• Title/Summary/Keyword: Micro Etching

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ETCHING CHARACTERISTICS OF MAGNETIC THIN FILMS BY ION BEAM TECHNIQUE

  • Lee, H.C.;Kim, S.D.;Lim, S.H.;Han, S.H.;Kim, H.J.;Kang, I.K.
    • Journal of the Korean Magnetics Society
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    • v.5 no.5
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    • pp.538-542
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    • 1995
  • The etching characteristics of magnetic thin films of permalloy and Fe-based alloys are investigated. The thin films are fabricated by rf magnetron sputtering and the substrates used are silicon and glass. Etching is done by ion beam technique and the main process parameters investigated are beam voltage, beam current and accelerating voltage. The etch rate of the magnetic films is proportional to the beam current, but it is not directly related to the accelerating voltage and beam voltage. The dependence of etch rate on the process parameters can be explained by ion current density. It is found that the ion beam etching is effective in obtaining well-developed micro-patterns on the permalloy and Fe- based magnetic thin films.

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Surface Morphology and Optical Properties of Aluminosilicate Glass Manufactured by Physical and Chemical Etching Process (물리·화학적 혼합 식각 공정에 의해 제조된 알루미노실리케이트 유리의 표면 형상과 광학 특성)

  • Kim, Namhyuk;Sohn, Jeongil;Kim, Gwangsoo
    • Korean Journal of Materials Research
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    • v.27 no.9
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    • pp.501-506
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    • 2017
  • Surface morphology and optical properties such as transmittance and haze effect of glass etched by physical and chemical etching processes were investigated. The physical etching process was carried out by pen type sandblasting process with $15{\sim}20{\mu}m$ dia. of $Al_2O_3$ media; the chemical etching process was conducted using HF-based mixed etchant. Sandblasting was performed in terms of variables such as the distance of 8 cm between the gun nozzle and the glass substrate, the fixed air pressure of 0.5bar, and the constant speed control of the specimen stage. The chemical etching process was conducted with mixed etching solution prepared by combination of BHF (Buffered Hydrofluoric Acid), HCl, and distilled water. The morphology of the glass surface after sandblasting process displayed sharp collision vestiges with nonuniform shapes that could initiate fractures. The haze values of the sandblasted glass were quantitatively acceptable. However, based on visual observation, the desirable Anti-Glare effect was not achieved. On the other hand, irregularly shaped and sharp vestiges transformed into enlarged and smooth micro-spherical craters with the subsequent chemical etching process. The curvature of the spherical crater increased distinctly by 60 minutes and decreased gradually with increasing etching time. Further, the spherical craters with reduced curvature were uniformly distributed over the etched glass surface. The haze value increased sharply up to 55 % and the transmittance decreased by 90 % at 60 minutes of etching time. The ideal haze value range of 3~7 % and transmittance value range of above 90 % were achieved in the period of 240 to 720 minutes of etching time for the selected concentration of the chemical etchant.

Micromachining Using Laser Beam Machining and Electrochemical Etching (레이저 빔 가공과 전해 에칭을 이용한 미세 가공)

  • Kim, Jang-Woo;Kwon, Min-Ho;Chung, Do-Kwan;Chu, Chong-Nam
    • Journal of the Korean Society for Precision Engineering
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    • v.29 no.10
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    • pp.1089-1095
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    • 2012
  • Laser beam machining (LBM) using nanosecond pulsed laser is widely known to be rapid and non-wear process for micromachining. However, the quality itself cannot meet the precision standard due to the recast layer and heat affected zone. In this paper, a fabrication method for machining micro features in stainless steel using a hybrid process of LBM using nanosecond pulsed laser and electrochemical etching (ECE) is reported. ECE uses non-contacting method for precise surface machining and selectively removes the recast layer and heat affected zone produced by laser beam in an effective way. Compared to the single LBM process, the hybrid process of LBM and ECE enhanced the quality of the micro features.

Maskless Fabrication of the Silicon Stamper for PDMS Nano/Micro Channel (나노/마이크로 PDMS 채널 제작을 위한 마스크리스 실리콘 스템퍼 제작 및 레오로지 성형으로의 응용)

  • 윤성원;강충길
    • Transactions of Materials Processing
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    • v.13 no.4
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    • pp.326-333
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    • 2004
  • The nanoprobe based on lithography, mainly represented by SPM based technologies, has been recognized as a potential application to fabricate the surface nanosctructures because of its operational versatility and simplicity. However, nanoprobe based on lithography itself is not suitable for mass production because it is time a consuming method and not economical for commercial applications. One solution is to fabricate a mold that will be used for mass production processes such as nanoimprint, PDMS casting, and others. The objective of this study is to fabricate the silicon stamper for PDMS casting process by a mastless fabrication technique using the combination of nano/micro machining by Nanoindenter XP and KOH wet etching. Effect of the Berkovich tip alignment on the deformation was investigated. Grooves were machined on a silicon surface, which has native oxide on it, by constant load scratch (CLS), and they were etched in KOH solutions to investigate chemical characteristics of the machined silicon surface. After the etching process, the convex structures was made because of the etch mask effect of the mechanically affected layer generated by nanoscratch. On the basis of this fact, some line patterns with convex structures were fabricated. Achieved groove and convex structures were used as a stamper for PDMS casting process.

Etching Anisotropy Depending on the SiO2 and Process Conditions of NF3 / H2O Remote Plasma Dry Cleaning (NF3 / H2O 원거리 플라즈마 건식 세정 조건 및 SiO2 종류에 따른 식각 이방 특성)

  • Hoon-Jung Oh;Seran Park;Kyu-Dong Kim;Dae-Hong Ko
    • Journal of the Semiconductor & Display Technology
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    • v.22 no.4
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    • pp.26-31
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    • 2023
  • We investigated the impact of NF3 / H2O remote plasma dry cleaning conditions on the SiO2 etching rate at different preparation states during the fabrication of ultra-large-scale integration (ULSI) devices. This included consideration of factors like Si crystal orientation prior to oxidation and three-dimensional structures. The dry cleaning process were carried out varying the parameters of pressure, NF3 flow rate, and H2O flow rate. We found that the pressure had an effective role in controlling anisotropic etching when a thin SiO2 layer was situated between Si3N4 and Si layers in a multilayer trench structure. Based on these observations, we would like to provide further guidelines for implementing the dry cleaning process in the fabrication of semiconductor devices having 3D structures.

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Effects on Bond Strength between Zirconia and Porcelain according to Etching Treatment and Low Temperature Degradation (지르코니아 표면에칭처리와 저온열화현상이 지르코니아와 전장도재의 결합강도에 미치는 영향)

  • Park, Jin-Young;Kim, Jae-Hong;Kim, Woong-Chul;Kim, Ji-Hwan;Kim, Hae-Young
    • Journal of dental hygiene science
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    • v.14 no.2
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    • pp.140-149
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    • 2014
  • The purpose of this study was to investigate the influence of etching surface treatment and aging treatment of zirconia on the shear bond strength between zirconia core and veneered ceramic. Four groups of zirconia-ceramic specimens were prepared; 1) NEZ group (no etching zirconia), 2) EZ group (etching zirconia), 3) ANEZ group (aging and no etching zirconia), 4) AEZ group (aging and etching zirconia). The shear bond strength between zirconia and porcelain was measured using Instron Universal Testing Machine. Surface texture with crystalline structure of zirconia surface was examined by the field emission scanning electron microscopy (FE-SEM) with ingredient analysis. The fractured surfaces of specimens were examined to determine the failure pattern by a digital microscope. The mean${\pm}$standard deviation of shear bond strengths were $23.47{\pm}3.47$ Mpa in NEZ, $28.30{\pm}4.34$ Mpa in EZ, $21.85{\pm}4.65$ Mpa in ANEZ, $24.65{\pm}3.65$ Mpa in AEZ group, respectively, and were significantly different (p<0.05). The average shear bond strength was largest in EZ group, followed by AEZ, NEZ, and ANEZ groups. Most specimens in NEZ group showed adhesive failure and most specimens in EZ, AEZ, and ANEZ group showed mixed failure. Surface of etching treatment group (EZ and AEZ) showed complex micro-structure and irregular surface texture which may facilitate mechanical interlocking, while untreated zirconia surface presented simpler micro-structure. In conclusion, an etching treatment improved bonding strength between zirconia and porcelain by forming mechanical interlocking.

The Fabrication of Micro Actuator Used Micro Electro-Magnet and Magnetostrictive Thin Film (마이크로 전자석과 자기변형박막을 이용한 마이크로 엑추에이터의 제작)

  • Seo, Jee-Hoon;Yang, Sang-Sik;Jeong, Jong-Man;Lim, Sang-Ho
    • Proceedings of the KIEE Conference
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    • 1999.07g
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    • pp.3328-3330
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    • 1999
  • In this paper, the fabrication of a micro actuator with a micro electromagnet and an actuator diaphragm is presented. The micro electromagnet consists of a magnetic core and a micro inductive planar coil. The actuator diaphragm is the p+ silicon diaphragm on both sides of which magnetostrictive materials are deposited by sputtering. The micro electromagnet is fabricated by sputtering, evaporating, etching and electroplating. The magnetic flux density of the micro electromagnet is measured by using the gauss meter. The deflection of the actuator diaphragm is measured by using the laser vibrometer and optic microscope.

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Comparison of the shear bond strength of self-etching dentin bonding agents to dentin (자가부식형 상아질 접착제와 상아질과의 전단결합강도 비교)

  • Noh, Su-Jeong;Kim, Bu-Sub;Chung, In-Sung
    • Journal of Technologic Dentistry
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    • v.29 no.2
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    • pp.141-150
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    • 2007
  • The purpose of this study was to ascertain the bonding durability of self-etching dentin bonding agents to dentin by means of shear bonding strength. Several acid-etching dentin bonding system (ESPE Z100) and self-etching dentin bonding systems (DEN-FIL, GRADIA DIRET) were used. The occlusion surface of human molars were ground flat to expose dentin and treated with the etch bonding system according to manufactures instruction and followed by composite resin application. After 24hours of storage at 37$^{\circ}C$, the shear bonding strength of the specimens was measured in a universal testing machine with a 1mm/min crosshead speed. An one-way analysis of variance and the scheffe test were performed to identify significant differences (p<0.05). The bonded interfacial surfaces and treated dentin surfaces were examined using a SEM. Through the analysis of shear bond strength data and micro-structures of dentin-resin interfaces, following results are obtained. In dentin group, the shear bond strength of DEN-FIL showed statistical superiority in comparison to the other groups and followed by ESPE Z100 and GRADIA DIRECT (p<0.05).

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Impact of Wet Etching on the Tribological Performance of 304 Stainless Steel in Hydrogen Compressor Applications

  • Chan-Woo Kim;Sung-Jun Lee;Chang-Lae Kim
    • Tribology and Lubricants
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    • v.40 no.3
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    • pp.71-77
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    • 2024
  • Hydrogen has emerged as an eco-friendly and sustainable alternative to fossil fuels. However, the utilization of hydrogen requires high-pressure compression, storage, and transportation, which poses challenges to the durability of compressor components, particularly the diaphragm. This study aims to improve the durability of 304 stainless steel diaphragms in hydrogen compressors by optimizing their surface roughness and corrosion resistance through wet etching. The specimens were prepared by immersing 304 stainless steel in a mixture of sulfuric acid and hydrogen peroxide, followed by etching in hydrochloric acid for various durations. The surface morphology, roughness, and wettability of the etched specimens were characterized using optical microscopy, surface profilometry, and water contact angle measurements. The friction and wear characteristics were evaluated using reciprocating sliding tests. The results showed that increasing the etching time led to the development of micro/nanostructures on the surface, thereby increasing surface roughness and hydrophilicity. The friction coefficient initially decreased with increasing surface roughness owing to the reduced contact area but increased during long-term wear owing to the destruction and delamination of surface protrusions. HCl-30M exhibited the lowest average friction coefficient and a balance between the surface roughness and oxide film formation, resulting in improved wear resistance. These findings highlight the importance of controlling the surface roughness and oxide film formation through etching optimization to obtain a uniform and wear-resistant surface for the enhanced durability of 304 stainless steel diaphragms in hydrogen compressors.

Micromachining Thin Metal Film Using Laser Photo Patterning Of Organic Self-Assembled Monolayers (유기 자기조립 단분자막의 레이저 포토 패터닝을 이용한 금속 박막의 미세 형상 가공 기술)

  • 최무진;장원석;신보성;김재구
    • Proceedings of the Korean Society of Precision Engineering Conference
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    • 2003.06a
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    • pp.219-222
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    • 2003
  • Self-Assembled Monolayers(SAMs) by alkanethiol adsorption to thin metal film are widely being investigated for applications as coating layer for anti-stiction or friction reduction and in fabrication of micro structure of molecular and bio molecular. Recently, there have been many researches on micro patterning using the advantages of very thin thickness and etching resistance in selective etching of thin metal film of Self- Assembled Monolayers. In this report, we present the micromachining thin metal film by Mask-Less laser patterning of alknanethiolate Self-Assembled Monolayers.

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