• Transactions of Materials Processing
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• v.14 no.5 s.77
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• pp.477-481
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• 2005

Wafer scale micro mirror array with high surface quality for small form factor (SFF) optical pick-up was fabricated by micro UV-molding. To replicate micro mirror array for SFF optical pick-up, a high- precision mold was fabricated using micro-machining technology. Wafer scale micro mirror array was UV-molded using the mold and then the process was optimized experimentally. The surface flatness and roughness of UV-molded micro mirror array were measured by white light scanning interferomety system and analyzed the transcribing characteristics. Finally, the measured flatness of UV-molded micro mirror away for SFF optical pick-up, which was fabricated in the optimum processing condition, was less than 70nm.

• Proceedings of the Korean Society for Technology of Plasticity Conference
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• 2005.05a
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• pp.47-50
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• 2005

In this study, micro mirror array for small form factor optical pick-up was replicated by micro UV-molding. First, mold for micro mirror array was fabricated using micromachining. Also, to analyze the characteristics of the surface quality, flatness of replicated mirror surface were measured by white light scanning inteferometry system. The results show that the micro mirror array with a sufficient surface quality can be obtained by polymer replication process.

• JSTS:Journal of Semiconductor Technology and Science
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• v.1 no.2
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• pp.132-139
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• 2001

We considered the uniformity of fabricated micromirror arrays by characterizing the fabrication process and calculating the appropriate driving voltages of micromirrors used as virtual photomask in maskless photolithography. The uniformity of the micromirror array in terms of driving voltage and optical characteristics is adversely affected by factors, such as the air gap between the bottom electrode and the mirror plate, the spring shape and the deformation of the mirror plate or torsion spring. The thickness deviation of the photoresist sacrificial layer, the misalignment between mirror plate and bottom electrode, the aluminum deposition condition used to produce the spring and the mirror plate, and initial mirror deflection were identified as key factors. Their importance lies in the fact that they are related to air gap deviations under the mirror plate, asymmetric driving voltages in left and right mirror directions, and the deformation of the Al sring or mirror plate after removal of the sacrificial layer. The plasma ashing conditions used for removing the sacrificial layer also contributed to the deformation of the mirror plate and spring. Driving voltages were calculated for the pixel operation of the micromirror array, and the non-uniform characteristics of fabricated micromirrors were taken into consideration to improve driving performance reliability.

• Journal of the Institute of Electronics and Information Engineers
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• v.50 no.8
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• pp.94-102
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• 2013

We propose the mirror active element pattern (AEP) method for the radiation pattern computation of linear array antennas versus scan angles. The computation time for the radiation pattern of linear array antennas using the mirror AEP method is reduced by almost half compared to that using the AEP method because the number of AEPs of elements obtained by the full-wave simulation necessary for the radiation pattern computation of linear array antennas is reduced by almost half. The difference between the radiation patterns of linear array antennas obtained by the full-wave simulation and mirror AEP method is very small for wide scan angle range when the radiation pattern of an antenna element is symmetric.

• Broadcasting and Media Magazine
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• v.6 no.2
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• pp.84-101
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• 2001

In this paper, we present a primitive system design of a super multi-view(SMV) 3-D display system based on a focused light array(FLA) concept using reflective vibrating scanner array(ViSA). The parallel beam scanning using a vibrating scanner array is performed by moving left and right an array of curvature-compensated mirrors or diamond-ruled reflective grating attached to a vibrating membrane. The parallel laser beam scanner array can replace the polygon mirror scanner which has been used in the SMV 3-D display system based on the focused light array(FLA) concept proposed by Kajiki at TAO(Telecommunications) Advancement Organization). The proposed system has great advantages in the sense that it requires neither huge imaging optics nor mechanical scanning pals. Some mathematical analyses and fundamental limitations of the proposed system are presented. The proposed vibrating scanner array, after some modifications and refinements, may replace polygon mirror-based scanners in the near future.

• Proceedings of the KIEE Conference
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• 2000.07c
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• pp.2257-2259
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• 2000

This paper reports on the design, fabrication and driving experiment of micro mirror array(MMA) for lithography process to apply to biochip fabrication Photolithography technology is applied to activate specific area on the surface of modified glass surface, DNA monomers are bound on the activated area of the glass surface. After repeat of DNA monomer synthesizing process, DNA single strand probes could be solid-synthesized on the glass substrate. Without using photomask, photolithography process is tried using micro mirror array(MMA). Photomask or mask alignment is not required in maskless photolithography process using micro mirror array.

• Journal of the Institute of Convergence Signal Processing
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• v.5 no.1
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• pp.13-17
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• 2004

In order to measure the retina thickness, the retina photographing system and the multi-channel high speed image data acquisition system is developed. This system requires the optical processing techniques and the high speed image processing techniques. The HeNe laser beam is projected the retina in artificial eye and then we sensed the reflected laser signal using APD array. The laser projection system on retina using optical instruments is implemented. In order to project the plane laser beam on retina, laser photographing system used the polygon mirror for horizontal scanning and the galvano mirror for vertical scanning. We acquired retina images in each channel of APD array, transferred computer using PCI interface the image data after real-time A/D converting.

• Proceedings of the Optical Society of Korea Conference
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• 1999.08a
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• pp.128-129
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• 1999

Polygon Mirror Scanning(PMS) is composed of LED array, magnifying lens, polygon mirror and motor. It is important to correct the lens aberrations to gain the image we want to show. In this paper, we have simulated the lens aberration correction to reduce the spherical aberration . We have obtained a aspherical lens which is corrected the spherical aberration.

• Proceedings of the KIEE Conference
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• 1997.11a
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• pp.612-614
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• 1997

Silicon based micro mirror array is a highly efficient component for use in optical applications such as adaptive optical systems and optical correlators. A micro mirror array designed, fabricated and tested here is consisted of $5{\times}5$ single layer polysilicon, electrostatically driven actuators. In this paper, deflection characteristics and pull-in behavior of the actuators for analog control was studied and particularly, the influence of the residual stress in flexure beams for the restorative force of actuators was considered. The springs are modeled as a residual stress-free spring and a spring with residual stress. In calculation, a mirror with the residual stress-free springs has 30.3N/m spring constant and 31.1V pull-in voltage. On the other hand, a mirror with the stressed springs has 23.6N/m and 27.4V respectively. The experimental result, which is 20.5N/m and 25.5V, shows that the stressed springs ore well modeled.

• Proceedings of the KIEE Conference
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• 1996.11a
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• pp.416-418
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• 1996

A $50{\times}50{\mu}m^2$ aluminum micromirror array is fabricated using surface micromachining technology. $50{\times}50$ micromirrors are arrayed two dimensionally. The micromirror plate is supported by a vertical spring structure that is placed underneath the mirror plate. When the mirror plates reflect a light, the micromirror array un have large effective reflecting area. Fabrication of vertical spring uses only one mask and shadow evaporation process.