• 제목/요약/키워드: Mixture Gas

검색결과 2,019건 처리시간 0.035초

$Cl_2$/Ar 분위기에서 GST 박막의 ICP 에칭 (Inductively Coupled Plasma Etching of GST Thin Films in $Cl_2$/Ar Chemistry)

  • 유금표;박은진;김만수;이승환;권광호;민남기
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 2006년도 제37회 하계학술대회 논문집 C
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    • pp.1438-1439
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    • 2006
  • $Ge_{2}Sb_{2}Te_5$(GST) thin film at present is a promising candidate for a phase change random access memory (PCRAM) based on the difference in resistivity between the crystalline and amorphous phase. PCRAM is an easy to manufacture, low cost storage technology with a high storage density. Therefore today several major chip in manufacturers are investigating this data storage technique. Recently, A. Pirovano et al. showed that PCRAM can be safely scaled down to the 65 nm technology node. G. T Jeonget al. suggested that physical limit of PRAM scaling will be around 10 nm node. Etching process of GST thin ra films below 100 nm range becomes more challenging. However, not much information is available in this area. In this work, we report on a parametric study of ICP etching of GST thin films in $Cl_2$/Ar chemistry. The etching characteristics of $Ge_{2}Sb_{2}Te_5$ thin films were investigated using an inductively coupled plasma (ICP) of $Cl_2$/Ar gas mixture. The etch rate of the GST films increased with increasing $Cl_2$ flow rate, source and bias powers, and pressure. The selectivity of GST over the $SiO_2$ films was higher than 10:1. X-ray photoelectron spectroscopy(XPS) was performed to examine the chemical species present in the etched surface of GST thin films. XPS results showed that the etch rate-determining element among the Ge, Sb, and Te was Te in the $Cl_2$/Ar plasma.

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저온연소조건에서 급속압축기를 이용한 n-heptane/n-butanol 혼합연료의 착화지연에 관한 연구 (The investigation on the Ignition Delay of n-heptane/n-butanol Blend Fuel Using a Rapid Compression Machine at Low Temperature Combustion Regime)

  • 송재혁;강기중;;;최경민;김덕줄
    • 한국연소학회지
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    • 제18권2호
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    • pp.32-41
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    • 2013
  • This study presents both experimental and numerical investigation of ignition delay time of n-heptane and n-butanol binary fuel. The $O_2$ concentration in the mixture was set to 9-10% to make high exhaust gas recirculation( EGR) rate condition which leads low NOx and soot emission. Experiments were performed using a rapid compression machine(RCM) at compressed pressure 20bar, several compressed temperature and three equivalence ratios(0.4, 1.0, 1.5). In addition, a numerical study on the ignition delay time was performed using CHEMKIN codes to validate experimental results and predict chemical species in the combustion process. The results showed that the ignition delay time increased with increasing the n-butanol fraction due to a decrease of oxidation of n-heptane at the low temperature. Moreover, all of the binary fuel mixtures showed the combustion characteristics of n-heptane such as cool flame mode at low temperature and negative-temperature-coefficient(NTC) behavior. Due to the effect of high EGR rate condition, the operating region is reduced at lean condition and the ignition delay time sharply increased compared with no EGR condition.

ANALYSIS OF HCCI COMBUSTION CHARACTERISTICS BASED ON EXPERIMENTATION AND SIMULATIONS-INFLUENCE OF FUEL OCTANE NUMBER AND INTERNAL EGR ON COMBUSTION

  • Iijima, A.;Yoshida, K.;Shoji, H.;Lee, J.T.
    • International Journal of Automotive Technology
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    • 제8권2호
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    • pp.137-147
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    • 2007
  • Homogenous Charge Compression Ignition (HCCI) combustion systems can be broadly divided for the process applied to 4-stroke and 2-stroke engines. The former process is often referred to as simply HCCI combustion and the latter process as Active Thermo-Atmosphere Combustion (ATAC). The region of stable engine operation tends to differ greatly between the two processes. In this study, it was shown that the HCCI combustion process of a 4-stroke engine, characterized by the occurrence of autoignition under a high compression ratio, a lean mixture and wide open throttle operation, could be simulated by operating a 2-stroke engine at a higher compression ratio. On that basis, a comparison was made of the combustion characteristics of high-compression-ratio HCCI combustion and ATAC, characterized as autoignited combustion in the presence of a large quantity of residual gas at a low compression ratio and part throttle. The results showed that one major difference between these two combustion processes was their different degrees of susceptibility to the occurrence of cool flame reactions. Compared with high-compression-ratio HCCI combustion, the ignition timing of ATAC tended not to change in relation to different fuel octane numbers. Furthermore, when internal EGR was applied to high-compression-ratio HCCI combustion, it resulted in combustion characteristics resembling ATAC. Specifically, as the internal EGR rate was increased, the ignition timing showed less change in relation to changes in the octane number and the region of stable engine operation also approached that of ATAC.

그라파이트 블록을 원료로써 재활용한 β-SiC 분말 합성 (Synthesis of β-SiC Powder using a Recycled Graphite Block as a Source)

  • 민닷 응우옌;방정원;김수룡;김영희;정은진;황규홍;권우택
    • 자원리싸이클링
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    • 제26권1호
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    • pp.16-21
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    • 2017
  • 본 연구는 SiC 결정 성장을 위한 원료 분말 합성법에 관한 것이다. ${\beta}-SiC$ 분말들은 높은 온도 조건(>$1400^{\circ}C$)에서 실리콘 분말과 탄소 분말의 반응에 의해서 합성 된다. 이 반응은 진공 상태(또는 Ar 가스 분위기)에서 실리콘+탄소 혼합물이 반응하고 다결정의 SiC 분말을 형성하기 충분한 횟수를 거쳐 그라파이트 도가니 안에서 진행된다. 최종 결과물의 특성들은 X-ray 회절, SEM/EDS, 입도 분석 및 ICP-OES을 통해 분석되었다. 또한, 최종 결과물의 순도는 the Korean Standard KS L 1612에 의거해서 분석했다.

PECVD법에 의해 증착된 Ti-B-C코팅막 내의 보론함량과 증착온도에 따른 미세구조 및 기계적 물성의 변화 (The Effect of Boron Content and Deposition Temperature on the Microstructure and Mechanical Property of Ti-B-C Coating Prepared by Plasma-enhanced Chemical Vapor Deposition)

  • 옥정태;송풍근;김광호
    • 한국표면공학회지
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    • 제38권3호
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    • pp.106-111
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    • 2005
  • Ternary Ti-B-C coatings were synthesized on WC-Co and Si wafers substrates by a PECVD technique using a gaseous mixture of $TiCl_4,\;BCl_3,\;CH_4,\;Ar,\;and\; H_2$. The effects of deposition variables such as substrate temperature, gas ratio, $R_x=[BCl_3/(CH_4+BCl_3)]$ on the microstructure and mechanical properties of Ti-B-C coatings were investigated. From our instrumental analyses, the synthesized Ti-B-C coatings was confirmed to be composites consisting of nanocrystallites TiC, quasi-amorphous TiB2, and amorphous carbon at low boron content, on the contrary, nanocrystallites $TiB_2$, quasi-amorphous TiC, and amorphous carbon at relatively high boron content. The microhardness of the Ti-B-C coatings increased from $\~23 GPa$ of TiC to $\~38 GPa$ of $Ti_{0.33}B_{0.55}C_{0.11}$ coatings with increasing the boron content. The $Ti_{0.33}B_{0.55}C_{0.11}$ coatings showed lower average friction coefficient of 0.45, in addition, it showed relatively better wear behavior compared to other binary coatings of $TiB_2$ and TiC. The microstruture and microhardness value of Ti-B-C coatings were largely depend on the deposition temperature.

폐 반도체 슬러리 및 폐 망간전지 흑연봉으로부터 탄화규소 합성 (Synthesis of SiC from the Wire Cutting Slurry of Silicon Wafer and Graphite Rod of Spent Zinc-Carbon Battery)

  • 손용운;정인화;손정수;김병규
    • 자원리싸이클링
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    • 제12권3호
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    • pp.25-30
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    • 2003
  • 본 연구의 목적은 실리콘웨이퍼의 절단공정에서 발생한 폐슬러리와 폐망간전지에서 발생하는 흑연봉을 각각 규소 및 탄소의 출발물질로 사용하여 가스터빈 부품, 열교환기 등에 사용되는 탄화규소(SiC)를 합성하는 연구를 수행하였다. 실리콘웨이퍼의 절단공정에서 발생하는 폐슬러리로부터 비중차이에 의한 선별과 자력선별 등에 의해 정제된 규소와 탄화규소를 얻을 수 있었으며, 폐망간전지를 해체하여 얻은 탄소봉으로부터 수세와 분쇄를 통하여 탄소분말을 얻을 수 있었다. 탄화규소의 합성은 규소와 당량비의 탄소분발을 혼합하여 1$600^{\circ}C$이상의 온도에서 아르곤 분위기와 진공분위기 하에서 2시간 유지시켰을 때 이루어졌으며, 이때 합성된 탄화규소의 순도는 99% 이상이었다.

Ulra shallow Junctions을 위한 플라즈마 이온주입 공정 연구 (The study of plasma source ion implantation process for ultra shallow junctions)

  • 이상욱;정진열;박찬석;황인욱;김정희;지종열;최준영;이영종;한승희;김기만;이원준;나사균
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2007년도 하계학술대회 논문집 Vol.8
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    • pp.111-111
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    • 2007
  • Further scaling the semiconductor devices down to low dozens of nanometer needs the extremely shallow depth in junction and the intentional counter-doping in the silicon gate. Conventional ion beam ion implantation has some disadvantages and limitations for the future applications. In order to solve them, therefore, plasma source ion implantation technique has been considered as a promising new method for the high throughputs at low energy and the fabrication of the ultra-shallow junctions. In this paper, we study about the effects of DC bias and base pressure as a process parameter. The diluted mixture gas (5% $PH_3/H_2$) was used as a precursor source and chamber is used for vacuum pressure conditions. After ion doping into the Si wafer(100), the samples were annealed via rapid thermal annealing, of which annealed temperature ranges above the $950^{\circ}C$. The junction depth, calculated at dose level of $1{\times}10^{18}/cm^3$, was measured by secondary ion mass spectroscopy(SIMS) and sheet resistance by contact and non-contact mode. Surface morphology of samples was analyzed by scanning electron microscopy. As a result, we could accomplish the process conditions better than in advance.

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MWPECVD에 의한 박막의 합성과 방사선 검출 특성에 관한 연구 (A study on Synthesis and Radiation Detector Fabrication of Thin Films by MW Plasma CVD)

  • 구효근;이덕규;송재흥;노경석;박상현
    • 대한방사선기술학회지:방사선기술과학
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    • 제27권2호
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    • pp.45-50
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    • 2004
  • 방사선검출기에 사용되는 다이아몬드는 그 비저항이 $10^{12}[{\Omega}m]$로 매우 크기 때문에 고전압 하에서도 누설전류가 매우 작아 실리콘과 달리 p-n접합을 하지 않고 바로 고전압을 걸 수 있는 이점이 있다. 또한 절연파괴 전압이 매우 크기 때문에 이동속도가 포화되는 전압까지 올릴 수 있다. 이 결과 다이아몬드 내에서의 전하 이동속도는 실리콘의 최대속도보다 약 20배 정도 빠르다. $200[{\mu}m]$ 두께의 박막을 통해 전하가 모두 수집되는 시간은 불과 1[ns] 정도이다. 이상과 같이 독특한 다이아몬드의 성질을 이용하여 방사선검출기에 사용되는 물질로 파고계수형 전리조나 분광계, 열형광선량계, 형광검출기 그리고 핵방사선검출기 등에 사용된다. 본 연구에서는 마이크로파 플라즈마 CVD법으로 $CH_4-H_2-O_2$계로부터 몰리브덴기판 위에 100시간 동안 성장시킨 결과 약 $100[{\mu}m]$의 두께를 가진 결정성이 좋은 방사선검출기용 다이아몬드막을 성장시킬 수 있었고, X-선 방사선량에 따른 방사선검출기의 전류파형을 측정한 결과 방사선량에 따라 전류가 증가됨을 알 수 있었다.

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Annealing behavior of the Pt films sputtered with $Ar/N_2$ gas mixture by real-time, in situ ellipsometry

  • 이동수;박동연;우현정;김승현;주한용;안응진;윤의준
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2000년도 제18회 학술발표회 논문개요집
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    • pp.125-125
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    • 2000
  • 백금 스퍼터 증착시 아르곤에 산소와 같은 첨가 가스를 사용할 경우 산화막에 대한 접착력이 좋아지며 백금 박막의 우선배향성을 조절할 수 있음이 알려져 있다. 이러한 첨가 가스는 백금 박막에 상당량 포함되며 스퍼터링 후 열처리 과정에서 탈착되는 것으로 알려져 있다. 후열처리 도중 첨가 가스의 탈착 거동이 백금 박막의 미세구조, 조성 및 전기 전도도 등과 같은 제반 물성에 영향을 미칠 것이라 추정된다. 본 연구에서는 백금의 스퍼터링 시 질소를 첨가하여 질소가 포함된 백금 박막을 증착한 후 질소 탈착 거동을 연구하기 위해 실시간 타원해석기(in situ ellipsometer)를 이용하여 진공열처리(15mTorr)하면서 온도변화에 따른 유효굴절율(n)과 소광계수(k) 값을 구하였다. 또한 산소를 첨가하여 얻은 백금 박막의 결과와 비교하여 백금 박막내에 포함된 산소와 질소의 탈착 거동의 차이를 조사하였다. 산소를 이용하여 우선배향성이 (200)으로 조절된 박막의 경우 n과 k의 급격한 변화가 관찰되었으며 이로부터 55$0^{\circ}C$ 온도에서 산소가 급격히 빠져나감을 추측할 수 있었으며 열처리 후에는 백금 bulk 값에 가까운 값을 가짐을 알 수 있었다. 한편, 질소를 사용하여 (200)으로 우선배향성이 조절된 박막의 경우 n,k 값의 후열처리 도중의 변화 양상은 스퍼터링 압력에 크게 의존하는 것으로 나타났다. 22mTorr에서 스퍼터링한 박막의 경우 23$0^{\circ}C$ 부근에서 굴절률과 미세구조의 변화가 있음을 관찰할 수 있었으나, 10mTorr에서 스퍼터링한 시편의 경우 굴절률의 변화양상은 산소를 상요한 경우와 매우 유사한 거동을 나타내지만 열처리 후에는 상대적으로 낮은 n,k 값을 나타내고 있었다. 또한 열처리 시편의 미세구조 변화에 대한 분석 결과 산소 사용의 경우는 측정온도 범위내에서는 후 열처리 후에도 박막내에 hole이나 hillock 등이 관찰되지 않아 bulk 값에 가까운 n, k 값을 가지지만, 질소 사용의 경우는 hole, 표면 거칠기, 혹은 스퍼터링 중에 인입된 질소의 탈착이 완전히 이루어지지 못해 bulk 값과 다르게 나온 것으로 생각된다.

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Friction and Wear Properties of Boron Carbide Coating under Various Relative Humidity

  • Pham Duc-Cuong;Ahn Hyo-Sok;Yoon Eui-Sung
    • KSTLE International Journal
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    • 제6권2호
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    • pp.39-44
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    • 2005
  • Friction and wear properties of the Boron carbide ($B_{4}C$) coating 100 nm thickness were studied under various relative humidity (RH). The boron carbide film was deposited on silicon substrate by DC magnetron sputtering method using $B_{4}C$ target with a mixture of Ar and methane ($CH_4$) as precursor gas. Friction tests were performed using a reciprocation type friction tester at ambient environment. Steel balls of 3 mm in diameter were used as counter-specimen. The results indicated that relative humidity strongly affected the tribological properties of boron carbide coating. Friction coefficient decreased from 0.42 to 0.09 as the relative humidity increased from $5\%$ to $85\%$. Confocal microscopy was used to observe worn surfaces of the coating and wear scars on steel balls after the tests. It showed that both the coating surface and the ball were significantly worn-out even though boron carbide is much harder than the steel. Moreover, at low humidity ($5\%$) the boron carbide showed poor wear resistance which resulted in the complete removal of coating layer, whereas at the medium and high humidity conditions, it was not. X-ray photoelectron spectroscopy (XPS) and Auger electron spectroscopy (AES) analyses were performed to characterize the chemical composition of the worn surfaces. We suggest that tribochemical reactions occurred during sliding in moisture air to form boric acid on the worn surface of the coating. The boric acid and the tribochemcal layer that formed on steel ball resulted in low friction and wear of boron carbide coating.