• 제목/요약/키워드: Microcrystalline silicon

검색결과 67건 처리시간 0.021초

이종접합 실리콘 태양전지의 효율 개선을 위한 열처리의 효과 (Effect on the Thermal Treatment for Improving Efficiency in Silicon Heterojunction Solar Cells)

  • 박형기;이준신
    • 한국전기전자재료학회논문지
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    • 제37권4호
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    • pp.439-444
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    • 2024
  • This study investigates the post-thermal treatment effects on the efficiency of silicon heterojunction solar cells, specifically examining the influence of annealing on p-type microcrystalline silicon oxide and ITO thin films. By assessing changes in carrier concentration, mobility, resistivity, transmittance, and optical bandgap, we identified conditions that optimize these properties. Results reveal that appropriate annealing significantly enhances the fill factor and current density, leading to a notable improvement in overall solar cell efficiency. This research advances our understanding of thermal processing in silicon-based photovoltaics and provides valuable insights into the optimization of production techniques to maximize the performance of solar cells.

Co-sputtering of Microcrystalline SiGe Thin Films for Optoelectronic Devices

  • 김선조;김형준;김도영
    • 한국재료학회:학술대회논문집
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    • 한국재료학회 2011년도 춘계학술발표대회
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    • pp.64.2-64.2
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    • 2011
  • Recently, Silicon Germanium (SiGe) alloys have been received considerable attention for their great potentials in advanced electronic and optoelectronic devices. Especially, microcrystalline SiGe is a good channel material for thin film transistor due to its advantages such as narrow and variable band gap and process compatibility with Si based integrated circuits. In this work, microcrystalline silicon-germanium films (${\mu}c$-SiGe) were deposited by DC/RF magnetron co-sputtering method using Si and Ge target on Corning glass substrates. The film composition was controlled by changing DC and RF powers applied to each target. The substrate temperatures were changed from $100^{\circ}C$ to $450^{\circ}C$. The microstructure of the thin films was analyzed by x-ray diffraction (XRD) and Raman spectroscopy. The analysis results showed that the crystallinity of the films enhances with increasing Ge mole fraction. Also, crystallization temperature was reduced to $300^{\circ}C$ with $H_2$ dilution. Hall measurements indicated that the electrical properties were improved by Ge alloying.

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Current Status of Thin Film Silicon Solar Cells for High Efficiency

  • Shin, Chonghoon;Lee, Youn-Jung;Park, Jinjoo;Kim, Sunbo;Park, Hyeongsik;Kim, Sangho;Jung, Junhee;Yi, Junsin
    • Current Photovoltaic Research
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    • 제5권4호
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    • pp.113-121
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    • 2017
  • The researches on the silicon-based thin films are being actively carried out. The silicon-based thin films can be made as amorphous, microcrystalline and mixed phase and it is known that the optical bandgap can be controlled accordingly. They are suitable materials for the fabrication of single junction, tandem and triple junction solar cells. It can be used as a doping layer through the bonding of boron and phosphorus. The carbon and oxygen can bond with silicon to form a wide range of optical gap. Also, The optical gap of hydrogenated amorphous silicon germanium can be lower than that of silicon. By controlling the optical gaps, it is possible to fabricate multi-junction thin film silicon solar cells with high efficiencies which can be promising photovoltaic devices.

i/p 계면 특성에 따른 nip 플렉서블 미세결정질 실리콘 박막 태양전지의 특성 연구 (Study on the influence of i/p interfacial properties on the cell performance of flexible nip microcrystalline silicon thin film solar cells)

  • 장은석;백상훈;장병열;이정철;박상현;이영우;조준식
    • 한국신재생에너지학회:학술대회논문집
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    • 한국신재생에너지학회 2011년도 춘계학술대회 초록집
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    • pp.128.2-128.2
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    • 2011
  • 스테인레스 스틸 유연기판 위에 플라즈마 화학기상 증착법 (plasma enhanced chemical vapor deposition)을 이용하여 nip 구조의 미세결정질 실리콘 박막 태양전지 (microcrystalline silicon thin film solar cell)를 제조하고 i ${\mu}c$-Si:H광 흡수층과 p ${\mu}c$-Si:H 사이에 i a-Si:H 버퍼 층을 삽입하여 i/p 계면특성을 개선하고 이에 따른 태양전지 성능특성 변화를 조사하였다. ${\mu}c$-Si:H 박막으로 이루어진 i/p 계면에서의 구조적, 전기적 결함은 태양전지 내에서 생성된 캐리어의 재결합과 shunt resistance 감소를 초래하여 개방전압 (open circuit voltage) 및 곡선 인자 (fill factor)를 감소시키는 것으로 알려졌다. 제조된 미세결정질 실리콘 박막 태양전지는 SUS/Ag/ZnO:Al/n ${\mu}c$-Si:H/i ${\mu}c$-Si:H/p ${\mu}c$-Si:H 구조로 제작되었으며 i/p 계면 사이의 i a-Si;H 버퍼층 두께를 변화시키고 이에 따른 태양전지의 특성을 조사하였다. 태양전지의 구조적, 전기적 특성 변화는 Scanning Electron Microscope (SEM), UV-visible-nIR spectrometry, Photo IV와 Dark IV를 통하여 조사하였다.

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Low temperature plasma deposition of microcrystalline silicon films for bottom gate thin film transistors

  • Cabarrocas, P.Roca i;Djeridane, Y.;Abramov, A.;Bui, V.D.;Bonnassieux, Y.
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2006년도 6th International Meeting on Information Display
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    • pp.56-60
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    • 2006
  • We review our studies on the growth of microcrystalline silicon films by the standard PECVD technique. In situ spectroscopic ellipsometry studies allow the optimization of the complex film structure with respect to competing aspects of the growth process. Fine tuning the hydrogen flux, the ion energy, and the nature of the species contributing to deposition produces unique films with a fully crystallized interface with silicon nitride. These materials have been successfully incorporated in bottom gate TFTs which present mobility values in the range of 1 to 3 $cm^2/V.s$, and stable characteristics when submitted to a bias stress. The stability of these TFTs makes them suitable for driver applications in AMLCDs as well as pixel elements in OLED displays.

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Substrate Temperature Dependence of Microcrystalline Silicon Thin Films by Combinatorial CVD Deposition

  • Kim, Yeonwon
    • 한국표면공학회지
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    • 제48권3호
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    • pp.126-130
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    • 2015
  • A high-pressure depletion method using plasma chemical vapor deposition (CVD) is often used to deposit hydrogenated microcrystalline silicon (${\mu}c-Si:H$) films of a low defect density at a high deposition rate. To understand proper deposition conditions of ${\mu}c-Si:H$ films for a high-pressure depletion method, Si films were deposited in a combinatorial way using a multi-hollow discharge plasma CVD method. In this paper the substrate temperature dependence of ${\mu}c-Si:H$ film properties are demonstrated. The higher substrate temperature brings about the higher deposition rate, and the process window of device quality ${\mu}c-Si:H$ films becomes wider until $200^{\circ}C$. This is attributed to competitive reactions between Si etching by H atoms and Si deposition.

HWCVD를 이용하여 Microcrystalline film 성장시 Silane 농도에 따른 박막 성장 특성

  • 박승일;이정택;이정철;허윤성;김근주
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2010년도 하계학술대회 논문집
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    • pp.267-267
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    • 2010
  • The structural and electrical properties of microcrystalline silicon films were investigated by hot wire chemical vapor deposition(HWCVD) often called catalytic chemical vapor deposition(Cat-CVD). The Si microcrystalline phase is easily controlled by changing the rate of the silane concentration of $SiH_4$ to $H_2$ during deposition. The Structural property was observed by Raman and SEM. Photo-conductivity and dark conductivity, and photo-sensitivity were observed by Sunsimulator (AM 1.5 illumination). The film color was changed by the variation of silane concentration. HWCVD is useful for the formation of Si thin films for solar cell and needs further commercialized development for mass production.

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정제 제형 제조를 위한 포공영 추출물 함유 분말의 제조 및 평가 (Fabrication and Characterization of Taraxacum platycarpum Extract-loaded Particles for Tablet Dosage Form)

  • 진성규
    • 한국분말재료학회지
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    • 제26권3호
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    • pp.225-230
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    • 2019
  • To develop Taraxacum platycarpum extract (TP)-loaded particles for tablet dosage form, various TP-loaded particles composed of TP, dextrin, microcrystalline cellulose (MCC), silicon dioxide, ethanol, and water are prepared using a spray-drying method and fluid-bed-drying method. Their physical properties are evaluated using angle of repose, Hausner ratio, Carr's index, hardness, disintegrant time, and scanning electron microscopy. Optimal TP-loaded particles improve flowability and compressibility. Furthermore, 2% silicon dioxide gives increased flowability and compressibility. The formula of TP-loaded fluid-bed-drying particles at a TP/MCC/silicon-dioxide amount of 5/5/0.2 improves the angle of repose, Hausner ratio, Carr's index, hardness, and disintegrant time as compared with the TP-loaded spray-drying particles. The TP-loaded fluid-bed-drying particles considerably improve flowability and compressibility ($35.10^{\circ}$ vs. $40.3^{\circ}$, 0.97 vs. 1.17, and 18.97% vs. 28.97% for the angle of repose, Hausner ratio, and Carr's index, respectively), hardness (11.34 vs. 4.7 KP), and disintegrant time (7.4 vs. 10.4 min) as compared with the TP-loaded spray-drying particles. Thus, the results suggest that these fluid-bed-drying particles with MCC and silicon dioxide can be used as powerful particles to improve the flowability and compressibility of the TP.

생약 추출물 함유 정제 제조를 위한 이산화규소 함유 분말의 제조 및 평가 (Fabrication and Characterization of Bangpungtongseong-San Extract-loaded Particles for Tablet Dosage Form)

  • 박진우;진성규
    • 한국분말재료학회지
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    • 제28권3호
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    • pp.227-232
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    • 2021
  • The purpose of this study is to optimize the powder formulation and manufacturing conditions for the solidification of an extract of the herb Bangpungtongseong-san (BPTS). To develop BPTS-loaded particles for the tablet dosage form, various BPTS-loaded particles composed of BPTS, dextrin, microcrystalline cellulose (MCC), silicon dioxide, ethanol, and water are prepared using spray-drying and high shear granulation (high-speed mixing). Their physical properties are evaluated using scanning electron microscopy and measurements of the angle of repose, Hausner ratio, Carr's index, hardness, and disintegration time. The optimal BPTS-loaded particles exhibit improved flowability and compressibility. In particular, the BPTS-loaded particles containing silicon dioxide show significantly improved flowability and compressibility (the angle of repose, Hausner ratio, and Carr's index are 35.27 ± 0.58°, 1.18 ± 0.06, and 15.67 ± 1.68%, respectively), hardness (18.97 ± 1.00 KP), and disintegration time (17.60 ± 1.50 min) compared to those without silicon dioxide. Therefore, this study suggests that particles prepared by high-speed mixing can be used to greatly improve the flowability and compressibility of BPTS using MCC and silicon dioxide.

PECVD에 의하여 제조된 Phosphorus-Doped ${\mu}c$-Si:H 박막의 특성 (Properties of Phosphorus Doped ${\mu}c$-Si:H Thin Films Prepared by PECVD)

  • 이정노;문대규;안병태;임호빈
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 1992년도 추계학술대회 논문집
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    • pp.22-27
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    • 1992
  • Phosphorus doped hydrogenated microcrystalline silicon (${\mu}c$-Si:H) thin films were deposited by PECVD (Plasma Enhanced Chemical Vapour Deposition) method using 10.2% $SiH_4$ gas (diluted in Ar) and 308ppm $PH_3$ gas (diluted in Ar). The structural, optical and electrical properties of the films were investigated as a function of substrate temperature(15 to $400^{\circ}C$) and RF power(10 to 120W). The thin film deposited by varing substrate temperature had columnar structure and microcrystalline phase. The volume fraction of microcrystalline phase in the films deposited at RF power of 80W, increased with increasing substrate temperature up to $200^{\circ}C$, and then decreased with further increasing substrate temperature. Volume fraction of microcrystalline phase increased monotonously with increasing RF power at substrate temperature of $250^{\circ}C$. With increasing volume fraction of microcrystalline, electrical resistivity of films decreased to 0.274 ${\Omega}cm$.

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