main challenges for industrial applications. In this study, plasma nitriding treatment was used in order to increase the mechanical properties of Mo-Cu-N coating to the H13 tool steel. The nanostructured Mo-Cu-N coating was deposited using pulsed DC magnetron sputtering method with a single alloy Mo-Cu target. Mechanical properties of MoN-Cu coated samples after nitriding were found to be relatively better than non-nitrided MoN-Cu coating.

• 대한전기학회논문지:전기물성ㆍ응용부문C
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• 제50권12호
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• pp.607-613
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• 2001

Molybdenum thin films were deposited on the soda lime glass(SLG) substrates by direct-current planar magnetron sputtering, with a sputtering power density of $4.44W/cm^2$. The working pressure was varied from 0.5 mtorr to 20 mtorr to gain a better understanding of the effect of sputtering pressure on the morphology and microstructure of the Mo film. Thin films of $CU(InGa)Se_2$ (CIGS) were deposited on the Mo-coated glass by three stage co-evaporation process. The highest efficiency device was obtained at the maximum value of the tensive stress. The morphology of Mo-coated films were examined by using scanning electron microscopy The film's microstructure, such as the preferred orientation, the full width at half-maximum(FWHM), and the residual intrinsic stress were examined by X-ray diffraction.

• Korean Chemical Engineering Research
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• 제49권2호
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• pp.195-199
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• 2011

DC 마그네트론 스퍼터링 방법을 이용하여 soda lime glass 위에 Mo 박막을 증착하였다. DC power와 증착 압력을 변화시키면서 상온에서 Mo 박막을 증착하였고 증착된 박막의 전기적 성질 및 구조적 성질을 조사하였다. DC power가 증가할수록 박막의 증착속도는 증가되었고 전기 저항도는 감소하였으며 박막의 결정성이 향상되는 것을 관찰할 수 있었다. 증착 압력이 감소할수록 박막의 증착속도와 전기 저항도가 감소하였으며 가늘고 긴 모양의 결정입자가 조밀하게 박막을 형성하였다. 압력이 증가함에 따라서 결정입자는 원형으로 변형되었으며 박막의 표면에 공극의 생성이 증가하였다. Mo 박막의 전기 저항도는 Mo 원자에 결합된 산소의 양이 많아질수록 증가하게 되고, 박막의 결정성이 높아지면 산소의 결합도가 감소하여 낮은 저항도를 갖게 되는 것을 확인하였다.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2002년도 추계학술대회 논문집 Vol.15
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• pp.460-463
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• 2002

$MoO_3$ thin films were deposited on electrode and heater screen-printed alumina substrates in $O_2$ atmosphere by RF reactive sputtering using Molybdenum metal target. The deposition was performed at $300^{\circ}C$ with 350W of a forward power in an $Ar-O_2$ atmosphere. The working pressure was maintained at $3{\times}10^{-2}mtorr$ and all deposited films were annealed at $500^{\circ}C$ for 5hours. To investigate gas sensing characteristics of the addition doped $MoO_3$ thin film, Co, Ni and Pt were used as adding dopants. The sensing properties were investigated in tenn of gas concentration under exposure of reducing gases such as $H_2$, $NH_3$ and CO at optimum working temperature. Co-doped $MoO_3$ thin film shows the maximum 46.8% of sensitivity in $NH_3$ and Ni-doped $MoO_3$ thin film exhibits 49.7% of sensitivity in $H_2$.

• 한국전기전자재료학회논문지
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• 제36권6호
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• pp.588-593
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• 2023

The advantage of OTFT technology is that large-area circuits can be manufactured on flexible substrates using a low-cost solution process such as inkjet printing. Compared to silicon-based inorganic semiconductor processes, the process temperature is lower and the process time is shorter, so it can be widely applied to fields that do not require high electron mobility. Materials that have utility as electrode materials include carbon that can be solution-processed, transparent carbon thin films, and metallic nanoparticles, etc. are being studied. Recently, a technology has been developed to facilitate charge injection by coating the surface of the Al electrode with solution-processable titanium oxide (TiOx), which can greatly improve the performance of OTFT. In order to commercialize OTFT technology, an appropriate method is to use a complementary circuit with excellent reliability and stability. For this, insulators and channel semiconductors using organic materials must have stability in the air. In this study, carbon-doped Mo (MoC) thin films were fabricated with different graphite target power densities via unbalanced magnetron sputtering (UBM). The influence of graphite target power density on the structural, surface area, physical, and electrical properties of MoC films was investigated. MoC thin films deposited by the unbalanced magnetron sputtering method exhibited a smooth and uniform surface. However, as the graphite target power density increased, the rms surface roughness of the MoC film increased, and the hardness and elastic modulus of the MoC thin film increased. Additionally, as the graphite target power density increased, the resistivity value of the MoC film increased. In the performance of an organic thin film transistor using a MoC gate electrode, the carrier mobility, threshold voltage, and drain current on/off ratio (I_on/I_off) showed 0.15 cm²/V·s, -5.6 V, and 7.5×10⁴, respectively.

• 한국표면공학회:학술대회논문집
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• 한국표면공학회 2017년도 춘계학술대회 논문집
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• pp.95.1-95.1
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• 2017

In this study, it has been tried to make the single Mo-Cu alloying targets with the Cu showing the best surface hardness that was determined by investigation on the coatings with the double target process. The single alloying targets were prepared by powder metallurgy methods such as mechanical alloying and spark plasma sintering. The nanocomposite coatings were prepared by reactive magnetron sputtering process with the single alloying targets in $Ar+N_2$ atmosphere. The microstructure changes of the Mo-Cu-N coatings with diverse Cu contents were investigated by using XRD, SEM and EDS. The mechanical properties of the coatings were evaluated by using nano-indentor, scratch test, and ball on disc methods. Especially, the coated samples were tested by using various lubricating oil to compare the property of anti wear-resistance. In this study, the nano-composite MoN-Cu coatings prepared using an alloying target was eventually compared with the coatings from the multiple targets.

• 한국표면공학회지
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• 제33권4호
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• pp.266-272
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• 2000

Sputtered $MoS_2$ thin films provide lubrication and wear improvements for vacuum and space applications. In this study, deposition of $MoS_2$ thin films by R.F. magnetron sputtering was studied with regard to the micro-structural change of $MoS_2$ film and mechanical properties. The coating parameters such as the working pressure, the RF power, the substrate temperature, the etching time were varied to determine how these parameters affected the film morphology and mechanical properties of deposited films. The best wear properties and critical load were observed with the film deposited at $70^{\circ}C$, 1.0$\times$$10^{ -3}$ Torr, 170W and 1 hour deposition time. The critical load increased with the increase of sputter etching time.

• 한국표면공학회:학술대회논문집
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• 한국표면공학회 2000년도 추계학술발표회 초록집
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• pp.10-11
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• 2000