• Proceedings of the Korean Society of Propulsion Engineers Conference
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• 2004.03a
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• pp.271-277
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• 2004

As one of the concepts of the laser/electric hybrid propulsion system, a feasibility study on possibilities of electrostatic acceleration of a laser ablation plasma induced from a solid target was conducted. Energy distributions of accelerated ions were measured by a Faraday cup. A time-of-flight measurement was also conducted for ion velocity measurement. It was found that an average speed of ions from a pure laser ablation in this case was about 20 km/sec for pulse energy of 40 $\mu$J/pulse with pulse width of 250 psec. On the other hand, through an electrostatic field with a + I ,000 V electrode, the speed could be accelerated up to 40 km/sec. It was shown that the electrode with positive potential was more effective than that with negative potential for positive-ion acceleration in laser induced plasma, or pulsed plasma, in which ions were induced with the Coulomb explosion following electrons. In addition, the ion-acceleration or deceleration strongly depended on conditions of pairs of inner diameter and electrodes gap.

• Journal of the Semiconductor & Display Technology
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• v.19 no.2
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• pp.45-50
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• 2020

We investigated the Si_1-xGe_x surface properties when dry cleaning the films using NF₃ / H₂O remote plasma. After the dry cleaning process, it was found that about 80-250 nm wide bumps were formed on the SiGe surface regardless of Ge concentration in the rage of x = 0.1 ~ 0.3. In addition, effects of the dry cleaning processing parameters such as pressure, substrate temperature, and H₂O flow rates were examined. It was found that the surface bump is significantly dependent on the flow rate of H₂O. Based on these observations, we would like to provide additional guidelines for implementing the dry cleaning process to SiGe materials.

• Proceedings of the Korean Vacuum Society Conference
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• 2010.02a
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• pp.47-47
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• 2010

Discharge under the water is very hard and demand considerable high voltage. But specially improved electrode can generate plasma discharge to salty water with relatively low voltage. A round shape ceramic electrode having many pinholes combined with metallic one can generate plasma. 400 volt, 10 kHz and 3 micro second pulse width were applied to repeatedly running synthetic seawater with 10 L/m velocity, containing cultivated E. coli and Bacillus. As a result, 18, 94, 99.97, 100, 100 % disinfection rates to E. coli and 17.1, 17.1, 82.9, 99.4, 99.9 % disinfection rates to Bacillus subtilis were achieved to 1, 2, 3, 4, 5 times repetitive treatment respectively. In the plasma condition, the ions and electrons are separated and new kinds of components are re-synthesized by the intensive movement of the components. Especially chlorine ions are separated and recombined to residual free chlorine like HOCl, $OCl^-$. The residual free chlorine concentrations of discharged water were 0.25, 0.88, 1.39, 1.59, 1.66 mg $Cl_2$/L after 5 times treatment respectively. Another unconfirmed radical and oxidants for example, OH, $H_2O_2$, and $O_3$ can have an effect on microorganism of course.

• Journal of the Korean Ceramic Society
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• v.50 no.2
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• pp.108-115
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• 2013

Oxide coatings were prepared on Al-1050 substrates by an environment-friendly plasma electrolytic oxidation (PEO) process using an electrolytic solution of $Na_2SiO_3$ (8 g/L) and NaOH (3 g/L). The effects of three different duty cycles (20%, 40%, and 60%) and frequencies (50 Hz, 200 Hz, and 800 Hz) on the structure and micro-hardness of the oxide coatings were investigated. XRD analysis revealed that the oxides were mainly composed of ${\alpha}-Al_2O_3$, ${\gamma}-Al_2O_3$, and mullite. The proportion of each crystalline phase depended on various electrical parameters, such as duty cycle and frequency. SEM images indicated that the oxide coatings formed at a 60% duty cycle exhibited relatively coarser surfaces with larger pore sizes and sintering particles. However, the oxides prepared at a 20% duty cycle showed relatively smooth surfaces. The PEO treatment also resulted in a strong adhesion between the oxide coating and the substrate. The oxide coatings were found to improve the micro-hardness with the increase of duty cycle. The structural and physical properties of the oxide coatings were affected by the duty cycles.

• Journal of the Korean Society of Manufacturing Process Engineers
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• v.16 no.1
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• pp.36-41
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• 2017

In this paper, $Si_3N_4/hBN$ ceramics with various hexagonal boron nitride (hBN) contents (0, 10, 20, or 30 wt%) were fabricated via spark plasma sintering (SPS) at $1500^{\circ}C$, 50MPa, and 10m holding time. The material properties such as the relative density, hardness, and fracture toughness were systematically evaluated according to the hBN content in the $Si_3N_4/hBN$ ceramics. The results show that relative density, hardness, and fracture toughness continuously decreased as the hBN content increased. In addition, peak-step drilling (with tool diameter $500{\mu}m$) was performed to observe the effects of hBN content in micro-hole shape and cutting force. A machined hole diameter of $510{\mu}m$ (entrance) and stable cutting force were obtained at 30 wt% hBN content. Consequently, $Si_3N_4/30wt%$ hBN ceramic is a feasible material upon which to apply semi-conductor components, and this study is very meaningful for determining correlations between material properties and machining performance.

• Journal of Sensor Science and Technology
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• v.24 no.6
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• pp.379-384
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• 2015

An infrared image sensor is a core device in a thermal imaging system. The fabrication method of a focal plane array (FPA) is a key technology for a high resolution infrared image sensor. Each pixels in the FPA have $Si_3N_4/SiO_2$ membranes including legs to deposit bolometric materials and electrodes on Si readout circuits (ROIC). Instead of polyimide used to form a sacrificial layer, the feasibility of an amorphous silicon (${\alpha}-Si$) was verified experimentally in a $8{\times}8$ micro-bolometer array with a $50{\mu}m$ pitch. The elimination of the polyimide sacrificial layer hardened by a following plasma assisted deposition process is sometimes far from perfect, and thus requires longer plasma ashing times leading to the deformation of the membrane and leg. Since the amorphous Si could be removed in $XeF_2$ gas at room temperature, however, the fabricated micro-bolomertic structure was not damaged seriously. A radio frequency (RF) sputtered nickel oxide film was grown on a $Si_3N_4/SiO_2$ membrane fabricated using a low stress silicon nitride (LSSiN) technology with a LPCVD system. The deformation of the membrane was effectively reduced by a combining the ${\alpha}-Si$ and LSSiN process for a nickel oxide micro-bolometer.

• Journal of the Korean Society for Heat Treatment
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• v.14 no.1
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• pp.27-34
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• 2001

The effects of pre-heat treatment(Q/T) on microstructure and hardness of STD11 and STD61 tool steel nitrided by micro-pulse plasma were investigated. The quenching temperature for obtaining matrix hardness of STD11 and STD61 steel on range of HRC 50 to HRC 60 desired for machine parts is about $1070^{\circ}C$ and $1020^{\circ}C$ respectively. The hardness of STD11 and STD61 quenched at the temperature was HRC 63 and HRC 56 respectively. The nitrided case depth of STD11 and STD61 nitrided at $550^{\circ}C$ for 5 hours was independent of pre-heat treatment condition and the depth was approximately $100{\mu}m$. However, hardness and compactness of nitrided layer on Q/T treated specimen were higher than the annealed specimen. The case depth increased linearly with the increase of nitriding temperature, however, the hardness of nitrided layer decreased with the increase of temperature. Phase mixture of ${\gamma}-Fe_4N$ and ${\varepsilon}-Fe_{2-3}N$ was detected by XRD analysis in the nitrided layer formed at the optimum nitriding condition. The optimum nitriding temperature was approximately $490^{\circ}C$ which was $10^{\circ}C$ lower than the tempering temperature for preventing softening behavior of STD11 and STD61 matrix during nitriding process and the surface hardness of nitrided layer obtained by optimum pre-heat treatment condition was about Hv1400.

• Journal of the Korean Institute of Illuminating and Electrical Installation Engineers
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• v.18 no.1
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• pp.52-59
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• 2004

Recently, many researches for fine particles plasma have been focused on the fabrication of the new devices and materials in micro-electronic industry, although reduction or elimination of fine particles was interested in plasma processing until now on. In order to enhance their utilization, it is necessary to control and analyze fine particle behavior. Therefore, we developed simulation model of fine particles in RF Ar plasmas. This model consists of the calculation parts of plasma structure using a two-dimensional fluid model and of fine particle behavior. The motion of fine particles was derived from the charge amount on the fine particles and forces applied to them. In this paper, Ar plasma properties using two-dimensional fluid model without fine particles were calculated at power source voltage 15[V] and pressure 0.5[Torr]. Time-averaged spatial distributions of Ar plasma were shown. The process on the formation of Coulomb crystal of fine particles was investigated and it was explained by combination of ion drag and electrostatic forces. And also analysis on the forces of fine particles was presented.

• Genomics & Informatics
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• v.13 no.3
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• pp.70-75
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• 2015

MicroRNAs (miRNAs) have been demonstrated to play an important role in carcinogenesis. Previous studies revealed that miRNAs are present in human plasma in a remarkably stable form that is protected from endogenous RNase activity. In this study, we measured the plasma expression levels of three miRNAs (miR-21, miR-27a, and miR-155) to investigate the usefulness of miRNAs for gastric cancer detection. We initially examined plasma miRNA expression levels in a screening cohort consisting of 15 patients with gastric cancer and 15 healthy controls from Korean population, using TaqMan quantitative real-time polymerase chain reaction. We observed that the expression level of miR-27a was significantly higher in patients with gastric cancer than in healthy controls, whereas the miR-21 and miR-155a expression levels were not significantly higher in the patients with gastric cancer. Therefore, we further validated the miR-27a expression level in 73 paired gastric cancer tissues and in a validation plasma cohort from 35 patients with gastric cancer and 35 healthy controls. In both the gastric cancer tissues and the validation plasma cohort, the miR-27a expression levels were significantly higher in patients with gastric cancer. Receiver-operator characteristic (ROC) analysis of the validation cohort, revealed an area under the ROC curve value of 0.70 with 75% sensitivity and 56% specificity in discriminating gastric cancer. Thus, the miR-27a expression level in plasma could be a useful biomarker for the diagnosis and/or prognosis of gastric cancer.

• Proceedings of the Korean Institute of Surface Engineering Conference
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• 2001.11a
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• pp.35-35
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• 2001

agnesium Oxide (MgO) with a NaCI structure is well known to exhibit high secondary electron emission, excellent high temperature chemical stability, high thermal conductance and electrical insulating properties. For these reason MgO films have been widely used for a buffer layer of high $T_c$ superconducting and a protective layer for AC-plasma display panels to improve discharge characteristics and panel lifetime. Up to now MgO films have been synthesized by lE-beam evaporation, Molecular Beam Epitaxy (MBE) and Metalorganic Chemical Vapor Deposition (MOCVD), however there have been some limitations such as low film density and micro-cracks in films. Therefore magnetron sputtering process were emerged as predominant method to synthesis high density MgO films. In previous works, we designed and manufactured unbalanced magnetron source with high power density for the deposition of high quality MgO films. The magnetron discharges were sustained at the pressure of O.lmtorr with power density of $110W/\textrm{cm}^2$ and the maximum deposition rate was measured at $2.8\mu\textrm{m}/min$ for Cu films. In this study, the syntheses of MgO films were carried out by unbalanced magnetron sputtering with various $O_2$ partial pressure and specially target power densities, duty cycles and frequency using pulsed DC power supply. And also we investigated the plasma states with various $O_2$ partial pressure and pulsed DC conditions by Optical Emission Spectroscopy (OES). In order to confirm the relationships between plasma states and film properties such as microstructure and secondary electron emission coefficient were analyzed by X-Ray Diffraction(XRD), Transmission Electron Microscopy(TEM) and ${\gamma}-Focused$ Ion Beam (${\gamma}-FIB$).