• Journal of the Semiconductor & Display Technology
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• v.9 no.1
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• pp.17-21
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• 2010

Currently miniaturized electron-optical columns find their way into electron beam lithography systems. For better lithography process, it is required to make smaller spot size and longer working distance. But, the micro-columns of the multi-beam lithography system suffer from chromatic and spherical aberration, even when the electron beam is exactly on the symmetric axis of the micro-column. The off-axis error of the electron emitting source is expected to become worse with increasing off-axis distance of the focusing spot. Especially the electron beams far from the system optical axis have a non-negligible asymmetric intensity distribution in the micro-column. In this paper, the effect of the off-axis e-beam source is analyzed. To analyze this effect is to introduce a micro-column model of which the e-beam emitting source is aligned with the center of the electron beam by shifting them perpendicular to the system optical axis. The presented solution can be used to analysis the performance of the multi-electron-beam system. The performance parameters, such as the working distances and the focusing position are obtained by the computational simulations as a function of the off-axis distance of the emitting source.

• Proceedings of the Korean Society of Precision Engineering Conference
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• 2011.06a
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• pp.777-778
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• 2011

• Journal of the Semiconductor & Display Technology
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• v.8 no.4
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• pp.43-48
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• 2009

The aim of this paper is to describe the development of the electron-beam optic analysis algorithm for simulating the e-beam behavior concerned with electrostatic lenses and their focal properties in the micro-column of the multi-beam lithography system. The electrostatic lens consists of an array of electrodes held at different potentials. The electrostatic lens, the so-called einzel lens, which is composed of three electrodes, is used to focus the electron beam by adjusting the voltages of the electrodes. The optics of an electron beam penetrating a region of an electric field is similar to the situation in light optics. The electron is accelerated or decelerated, and the trajectory depends on the angle of incidence with respect to the equi-potential surfaces of the field. The performance parameters, such as the working distances and the beam diameters are obtained by the computational simulations as a function of the focusing voltages of the einzel lens electrodes. Based on the developed simulation algorithm, the high performance of the micro-column can be achieved through optimized control of the einzel lens.

• Proceedings of the Korean Society of Precision Engineering Conference
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• 2008.06a
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• pp.939-940
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• 2008

• Proceedings of the Korean Society of Precision Engineering Conference
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• 2010.11a
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• pp.535-536
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• 2010

• Proceedings of the Korean Society of Precision Engineering Conference
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• 2008.11a
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• pp.285-286
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• 2008

• Proceedings of the Korean Society of Precision Engineering Conference
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• 2009.10a
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• pp.383-384
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• 2009

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.20 no.6
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• pp.481-486
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• 2007

In large area scanning with a micro-electron-column, the operating condition for the best resolution was investigated in factors of working distance and field of view. The resolution of a test sample was dependent on electron beam energy and scanning field size. The best resolution with single deflector was obtained at 300 V and 30 mm in the electron emitting tip voltage and a working distance, respectively. The scanning area at that condition was $13.9{\times}13.9mm^2$, linearly increased with the working distance. Double deflector was employed for larger scanning size without increasing working distance, but showed only 1.7 times larger than that of single deflector, and the resolution was inverse proportional to the scanning size.

• Korean Journal of Optics and Photonics
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• v.17 no.4
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• pp.354-358
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• 2006

A silicon lens and an insulator of pyrex, components of a micro-electron column, should be assembled by aligning and stacking simultaneously. An optical alignment of a diffraction beam and a laser welding were employed for the assembly of a source lens and an Einzel lens with precision within $\pm$4% for the maximum aperture size. The experimental condition for optical alignment and laser welding are explained. Anodic bonding was used to assist in stacking lenses. A micro-electron column of smaller apertures assembled with precise alignment and fabrication was tested with a current image of a Cu grid of 9$\mu$m in linewidth, and showed a higher resolution in acceleration mode.

• Korean Journal of Optics and Photonics
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• v.13 no.4
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• pp.314-318
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• 2002

We examine the adjustment of the semiconvergent angle and current for the miniaturized micro column working at low voltage but producing maximized current. Our study shows that the minimum electron beam sizes are 10 ㎚ for the cold field emitter (CFE) and 20 ㎚ for the thermal field emitter (TFE) at a given condition.