• 한국표면공학회지
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• 제25권4호
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• pp.189-206
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• 1992

The effect of activation and electroless nickel plating conditions on contact properties was investi-gated for selective electroless nickel plating of Si wafers in order to obtain an optimum condition of con-tact hole filling. According to RCA prosess, p-type silicon (100) surface was cleaned out and activated. The effects of temperature, DMAB concentration, time, and strirring were investigated for activation of p-type Si(100) surface. The optimal activation condition was 0.2M HF, 1mM PdCl2, 2mM EDTA,$ 70^{\circ}C$, and 90sec under ultrasonic vibration. In electroless nickel plating, the effect of temperature, DMAB concentra-tion, pH, and plating time were studied. The optimal plating condition found was 0.10M NiSO4.H2O, 0.11M Citrate, pH 6.8, $60^{\circ}C$, 30minutes. The contact resistance of films was comparatively low. It took 30minutes to obtain 1$\mu\textrm{m}$ thick film with 8mM DMAB concentration. The film surface roughness was improved with decreasing temperature and decreasing pH of the plating solution. The best quality of the film was obtained at the condition of temperature $60^{\circ}C$ and pH 6.0. The micro-vickers hardness of film was about 800Hv. Plating rate of nickel on the hole pattern was slower than that of nickel on the line pattern.

• 대한전기학회논문지:전력기술부문A
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• 제53권6호
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• pp.316-323
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• 2004

This paper develops an ADWHM(Advanced Digital Watt-Hour Meter) which integrates and implements the voltage management data record function and the load management data record function in the electronic watt-hour meter. ADWHM is developed based on PIC16F874 which is 8bit micro-controller of RISK type for the easy of programing and maintenance, and electronic power signal processing module is located at front of it to reduce the computing load of processor. Also, a 16kbyte EEPROM is used to record the voltage management data and load management data for a week as well as watt-hour data and USART communication mode is used to transfer data from ADWHM to PC. The accuracy of the voltage and unt measuring for ADWHM is verified by identifying the LCD display values of the ADWHM after the voltage signals of id levels from digital function generator is applied to PT(Potential Transformer) and CT(Current Transformer) output under state which it is separated from real power line. On the its basic functions such as watt-hour data recording function, voltage management data recording function and load management data recording function was verified by showing data for three days among the collected data to PC by RS232C communication from ADWHM which was connected to real power lines for a week.

• 대한전기학회:학술대회논문집
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• 대한전기학회 2001년도 춘계학술대회 논문집 전기기기 및 에너지변환시스템부문
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• pp.349-352
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• 2001

FACTS technology is developed into the sophisticated system technology which combines conventional power system technology with power electronics, micro-process control, and information technology. Its objectives are achieving enhancement of the power system flexibility and maximum utilization of the power transfer capability through improvements of the system reliability, controllability, and efficiency [1]. As a series and shunt compensator, UPFC consists of two inverters with common dc link capacitor bank. It controls the magnitude of shunt bus voltage and real and reactive power flow of transmission line[2]. In this paper, we present the design, implementation and test results of developed 20kVA level prototype UPFC. It is applied to power system simulator and controls the real and reactive power flow and shunt bus voltage magnitude.

• 대한전기학회:학술대회논문집
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• 대한전기학회 2001년도 하계학술대회 논문집 A
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• pp.374-376
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• 2001

FACTS technology is developed into the sophisticated system technology which combines conventional power system technology with power electronics, micro-process control, and information technology. Its objectives are achieving enhancement of the power system flexibility and maximum utilization of the power transfer capability through improvements of the system reliability, controllability, and efficiency[1]. As a series and shunt compensator, UPFC consists of two inverters with common dc link capacitor bank. It controls the magnitude of shunt bus voltage and real and reactive power flow of transmission line[2]. In this paper, we present the design and control algorithm of UPFC simulator for KERI simulator. As a control algorithm is implemented by digital controller, we consider sample-and-hold of signals In this simulation, we use EMTDC/PSCAD V3.0 software which can simulate instantaneous voltage and current.

• 전자공학회논문지A
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• 제28A권9호
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• pp.721-728
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• 1991

In this paper, a magneto-optic modulator has been designed by using single crystal BSO and polycrystal ZnSe as Faraday cells. And practical core-type optical current sensors using pure iron and permalloy have been prepared and experimented. In order to obtain efficient magnetic field detection, LED(NEC OD08358, 0.87 $\mu$m) was used as optical source, PIN-PD(OD-8454)as optical receiver and multi-mode optical fiber (100/140$\mu$m) as transmission line. The characteristics matrix of the optical element was calculated by Stokes parameter, and optic modulation characteristics equations were derived by Muller matrix. Electromagnetic analysis program (FLUX 2D, micro VAX 3600) by finite element method was used to find the magnetic flux density around the core. The measuring error of the output voltage to input current has been masured below 5% in the range of 50A to 1000A. As the temperature was changed from -20$^{\circ}C$ to 60$^{\circ}C$, the maximum measurement error of the optical output has been found to be 0.5% at 60$^{\circ}C$. These experimental results show good temperature and linearity characteristics. The SNR of the overall system was 47dB in case of 600A (250.2 Oe) conductor current and the system has good noise immunity.

• 한국레이저가공학회:학술대회논문집
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• 한국레이저가공학회 2006년도 추계학술발표대회 논문집
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• pp.114-117
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• 2006

Diffraction grating is the optical device which has periodic pattern. Decorative logotypes is the one of application of diffraction grating. In this paper diffraction grating for decorative logotype is fabricated by dot pattern in stead of line pattern. A metallic mold for diffraction gratings is fabricated with a mode-locked 12 ps $Nd:YVO_4$ laser. Laser pulses with a wavelength of 355nm are irradiated on the surface of NOK 80, a mold material, to generate dot patterns. In order to minimize the dot diameter, laser power is set just above the ablation threshold of NOK 80. Results show that the spectrum from the fabricated mold is good enough for some industrial application.

• 반도체디스플레이기술학회지
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• 제11권4호
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• pp.43-48
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• 2012

The screen printing method is much used in the flat panel display field including the LCD, PDP, FED, organic EL, and etc. for forming the high precision micro-pattern. Also A number of studies of screen printing method has been conducted as the method for the cost down through the improvement of productivity. Because of being the dot printing method of the cylindrical shape not being the line printing method like the existing PDP barrier rib and phosphor, the pillar arrays using the screen printing method is deposited in the hemispherical type not being cylindrical shape in the existing printing process conditions. In this paper, the parameters were set on the screen printing device in order to deposit the cross-sectional shape with the cone or trapezoid shape of the pillar in depositing the pillars used the screen printing device for vacuum glazing. The cross-sectional shape slope of the pillar according to the parameters was measured. And analysis the effect of the screen printing process conditions on the cross-sectional shape slope of pillars based upon the result of being measured. The processing conditions were drawn to minimize the cross-sectional shape slope of pillar.

• 한국방재학회지
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• 제2권4호
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• pp.40-47
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• 2002

Since it is important to understand the bio-climatic change in Seoul for ecological city planning in the future, this paper gives an overview on bio-climate analysis of urban environments at Seoul. We analyzed its characteristics in recent years using the observations of 24 of Automatic Weather Station (AWS) by Korea Meteorological Administration (KMA). In urbanization, Seoul metropolitan area is densely populated and is concentrated with high buildings. This urban activity changes land covering, which modifies the local circulation of radiation, heat and moisture, precipitation and creating a specific climate. Urban climate is evidently manifested in the phenomena of the increase of the air temperature, called urban heat Island and in addition urban sqall line of heavy rain. Since a city has its different land cover and street structure, these form their own climate character such as climate comfort zone. The thermal fold in urban area such as the heat island is produced by the change of land use and the air pollution that provide the bio-climate change of urban eco-system. The urban wind flow is the most important climate element on dispersion of air pollution, thermal effects and heavy shower. Numerical modeling indicates that the bio-climatic transition of wind wake in urban area and the dispersion of the air pollution by the simulations of the wind variation depend on the urban land cover change. The winds are separately simulated on small and micro-scale at Seoul with two kinds of kinetic model, Witrak and MUKLIMO.

• 한국정보통신학회:학술대회논문집
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• 한국해양정보통신학회 2001년도 추계종합학술대회
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• pp.552-555
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• 2001

본 논문에서는 컴퓨터 및 통신분야의 급속한 기술발전으로 마이크로세서의 성능향상과 제어용 LAN(Local Area Network)이 실용화됨으로 시스템 구축에 대한 유연성이 높아져 중앙처리장치(CPU)를 기능별로 분리하고 LAN 통신선로(Dataway)를 이용하여 프로세스의 제어기능은 분산시키고, 정보처리 및 감시와 운전조작기능은 집중화시켜 전체시스템을 구성하므로 신뢰성 향상을 도모하는 분산제어시스템의 개발배경과 적용과정 그리고 제철, 전력, 환경, 수 처리, 석유화학 등의 산업현장에서 다방면에 적용 및 응용되고 있는 분산제어시스템을 고찰하여 보고 향후 분산제어시스템의 발전방향까지 살펴보았다.

• 한국전기전자재료학회논문지
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• 제17권2호
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• pp.138-143
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• 2004

CMP (Chemical Mechanical Polishing) technology for global planarization of multilevel interconnection structure has been widely studied for the next generation devices. Among the consumables for CMP process, especially, slurry and their chemical compositions play a very important role in the removal rates and within-wafer non-uniformity (WIWNU) for global planarization ability of CMP process. However, CMP slurries contain abrasive particles exceeding 1 ${\mu}{\textrm}{m}$ size, which can cause micro-scratch on the wafer surface after CMP process. Such a large size particle in these slurries may be caused by particle agglomeration in slurry supply-line. In this work, to investigate the effects of agglomeration on the performance of oxide CMP slurry, we have studied an aging effect of silica slurry as a function of particle size distribution and aging time during one month. We Prepared and compared the self-developed silica slurry by adding of alumina powders. Also, we have investigated the oxide CMP characteristics. As an experimental result, we could be obtained the relatively stable slurry characteristics comparable to aging effect of original silica slurry. Consequently, we can expect the saving of high-cost slurry.